Method of polishing hard crystal substrate
    1.
    发明授权
    Method of polishing hard crystal substrate 有权
    抛光硬质合金基板的方法

    公开(公告)号:US07828628B2

    公开(公告)日:2010-11-09

    申请号:US11946531

    申请日:2007-11-28

    IPC分类号: B24B7/22

    摘要: A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.

    摘要翻译: 通过使用分散在分散剂中的具有研磨人造金刚石颗粒的抛光油浆来研磨诸如GaN衬底或SiC衬底的硬质晶体衬底。 人造金刚石团簇包括具有粒径为2nm以上且10nm以下的一次粒子的平均粒径D 50为20nm以上且50nm以下的近似球状的聚集体颗粒。 首先进行粗抛光处理,使得得到0.5nm以上且1nm以下的平均表面粗糙度,然后进行表面的平均表面粗糙度为0.2nm以下的精加工。

    POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE
    2.
    发明申请
    POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE 审中-公开
    用于抛光硬质基材的抛光油浆

    公开(公告)号:US20110005143A1

    公开(公告)日:2011-01-13

    申请号:US12886810

    申请日:2010-09-21

    IPC分类号: C09K3/14 C09G1/02

    摘要: A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.

    摘要翻译: 通过使用分散在分散剂中的具有研磨人造金刚石颗粒的抛光油浆来研磨诸如GaN衬底或SiC衬底的硬质晶体衬底。 人造金刚石团簇包括具有粒径为2nm以上且10nm以下的一次粒子的平均粒径D 50为20nm以上且50nm以下的近似球状的聚集体颗粒。 首先进行粗抛光处理,使得得到0.5nm以上且1nm以下的平均表面粗糙度,然后进行表面的平均表面粗糙度为0.2nm以下的精加工。

    METHOD OF POLISHING HARD CRYSTAL SUBSTRATE AND POLISHING OIL SLURRY THEREFOR
    3.
    发明申请
    METHOD OF POLISHING HARD CRYSTAL SUBSTRATE AND POLISHING OIL SLURRY THEREFOR 有权
    抛光硬质基底和抛光油浆的方法

    公开(公告)号:US20080139089A1

    公开(公告)日:2008-06-12

    申请号:US11946531

    申请日:2007-11-28

    IPC分类号: B24B57/02

    摘要: A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.

    摘要翻译: 通过使用分散在分散剂中的具有研磨人造金刚石颗粒的抛光油浆来研磨诸如GaN衬底或SiC衬底的硬质晶体衬底。 人造金刚石团簇包括具有粒径为2nm以上且10nm以下的一次粒子的平均粒径D 50为20nm以上且50nm以下的近似球状的聚集体颗粒。 首先进行粗抛光处理,使得得到0.5nm以上且1nm以下的平均表面粗糙度,然后进行表面的平均表面粗糙度为0.2nm以下的精加工。

    INFORMATION SPREAD SCALE PREDICTION DEVICE, INFORMATION SPREAD SCALE PREDICTION METHOD, AND INFORMATION SPREAD SCALE PREDICTION PROGRAM
    4.
    发明申请
    INFORMATION SPREAD SCALE PREDICTION DEVICE, INFORMATION SPREAD SCALE PREDICTION METHOD, AND INFORMATION SPREAD SCALE PREDICTION PROGRAM 有权
    信息扩展规模预测装置,信息扩展规模预测方法和信息扩展规模预测方案

    公开(公告)号:US20140244551A1

    公开(公告)日:2014-08-28

    申请号:US13824122

    申请日:2012-11-01

    IPC分类号: G06N99/00

    CPC分类号: G06N99/005 G06Q30/02

    摘要: To provide an information spread scale prediction device capable of accurately predicting the number of future contributions for a specific topic in SNS and the like. The information spread scale prediction device includes: a learning text data input unit which acquires learning text data from a specific website; a node influence learning unit which calculates the influence for the number of statements by each group to which a node specifying a single specific user belongs for the topic from the number of statements by each classified topic, and stores it as learning data; a prediction text data input unit which acquires prediction text data from the specific website after storing the learning data; and a future contribution number prediction unit which predicts and outputs the number of contributions at a specific future time of the topic based on the number of statements of each topic and the learning data.

    摘要翻译: 提供能够准确地预测SNS等中的特定主题的未来贡献的数量的信息扩展规模预测装置。 信息扩展规模预测装置包括:学习文本数据输入单元,其从特定网站获取学习文本数据; 节点影响学习单元,根据每个分类主题的语句数,计算对于指定单个特定用户的节点所属的每个组的语句数量的影响,并将其存储为学习数据; 预测文本数据输入单元,其在存储所述学习数据之后从所述特定网站获取预测文本数据; 以及未来贡献数量预测单元,其基于每个主题的语句数量和学习数据来预测并输出该主题的特定将来时间的贡献数量。

    METHOD FOR POLISHING SEMICONDUCTOR WAFER
    5.
    发明申请
    METHOD FOR POLISHING SEMICONDUCTOR WAFER 有权
    抛光半导体波形的方法

    公开(公告)号:US20120208439A1

    公开(公告)日:2012-08-16

    申请号:US13502879

    申请日:2010-09-28

    IPC分类号: H01L21/304

    CPC分类号: B24B37/105 B24B37/042

    摘要: In a method for polishing a semiconductor wafer by rotating a work carrier and a table while pressing the semiconductor wafer retained by the work carrier against a polishing cloth mounted on the table, at a time when the table and the work carrier both having been at rest are rotated, each at a predetermined number of revolutions, in a condition that the polishing cloth and the semiconductor wafer are pressed against each other, to thereby start polishing, a table acceleration is maintained smaller than a work carrier acceleration. By such maintaining the table acceleration smaller than the work carrier acceleration, vibrations to be generated when the polishing is started can be prevented. In the method for polishing a semiconductor wafer according to the present invention, the diameter of the semiconductor wafer is preferably defined to be 30% or more of the diameter of the table.

    摘要翻译: 在通过使工作载体和工作台旋转而将由工作载体保持的半导体晶片压靠在安装在工作台上的研磨布上的情况下,在工作台和工作台两者都处于静止状态的时刻来研磨半导体晶片的方法 在抛光布和半导体晶片彼此挤压的条件下以预定转数旋转,从而开始抛光,台加速度保持小于作业载体加速度。 通过这样保持工作台加速度小于工作载体加速度,可以防止在抛光开始时产生的振动。 在本发明的半导体晶片的研磨方法中,半导体晶片的直径优选为台的直径的30%以上。

    PROCESS FOR PRODUCING AN ACTIVE CATHODE FOR ELECTROLYSIS
    7.
    发明申请
    PROCESS FOR PRODUCING AN ACTIVE CATHODE FOR ELECTROLYSIS 失效
    用于生产用于电解的活性阴离子的方法

    公开(公告)号:US20110198230A1

    公开(公告)日:2011-08-18

    申请号:US13123772

    申请日:2009-11-12

    摘要: Soluble nickel and tin contained in a coating layer are eluted into an aqueous solution by bringing a cathode coated with a nickel-tin alloy into contact with an aqueous solution of an alkali metal hydrogen carbonate such as sodium hydrogen carbonate, thereby reducing the amounts of these metals eluted during electrolysis.

    摘要翻译: 通过将涂覆有镍 - 锡合金的阴极与碱金属碳酸氢盐如碳酸氢钠的水溶液接触,将包含在涂层中的可溶性镍和锡溶解到水溶液中,从而减少这些量 金属在电解过程中被洗脱。

    Optical phase modulator
    8.
    发明授权
    Optical phase modulator 有权
    光相位调制器

    公开(公告)号:US07869669B2

    公开(公告)日:2011-01-11

    申请号:US12510535

    申请日:2009-07-28

    IPC分类号: G02F1/035

    摘要: The invention provides an optical phase modulator having a substrate made of an electro-optical material, a signal electrode provided on the substrate and first and second ground electrodes provided on both sides of the signal electrode. The electrodes are provided so that a size of the first gap between the first ground electrode and the signal electrode is smaller than a size of a second gap between the second ground electrode and the signal electrode. Furthermore, an optical waveguide is provided in the first gap as an optical phase modulator and not provided in the second gap. A driving voltage required for the phase adjustments is thereby lowered, the impedance matching is easily made and excellent radio frequency property can be realized.

    摘要翻译: 本发明提供一种光学相位调制器,其具有由电光材料制成的基板,设置在基板上的信号电极以及设置在信号电极两侧的第一和第二接地电极。 设置电极,使得第一接地电极和信号电极之间的第一间隙的尺寸小于第二接地电极和信号电极之间的第二间隙的尺寸。 此外,在第一间隙中设置光波导作为光相位调制器,并且不设置在第二间隙中。 相位调整所需的驱动电压因此降低,容易进行阻抗匹配,能够实现优异的射频特性。

    DEVICES FOR DETECTING ACCUMULATION AMOUNT OF PARTICULATES
    9.
    发明申请
    DEVICES FOR DETECTING ACCUMULATION AMOUNT OF PARTICULATES 有权
    用于检测颗粒的累积量的装置

    公开(公告)号:US20100242442A1

    公开(公告)日:2010-09-30

    申请号:US12721826

    申请日:2010-03-11

    IPC分类号: F01N11/00 F01N3/02

    CPC分类号: F01N11/00 Y02T10/47

    摘要: A device for detecting particulates includes: a filter; a filter container; an upstream pipe; a downstream pipe; an upstream detecting unit; and a downstream detecting unit. The upstream detecting unit has a branch flow route for receiving gas from the upstream pipe, a trapping portion, a transmitting portion for transmitting an electromagnetic wave to the trapping portion, and a receiving portion for receiving an electromagnetic wave from the trapping portion. The downstream detecting unit has a branch flow route for receiving gas from the downstream pipe, a trapping portion, a transmitting portion for transmitting an electromagnetic wave to the trapping portion, and a receiving portion for receiving an electromagnetic wave from the trapping portion. The amount of the particulates trapped in the filter is detected based on a difference between detection values of the mass of the particulates trapped in the upstream and downstream trapping portions.

    摘要翻译: 用于检测微粒的装置包括:过滤器; 过滤容器; 上游管道 下游管道 上游检测单元; 和下游检测单元。 上游检测单元具有用于从上游管接收气体的分支流动路径,捕获部分,用于将电磁波发送到捕获部分的发送部分和用于从捕获部分接收电磁波的接收部分。 下游检测单元具有用于从下游管接收气体的分支流动路径,捕获部分,用于将电磁波发送到捕获部分的发送部分和用于从捕获部分接收电磁波的接收部分。 基于捕集在上游捕集部和下游捕获部中的微粒的质量的检测值之差来检测捕集在过滤器中的微粒的量。

    OPTICAL MODULATORS
    10.
    发明申请
    OPTICAL MODULATORS 失效
    光学调制器

    公开(公告)号:US20090245715A1

    公开(公告)日:2009-10-01

    申请号:US12407904

    申请日:2009-03-20

    IPC分类号: G02F1/035

    CPC分类号: G02F1/035 G02B6/4202

    摘要: An optical modulator 24 has a supporting substrate 5, a modulating substrate 11 made of an electro-optical material, an optical waveguide 12 provided on the side of a first main surface 30 of the modulating substrate 11, and an adhesion layer 6 adhering a second main surface 31 of the modulating substrate 11 onto the supporting substrate 5. The modulating substrate 11 has a high-frequency interaction portion 11c applying a voltage on the optical waveguide 12 to modulate propagating light, an incident portion 11a inputting light to the optical waveguide, and an outgoing portion 11b outputting light from the optical waveguide. The high-frequency interaction portion 11c is recessed on the first main surface 30 of the modulating substrate 11 with respect to the incident and outgoing portions 11a and 11b. The high-frequency interaction portion 11c has a thickness smaller than the those of the incident and outgoing portions 11a and 11b.

    摘要翻译: 光调制器24具有支撑基板5,由电光材料制成的调制基板11,设置在调制基板11的第一主表面30一侧的光波导12和粘附层 调制基板11的主表面31到支撑基板5上。调制基板11具有在光波导12上施加电压以调制传播光的高频相互作用部分11c,向光波导输入光的入射部分11a, 以及从光波导输出光的出射部分11b。 高频相互作用部分11c相对于入射和出射部分11a和11b凹入调制基板11的第一主表面30上。 高频相互作用部分11c的厚度小于入射部分11a和出射部分11b的厚度。