Plasma processing apparatus and processing gas supply structure thereof
    3.
    发明授权
    Plasma processing apparatus and processing gas supply structure thereof 有权
    等离子体处理装置及其处理气体供应结构

    公开(公告)号:US09082592B2

    公开(公告)日:2015-07-14

    申请号:US13159585

    申请日:2011-06-14

    申请人: Masashi Saito

    发明人: Masashi Saito

    摘要: There is provided a plasma processing apparatus for performing a plasma process on a substrate mounted on a mounting table in a processing chamber by generating inductively coupled plasma within the processing chamber by applying a high frequency power to a high frequency antenna. The apparatus includes a multiple number of gas nozzles protruding from a sidewall of the processing chamber toward a center of the processing chamber in a space above the mounting table, and each gas nozzle has a gas discharge hole at a leading end of the gas nozzle in a protruding direction and a gas discharge hole at a sidewall of the gas nozzle. Further, the apparatus includes a rotation device configured to rotate each of the gas nozzles on each central axis of the gas nozzles and each central axis is extended in the protruding direction of each of the gas nozzles.

    摘要翻译: 提供了一种等离子体处理装置,用于通过对高频天线施加高频功率,通过在处理室内产生感应耦合等离子体,在安装在处理室中的安装台上的基板上进行等离子体处理。 该装置包括多个气体喷嘴,其从处理室的侧壁向安装台上方的空间朝向处理室的中心突出,并且每个气体喷嘴在气体喷嘴的前端具有排气孔 突出方向和在气体喷嘴的侧壁处的气体排出孔。 此外,该装置包括旋转装置,其构造成使气体喷嘴的每个中心轴线上的每个气体喷嘴旋转,并且每个中心轴线在每个气体喷嘴的突出方向上延伸。

    Plasma processing apparatus, and maintenance method and assembling method of the same
    4.
    发明授权
    Plasma processing apparatus, and maintenance method and assembling method of the same 有权
    等离子体处理装置及其维护方法及组装方法

    公开(公告)号:US08945340B2

    公开(公告)日:2015-02-03

    申请号:US12705141

    申请日:2010-02-12

    申请人: Masashi Saito

    发明人: Masashi Saito

    摘要: A plasma processing apparatus includes a processing chamber that converts a processing gas introduced from a gas supply source into plasma and performs plasma processing on a target object, an exhaust chamber that communicates with the inside of the processing chamber to exhaust a gas converted into plasma from the processing chamber, and a blocking cover that is provided in the exhaust chamber to block communication between the inside of the processing chamber and the inside of the exhaust chamber.

    摘要翻译: 等离子体处理装置包括处理室,其将从气体供给源引入的处理气体转换成等离子体,并对目标物体进行等离子体处理;排气室,其与处理室内部连通,排出转换成等离子体的气体 所述处理室和设置在所述排气室中的阻挡盖,以阻挡所述处理室的内部和所述排气室的内部之间的连通。

    Solid-state imaging device, method of driving solid-state imaging device, and image processing device
    5.
    发明授权
    Solid-state imaging device, method of driving solid-state imaging device, and image processing device 有权
    固态成像装置,固态成像装置的驱动方法和图像处理装置

    公开(公告)号:US08743248B2

    公开(公告)日:2014-06-03

    申请号:US13019560

    申请日:2011-02-02

    申请人: Masashi Saito

    发明人: Masashi Saito

    IPC分类号: H04N5/335

    摘要: An image processing device comprising: first A/D converters that receive output signals of respective columns of a plurality of pixels arranged in a matrix form, convert the output signals into first digital signals, and output the first digital signals; a second A/D converter that receives a correction signal, converts the correction signal into a second digital signal, and outputs the second digital signal; a first correction calculation unit that produces a first correction formula; a second correction calculation unit that produces a second correction formula based on the second digital signal; a determination unit that compares a coefficient of the second correction formula and a coefficient of a second correction formula produced before the second correction formula, and determines whether or not to produce the first correction formula based on the comparison result; and a signal output unit that outputs an update signal when it is determined to produce the first correction formula.

    摘要翻译: 一种图像处理装置,包括:第一A / D转换器,其接收以矩阵形式布置的多个像素的各列的输出信号,将输出信号转换为第一数字信号,并输出第一数字信号; 接收校正信号的第二A / D转换器,将校正信号转换为第二数字信号,并输出第二数字信号; 产生第一校正公式的第一校正计算单元; 第二校正计算单元,其基于所述第二数字信号产生第二校正公式; 确定单元,其比较第二校正公式的系数和在第二校正公式之前产生的第二校正公式的系数,并且基于比较结果来确定是否产生第一校正公式; 以及当确定产生第一校正公式时,输出更新信号的信号输出单元。

    IMAGE FORMING APPARATUS AND METHOD OF CONTROLLING THE SAME
    6.
    发明申请
    IMAGE FORMING APPARATUS AND METHOD OF CONTROLLING THE SAME 有权
    图像形成装置及其控制方法

    公开(公告)号:US20130243453A1

    公开(公告)日:2013-09-19

    申请号:US13836197

    申请日:2013-03-15

    IPC分类号: G03G15/00 G03G21/00

    CPC分类号: G03G21/20 G03G21/206

    摘要: An image forming apparatus has an outline surrounded by a casing. The casing has an opening. The image forming apparatus includes a fixing unit configured to fix an image formed on a recording medium, and a control unit. The fixing unit includes a heating fixing member. The control unit is configured to control an opening degree of the opening based on temperature of a surface of or in the vicinity of the heating fixing member, so as to prevent emission of a substance by an air current to outside of the casing through the opening, during an image forming operation.

    摘要翻译: 图像形成装置具有由壳体包围的轮廓。 外壳有开口。 图像形成装置包括:固定单元,被配置为固定形成在记录介质上的图像;以及控制单元。 定影单元包括加热固定构件。 控制单元被配置为基于加热固定构件的表面或其附近的温度来控制开口的开度,以防止物质通过气流通过开口向壳体的外部发射 ,在图像形成操作期间。

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    9.
    发明申请
    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 有权
    等离子体加工设备和等离子体处理方法

    公开(公告)号:US20110094995A1

    公开(公告)日:2011-04-28

    申请号:US12913135

    申请日:2010-10-27

    摘要: A plasma processing apparatus includes: a processing chamber including a dielectric window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate supporting unit, provided in the chamber, for mounting thereon a target substrate; a processing gas supply unit for supplying a processing gas to the chamber; and an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the chamber. The apparatus further includes a correction coil, provided at a position outside the chamber where the correction coil is to be coupled with the RF antenna by an electromagnetic induction, for controlling a plasma density distribution in the chamber; and an antenna-coil distance control unit for controlling a distance between the RF antenna and the correction coil while supporting the correction coil substantially in parallel with the RF antenna.

    摘要翻译: 一种等离子体处理装置,包括:包括电介质窗的处理室; 设置在电介质窗外部的线圈状RF天线; 基板支撑单元,设置在所述室中,用于在其上安装目标基板; 处理气体供应单元,用于将处理气体供应到所述室; 以及RF电源单元,用于向RF天线提供RF功率,以通过腔室中的感应耦合产生处理气体的等离子体。 该装置还包括校正线圈,其设置在室外的位置处,其中校正线圈将通过电磁感应与RF天线耦合,用于控制腔室中的等离子体密度分布; 以及天线线圈距离控制单元,用于在支撑基本上与RF天线并联的校正线圈的同时控制RF天线和校正线圈之间的距离。

    Imaging device, portable terminal using the same, and image device producing method
    10.
    发明授权
    Imaging device, portable terminal using the same, and image device producing method 有权
    成像装置,使用其的便携式终端和图像装置的制造方法

    公开(公告)号:US07656452B2

    公开(公告)日:2010-02-02

    申请号:US10562530

    申请日:2004-07-05

    IPC分类号: H04N5/225

    摘要: This invention relates to dust-proof, moisture-proof structures of the image pickup devices mounted in small-size thin types of electronic apparatus. More specifically, an image pickup device of this invention includes an image pickup element, a mounting base having a formed leg section which abuts on the image pickup element, an image pickup optical system that guides photographic object light to the imaging region of the image pickup element, and an outer frame member that contains the image pickup element, the mounting base, and the image pickup optical system. The space formed at the photoelectric conversion plane side of the image pickup element is sealed by using the mounting base or by using the mounting base and a part of the outer frame member.

    摘要翻译: 本发明涉及安装在小型薄型电子设备中的摄像装置的防尘,防湿结构。 更具体地说,本发明的图像拾取装置包括一个图像拾取元件,一个安装基座,其具有形成的支脚部分,该支撑部分邻接图像拾取元件;摄像光学系统,其将摄影对象光引导到图像拾取器的成像区域 元件,以及包含图像拾取元件,安装基座和图像拾取光学系统的外框构件。 通过使用安装基座或使用安装基座和外框架部件的一部分来密封在摄像元件的光电转换面侧形成的空间。