摘要:
An optical condenser system for a light scanning apparatus includes a first lens which is a single lens formed of plastic and a second lens which is a plano-convex lens formed of glass and convex toward the scanning surface. The first lens is concave toward a deflector of the light scanning apparatus and each side of the first lens is an aspheric surface defined by the following formula (6). The first and second lens satisfying the following formulae (1) to (5) 0.1f.ltoreq.d.sub.0 .ltoreq.0.3f (1) 0.02f.ltoreq.d.sub.2 .ltoreq.0.2f (2) -1.0.times.10.sup.2 /f.sup.3 .ltoreq.a.sub.1 .ltoreq.-1.0/f.sup.3( 3) 5.0.times.10/f.sup.5 .ltoreq.a.sub.2 .ltoreq.5.0.times.10.sup.3 /f.sup.5( 4) -0.3/f.ltoreq.1/f.sub.1 .ltoreq.0.3f (5) z=ch.sup.2 /�1+{1-(1+K)c.sup.2 h.sup.2}.sup.1/2 !+a.sub.1 h.sup.4 +a.sub.2 h.sup.6 +a.sub.3 h.sup.8 +a.sub.4 h.sup.10 ( 6) wherein f represents the focal length (mm) of the whole system, d.sub.0 represents the axial surface separation (mm) between the deflecting point at the deflector and the first lens, d.sub.2 represents the axial surface separation (mm) between the first lens and the second lens and f.sub.1 represents the focal length (mm) of the first lens.
摘要:
A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 along the peripheral part of the wafer W relatively. The fluid suppliers 61, 62, 63 are arranged in a direction extending from the circumference of the wafer W to its inside. With the arrangement, the apparatus is capable of stable processing of the wafer W in spite of rotating the wafer W at a low speed. Further, it is possible to improve a throughput of the apparatus in resist processing.
摘要:
When cassettes are placed on a conveyor disposed in a cassette loader and detectors disposed on a support plate on the conveyor detect information of identification strips on side walls of the cassettes, the cassettes are judged as being loaded properly in the cassette loader. When the detectors fail to detect the identification strips, the cassettes are judged as not being loaded in a desired state in the cassette loader.
摘要:
A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a carrier stock section capable of storing a plurality of carriers, an interface section for transferring the wafers W between the carrier stock section and the liquid processing section, a carrier transfer device for transferring the carrier, a wafer inspecting device for inspecting the wafers W within the carrier, and a carrier transfer device control section for controlling the carrier transfer device. The carrier transfer device control section controls the carrier transfer device such that the carrier, which has been judged to be capable of a liquid processing on the basis of the result of the inspection of the wafers W, is stored in the carrier stock section, and the liquid processing is started after completion of the inspection of a predetermined number of carriers.
摘要:
According to evaluation of tone quality of exhaust sound adapted to human audition, a characteristic of the tone quality of exhaust sound is objectively analyzed. There are provided a measuring process (M1) for sampling exhaust sound to be analyzed, by means of a microphone disposed in an exhaust system EX and converting the exhaust sound into an electric signal, an analyzing process (M2) for amplifying a high frequency component of the electric signal and performing a frequency analysis of the electric signal at an arbitrary time interval, a detecting process (M3) for detecting a first formant of the first peak from the low frequency side and a second formant of the second peak from the low frequency side, and a displaying process (M4) for displaying a relationship (brightness and sharpness) between the first formant and second formant in a predetermined time range.
摘要:
The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.
摘要:
An exhaust gas purification apparatus for use in an internal combustion engine comprises an exhaust gas duct connected to the engine through which the exhaust gas containing NOx gas passes and a catalyst so disposed in the exhaust gas duct that it contacts with the exhaust gas.The catalyst chemically adsorbs NOx under the condition that a stoichiometric amount of a gaseous oxidizing agent present in the exhaust gas is larger than that of a gaseous reducing agent present in the exhaust gas for reducing NOx, while NOx being adsorbed is catalytically reduced in the presence of the reducing agent under the condition that the stoichiometric amount of the oxidizing agent is not larger that of the reducing agent.Thereby, NOx, the lean burn exhaust gas in the engine can be effectively made harmlessly.
摘要:
In an exhaust gas purifying apparatus provided with a lean NOx catalyst supporting a catalyst layer, which contains a NOx trapping component, on a honeycomb substrate formed so as not to cause an alkali attack, the invention prevents trapped NOx from being dissociated and exhausted during the time of a rich spike. A NOx reducing catalyst with the function of reducing NOx by a reductant in a rich or stoichiometric condition, e.g., a three-way catalyst, is disposed downstream of the lean NOx catalyst. In the case of increasing the amount of the NOx trapping component in the lean NOx catalyst to enhance a NOx trapping capability, even if a part of trapped NOx is dissociated during the time of the rich spike, the dissociated NOx can be reduced by the NOx reducing catalyst disposed on the downstream side.
摘要:
In one embodiment of a liquid processing apparatus, a cleaning unit (CLN) 12 includes a rotary plate 61, supporting members 64a, holding members 64b, a chemical nozzle 51 for supplying a wafer W with a chemical liquid, a spring 120 and a pressing mechanism 121 both of which moves each of the holding members 64b. The pressing mechanism 121 moves the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a and conversely, the wafer W is supported by the supporting members 64a while the wafer W is apart from the holding members 64b. The spring 120 holds the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a. By supplying the wafer W held by the holding members 64b with the cleaning liquid, it is possible to prevent an occurrence of unprocessed portions on the cleaned wafer W, accomplishing a uniform cleaning for the wafer W.
摘要:
A cleaning apparatus 11 includes a cleaning bath 30 for cleaning wafers W, a wafer guide 31 moving up and down to accommodate the wafers W in the cleaning bath 30, a motor 49 for moving the wafer guide 31 up and down, an absolute encoder 33 for detecting the position of the wafer guide 31, a driver 62 and a controller 63. The absolute encoder 33 detects a rotational angle of a rotating shaft 53 of the motor 49 and outputs a detection signal to the driver 62. Based on this detection signal, the driver 62 detects the position of the wafer guide 31 and further outputs the positional information of the wafer guide 31 to the controller 63. Thus, the invention provides a transferring apparatus and a substrate processing apparatus both of which allow of easy detection of the wafer guide and further facilitate their maintenance.