摘要:
An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.
摘要:
An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.
摘要:
An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device.
摘要:
An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device.
摘要:
A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.
摘要:
A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.
摘要:
With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe inputted to the pressure type flow control apparatus is changed to detect the magnitude ΔV of change of a flow rate output signal Qo from the pressure type flow control apparatus while the flow rate setting value Qe is changed, so that normal functioning of the releasing operations of the valve on the downstream side of the throttle mechanism is confirmed when the magnitude ΔV of change of the flow rate output signal Qo is above the predetermined value. If the releasing operations are malfunctioning, the magnitude ΔV of changes is found to be below the predetermined value.
摘要:
With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe inputted to the pressure type flow control apparatus is changed to detect the magnitude ΔV of change of a flow rate output signal Qo from the pressure type flow control apparatus while the flow rate setting value Qe is changed, so that normal functioning of the releasing operations of the valve on the downstream side of the throttle mechanism is confirmed when the magnitude ΔV of change of the flow rate output signal Qo is above the predetermined value. If the releasing operations are malfunctioning, the magnitude ΔV of changes is found to be below the predetermined value.
摘要:
A method for detecting abnormality in a fluid supply line is provided that uses a fluid control apparatus with a pressure sensor so that abnormality of malfunction and sheet leaks of a plurality of valves incorporated into the fluid supply line can be checked easily, promptly and accurately by operating the flow rate control apparatus possessing the pressure sensor. Specifically, using a fluid supply line provided with the flow rate control apparatus possessing the pressure sensor equipped with a flow rate setting mechanism, a flow rate/pressure display mechanism, and/or a flow rate self-diagnosis mechanism, abnormality of the control valves, installed with the flow rate control apparatus and on the upstream side and downstream side thereof, is detected by using the pressure value displayed and/or the value diagnosed with a self-diagnosis mechanism of the flow rate control apparatus.
摘要:
A method for detecting abnormality in a fluid supply line is provided that uses a fluid control apparatus with a pressure sensor so that abnormality of malfunction and sheet leaks of a plurality of valves incorporated into the fluid supply line can be checked easily, promptly and accurately by operating the flow rate control apparatus possessing the pressure sensor. Specifically, using a fluid supply line provided with the flow rate control apparatus possessing the pressure sensor equipped with a flow rate setting mechanism, a flow rate/pressure display mechanism, and/or a flow rate self-diagnosis mechanism, abnormality of the control valves, installed with the flow rate control apparatus and on the upstream side and downstream side thereof. is detected by using the pressure value displayed and/or the value diagnosed with a self-diagnosis mechanism of the flow rate control apparatus.