Optical condenser system for light scanning apparatus
    1.
    发明授权
    Optical condenser system for light scanning apparatus 失效
    光学扫描仪用光电聚光系统

    公开(公告)号:US5774250A

    公开(公告)日:1998-06-30

    申请号:US839156

    申请日:1997-04-23

    CPC分类号: G02B26/125

    摘要: An optical condenser system for a light scanning apparatus includes a first lens which is a single lens formed of plastic and a second lens which is a plano-convex lens formed of glass and convex toward the scanning surface. The first lens is concave toward a deflector of the light scanning apparatus and each side of the first lens is an aspheric surface defined by the following formula (6). The first and second lens satisfying the following formulae (1) to (5) 0.1f.ltoreq.d.sub.0 .ltoreq.0.3f (1) 0.02f.ltoreq.d.sub.2 .ltoreq.0.2f (2) -1.0.times.10.sup.2 /f.sup.3 .ltoreq.a.sub.1 .ltoreq.-1.0/f.sup.3( 3) 5.0.times.10/f.sup.5 .ltoreq.a.sub.2 .ltoreq.5.0.times.10.sup.3 /f.sup.5( 4) -0.3/f.ltoreq.1/f.sub.1 .ltoreq.0.3f (5) z=ch.sup.2 /�1+{1-(1+K)c.sup.2 h.sup.2}.sup.1/2 !+a.sub.1 h.sup.4 +a.sub.2 h.sup.6 +a.sub.3 h.sup.8 +a.sub.4 h.sup.10 ( 6) wherein f represents the focal length (mm) of the whole system, d.sub.0 represents the axial surface separation (mm) between the deflecting point at the deflector and the first lens, d.sub.2 represents the axial surface separation (mm) between the first lens and the second lens and f.sub.1 represents the focal length (mm) of the first lens.

    摘要翻译: 一种用于光扫描装置的光学聚光器系统包括:第一透镜,其是由塑料形成的单个透镜,第二透镜是由玻璃形成并且朝向扫描表面凸出的平凸透镜。 第一透镜对于光扫描装置的偏转器是凹形的,并且第一透镜的每一侧是由下式(6)限定的非球面。 满足以下公式(1)至(5)的第一和第二透镜0.1f

    Substrate processing apparatus
    2.
    发明授权
    Substrate processing apparatus 有权
    基板加工装置

    公开(公告)号:US07862680B2

    公开(公告)日:2011-01-04

    申请号:US12149829

    申请日:2008-05-08

    CPC分类号: H01L21/6708 B08B3/02

    摘要: A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 along the peripheral part of the wafer W relatively. The fluid suppliers 61, 62, 63 are arranged in a direction extending from the circumference of the wafer W to its inside. With the arrangement, the apparatus is capable of stable processing of the wafer W in spite of rotating the wafer W at a low speed. Further, it is possible to improve a throughput of the apparatus in resist processing.

    摘要翻译: 提供了一种基板处理装置。 该装置包括用于供应不同加工流体的多个流体供应器61,61,63。 在处理晶片W时,基板处理装置沿着晶片W的周边部分相对移动流体供给部61,62,63。 流体供应部61,62,63沿着从晶片W的圆周向内延伸的方向配置。 通过这种布置,尽管晶片W以低速旋转,该装置能够稳定地处理晶片W. 此外,可以提高抗蚀剂处理中的装置的生产量。

    Liquid processing apparatus and liquid processing method
    4.
    发明授权
    Liquid processing apparatus and liquid processing method 有权
    液体处理装置和液体处理方法

    公开(公告)号:US07493904B2

    公开(公告)日:2009-02-24

    申请号:US11361926

    申请日:2006-02-24

    申请人: Osamu Kuroda

    发明人: Osamu Kuroda

    IPC分类号: B08B5/00

    摘要: A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a carrier stock section capable of storing a plurality of carriers, an interface section for transferring the wafers W between the carrier stock section and the liquid processing section, a carrier transfer device for transferring the carrier, a wafer inspecting device for inspecting the wafers W within the carrier, and a carrier transfer device control section for controlling the carrier transfer device. The carrier transfer device control section controls the carrier transfer device such that the carrier, which has been judged to be capable of a liquid processing on the basis of the result of the inspection of the wafers W, is stored in the carrier stock section, and the liquid processing is started after completion of the inspection of a predetermined number of carriers.

    摘要翻译: 一种液体处理装置,包括用于向晶片W施加液体处理的液体处理部分,用于输送容纳晶片W的载体的载体传送部分,能够存储多个载体的载体存储部分,用于传送晶片的界面部分 载体储存部分和液体处理部分之间的W,用于传送载体的载体传送装置,用于检查载体内的晶片W的晶片检查装置和用于控制载体传送装置的载体传送装置控制部分。 载体传送装置控制部控制载体传送装置,使得基于晶片W的检查结果判断为能够进行液体处理的载体被存储在载体存储部中,并且 在完成预定数量的载体的检查之后开始液体处理。

    Method For Analyzing Tone Quality Of Exhaust Sound
    5.
    发明申请
    Method For Analyzing Tone Quality Of Exhaust Sound 失效
    分析排气声音质量的方法

    公开(公告)号:US20080125992A1

    公开(公告)日:2008-05-29

    申请号:US11658536

    申请日:2005-06-28

    申请人: Osamu Kuroda

    发明人: Osamu Kuroda

    IPC分类号: G01H17/00

    摘要: According to evaluation of tone quality of exhaust sound adapted to human audition, a characteristic of the tone quality of exhaust sound is objectively analyzed. There are provided a measuring process (M1) for sampling exhaust sound to be analyzed, by means of a microphone disposed in an exhaust system EX and converting the exhaust sound into an electric signal, an analyzing process (M2) for amplifying a high frequency component of the electric signal and performing a frequency analysis of the electric signal at an arbitrary time interval, a detecting process (M3) for detecting a first formant of the first peak from the low frequency side and a second formant of the second peak from the low frequency side, and a displaying process (M4) for displaying a relationship (brightness and sharpness) between the first formant and second formant in a predetermined time range.

    摘要翻译: 根据适合人体试听的排气声音质量评估,客观分析排气声音质量的特点。 提供了一种用于通过设置在排气系统EX中的麦克风来抽取要分析的废气声音的测量过程(M 1),并将排气声音转换为电信号,用于放大高频的分析过程(M 2) 并且以任意时间间隔对电信号进行频率分析,检测从低频侧检测第一峰值的第一共振峰的检测处理(M 3)和第二峰值的第二共振峰 以及用于在预定时间范围内显示第一共振峰和第二共振峰之间的关系(亮度和锐度)的显示处理(M 4)。

    SUBSTRATE PROCESSING APPARATUS
    6.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 有权
    基板加工设备

    公开(公告)号:US20070105379A1

    公开(公告)日:2007-05-10

    申请号:US11616075

    申请日:2006-12-26

    IPC分类号: H01L21/302

    摘要: The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.

    摘要翻译: 衬底处理设备具有包围衬底支撑构件以限定处理空间的封闭结构。 外壳结构具有由快门关闭的开口。 供给处理流体(如化学液体)的处理流体供应单元容纳在壳体中。 容纳在壳体中的处理流体供应单元通过外壳结构的打开而进入处理空间,以将处理流体供给到由基板支撑构件支撑的基板上。

    Liquid processing apparatus and method
    9.
    发明授权
    Liquid processing apparatus and method 有权
    液体处理装置及方法

    公开(公告)号:US06811618B2

    公开(公告)日:2004-11-02

    申请号:US10304749

    申请日:2002-11-27

    申请人: Osamu Kuroda

    发明人: Osamu Kuroda

    IPC分类号: B08B302

    摘要: In one embodiment of a liquid processing apparatus, a cleaning unit (CLN) 12 includes a rotary plate 61, supporting members 64a, holding members 64b, a chemical nozzle 51 for supplying a wafer W with a chemical liquid, a spring 120 and a pressing mechanism 121 both of which moves each of the holding members 64b. The pressing mechanism 121 moves the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a and conversely, the wafer W is supported by the supporting members 64a while the wafer W is apart from the holding members 64b. The spring 120 holds the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a. By supplying the wafer W held by the holding members 64b with the cleaning liquid, it is possible to prevent an occurrence of unprocessed portions on the cleaned wafer W, accomplishing a uniform cleaning for the wafer W.

    摘要翻译: 在液体处理装置的一个实施例中,清洁单元(CLN)12包括旋转板61,支撑构件64a,保持构件64b,用于向晶片W供给化学液体的化学喷嘴51,弹簧120和按压 两个机构121都移动每个保持构件64b。 按压机构121移动相应的保持构件64b,使得晶片W被保持构件64b保持,同时晶片W与支撑构件64a分离,相反,晶片W由支撑构件64a支撑,同时晶片W 与保持构件64b分离。 弹簧120保持相应的保持构件64b,使得晶片W被保持构件64b保持,同时晶片W与支撑构件64a分离。 通过将由保持构件64b保持的晶片W供给清洁液,可以防止在清洁的晶片W上发生未处理部分,从而对晶片W进行均匀的清洁。

    Transferring apparatus and substrate processing apparatus
    10.
    发明授权
    Transferring apparatus and substrate processing apparatus 有权
    转印装置和基板处理装置

    公开(公告)号:US06761178B2

    公开(公告)日:2004-07-13

    申请号:US09998431

    申请日:2001-11-28

    IPC分类号: B08B304

    摘要: A cleaning apparatus 11 includes a cleaning bath 30 for cleaning wafers W, a wafer guide 31 moving up and down to accommodate the wafers W in the cleaning bath 30, a motor 49 for moving the wafer guide 31 up and down, an absolute encoder 33 for detecting the position of the wafer guide 31, a driver 62 and a controller 63. The absolute encoder 33 detects a rotational angle of a rotating shaft 53 of the motor 49 and outputs a detection signal to the driver 62. Based on this detection signal, the driver 62 detects the position of the wafer guide 31 and further outputs the positional information of the wafer guide 31 to the controller 63. Thus, the invention provides a transferring apparatus and a substrate processing apparatus both of which allow of easy detection of the wafer guide and further facilitate their maintenance.

    摘要翻译: 清洁装置11包括用于清洁晶片W的清洗槽30,上下移动以容纳清洗槽30中的晶片W的晶片引导件31,用于上下移动晶片引导件31的电机49,绝对编码器33 用于检测晶片引导件31的位置,驱动器62和控制器63.绝对值编码器33检测马达49的旋转轴53的旋转角度,并向驱动器62输出检测信号。基于该检测信号 驱动器62检测晶片引导件31的位置,并且进一步将晶片引导件31的位置信息输出到控制器63.因此,本发明提供了一种转移装置和基板处理装置,其能够容易地检测 晶圆导板,进一步便于维护。