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29 条记录 (耗时 0.146 秒)

    Oxime ester photoinitiators
    4.
    发明授权
    Oxime ester photoinitiators 有权
    肟酯光引发剂

    公开(公告)号：US07759043B2

    公开(公告)日：2010-07-20

    申请号：US11660346

    申请日：2005-08-08

    申请人： Junichi Tanabe ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    发明人： Junichi Tanabe ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    IPC分类号： G03C1/00 ,  C07D213/00 ,  C07D207/00 ,  C07D209/56 ,  C09B5/00 ,  G03F7/26 ,  C08F2/50

    CPC分类号： G03F7/031 ,  B33Y70/00 ,  C07D209/86 ,  C07D413/10

    摘要： Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.

    摘要翻译： 式（I）化合物，其中R 1，R 2和R 10彼此独立地是C 1 -C 20烷基，苯基，C 1 -C 12烷基苯基或苯基-C 1 -C 6烷基; R 3和R 4彼此独立地是氢，C 1 -C 20烷基，NR 6 R 7或SR 8，条件是R 3或R 4中的至少一个是NR 6 R 7或SR 8; R5是氢或C1-C20烷基; R 6和R 7彼此独立地是C 1 -C 20烷基，或者R 6和R 7与它们所连接的N原子一起形成5或6元环，其任选地被O，S或NR 9中断，并且任选地另外是 被一个或多个C 1 -C 4烷基取代; R8是苯基，联苯基，萘基，蒽基或菲基，它们全部被一个或多个C 1 -C 4烷基取代; 且R 9为氢，C 1 -C 20烷基，C 2 -C 4羟烷基或苯基; 在光聚合反应中表现出出人意料的良好性能。

    Photosensitive resin composition
    5.
    发明授权
    Photosensitive resin composition 有权
    感光树脂组合物

    公开(公告)号：US07829257B2

    公开(公告)日：2010-11-09

    申请号：US09734635

    申请日：2000-12-12

    申请人： Hidetaka Oka ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Masaki Ohwa ,  Junichi Tanabe

    发明人： Hidetaka Oka ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Masaki Ohwa ,  Junichi Tanabe

    IPC分类号： G03C1/00

    CPC分类号： C08F2/50 ,  G03F7/031

    摘要： Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR3, SR4 or NR5R6; or M1, when x is 3, is a trivalent group, optionally substituted; R3 is for example hydrogen or C1-C12alkyl; C2-C6alkyl which is for example substituted by —OH, —SH, —CN, C3-C6alkenoxy, or —OCH2CH2CN; R4 is for example hydrogen, C1-C12alkyl, C3-C12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R5 and R6 independently of each other inter alia are hydrogen, C1-C12alkyl, C2-C4hydroxyalkyl, C2-C10alkoxyalkyl, C3-C5alkenyl, C3-C8cycloalkyl, phenyl-C1-C3alkyl, C1-C4alkanoyl, C3-C6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.

    摘要翻译： 光敏组合物，其包含（A）碱溶性化合物; （B）至少一种式I或II的化合物，其中R 1特别是C 4 -C 9环烷酰基，C 3 -C 12烯酰基或未取代或取代的苯甲酰基; Ar 1是C 6 -C 20芳基或C 6 -C 20芳酰基，其各自为未取代或取代的; x为2或3; M1当x为2时，特别是亚苯基或亚萘基，其各自任选被取代。 由OR3，SR4或NR5R6; 或M1，当x为3时，为任选取代的三价基团; R3是例如氢或C1-C12烷基; 例如被-OH，-SH，-CN，C 3 -C 6烯氧基或-OCH 2 CH 2 CN取代的C 2 -C 6烷基; R4是例如氢，C1-C12烷基，C3-C12链烯基，环己基或未取代或取代的苯基; R 5和R 6彼此独立地尤其是氢，C 1 -C 12烷基，C 2 -C 4羟烷基，C 2 -C 10烷氧基烷基，C 3 -C 5烯基，C 3 -C 8环烷基，苯基-C 1 -C 3烷基，C 1 -C 4烷酰基，C 3 -C 6烯酰基，苯甲酰基或苯基 未取代或取代; 和（C）可光聚合化合物; 表现出意想不到的良好性能，特别是在光刻胶技术中。

    Oxime ester photoiniators having a combined structure
    6.
    发明授权
    Oxime ester photoiniators having a combined structure 有权
    具有组合结构的肟酯光合剂

    公开(公告)号：US07189489B2

    公开(公告)日：2007-03-13

    申请号：US10480146

    申请日：2002-06-04

    申请人： Kazuhiko Kunimoto ,  Junichi Tanabe ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    发明人： Kazuhiko Kunimoto ,  Junichi Tanabe ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    IPC分类号： G03F7/004

    CPC分类号： C08F2/50 ,  B33Y70/00 ,  C07C251/66 ,  G03F7/031

    摘要： Compounds of the formulae I, II and III wherein R1 is for example hydrogen, C3–C8cycloalkyl, C1–C12alkyl, phenyl unsubstituted or substituted; R2 and R2′ for example are hydrogen, C1–C20alkyl, C3–C8cycloalkyl or phenyl, unsubstituted or substituted, or are Ar1 is for example phenyl, optionally substituted by e.g. Ar2 is for example phenylene, optionally substituted e.g. by —(CO)R7, (D), (E) or (F); Ar3 is for example phenyl; M1, M2 and M3 are, for example, C1–C20alkylene; M4 is for example direct bond, —O—, —S—, —Y—(C1–C10alkylene)-Y′—, optionally substituted; Y and Y′ are for example a direct bond or —O—; R7 is for example hydrogen, C1–C20alkyl or phenyl, optionally substituted; R8, R9, R8′ and R9′ are for example hydrogen or C1–C12alkyl, exhibit an unexpectedly good performance in photopolymerization reactions.

    摘要翻译： 式I，II和III的化合物，其中R 1是例如氢，C 3 -C 8环烷基，C 1 C 12 -C 12烷基，未取代或取代的苯基; R 2和R 2是例如氢，C 1 -C 20烷基，C 1 -C 12烷基，C 1 -C 12烷基， C 3 -C 8环烷基或未取代或取代的苯基，或者Ar 1是例如苯基，任选地被例如 Ar 2是例如亚苯基，任选被取代的例如亚苯基。 （CO）R 7，（D），（E）或（F）; Ar 3是例如苯基; M 1，M 2和M 3是例如C 1 -C 20， 亚烷基; M 4是例如直接键合，-O - ， - S-， -​​ Y-（C 1 -C 10亚烷基）-Y ' - ，任选取代; Y和Y'例如是直接键或-O-键; R 7是例如氢，C 1 -C 20烷基或任选被取代的苯基; R 8，R 9，R 8和R 9是例如氢或C 1 -C 8烷基， 1 -C 12烷基，在光聚合反应中表现出出乎意料的良好性能。

    Oxime Ester Photoinitiators
    7.
    发明申请
    Oxime Ester Photoinitiators 有权
    肟酯光引发剂

    公开(公告)号：US20080096115A1

    公开(公告)日：2008-04-24

    申请号：US11660346

    申请日：2005-08-08

    申请人： Junichi Tanabe ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    发明人： Junichi Tanabe ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    IPC分类号： C08F2/46 ,  C07D209/88 ,  G03F3/00 ,  G03F7/40

    CPC分类号： G03F7/031 ,  B33Y70/00 ,  C07D209/86 ,  C07D413/10

    摘要： Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.

    摘要翻译： 式（I）的化合物，其中R 1，R 2和R 10彼此独立地为C 1〜 C 1 -C 20烷基，苯基，C 1 -C 12烷基苯基或苯基-C 1 -C 1 -C 12烷基， C 6烷基; R 3和R 4彼此独立地是氢，C 1 -C 20烷基，NR N > 6> R 7或SR 8，条件是R 3或R 4中的至少一个是NR 6 R 7或SR 8; R 5是氢或C 1 -C 20烷基; R 6和R 7彼此独立地是C 1 -C 20烷基，或R 1和R 2彼此独立地是C 1 -C 6烷基， 6和R 7与它们所连接的N-原子一起形成5或6元环，其任选被O，S或NR 9中断， 并且其任选另外被一个或多个C 1 -C 4烷基取代; R 8是苯基，联苯基，萘基，蒽基或菲基，它们全部被任意被一个或多个C 1 -C 4烷基取代 ; R 9是氢，C 1 -C 20烷基，C 2 -C 4烷基，C 1 -C 20烷基， 羟基烷基或苯基; 在光聚合反应中表现出出人意料的良好性能。

    PHOTORESIST COMPOSITIONS
    9.
    发明申请
    PHOTORESIST COMPOSITIONS 有权
    光电组合物

    公开(公告)号：US20120038996A1

    公开(公告)日：2012-02-16

    申请号：US13255543

    申请日：2010-03-17

    申请人： Hisatoshi Kura ,  Kaori Sameshima ,  Kazuhiko Kunimoto ,  Peter Nesvadba ,  Masaki Ohwa

    发明人： Hisatoshi Kura ,  Kaori Sameshima ,  Kazuhiko Kunimoto ,  Peter Nesvadba ,  Masaki Ohwa

    IPC分类号： G02B5/22 ,  G03F7/20 ,  G03F7/40 ,  C07D401/12 ,  C08F8/32 ,  C08F8/50 ,  C07D491/113 ,  C07D211/94 ,  G03F7/028 ,  C08F2/00

    CPC分类号： G03F7/028 ,  C07D211/94 ,  C07D491/113 ,  C08F110/02 ,  C08F110/06 ,  C08F265/02 ,  C08K5/3435 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/40 ,  C08L33/06

    摘要： The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula (I) wherein Ra represents an acyl radical; one of Rb and Rc represents hydrogen and the other one represents a substituent; or Rb and Rc both represent hydrogen or identical or different substituents; or Rb and Rc together represent oxygen; or Rb and Rc together form a ring; R1-R4 each represent C1-C6 alkyl; and R5 and R6 each represent independently of one another hydrogen, C1-C6 alkyl or C6-C10 aryl; or R5 and R6 together represent oxygen.

    摘要翻译： 本发明涉及一种可自由基聚合的组合物，其包含用于制造滤色器的羟胺酯。 本发明还涉及新的羟胺酯。 本发明还涉及在需要后烘烤的所有液晶显示组件中使用羟胺酯。 本发明涉及可自由基聚合的组合物，其包含：（a）至少一种碱性显影树脂; （b）至少一种丙烯酸酯单体; （c）至少一种光引发剂; （d）至少一种式（I）的羟胺酯化合物，其中R a表示酰基; Rb和Rc之一表示氢，另一个表示取代基; 或Rb和Rc都表示氢或相同或不同的取代基; 或Rb和Rc一起代表氧; 或Rb和Rc一起形成环; R1-R4各自表示C1-C6烷基; R 5和R 6各自独立地表示氢，C 1 -C 6烷基或C 6 -C 10芳基; 或R5和R6一起表示氧。

    Photoresist compositions
    10.
    发明授权
    Photoresist compositions 有权
    光刻胶组合物

    公开(公告)号：US08507569B2

    公开(公告)日：2013-08-13

    申请号：US13255543

    申请日：2010-03-17

    申请人： Hisatoshi Kura ,  Kaori Sameshima ,  Kazuhiko Kunimoto ,  Peter Nesvadba ,  Masaki Ohwa

    发明人： Hisatoshi Kura ,  Kaori Sameshima ,  Kazuhiko Kunimoto ,  Peter Nesvadba ,  Masaki Ohwa

    IPC分类号： H05B6/68 ,  C08G61/04

    CPC分类号： G03F7/028 ,  C07D211/94 ,  C07D491/113 ,  C08F110/02 ,  C08F110/06 ,  C08F265/02 ,  C08K5/3435 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/40 ,  C08L33/06

    摘要： The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula (I) wherein Ra represents an acyl radical; one of Rb and Rc represents hydrogen and the other one represents a substituent; or Rb and Rc both represent hydrogen or identical or different substituents; or Rb and Rc together represent oxygen; or Rb and Rc together form a ring; R1-R4 each represent C1-C6 alkyl; and R5 and R6 each represent independently of one another hydrogen, C1-C6 alkyl or C6-C10 aryl; or R5 and R6 together represent oxygen.

    摘要翻译： 本发明涉及一种可自由基聚合的组合物，其包含用于制造滤色器的羟胺酯。 本发明还涉及新的羟胺酯。 本发明还涉及在需要后烘烤的所有液晶显示组件中使用羟胺酯。 本发明涉及可自由基聚合的组合物，其包含：（a）至少一种碱性显影树脂; （b）至少一种丙烯酸酯单体; （c）至少一种光引发剂; （d）至少一种式（I）的羟胺酯化合物，其中R a表示酰基; Rb和Rc之一表示氢，另一个表示取代基; 或Rb和Rc都表示氢或相同或不同的取代基; 或Rb和Rc一起代表氧; 或Rb和Rc一起形成环; R1-R4各自表示C1-C6烷基; R 5和R 6各自独立地表示氢，C 1 -C 6烷基或C 6 -C 10芳基; 或R5和R6一起表示氧。