Biarylalkylenecarbamic acid derivatives and bacteriocides for agricultural and horticultural use
    1.
    发明授权
    Biarylalkylenecarbamic acid derivatives and bacteriocides for agricultural and horticultural use 失效
    二芳基亚烷基氨基甲酸衍生物和用于农业和园艺用途的杀菌剂

    公开(公告)号:US06620961B1

    公开(公告)日:2003-09-16

    申请号:US09485689

    申请日:2000-02-25

    IPC分类号: C07C26100

    摘要: Biarylalkylenecarbamic acid derivative represented by general formula (I): [wherein Q is a phenyl group which may be substituted or the like, X is a halogen atom, a (C1-C6) alkyl group or the like, n is 0 or an integer of from 1 to 4, R1 is a (C1-C6) alkyl group or the like, R2 is a hydrogen atom, a (C1-C6) alkyl group or the like, A is a (C1-C7) alkylene group which may be branched, and G is an oxygen atom, a sulfur atom or a group —NR— (wherein R3 is a hydrogen atom or a (C1-C4) alkyl group)] and agricultural and horticultural fungicides. The agricultural and horticultural fungicides of the present invention are useful as agricultural and horticultural fungicides because they have high preventive effects on cucumber downy mildew, apple scab, wheat powdery mildew, rice blast, cucumber gray mold and rice sheath blight without damaging crops, and are excellent in residual effectiveness and rain-resistance.

    摘要翻译: 由通式(I)表示的二芳基亚烷基氨基甲酸衍生物:[其中Q为可被取代的苯基等,X为卤素原子,(C1-C6)烷基等,n为0或整数 为1〜4,R1为(C1-C6)烷基等,R2为氢原子,(C1-C6)烷基等,A为(C1-C7)亚烷基, 是支链的,G是氧原子,硫原子或-NR-(其中R3是氢原子或(C1-C4)烷基)]和农业和园艺杀真菌剂。农业和园艺杀真菌剂 本发明对农作物和园艺杀菌剂有用,因为它们对黄瓜霜霉病,苹果痂病,小麦白粉病,稻瘟病,黄瓜灰霉病和水稻纹枯病具有很好的预防作用,没有损害作物, 抵抗性。

    Photosensitive resin composition and printed wiring board
    4.
    发明授权
    Photosensitive resin composition and printed wiring board 失效
    感光树脂组合物和印刷线路板

    公开(公告)号:US06756166B2

    公开(公告)日:2004-06-29

    申请号:US10252200

    申请日:2002-09-23

    IPC分类号: G03F7038

    CPC分类号: G03F7/038 H05K3/287

    摘要: Disclosed is a photosensitive resin composition which can be developed using a dilute aqueous alkaline solution after ultraviolet ray exposure, is excellent in pot life, capable of preventing deposits from being generated in a cured coated film, capable of widening heat control tolerance, and is excellent in sensitivity, in heat resistance, in chemical resistance and in electric insulating properties, thereby rendering the composition suitable for use as a solder resist for producing a printed wiring board. This photosensitive resin composition comprises (A) an active energy ray-curable resin having at least two ethylenic unsaturated linkages per molecule thereof, (B) at least one kind material selected from acid salts of N-substituted melamine compound and acid salts of guanamine compound, (C) a photopolymerization initiator, (D) a diluent, and (E) a thermosetting compound. There is also disclosed a printed wiring board where this photosensitive resin composition is employed.

    摘要翻译: 公开了一种感光性树脂组合物,其可以在紫外线照射后使用稀碱水溶液显影,具有优异的适用期,能够防止在固化涂膜中产生沉积物,能够扩大耐热耐受性,并且优异 敏感性,耐热性,耐化学性和电绝缘性,从而使组合物适合用作制造印刷线路板的阻焊剂。 该感光性树脂组合物包含(A)每分子具有至少2个烯键式不饱和键的活性能量射线固化性树脂,(B)选自N-取代三聚氰胺化合物的酸式盐和胍胺化合物的酸盐中的至少一种 ,(C)光聚合引发剂,(D)稀释剂和(E)热固化性化合物。 还公开了使用该感光性树脂组合物的印刷电路板。

    Active energy beam curable composition and printed wiring board
    5.
    发明授权
    Active energy beam curable composition and printed wiring board 失效
    活性能量束固化组合物和印刷线路板

    公开(公告)号:US06475701B2

    公开(公告)日:2002-11-05

    申请号:US09782381

    申请日:2001-02-12

    IPC分类号: C08F248

    摘要: There is provided an active energy beam curable composition, which is useful for forming a solder resist film for a printed wiring board, which can be developed through an ultraviolet exposure and a dilute alkali aqueous solution, and is excel lent in heat resistance, adhesivity and chemical resistance. There is also proposed a printed wiring board provided with a cured film of such an active energy beam curable composition. This composition is featured in that it comprises not only an active energy beam curable vinyl copolymer modified resin wherein an epoxy compound having an ethylenic unsaturated group is added to a copolymer comprising styrene, (metha)acrylic acid, and, as an optional component, (metha)acrylate; but also an active energy beam curable bisphenol type epoxyacrylate resin.

    摘要翻译: 提供了一种活性能量束固化性组合物,其可用于形成可通过紫外线曝光和稀碱水溶液显影的印刷线路板的阻焊膜,并且具有耐热性,粘合性和 耐化学性。 还提出了一种设置有这种活性能量束固化组合物的固化膜的印刷线路板。 该组合物的特征在于,其不仅包含活性能量束可固化乙烯基共聚物改性树脂,其中将具有烯属不饱和基团的环氧化合物加入到包含苯乙烯,(甲基)丙烯酸和作为任选组分的共聚物中( 甲基)丙烯酸酯; 而且是活性能量束可固化双酚型环氧丙烯酸酯树脂。

    Method and apparatus for automatically adjusting a gain of a
servomechanism
    9.
    发明授权
    Method and apparatus for automatically adjusting a gain of a servomechanism 失效
    自动调节伺服机构增益的方法和装置

    公开(公告)号:US5786678A

    公开(公告)日:1998-07-28

    申请号:US757870

    申请日:1996-11-27

    摘要: In a servomechanism which includes a motor and performs positioning control and velocity control, based on a response of the motor when a step command is supplied in a condition where a load is applied to the motor, the value of the load is estimated, and the servo-gain of the servomechanism is automatically set in accordance with the estimated load value. Load inertia of the servomechanism is automatically calculated, an optimum gain is automatically set based on the calculation result, and a test operation is performed, so that a time period required for the adjustment can be shortened.

    摘要翻译: 在包括电动机并执行定位控制和速度控制的伺服机构中,基于在向电动机施加负载的状况下提供步进指令时的电动机的响应,估计负载的值, 伺服机构的伺服增益根据估计的负载值自动设定。 自动计算伺服机构的负载惯量,根据计算结果自动设定最佳增益,进行试运转,可以缩短调整所需的时间。

    Microtron electron accelerator
    10.
    发明授权

    公开(公告)号:US5561697A

    公开(公告)日:1996-10-01

    申请号:US372124

    申请日:1995-01-13

    IPC分类号: H05H7/18 H05H13/10 H05H13/00

    CPC分类号: H05H13/10

    摘要: Disclosed is a microtron electron accelerator having an accelerating cavity accepting microwave electric power for generating a high-frequency accelerating electric field E disposed within a uniform magnetic field B and adapted such that electrons are accelerated and caused to move in a circular trajectory under action of the magnetic field B and the electric field E, comprising an electron source formed of a cathode and an anode, which has a minute slit allowing an electron beam extracted from the cathode to pass therethrough, disposed on the outer side of the wall of the accelerating cavity, a first electron beam through-hole and a second electron beam through-hole formed in the wall of the accelerating cavity in two positions, with the electron source therebetween, along the decreasing or increasing direction of the strength of the electric field E in the accelerating cavity, and a third electron beam through-hole formed in the wall of the accelerating cavity in a position in confrontation with the first electron beam through-hole across the inner space of the accelerating cavity. By adopting the above described structure, it has been made possible to have the energy gain within the accelerating cavity at each time of acceleration increased and to have contamination of the inner surface of the accelerating cavity by evaporated cathode material decreased, and as a result, it is made possible to obtain a microtron electron accelerator smaller in size and capable of stably providing a high-energy electron beam.