公开(公告)号：US5850279A

公开(公告)日：1998-12-15

申请号：US619981

申请日：1996-03-20

申请人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： Disclosed is a projection exposure method for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system. A light beam having a first wavelength for exposure is radiated through the projection optical system onto a first mark area including a fiducial mark on a fiducial plate installed on a substrate stage, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A light beam having a second wavelength to which the photosensitive substrate is not photosensitive is radiated through the projection optical system onto the first mark area, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A positional discrepancy of the fiducial mark caused by the difference in wavelength between the first and second wavelengths is previously calculated on the basis of results of the detection. The light beam having the second wavelength is radiated through the projection optical system onto an alignment mark on the photosensitive substrate, reflected light therefrom is detected to obtain a position of the photosensitive substrate under the light beam having the second wavelength. A positional discrepancy of the photosensitive substrate is corrected on the basis of a result of the detection and the calculation, and thus positional alignment for the photosensitive substrate is performed, followed by actual exposure.

摘要翻译： 公开了一种投影曝光方法，用于通过投影光学系统将形成在掩模上的图案转印到感光基板上。 将具有用于曝光的第一波长的光束通过投影光学系统辐射到安装在基板台上的基准板上的包括基准标记的第一标记区域上，检测来自第一标记区域的反射光， 基准标记。 具有感光基片不感光的第二波长的光束通过投影光学系统辐射到第一标记区域上，检测来自第一标记区域的反射光以获得基准标记的位置。 基于检测结果预先计算由第一和第二波长之间的波长差导致的基准标记的位置偏差。 具有第二波长的光束通过投影光学系统辐射到感光基板上的对准标记上，检测其反射光，以获得具有第二波长的光束下的感光基板的位置。 基于检测和计算的结果校正感光性基板的位置偏差，由此进行感光性基板的位置对准，然后实际曝光。

公开(公告)号：US5726757A

公开(公告)日：1998-03-10

申请号：US719315

申请日：1996-09-25

申请人： Masaki Kato ,  Kinya Kato ,  Kei Nara

发明人： Masaki Kato ,  Kinya Kato ,  Kei Nara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： In an exposure apparatus, an alignment-detecting light component of a mask and that of a plate are spatially separated from each other, thereby enabling highly accurate alignment with little influence of the light from the plate on detection of the mask position. An alignment optical system comprises a light source means for supplying a luminous flux; a scan beam forming optical system for forming, based on the luminous flux, a scan beam at a visual field area on a first substrate with respect to a predetermined optical system; a scanning means for optically scanning, in a predetermined direction, the scan beam formed on the first substrate; a first detection means for detecting a diffracted and reflected light component from a first mark generated when optically scanned with the scan beam formed on the first substrate; and a second detection means for detecting, by way of the predetermined optical system and through a path different from the path through which the diffracted and reflected light component from the first mark is detected, a diffracted and reflected light component from a second mark generated when optically scanned with the scan beam which is formed on the second substrate by way of the predetermined optical system.

摘要翻译： 在曝光装置中，掩模的对准检测光分量和板的对准检测光分量在空间上彼此分离，从而在对掩模位置的检测时几乎不受来自板的光的影响。 对准光学系统包括用于提供光通量的光源装置; 扫描光束形成光学系统，用于基于光通量，相对于预定光学系统在第一基板上的视野区域处形成扫描光束; 扫描装置，用于在预定方向上光扫描形成在第一基板上的扫描光束; 第一检测装置，用于从由形成在第一基板上的扫描光束进行光扫描时产生的第一标记中检测衍射和反射光分量; 以及第二检测装置，用于通过预定的光学系统和通过不同于检测到来自第一标记的衍射和反射光分量的路径的路径来检测来自第二标记的衍射和反射光分量， 通过预定的光学系统用形成在第二基板上的扫描光束进行光学扫描。

公开(公告)号：US5838449A

公开(公告)日：1998-11-17

申请号：US912954

申请日：1997-08-14

申请人： Kinya Kato ,  Masaki Kato ,  Kei Nara

发明人： Kinya Kato ,  Masaki Kato ,  Kei Nara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F7/70791 ,  G03F9/70

摘要： An exposure apparatus of a large-substrate single scan-exposure type by which a mask mark and a plate mark are two-dimensionally scanned in relatively narrow respective scan areas at the same time to effect highly accurate alignment. In the present invention, a first substrate and a second substrate are relatively moved in a predetermined direction with respect to a projection optical system, while an image of a pattern formed in the first substrate projectively impinges on the second substrate by way of the projection optical system. The projection optical system comprises a plurality of projection optical units arranged in a direction orthogonal to the scanning direction in order to form, on the second substrate, a same-magnification erected image of the pattern formed on the first substrate. The exposure apparatus has an alignment means for detecting a first mark formed on the first substrate and a second mark formed on the second substrate by optical scanning so as to measure a positional deviation between the first substrate and the second substrate.

摘要翻译： 大面积单扫描曝光型的曝光装置，通过该曝光装置在相对较窄的各个扫描区域中同时二维地扫描掩码标记和印记标记，以实现高精度对准。 在本发明中，第一基板和第二基板相对于投影光学系统相对于预定方向相对移动，而形成在第一基板中的图案的图像通过投影光学投射到第二基板上 系统。 投影光学系统包括沿与扫描方向正交的方向布置的多个投影光学单元，以在第二基板上形成在第一基板上形成的图案的相同放大率的竖立图像。 曝光装置具有用于检测形成在第一基板上的第一标记的对准装置和通过光学扫描形成在第二基板上的第二标记，以便测量第一基板和第二基板之间的位置偏差。

公开(公告)号：US20100143595A1

公开(公告)日：2010-06-10

申请号：US12576752

申请日：2009-10-09

申请人： Kei NARA ,  Tomohide Hamada ,  Masaki Kato ,  Tohru Kiuchi

发明人： Kei NARA ,  Tomohide Hamada ,  Masaki Kato ,  Tohru Kiuchi

IPC分类号： B05D3/12 ,  B29C59/04 ,  B32B3/30 ,  B05C11/00

CPC分类号： H01L51/00 ,  H01L51/52 ,  H01L51/56 ,  H01L2251/5338 ,  Y10T428/24479

摘要： In a manufacturing apparatus of display element, a display element is formed in a flexible substrate that has a first surface and a second surface that is an opposite surface thereof, and this manufacturing apparatus of display element includes a transportation section that transports the flexible substrate in a predetermined direction that intersects with a width direction of the flexible substrate; a first partition wall formation section that forms a first partition wall for a display element in the first surface; and a second partition wall formation section that forms a second partition wall in the second surface.

摘要翻译： 在显示元件的制造装置中，显示元件形成在柔性基板中，该柔性基板具有作为其相对表面的第一表面和第二表面，并且该显示元件的制造装置包括：输送柔性基板的输送部 与柔性基板的宽度方向相交的预定方向; 第一分隔壁形成部，其形成第一表面中的显示元件的第一分隔壁; 以及在所述第二表面中形成第二隔壁的第二分隔壁形成部。

公开(公告)号：US09178155B2

公开(公告)日：2015-11-03

申请号：US12576752

申请日：2009-10-09

申请人： Kei Nara ,  Tomohide Hamada ,  Masaki Kato ,  Tohru Kiuchi

发明人： Kei Nara ,  Tomohide Hamada ,  Masaki Kato ,  Tohru Kiuchi

IPC分类号： B05D5/12 ,  B65G47/26 ,  B65G1/133 ,  H01L51/00 ,  H01L51/52 ,  H01L51/56

CPC分类号： H01L51/00 ,  H01L51/52 ,  H01L51/56 ,  H01L2251/5338 ,  Y10T428/24479

摘要： In a manufacturing apparatus of display element, a display element is formed in a flexible substrate that has a first surface and a second surface that is an opposite surface thereof, and this manufacturing apparatus of display element includes a transportation section that transports the flexible substrate in a predetermined direction that intersects with a width direction of the flexible substrate; a first partition wall formation section that forms a first partition wall for a display element in the first surface; and a second partition wall formation section that forms a second partition wall in the second surface.

摘要翻译： 在显示元件的制造装置中，显示元件形成在柔性基板中，该柔性基板具有作为其相对表面的第一表面和第二表面，并且该显示元件的制造装置包括：输送柔性基板的输送部 与柔性基板的宽度方向相交的预定方向; 第一分隔壁形成部，其形成第一表面中的显示元件的第一分隔壁; 以及在所述第二表面中形成第二隔壁的第二分隔壁形成部。

公开(公告)号：US07372544B2

公开(公告)日：2008-05-13

申请号：US11797605

申请日：2007-05-04

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/44 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

摘要翻译： 曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场 元素。 所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体 辐射图。 多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

公开(公告)号：US20070216885A1

公开(公告)日：2007-09-20

申请号：US11797605

申请日：2007-05-04

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/32

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

摘要翻译： 曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场 元素。 所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体 辐射图。 多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

公开(公告)号：US5640227A

公开(公告)日：1997-06-17

申请号：US349869

申请日：1994-12-06

申请人： Kinya Kato ,  Kazuaki Saiki ,  Masami Seki ,  Masaki Kato

发明人： Kinya Kato ,  Kazuaki Saiki ,  Masami Seki ,  Masaki Kato

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7026 ,  G03F7/70358

摘要： An exposure apparatus and an exposure method which minimize defocusing of the transferred pattern even with a large-sized mask. When the exposure apparatus is used which transfers the pattern formed on a first substrate through a substantially real-size projection optical system onto a second substrate, the positions of the mask and the substrate are detected, and based on the information on the positions the distance between the mask and the substrate is controlled to be substantially constant. According to the present invention, defocusing of the transferred pattern may be substantially avoided by detecting positions of the mask and the plate by making use of, e.g., an obliquely incident light focus detection optical system, and controlling the distance therebetween to be held constant or at a predetermined distance.

摘要翻译： 曝光装置和曝光方法，即使用大尺寸的掩模，也能最小化转印图案的散焦。 当使用通过基本上实际尺寸的投影光学系统将形成在第一基板上的图案转印到第二基板上的曝光装置时，检测掩模和基板的位置，并且基于关于位置的信息，距离 掩模和基板之间的距离被控制为基本恒定。 根据本发明，通过利用例如倾斜入射的光聚焦检测光学系统来检测掩模和板的位置，并且控制其之间的距离保持不变，可以基本上避免转印图案的散焦 在预定距离处。

公开(公告)号：US20080192216A1

公开(公告)日：2008-08-14

申请号：US12078863

申请日：2008-04-07

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/44

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure field on the second plane via the optical elements. A movable portion is disposed in the side of the second plane with respect to the projection optical systems, which holds an object to be moved relative to the exposure field in a first direction in the second plane during scanning exposure of the object in which the radiation patterns are formed on the object as the object is moved in the first direction. The projection optical systems may include an adjustable wedge prism. The projection optical systems may include first and second optical units, optical axes of the first and second optical units being decentered from each other.

摘要翻译： 一种装置包括多个投影光学系统，每个投影光学系统包括布置在第一平面和第二平面之间的光路中的光学元件，并且通过光学元件将第一平面的辐射图形形成在第二平面上的曝光场上。 可移动部分相对于投影光学系统设置在第二平面的侧面，该投影光学系统在扫描曝光期间在第二平面中沿第一方向相对于曝光场移动物体，其中辐射 当物体沿第一方向移动时，在物体上形成图案。 投影光学系统可以包括可调楔形棱镜。 投影光学系统可以包括第一和第二光学单元，第一和第二光学单元的光轴彼此偏心。

公开(公告)号：US07023527B2

公开(公告)日：2006-04-04

申请号：US10920294

申请日：2004-08-18

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/42 ,  G03B27/44 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

摘要翻译： 扫描投影曝光装置在沿着扫描方向移动感光基板的同时将掩模的图案转印到感光基板上。 扫描投影曝光装置可以包括光学连接到光源的照明光学系统和布置在掩模和基板之间的光路中的投影光学系统。 照明光学系统以偏振方向沿着扫描方向和与扫描方向垂直的方向延伸的线偏振光照射掩模，而不损失光量。 扫描投影曝光装置的照明光学系统也可以包括能够围绕光的行进方向旋转的波片。