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    Method of polishing hard crystal substrate
    1.
    发明授权
    Method of polishing hard crystal substrate 有权
    抛光硬质合金基板的方法

    公开(公告)号：US07828628B2

    公开(公告)日：2010-11-09

    申请号：US11946531

    申请日：2007-11-28

    申请人： Kenji Aoki ,  Toru Yamazaki ,  Takehiro Watanabe ,  Naoyuki Hamada

    发明人： Kenji Aoki ,  Toru Yamazaki ,  Takehiro Watanabe ,  Naoyuki Hamada

    IPC分类号： B24B7/22

    CPC分类号： H01L21/02024 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1472 ,  H01L29/1608

    摘要： A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.

    摘要翻译： 通过使用分散在分散剂中的具有研磨人造金刚石颗粒的抛光油浆来研磨诸如GaN衬底或SiC衬底的硬质晶体衬底。 人造金刚石团簇包括具有粒径为2nm以上且10nm以下的一次粒子的平均粒径D 50为20nm以上且50nm以下的近似球状的聚集体颗粒。 首先进行粗抛光处理，使得得到0.5nm以上且1nm以下的平均表面粗糙度，然后进行表面的平均表面粗糙度为0.2nm以下的精加工。

    POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE
    2.
    发明申请
    POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE 审中-公开
    用于抛光硬质基材的抛光油浆

    公开(公告)号：US20110005143A1

    公开(公告)日：2011-01-13

    申请号：US12886810

    申请日：2010-09-21

    申请人： Kenji Aoki ,  Toru Yamazaki ,  Takehiro Watanabe ,  Naoyuki Hamada

    发明人： Kenji Aoki ,  Toru Yamazaki ,  Takehiro Watanabe ,  Naoyuki Hamada

    IPC分类号： C09K3/14 ,  C09G1/02

    CPC分类号： H01L21/02024 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1472 ,  H01L29/1608

    摘要： A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.

    摘要翻译： 通过使用分散在分散剂中的具有研磨人造金刚石颗粒的抛光油浆来研磨诸如GaN衬底或SiC衬底的硬质晶体衬底。 人造金刚石团簇包括具有粒径为2nm以上且10nm以下的一次粒子的平均粒径D 50为20nm以上且50nm以下的近似球状的聚集体颗粒。 首先进行粗抛光处理，使得得到0.5nm以上且1nm以下的平均表面粗糙度，然后进行表面的平均表面粗糙度为0.2nm以下的精加工。

    METHOD OF POLISHING HARD CRYSTAL SUBSTRATE AND POLISHING OIL SLURRY THEREFOR
    3.
    发明申请
    METHOD OF POLISHING HARD CRYSTAL SUBSTRATE AND POLISHING OIL SLURRY THEREFOR 有权
    抛光硬质基底和抛光油浆的方法

    公开(公告)号：US20080139089A1

    公开(公告)日：2008-06-12

    申请号：US11946531

    申请日：2007-11-28

    申请人： Kenji Aoki ,  Toru Yamazaki ,  Takehiro Watanabe ,  Naoyuki Hamada

    发明人： Kenji Aoki ,  Toru Yamazaki ,  Takehiro Watanabe ,  Naoyuki Hamada

    IPC分类号： B24B57/02

    CPC分类号： H01L21/02024 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1472 ,  H01L29/1608

    摘要： A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.

    摘要翻译： 通过使用分散在分散剂中的具有研磨人造金刚石颗粒的抛光油浆来研磨诸如GaN衬底或SiC衬底的硬质晶体衬底。 人造金刚石团簇包括具有粒径为2nm以上且10nm以下的一次粒子的平均粒径D 50为20nm以上且50nm以下的近似球状的聚集体颗粒。 首先进行粗抛光处理，使得得到0.5nm以上且1nm以下的平均表面粗糙度，然后进行表面的平均表面粗糙度为0.2nm以下的精加工。

    Method of mirror-finishing a glass substrate
    6.
    发明授权
    Method of mirror-finishing a glass substrate 失效
    镜面整理玻璃基板的方法

    公开(公告)号：US06287175B1

    公开(公告)日：2001-09-11

    申请号：US09598545

    申请日：2000-06-21

    申请人： Takabumi Marukawa ,  Naoyuki Hamada ,  Kanichi Endo

    发明人： Takabumi Marukawa ,  Naoyuki Hamada ,  Kanichi Endo

    IPC分类号： B24B100

    CPC分类号： B24B37/08 ,  B24B13/015 ,  G11B5/7085

    摘要： A mirror-finishing method embodying this invention, with which the above and other objects can be accomplished, may be characterized as comprising the step of supplying a solution containing hydroxyl groups on a target surface to be polished of a glass substrate while simultaneously pressing onto this target surface an elastic sponge material having abrading particles affixed therein and a plurality of indentations on a polishing surface thereof, and causing the substrate and the sponge material to move with respect to each other.

    摘要翻译： 实现本发明的镜面精加工方法可以实现上述和其它目的，其特征在于包括以下步骤：在玻璃基板的待抛光目标表面上提供含有羟基的溶液，同时将其压在该 目标表面具有粘附在其中的研磨颗粒的弹性海绵材料和在其抛光表面上的多个凹痕，并使基底和海绵材料相对于彼此移动。