-
公开(公告)号:US20220226962A1
公开(公告)日:2022-07-21
申请号:US17617118
申请日:2020-06-04
申请人: KURARAY CO., LTD.
发明人: Mitsuru KATO , Hirofumi KIKUCHI , Chihiro OKAMOTO , Shinya KATO
IPC分类号: B24B37/24 , B24B37/26 , B24B53/017
摘要: Disclosed is a polishing pad including a polishing layer having a polishing surface, wherein the polishing surface includes a deep-groove region having a first pattern formed by a deep groove or hole having a depth of 0.3 mm or more, and a land region that is a region other than the deep-groove region, and the land region includes shallow recesses having a second pattern and a depth of 0.01 to 0.1 mm, and a plurality of island-like land portions surrounded by the shallow recesses and having a maximum distance in a horizontal direction of 8 mm or less.
-
公开(公告)号:US20190218697A1
公开(公告)日:2019-07-18
申请号:US16368190
申请日:2019-03-28
申请人: KURARAY CO., LTD.
发明人: Kimio NAKAYAMA , Nobuo TAKAOKA , Mitsuru KATO , Hirofumi KIKUCHI
摘要: Disclosed herein is a method for manufacturing a polishing pad, including the step of filling the interior of bundles of ultrafine fibers which have an average fineness of from 0.01 to 0.8 dtex with a polymeric elastomer having a glass transition temperature of −10° C. or below, storage moduli at 23° C. and 50° C. of from 90 to 900 MPa, and a water absorption ratio, when saturated with water at 50° C. of from 0.2 to 5 mass %. Also disclosed herein are polishing pads obtained by the method above.
-