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公开(公告)号：US4921537A
公开(公告)日：1990-05-01
申请号：US601832
申请日：1984-04-19
IPC分类号： C04B22/06 , C04B7/34 , C04B22/00 , C04B22/14 , C04B24/06 , C04B24/22 , C04B28/02 , C04B28/04 , C04B28/06
CPC分类号： C04B22/008 , C04B28/06 , C04B7/34 , C04B2111/34
摘要： A shrinkage compensated mortar or grout can be made with about 40 to 60% by weight of fine aggregate and 40 to 60% by weight of a hydraulic composition which in turn is made with 60 to 80% by weight of mixture of rapid hardening cement and 20 to 40% portland cement; and based on the weight of cement, 5 to 8% by weight of silica powder; 0.2 to 0.4% by weight of a hydroxycarboxylic acid or a salt thereof; and 2 to 3% by weight of a high performance water-reducer. Such shrinkage compensated mortars or grouts are useful in the installation of machinery, foundations for major structures and the like.
摘要翻译： 收缩补偿砂浆或浆料可以用约40-60％重量的细骨料和40-60％重量的水硬性组合物制成，水硬性组合物依次由60-80％重量的快速硬化水泥和 20〜40％硅酸盐水泥; 并以水泥重量计，5〜8重量％的二氧化硅粉末; 0.2〜0.4重量％的羟基羧酸或其盐; 和2〜3重量％的高性能减水剂。 这种收缩补偿的砂浆或浆料可用于机械的安装，主要结构的基础等。
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2.发明申请Novel diaminobenzene derivative, polyimide precursor and polyimide obtained therefrom, and aligning agent for liquid crystal 有权新型二氨基苯衍生物，聚酰亚胺前体和由其得到的聚酰亚胺和液晶取向剂公开(公告)号：US20060246230A1
公开(公告)日：2006-11-02
申请号：US10538060
申请日：2003-12-10
IPC分类号： C09K19/00 , C08G69/14 , C07C215/48
CPC分类号： C07C217/76 , C08G73/10 , G02F1/133723 , Y10T428/1018 , Y10T428/1023 , Y10T428/1036
摘要： The present invention provides a novel diamine which is especially useful as a material for a resin for a liquid crystal alignment film, a polyimide precursor and a polyimide synthesized by using the diamine, and a treating agent for liquid crystal alignment containing such a polymer, which gives a liquid crystal alignment film having a high pretilt angle of liquid crystal, excellent thermal stability of the pretilt angle and small dependence of the pretilt angle on rubbing pressure. A diaminobenzene derivative represented by the formula (1): wherein X1 and X2 are cyclic groups, and X3 is selected from an alkyl group, an alkoxy group, a fluoroalkyl group, a fluoroalkoxy group, a fluorine atom, a chlorine atom, a bromine atom and a cyano group; a polyimide precursor and a polyimide synthesized by using the diaminobenzene derivative as a part of the material; and a treating agent for liquid crystal alignment containing at least one of the polymers.
摘要翻译： 本发明提供了一种特别可用作液晶取向膜用树脂，聚酰亚胺前体和使用二胺合成的聚酰亚胺的新型二胺和含有这种聚合物的液晶取向处理剂，其中， 得到液晶预倾角大的液晶取向膜，预倾角的热稳定性优异，预倾角对摩擦压力的依赖性小。 由式（1）表示的二氨基苯衍生物：其中X 1和X 2是环状基团，X 3选自烷基 氟烷基，氟代烷氧基，氟原子，氯原子，溴原子和氰基; 通过使用二氨基苯衍生物作为材料的一部分合成的聚酰亚胺前体和聚酰亚胺; 和含有至少一种聚合物的液晶取向处理剂。
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3.发明授权Diaminobenzene derivative, polyimide precursor and polyimide obtained therefrom, and aligning agent for liquid crystal 有权二氨基苯衍生物，聚酰亚胺前体和由其获得的聚酰亚胺和液晶取向剂公开(公告)号：US07303792B2
公开(公告)日：2007-12-04
申请号：US10538060
申请日：2003-12-10
IPC分类号： C09K19/00
CPC分类号： C07C217/76 , C08G73/10 , G02F1/133723 , Y10T428/1018 , Y10T428/1023 , Y10T428/1036
摘要： The present invention provides a novel diamine which is especially useful as a material for a resin for a liquid crystal alignment film, a polyimide precursor and a polyimide synthesized by using the diamine, and a treating agent for liquid crystal alignment containing such a polymer, which gives a liquid crystal alignment film having a high pretilt angle of liquid crystal, excellent thermal stability of the pretilt angle and small dependence of the pretilt angle on rubbing pressure.A diaminobenzene derivative represented by the formula (1): wherein X1 and X2 are cyclic groups, and X3 is selected from an alkyl group, an alkoxy group, a fluoroalkyl group, a fluoroalkoxy group, a fluorine atom, a chlorine atom, a bromine atom and a cyano group; a polyimide precursor and a polyimide synthesized by using the diaminobenzene derivative as a part of the material; and a treating agent for liquid crystal alignment containing at least one of the polymers.
摘要翻译： 本发明提供了一种特别可用作液晶取向膜用树脂，聚酰亚胺前体和使用二胺合成的聚酰亚胺的新型二胺和含有这种聚合物的液晶取向处理剂，其中， 得到液晶预倾角大的液晶取向膜，预倾角的热稳定性优异，预倾角对摩擦压力的依赖性小。
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4.发明授权Diamines, polyimide precursors and polyimides produced by using the diamines, and liquid crystal aligning agents 有权二胺，聚酰亚胺前体和通过使用二胺制备的聚酰亚胺和液晶取向剂公开(公告)号：US07169878B2
公开(公告)日：2007-01-30
申请号：US10450841
申请日：2001-12-26
申请人： Kazuyoshi Hosaka , Hideyuki Nawata
发明人： Kazuyoshi Hosaka , Hideyuki Nawata
CPC分类号： G02F1/133723 , C07C217/86 , C07C229/60 , C08G73/10 , Y10T428/10 , Y10T428/1005 , Y10T428/1023 , Y10T428/31721
摘要： A diamine compound represented by the formula (1): wherein R1 is a trivalent organic group, each of X1 and X2 is a bivalent organic group, X3 is an alkyl or fluoroalkyl group having from 1 to 22 carbon atoms, or a cyclic substituent selected from aromatic rings, aliphatic rings, heterocyclic rings and their substituted groups, and n is an integer of from 2 to 5. And, a polyimide precursor and a polyimide synthesized by using the diamine compound; and a treating agent for liquid crystal alignment containing the polyimide precursor and/or the polyimide.
摘要翻译： 由式（1）表示的二胺化合物：其中R 1为三价有机基团，X 1和X 2各自为 二价有机基团，X 3是具有1至22个碳原子的烷基或氟烷基，或选自芳环，脂族环，杂环及其取代基的环状取代基，n是 通过使用二胺化合物合成聚酰亚胺前体和聚酰亚胺; 和含有聚酰亚胺前体和/或聚酰亚胺的液晶取向处理剂。
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公开(公告)号：US07749664B2
公开(公告)日：2010-07-06
申请号：US11393849
申请日：2006-03-31
申请人： Masayoshi Suzuki , Kazuyoshi Hosaka , Mariko Shudo
发明人： Masayoshi Suzuki , Kazuyoshi Hosaka , Mariko Shudo
IPC分类号： G03F1/00 , G02F1/1335
CPC分类号： G03F7/0382 , G03F1/56 , G03F7/0007 , G03F7/0392
摘要： There is provided a color resist composition comprising a resin (A), a photoacid generator or a photobase generator (B), a crosslinking compound (C) and a dye mixture (D) containing a dye having a structure of amino sulfonate ester or ammonium sulfonate salt in a proportion of 40 to 95% by weight on total dye content. Preferably, resin (A) is polyvinyl phenol or a copolymer thereof, and the color resist composition has an optical quality having at least a region with a transmittance of 70% or more and a region with a transmittance of 10% or less in wavelength range between 400 nm and 700 nm, and in which a variation in transmittance is 5% or less even when the composition is subjected to a temperature of 200° C. or more. The color resist composition is applicable for color filters which exhibits a high spectrum reproducibility, a high light-resistance and a heat-resistance, and has a high resolution of 5 μm or less and no post development residue.
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公开(公告)号：US07517619B2
公开(公告)日：2009-04-14
申请号：US10918466
申请日：2004-08-16
申请人： Kazuyoshi Hosaka , Mariko Shudo , Masayoshi Suzuki
发明人： Kazuyoshi Hosaka , Mariko Shudo , Masayoshi Suzuki
CPC分类号： G03F7/0007 , G03F7/0048 , G03F7/0226 , G03F7/027 , G03F7/038
摘要： There is provided a dye-containing resist composition comprising a ketol solvent; a negative type resist composition comprising a resin, a photoacid generator or a photobase generator, a crosslinking compound, a dye and a ketol solvent; a negative type resist composition comprising a resin, a photoradical generator, a crosslinking compound, a dye and a ketol solvent; a positive type resist composition comprising a resin, a photoacid generator, a crosslinking compound, a dye and a ketol solvent. The ketol is preferably β-hydroxyketone, more preferably 4-hydroxy-4-methyl-2-pentanone. The resist composition does not occur problems such as occurrence of foreign matters (particles) even when the concentration of dye is increased, and enables the production of color filters in a shape of thinner film.
摘要翻译： 提供了含有酮醇溶剂的含有染料的抗蚀剂组合物; 包含树脂，光致酸产生剂或光碱产生剂，交联化合物，染料和酮溶剂的负型抗蚀剂组合物; 包含树脂，光自由基发生剂，交联化合物，染料和酮醇溶剂的负型抗蚀剂组合物; 包含树脂，光致酸产生剂，交联化合物，染料和酮醇溶剂的正型抗蚀剂组合物。 酮醇优选为β-羟基酮，更优选为4-羟基-4-甲基-2-戊酮。 即使增加染料的浓度，抗蚀剂组合物也不会发生诸如异物（颗粒）的发生等问题，并且能够生产薄膜形状的滤色器。
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公开(公告)号：US07776504B2
公开(公告)日：2010-08-17
申请号：US11058226
申请日：2005-02-16
申请人： Masayoshi Suzuki , Kazuyoshi Hosaka , Mariko Shudo
发明人： Masayoshi Suzuki , Kazuyoshi Hosaka , Mariko Shudo
IPC分类号： G03C1/00
CPC分类号： G03F7/0382 , G03F1/56 , G03F7/0007 , G03F7/0392
摘要： There is provided a color resist composition comprising a resin (A), a photoacid generator or a photobase generator (B), a crosslinking compound (C) and a dye mixture (D) containing a dye having a structure of amino sulfonate ester or ammonium sulfonate salt in a proportion of 40 to 95% by weight on total dye content. Preferably, resin (A) is polyvinyl phenol or a copolymer thereof, and the color resist composition has an optical quality having at least a region with a transmittance of 70% or more and a region with a transmittance of 10% or less in wavelength range between 400 nm and 700 nm, and in which a variation in transmittance is 5% or less even when the composition is subjected to a temperature of 200° C. or more. The color resist composition is applicable for color filters which exhibits a high spectrum reproducibility, a high light-resistance and a heat-resistance, and has a high resolution of 5 μm or less and no post development residue.
摘要翻译： 提供了包含树脂（A），光酸产生剂或光碱产生剂（B），交联化合物（C）和含有具有氨基磺酸酯或铵结构的染料的染料混合物（D）的着色剂组合物 磺酸盐，其总染料含量为40至95重量％。 优选地，树脂（A）是聚苯乙烯或其共聚物，并且所述着色剂组合物具有至少具有70％以上的透射率的区域和在波长范围内具有10％以下的透射率的区域的光学品质 400nm至700nm之间，即使组合物经受200℃以上的温度，透射率的变化也为5％以下。 彩色抗蚀剂组合物可用于显示高光谱再现性，高耐光性和耐热性的滤色器，并且具有5μm以下的高分辨率和无后显影残留。
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公开(公告)号：US20050227169A1
公开(公告)日：2005-10-13
申请号：US11058226
申请日：2005-02-16
申请人： Masayoshi Suzuki , Kazuyoshi Hosaka , Mariko Shudo
发明人： Masayoshi Suzuki , Kazuyoshi Hosaka , Mariko Shudo
CPC分类号： G03F7/0382 , G03F1/56 , G03F7/0007 , G03F7/0392
摘要： There is provided a color resist composition comprising a resin (A), a photoacid generator or a photobase generator (B), a crosslinking compound (C) and a dye mixture (D) containing a dye having a structure of amino sulfonate ester or ammonium sulfonate salt in a proportion of 40 to 95% by weight on total dye content. Preferably, resin (A) is polyvinyl phenol or a copolymer thereof, and the color resist composition has an optical quality having at least a region with a transmittance of 70% or more and a region with a transmittance of 10% or less in wavelength range between 400 nm and 700 nm, and in which a variation in transmittance is 5% or less even when the composition is subjected to a temperature of 200° C. or more. The color resist composition is applicable for color filters which exhibits a high spectrum reproducibility, a high light-resistance and a heat-resistance, and has a high resolution of 5 μm or less and no post development residue.
摘要翻译： 提供了包含树脂（A），光酸产生剂或光碱产生剂（B），交联化合物（C）和含有具有氨基磺酸酯或铵结构的染料的染料混合物（D）的着色剂组合物 磺酸盐，其总染料含量为40至95重量％。 优选地，树脂（A）是聚苯乙烯或其共聚物，并且所述着色剂组合物具有至少具有70％以上的透射率的区域和在波长范围内具有10％以下的透射率的区域的光学品质 400nm至700nm之间，即使组合物经受200℃以上的温度，透射率的变化也为5％以下。 彩色抗蚀剂组合物可用于显示高光谱重现性，高耐光性和耐热性，并且具有5mum以下的高分辨率和无显影残留的滤色器。
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公开(公告)号：US6084151A
公开(公告)日：2000-07-04
申请号：US106848
申请日：1998-06-30
摘要： Solanum stenotomum, Solanum phureja and Solanum goniocalyx, which are diploid potatoes native to the Andes, are crossed by open pollination, thereby forming a hybrid population rich in genetic variation. The hybrid population is raised while screening the hybrid population on the basis of selection criteria including a yield thereof, thereby reconstituting the hybrid population. The reconstituted hybrid population is raised for seedlings under short-day light conditions while limiting a rhizosphere thereof and controlling the growth at a slightly lower temperature during a potato-tuber growing period. A mini-potato edible whole (including skin) in one bite can be thus obtained.
摘要翻译： 作为安第斯山脉本土的二倍体土豆的Solanum stenotomum，Solanum phureja和Solanum goniocalyx通过开放授粉进行杂交，从而形成富含遗传变异的杂交种群。 根据包括其产量在内的选择标准筛选混合种群，从而重新混合种群，提高杂种种群。 在短日照光条件下，重建的杂交种群被种植，同时限制其根际，并且在马铃薯块茎生长期期间以稍低的温度控制生长。 可以获得一口中的小马铃薯可食用的整体（包括皮肤）。
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公开(公告)号：US20060172206A1
公开(公告)日：2006-08-03
申请号：US11393849
申请日：2006-03-31
申请人： Masayoshi Suzuki , Kazuyoshi Hosaka , Mariko Shudo
发明人： Masayoshi Suzuki , Kazuyoshi Hosaka , Mariko Shudo
IPC分类号： G03F1/00
CPC分类号： G03F7/0382 , G03F1/56 , G03F7/0007 , G03F7/0392
摘要： There is provided a color resist composition comprising a resin (A), a photoacid generator or a photobase generator (B), a crosslinking compound (C) and a dye mixture (D) containing a dye having a structure of amino sulfonate ester or ammonium sulfonate salt in a proportion of 40 to 95% by weight on total dye content. Preferably, resin (A) is polyvinyl phenol or a copolymer thereof, and the color resist composition has an optical quality having at least a region with a transmittance of 70% or more and a region with a transmittance of 10% or less in wavelength range between 400 nm and 700 nm, and in which a variation in transmittance is 5% or less even when the composition is subjected to a temperature of 200° C. or more. The color resist composition is applicable for color filters which exhibits a high spectrum reproducibility, a high light-resistance and a heat-resistance, and has a high resolution of 5 μm or less and no post development residue.
摘要翻译： 提供了包含树脂（A），光酸产生剂或光碱产生剂（B），交联化合物（C）和含有具有氨基磺酸酯或铵结构的染料的染料混合物（D）的着色剂组合物 磺酸盐，其总染料含量为40至95重量％。 优选地，树脂（A）是聚苯乙烯或其共聚物，并且所述着色剂组合物具有至少具有70％以上的透射率的区域和在波长范围内具有10％以下的透射率的区域的光学品质 400nm至700nm之间，即使组合物经受200℃以上的温度，透射率的变化也为5％以下。 彩色抗蚀剂组合物可用于显示高光谱重现性，高耐光性和耐热性，并且具有5mum以下的高分辨率和无显影残留的滤色器。
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