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81 条记录 (耗时 0.034 秒)

    Mold structure
    6.
    发明授权
    Mold structure 失效
    模具结构

    公开(公告)号：US07850441B2

    公开(公告)日：2010-12-14

    申请号：US11946198

    申请日：2007-11-28

    申请人： Toshihiro Usa ,  Kenji Ichikawa ,  Kazunori Komatsu

    发明人： Toshihiro Usa ,  Kenji Ichikawa ,  Kazunori Komatsu

    IPC分类号： B29D17/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/743 ,  G11B5/855 ,  Y10S425/81

    摘要： There is provided a mold structure containing a substrate, and a plurality of convex portions formed in the shape of concentric circles at predetermined intervals on one surface of the substrate, wherein a cross-sectional shape of the convex portions with respect to a radial direction of the concentric circles is such that a middle width M of each of the convex portions with respect to a heightwise direction is greater than a width T of a top portion of each of the convex portions with respect to the radial direction of the concentric circles.

    摘要翻译： 提供了一种包含基板的模具结构和在基板的一个表面上以预定间隔形成为同心圆形的多个凸部，其中凸部相对于基板的径向的横截面形状 同心圆使得每个凸部相对于高度方向的中间宽度M相对于同心圆的径向方向大于每个凸部的顶部的宽度T。

    Electron beam lithography apparatus and method for compensating for electron beam misalignment
    7.
    发明授权
    Electron beam lithography apparatus and method for compensating for electron beam misalignment 有权
    电子束光刻装置及补偿电子束失准的方法

    公开(公告)号：US07807988B2

    公开(公告)日：2010-10-05

    申请号：US11851188

    申请日：2007-09-06

    申请人： Toshihiro Usa ,  Kazunori Komatsu

    发明人： Toshihiro Usa ,  Kazunori Komatsu

    IPC分类号： H01J3/26 ,  G11B9/10

    CPC分类号： H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1472 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/30461 ,  Y10S430/143

    摘要： Linear movement direction of the stage and the actual deflection direction of the electron beam deflected by the first command signal for deflecting the electron beam in the linear movement direction of the stage do not necessarily align with each other for reasons such as the disposition precision of the stage driving device, a lens system, and the deflecting device. Therefore, the first command signal output from the first command device is processed based on the angle between the linear movement direction of the stage driven by the stage driving device and the deflection direction of the electron beam deflected by the first command signal so that the deflection direction of the electron beam aligns with the linear movement direction of the stage. With this processed first command signal, the deflection direction of the electron beam can be changed (rotated) to align with the linear movement direction of the stage.

    摘要翻译： 由于第一命令信号偏转的电子束的线性运动方向和用于使电子束沿着平台的线性移动方向偏转的实际偏转方向，不一定对准，原因如 舞台驱动装置，透镜系统和偏转装置。 因此，从第一指令装置输出的第一命令信号基于由载物台驱动装置驱动的载物台的线性移动方向与由第一命令信号偏转的电子束的偏转方向之间的角度被处理，使得偏转 电子束的方向与载物台的线性运动方向对齐。 利用该处理的第一命令信号，可以改变（旋转）电子束的偏转方向以与平台的线性移动方向对齐。

    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM
    8.
    发明申请
    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM 失效
    电子束写入方法，精细图案写入系统，制造未加载图案的基板的方法以及制造磁盘介质的方法

    公开(公告)号：US20090212230A1

    公开(公告)日：2009-08-27

    申请号：US12393117

    申请日：2009-02-26

    申请人： Toshihiro USA ,  Kazunori Komatsu

    发明人： Toshihiro USA ,  Kazunori Komatsu

    IPC分类号： H01J3/14 ,  G12B21/00

    CPC分类号： G11B5/855 ,  B82Y10/00 ,  B82Y25/00 ,  B82Y30/00 ,  G11B5/743 ,  G11B5/82 ,  G11B5/865 ,  G11B9/10 ,  Y10S430/143

    摘要： When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron beam while rotating the substrate in one direction, a long element is written by scanning the electron beam with the middle position of a 2-bit signal length as the center position of the electron beam so as to completely fill the area of the writing length reduced by a predetermined ratio and an unwritten portion of predetermined width remaining on each side of the long element with respect to a final 2-bit signal length on a magnetic disk medium.

    摘要翻译： 当通过在与基板的径向正交的方向上快速振动电子束在施加有抗蚀剂的基板上进行写入时，并且在使基板沿一个方向旋转的同时XY偏转电子束，通过扫描电子束来写入长元件 以2位信号长度的中间位置作为电子束的中心位置，以便完全填充以预定比率减小的写入长度的区域，并且在长元件的每一侧残留预定宽度的未写入部分 相对于磁盘介质上最后的2位信号长度。

    Electron beam lithography method
    9.
    发明授权
    Electron beam lithography method 失效
    电子束光刻法

    公开(公告)号：US07141356B2

    公开(公告)日：2006-11-28

    申请号：US11169575

    申请日：2005-06-30

    申请人： Toshihiro Usa ,  Kazunori Komatsu

    发明人： Toshihiro Usa ,  Kazunori Komatsu

    IPC分类号： G03C5/00 ,  G11B7/00

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  Y10S430/143

    摘要： Deflecting means, for deflecting an electron beam in a radial direction and the circumferential direction, and blanking means, for shielding irradiation of the electron beam at portions other than drawing portions, are provided. While the disk is rotated unidirectionally, the electron beam is repeatedly deflected in a figure 8 pattern, in which the electron beam is deflected toward the next deflection initiation point in the radial direction at track edge portions, such that the deflected directions toward the inner periphery of the disk and toward the outer periphery of the disk intersect each other. Parallel scanning is performed alternately toward the outer periphery and the inner periphery of the disk. Elements of a transfer pattern, having lengths which are integer multiples of a reference value, are drawn by performing scanning a number of times equal to the integer that the reference value is multiplied by.

    摘要翻译： 提供用于使电子束沿径向和圆周方向偏转的偏转装置，以及用于屏蔽除了拉伸部分之外的部分处的电子束照射的消隐装置。 当盘被单向旋转时，电子束在图8 图案中被重复地偏转，其中电子束在径向方向上沿着径向方向偏转到下一个偏转起始点 边缘部分，使得朝向盘的内周和朝向盘的外周的偏转方向彼此相交。 交替地向盘的外周和内周进行并行扫描。 通过执行等于参考值乘以的整数的次数来绘制具有作为参考值的整数倍的长度的传送图案的元素。