利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

32 条记录 (耗时 0.028 秒)

    Method of and apparatus for preparing single crystal
    1.
    发明授权
    Method of and apparatus for preparing single crystal 失效
    制备单晶的方法和装置

    公开(公告)号：US5290395A

    公开(公告)日：1994-03-01

    申请号：US838776

    申请日：1992-03-17

    申请人： Kazuhisa Matsumoto ,  Masami Tatsumi ,  Tomohiro Kawase

    发明人： Kazuhisa Matsumoto ,  Masami Tatsumi ,  Tomohiro Kawase

    IPC分类号： C30B15/02 ,  C30B15/10 ,  C30B15/12

    CPC分类号： C30B15/12 ,  C30B15/02 ,  C30B15/10 ,  Y10S117/907 ,  Y10T117/1052 ,  Y10T117/106 ,  Y10T117/1064

    摘要： A method and an apparatus for pulling a compound single crystal from a raw material molten solution is constructed to cause the solution to flow into a second crucible provided in a first crucible containing the raw material molten solution which is continuously synthesized from a plurality of raw materials, through a communicating hole formed in the bottom portion of the second crucible. The single crystal is pulled while the raw material molten solution is continuously synthesized from the plurality of raw materials, whereby it is possible to pull a long single compound crystal through a single pulling step from the raw material molten solution which is contained in the second crucible. An excellent state of a solid-liquid interface is maintained to obtain a quality single crystal.

    摘要翻译： PCT No.PCT / JP91 / 00987。 371日期：1992年3月17日 102（e）1992年3月17日PCT PCT 1991年7月24日PCT公布。 出版物WO92 / 01826 日本1992年2月6日。一种用于从原料熔融溶液中拉出复合单晶的方法和装置被构造成使溶液流入设置在包含原料熔融溶液的第一坩埚中的第二坩埚中 通过形成在第二坩埚的底部的连通孔从多个原料合成。 在从多个原料连续地合成原料熔融溶液的同时拉出单晶，由此可以从包含在第二坩埚中的原料熔融溶液中通过单一拉拔步骤拉出长的单一化合物晶体 。 维持固液界面的优异状态以获得优质的单晶。

    Liquid processing apparatus, liquid processing method, and recording medium having program stored therein
    2.
    发明授权
    Liquid processing apparatus, liquid processing method, and recording medium having program stored therein 失效
    液体处理装置，液体处理方法和存储有程序的记录介质

    公开(公告)号：US08425686B2

    公开(公告)日：2013-04-23

    申请号：US12843948

    申请日：2010-07-27

    申请人： Kazuhisa Matsumoto

    发明人： Kazuhisa Matsumoto

    IPC分类号： B08B7/04 ,  B08B9/20

    CPC分类号： B08B3/08 ,  H01L21/67017

    摘要： A liquid processing apparatus is provided which can reduce the amount of liquids used and reduce the difference of the process level between objects to-be-processed. The liquid processing apparatus includes a main pipe, a liquid supply device, a main valve, a plurality of branch pipes, and a plurality of processing units. The liquid supply device includes a mixer, a first liquid supply pipe, and a second liquid source supplying a second liquid and supplies a mixed liquid prepared by mixing the first and second liquids in the mixer to one end of the main pipe. The main valve is configured to close the other end of the main pipe opposite to the liquid supply device when the object to-be-processed is processed in the processing unit.

    摘要翻译： 提供了一种液体处理装置，其可以减少使用的液体的量并减少待处理物体之间的处理水平的差异。 液体处理装置包括主管，液体供应装置，主阀，多个分支管和多个处理单元。 液体供给装置包括混合器，第一液体供给管和供给第二液体的第二液体源，并且通过将混合器中的第一和第二液体混合而制备的混合液供给到主管的一端。 主阀被配置为当处理单元处理被处理物体时，关闭与液体供应装置相对的主管道的另一端。

    Liquid processing apparatus
    3.
    发明授权
    Liquid processing apparatus 有权
    液体处理设备

    公开(公告)号：US07998308B2

    公开(公告)日：2011-08-16

    申请号：US11785351

    申请日：2007-04-17

    申请人： Satoshi Kaneko ,  Kazuhisa Matsumoto ,  Norihiro Ito ,  Masami Akimoto ,  Takayuki Toshima ,  Hiromitsu Nanba

    发明人： Satoshi Kaneko ,  Kazuhisa Matsumoto ,  Norihiro Ito ,  Masami Akimoto ,  Takayuki Toshima ,  Hiromitsu Nanba

    IPC分类号： H01L21/00 ,  H01L21/30

    CPC分类号： H01L21/67051 ,  H01L21/6715 ,  H01L21/68728 ,  Y10S134/902

    摘要： A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate and to rotate along with the substrate; a liquid supply mechanism configured to supply a process liquid onto at least a front surface of the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining out of the rotary cup; and a guide member disposed to surround the substrate, having an upper surface to be substantially continued to the front surface of the substrate, and configured to rotate along with the substrate holding member and the rotary cup, such that a process liquid supplied onto the front surface of the substrate and thrown off from the substrate is guided by the upper surface of the guide member from the rotary cup to the exhaust/drain section.

    摘要翻译： 一种液体处理装置，包括：基板保持部件，其被构造成与水平状态下保持的基板一起旋转; 旋转杯，其构造成围绕所述基底并与所述基底一起旋转; 液体供给机构，其构造成将处理液体供给到所述基板的至少前表面上; 以及排气/排出部，其构造成从所述旋转杯中排出并排出液体; 以及引导构件，其设置成围绕所述基板，具有基本上连续到所述基板的前表面的上表面，并且被构造成与所述基板保持构件和所述旋转杯一起旋转，使得提供到所述前面的处理液 基板的表面从基板被甩出，由引导构件的上表面从旋转杯引导到排气/排出部。

    Crosslinkable Composition and Laminated Article Made of Same
    6.
    发明申请
    Crosslinkable Composition and Laminated Article Made of Same 审中-公开
    可交联组合物和层压制品

    公开(公告)号：US20080075904A1

    公开(公告)日：2008-03-27

    申请号：US11795039

    申请日：2006-02-01

    申请人： Kazuyoshi Kawasaki ,  Kazuhisa Matsumoto ,  Mitsuru Kishine

    发明人： Kazuyoshi Kawasaki ,  Kazuhisa Matsumoto ,  Mitsuru Kishine

    IPC分类号： C08L15/00 ,  B32B15/06 ,  C08K5/3415

    CPC分类号： C08K5/0025 ,  C08K5/3442 ,  Y10T428/1393 ,  C08L27/12 ,  C08L27/16

    摘要： The present invention provides a crosslinkable composition comprising a fluorine-containing rubber, a crosslinking agent and an additive, a laminated article having a rubber layer formed by using the composition, and a hose. The crosslinkable composition comprises a fluorine-containing rubber, a crosslinking agent and an additive, in which the additive is at least one compound selected from the group consisting of a compound represented by the formula (1): wherein R1, R2 and R3 are the same or different and each is hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; X1− is a monovalent anion, a compound represented by the formula (2): wherein n is 0 or an integer of 1 to 50, and a compound represented by the formula (3):

    摘要翻译： 本发明提供一种包含含氟橡胶，交联剂和添加剂的交联性组合物，具有通过使用该组合物形成的橡胶层的层压制品和软管。 可交联组合物包含含氟橡胶，交联剂和添加剂，其中添加剂是选自由式（1）表示的化合物中的至少一种化合物：其中R 1， R 2，R 2和R 3相同或不同，各自为氢原子或碳原子数为1〜30的一价有机基团; X 1是一价阴离子，由式（2）表示的化合物：其中n为0或1至50的整数，以及由式（3）表示的化合物：

    Liquid processing apparatus
    8.
    发明授权
    Liquid processing apparatus 有权
    液体处理设备

    公开(公告)号：US07793610B2

    公开(公告)日：2010-09-14

    申请号：US11785352

    申请日：2007-04-17

    申请人： Masami Akimoto ,  Takayuki Toshima ,  Satoshi Kaneko ,  Kazuhisa Matsumoto ,  Norihiro Ito ,  Hiromitsu Nanba

    发明人： Masami Akimoto ,  Takayuki Toshima ,  Satoshi Kaneko ,  Kazuhisa Matsumoto ,  Norihiro Ito ,  Hiromitsu Nanba

    IPC分类号： B05C13/02

    CPC分类号： H01L21/67051 ,  H01L21/6715 ,  H01L21/68728

    摘要： A liquid processing apparatus includes: a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integratedly rotate the rotary cup and the substrate holding member; a liquid supply mechanism configured to supply a process liquid onto the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining of the rotary cup. The exhaust/drain section includes an annular drain cup configured to mainly collect and discharge a process liquid thrown off from the substrate, and an exhaust cup surrounding the drain cup and configured to mainly collect and discharge a gas component from inside and around the rotary cup. Liquid-draining from the drain cup and gas-exhausting from the exhaust cup are performed independently of each other.

    摘要翻译： 一种液体处理装置，包括：基板保持部件，其构造成与水平状态下保持的基板一起旋转; 旋转杯，其构造成围绕保持在所述基板保持构件上并与所述基板一起旋转的所述基板; 旋转机构，其构造成使所述旋转杯和所述基板保持部件一体地旋转; 液体供给机构，其构造成将处理液体供给到所述基板上; 以及排气/排出部，其构造成进行所述旋转杯的排气和排液。 排气/排放部分包括环形排水杯，其构造成主要收集和排出从基板排出的处理液体，以及围绕排水杯的排气杯，并且构造成主要从旋转杯内部和周围收集和排出气体成分 。 从排水杯排出液体并从排气杯排出气体彼此独立地进行。

    Method of Substrate Processing, Substrate Processing System, and Storage Medium
    9.
    发明申请
    Method of Substrate Processing, Substrate Processing System, and Storage Medium 有权
    基板处理方法，基板处理系统和存储介质

    公开(公告)号：US20090114253A1

    公开(公告)日：2009-05-07

    申请号：US12083466

    申请日：2007-04-12

    申请人： Kazuhisa Matsumoto

    发明人： Kazuhisa Matsumoto

    IPC分类号： B08B3/04

    CPC分类号： H01L21/67028 ,  C11D11/0047 ,  H01L21/02052 ,  H01L21/30604 ,  H01L21/67034 ,  H01L21/6708

    摘要： The present invention provides a substrate processing system in which a processing liquid is supplied to a substrate W from a processing nozzle 50a situated above the substrate W so as to process the substrate W, and which makes it possible to prevent unintended dripping of the processing liquid from the processing nozzle. A substrate processing system 20 comprises a processing nozzle 50a capable of supplying a processing liquid to a substrate to be processed, an arm 54 supporting the processing nozzle, and droplet removing nozzles 60, 62 capable of blowing a gas to the processing nozzle. The arm is movable between a processing position and a waiting position, the processing nozzle being above a substrate when the arm is in the waiting position and being outside a substrate when the arm is in the processing position. The droplet removing nozzles are so situated that they are in the vicinity of the processing nozzle when the arm is in the waiting position.

    摘要翻译： 本发明提供了一种基板处理系统，其中处理液体从位于基板W上方的处理喷嘴50a提供给基板W，以处理基板W，并且能够防止处理液体的意外滴落 从加工喷嘴。 基板处理系统20包括能够将待处理液体供给到待处理基板的处理喷嘴50a，支撑处理喷嘴的支臂54以及能够向处理喷嘴吹送气体的液滴除去喷嘴60,62。 臂可以在处理位置和等待位置之间移动，当臂处于等待位置时，处理喷嘴位于基板上方，并且当臂处于处理位置时，其处于基板外部。 液滴去除喷嘴位于这样的位置，使得它们在臂处于等待位置时处于处理喷嘴附近。

    Liquid processing apparatus
    10.
    发明申请
    Liquid processing apparatus 有权
    液体处理设备

    公开(公告)号：US20070240638A1

    公开(公告)日：2007-10-18

    申请号：US11785352

    申请日：2007-04-17

    申请人： Masami Akimoto ,  Takayuki Toshima ,  Satoshi Kaneko ,  Kazuhisa Matsumoto ,  Norihiro Ito ,  Hiromitsu Nanba

    发明人： Masami Akimoto ,  Takayuki Toshima ,  Satoshi Kaneko ,  Kazuhisa Matsumoto ,  Norihiro Ito ,  Hiromitsu Nanba

    IPC分类号： B05C11/02 ,  B05C5/00 ,  B05B1/28

    CPC分类号： H01L21/67051 ,  H01L21/6715 ,  H01L21/68728

    摘要： A liquid processing apparatus includes: a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integratedly rotate the rotary cup and the substrate holding member; a liquid supply mechanism configured to supply a process liquid onto the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining of the rotary cup. The exhaust/drain section includes an annular drain cup configured to mainly collect and discharge a process liquid thrown off from the substrate, and an exhaust cup surrounding the drain cup and configured to mainly collect and discharge a gas component from inside and around the rotary cup. Liquid-draining from the drain cup and gas-exhausting from the exhaust cup are performed independently of each other.

    摘要翻译： 一种液体处理装置，包括：基板保持部件，其构造成与水平状态下保持的基板一起旋转; 旋转杯，其构造成围绕保持在所述基板保持构件上并与所述基板一起旋转的所述基板; 旋转机构，其构造成使所述旋转杯和所述基板保持部件一体地旋转; 液体供给机构，其构造成将处理液体供给到所述基板上; 以及排气/排出部，其构造成进行所述旋转杯的排气和排液。 排气/排放部分包括环形排水杯，其构造成主要收集和排出从基板排出的处理液体，以及围绕排水杯的排气杯，并且构造成主要从旋转杯内部和周围收集和排出气体成分 。 从排水杯排出液体并从排气杯排出气体彼此独立地进行。