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公开(公告)号：US09164395B2
公开(公告)日：2015-10-20
申请号：US13314537
申请日：2011-12-08
申请人： Keita Sakai , Tatsuya Hayashi , Noriyasu Hasegawa
发明人： Keita Sakai , Tatsuya Hayashi , Noriyasu Hasegawa
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041
摘要： An exposure apparatus that includes a projection optical system, and exposes a substrate to light via the projection optical system and a liquid that is supplied between the projection optical system and the substrate. A plurality of recovery ports recover the liquid supplied between the projection optical system and the substrate, and are discretely arranged between vertices on each side of a polygon and at each of the vertices of the polygon. A chamber, connected to the plurality of recovery ports, receives the liquid. A pump attracts the liquid via the plurality of recovery ports and the chamber. A pressure difference between the pump and each of the recovery ports positioned at the vertices, among the plurality of recovery ports, is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices, among the plurality of recovery ports.
摘要翻译： 一种曝光装置，其包括投影光学系统，并且经由所述投影光学系统将基板暴露于光，以及供应在所述投影光学系统和所述基板之间的液体。 多个回收端口回收在投影光学系统和基板之间供应的液体，并且离散地布置在多边形的每一侧的顶点和多边形的每个顶点之间。 连接到多个回收端口的室接收液体。 泵通过多个回收口和腔室吸引液体。 在多个恢复端口中，定位在顶点处的泵和恢复端口中的每个恢复端口之间的压力差小于泵和定位在顶点之间的每个恢复端口之间的压力差，在多个恢复端口 。
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公开(公告)号：US20120170007A1
公开(公告)日：2012-07-05
申请号：US13314537
申请日：2011-12-08
申请人： Keita Sakai , Tatsuya Hayashi , Noriyasu Hasegawa
发明人： Keita Sakai , Tatsuya Hayashi , Noriyasu Hasegawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041
摘要： The present invention provides an exposure apparatus including a projection optical system, and configured to expose a substrate to light via the projection optical system and a liquid, the apparatus including a plurality of recovery ports configured to recover the liquid supplied between the projection optical system and the substrate, a chamber connected to the plurality of recovery ports, and a pump configured to attract the liquid via the plurality of recovery ports and the chamber, wherein the plurality of recovery ports are discretely arranged between vertices on each side of a polygon and at each of vertices of the polygon, and a pressure difference between the pump and each of the recovery ports positioned at the vertices among the plurality of recovery ports is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices among the plurality of recovery ports.
摘要翻译： 本发明提供一种曝光装置，包括：投影光学系统，用于经由投影光学系统和液体将基板曝光，所述装置包括多个回收端口，所述多个回收端口被配置为回收在投影光学系统和 所述基板，连接到所述多个回收端口的室以及被配置为经由所述多个回收端口和所述室吸引所述液体的泵，其中所述多个回收端口离散地布置在多边形的每一侧的顶点和 所述多边形的顶点中的每一个以及位于所述多个恢复端口中的所述顶点处的所述泵与所述每个所述恢复端口之间的压力差小于所述泵与位于所述顶点之间的每个所述恢复端口之间的压力差， 多个恢复端口。
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公开(公告)号：US20080002169A1
公开(公告)日：2008-01-03
申请号：US11755380
申请日：2007-05-30
IPC分类号： G03B27/42
CPC分类号： G03B27/58 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.
摘要翻译： 至少一个示例性实施例涉及用于曝光衬底的曝光装置。 曝光装置包括可移动基板台，投影光学系统，被配置为投射来自原稿的光并包括最终光学元件，以及设置在最终光学元件周围的喷嘴构件，并且包括与基板相对的相对表面。 基板通过投影光学系统的最终表面和基板，投影光学系统和原稿之间的液体曝光。 所述相对表面包括供给口，比所述供给口更远离所述最终光学元件的光轴提供的第一回收口以及设置在所述供给口与所述第一回收口之间的第一部分和第二部。 第一部分和基底之间的距离比供给口和基底之间的距离长。
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公开(公告)号：US20070291241A1
公开(公告)日：2007-12-20
申请号：US11755389
申请日：2007-05-30
申请人： Keita Sakai , Noriyasu Hasegawa
发明人： Keita Sakai , Noriyasu Hasegawa
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.
摘要翻译： 至少一个示例性实施例涉及被配置为通过包括投影光学和喷嘴单元的液体曝光基板的曝光装置。 喷嘴单元具有回收液体的液体回收口和布置在最终透镜和液体回收口之间并供应液体的液体供给口。 与液体回收口相比，喷嘴单元表面的外侧第二部分相对于液体的静态接触角比液体回收口的喷嘴单元表面的内侧第一部分的静态接触角大20° 或者更多。 第二部分相对于液体的滑动角度为20°或更小。
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公开(公告)号：US07705966B2
公开(公告)日：2010-04-27
申请号：US11755389
申请日：2007-05-30
申请人： Keita Sakai , Noriyasu Hasegawa
发明人： Keita Sakai , Noriyasu Hasegawa
CPC分类号： G03B27/42 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus configured to expose a substrate through a liquid comprising a projection optical and a nozzle unit. The nozzle unit has a liquid recovery port recovering the liquid and a liquid supply port arranged between a final lens and the liquid recovery port and supplying the liquid. A static contact angle of an outer-side second portion of the nozzle unit surface than the liquid recovery port with respect to the liquid is larger than that of an inner-side first portion of the nozzle unit surface than the liquid recovery port by 20° or more. A sliding angle of the second portion with respect to the liquid is 20° or less.
摘要翻译： 至少一个示例性实施例涉及被配置为通过包括投影光学和喷嘴单元的液体曝光基板的曝光装置。 喷嘴单元具有回收液体的液体回收口和布置在最终透镜和液体回收口之间并供应液体的液体供给口。 与液体回收口相比，喷嘴单元表面的外侧第二部分相对于液体的静态接触角比液体回收口的喷嘴单元表面的内侧第一部分的静态接触角大20° 或者更多。 第二部分相对于液体的滑动角度为20°或更小。
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公开(公告)号：US07394522B2
公开(公告)日：2008-07-01
申请号：US11755380
申请日：2007-05-30
CPC分类号： G03B27/58 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.
摘要翻译： 至少一个示例性实施例涉及用于曝光衬底的曝光装置。 曝光装置包括可移动基板台，投影光学系统，被配置为投射来自原稿的光并包括最终光学元件，以及设置在最终光学元件周围的喷嘴构件，并且包括与基板相对的相对表面。 基板通过投影光学系统的最终表面和基板，投影光学系统和原稿之间的液体曝光。 所述相对表面包括供给口，比所述供给口更远离所述最终光学元件的光轴提供的第一回收口以及设置在所述供给口与所述第一回收口之间的第一部分和第二部。 第一部分和基底之间的距离比供给口和基底之间的距离长。
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公开(公告)号：US08678808B2
公开(公告)日：2014-03-25
申请号：US13268351
申请日：2011-10-07
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.
摘要翻译： 本发明的压印装置使用模具将压印材料模制在基板上，并固化压印材料以在基板上形成图案。 该装置包括：支架，其构造成吸引模具以保持模具; 以及减压装置，其构造成减小由所述保持器保持的模具的背压，其中所述装置构造成与所述压模材料的模具释放平行地减小所述减压装置的背压。
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公开(公告)号：US20060215137A1
公开(公告)日：2006-09-28
申请号：US11387682
申请日：2006-03-24
IPC分类号： G03B27/42
CPC分类号： G03F7/70933 , G03F7/70916
摘要： An exposure apparatus for exposing a substrate to light via a reticle in a vacuum atmosphere includes a projection optical system configured to project a pattern of the reticle onto the substrate; a stage configured to hold one of the reticle and the substrate and to move; first and second partitions configured to define an exhaust space between a first space which accommodates at least a part of the projection optical system and a stage space which accommodates the stage, the first partition including a first opening configured to make the light pass between the first space and the exhaust space, and the second partition including a second opening configured to make the light pass between the exhaust space and the stage space; a first supply system configured to supply fluid into the stage space; and a first exhaust system configured to recover fluid from the stage space through the second opening and the exhaust space.
摘要翻译： 一种用于在真空气氛中通过掩模版曝光衬底的曝光装置包括投影光学系统，其配置为将掩模版的图案投影到衬底上; 被配置为保持所述掩模版和所述基板之一并移动的台; 第一和第二分隔件被配置为在容纳投影光学系统的至少一部分的第一空间和容纳该台之间的台阶空间之间限定排气空间，该第一隔板包括第一开口，该第一开口被配置为使光通过第一 空间和排气空间，第二分隔件包括：第二开口，其构造成使得光在排气空间与台架空间之间通过; 第一供应系统，其构造成将流体供应到所述台架空间中; 以及构造成通过所述第二开口和所述排气空间从所述载物台空间回收流体的第一排气系统。
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公开(公告)号：US07423724B2
公开(公告)日：2008-09-09
申请号：US11387682
申请日：2006-03-24
CPC分类号： G03F7/70933 , G03F7/70916
摘要： An exposure apparatus exposes a substrate to light via a reticle in a vacuum. A projection optical system projects a pattern of the reticle onto the substrate, a stage holds the substrate and moves, and first and second partitions define an exhaust space between a first space accommodating at least a part of the projection optical system and a stage space accommodating the stage. The first partition includes a first opening to make the light pass between the first space and the exhaust space, and the second partition includes a second opening to make the light pass between the exhaust space and the stage space. A first supply system supplies fluid into the stage space, and a first exhaust system recovers fluid from the stage space through the second opening and the exhaust space. A pressure in the exhaust space is lower than those in the first space and the stage space.
摘要翻译： 曝光装置在真空中通过掩模版将基板曝光。 投影光学系统将掩模版的图案投影到基板上，台架保持基板并移动，第一和第二隔板在容纳投影光学系统的至少一部分的第一空间和容纳 舞台。 第一分隔件包括使第一空间和排气间隔之间的光通过的第一开口，第二分隔件包括第二开口，以在排气空间与台架空间之间形成光。 第一供应系统将液体供应到载物台空间中，第一排气系统通过第二开口和排气空间从载物台空间回收流体。 排气空间中的压力低于第一空间和台架空间中的压力。
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公开(公告)号：US20080198346A1
公开(公告)日：2008-08-21
申请号：US12026628
申请日：2008-02-06
申请人： Akiko Iimura , Noriyasu Hasegawa
发明人： Akiko Iimura , Noriyasu Hasegawa
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： An exposure apparatus, exposing a substrate via liquid, includes a projection optical system that projects a pattern of an original onto the substrate and a substrate stage that holds and moves the substrate. The substrate stage includes a chuck that holds the substrate, a top plate that surrounds the substrate held by the chuck, and a draining mechanism that drains liquid on the top plate. The top plate has a first area and a second area on the surface of the top plate. At least part of the first area is formed between the substrate held by the chuck and the second area. The contact angle of the first area with the liquid is smaller than the contact angle of the second area with the liquid. The draining mechanism drains liquid on the first area.
摘要翻译： 曝光装置，通过液体曝光基板，包括将原稿图案投影到基板上的投影光学系统和保持和移动基板的基板台。 衬底台包括夹持衬底的卡盘，围绕由卡盘保持的衬底的顶板以及排出顶板上的液体的排出机构。 顶板在顶板的表面上具有第一区域和第二区域。 第一区域的至少一部分形成在由卡盘保持的基板和第二区域之间。 第一区域与液体的接触角小于第二区域与液体的接触角。 排水机构在第一区域排出液体。
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