Hard coating film excellent in adhesion and manufacturing method thereof
    1.
    发明授权
    Hard coating film excellent in adhesion and manufacturing method thereof 有权
    粘合性优异的硬涂膜和其制造方法

    公开(公告)号:US07264883B2

    公开(公告)日:2007-09-04

    申请号:US10743735

    申请日:2003-12-24

    IPC分类号: B23B27/14

    摘要: A hard coating film of the present invention is formed on a substrate, and is a multilayer including at least the following layers (1) to (3). (1) A first layer on the substrate side comprising one or more metals selected from the group consisting of elements in Groups 4A, 5A, and 6A of the periodic table; (2) a B- and C-containing surface layer; and (3) a graded composition layer which is formed in a sandwiched manner between the first layer and the surface layer, and in which the content of B and C changes continuously or stepwise from the first layer side toward the surface layer side. Another hard coating film of the present invention has a cubic boron nitride film as its outermost surface layer; the cubic boron nitride film is stacked in a state of having been nucleated from a B- and N-containing layer; and the B- and N-containing layer has a ratio of N to B of 0.8 to 1 on a mole basis in at least the nucleation portion, and contains one or more elements selected from the group consisting of elements in Groups 4A, 5A, and 6A of the periodic table, and Si in a proportion of 0.02 to 0.1 on a mole basis. Such a configuration provides a hard coating film capable of being formed with good adhesion on the substrate surface of a cemented carbide, a high-speed steel, or the like.

    摘要翻译: 本发明的硬涂膜形成在基材上,是至少包含以下的层(1)〜(3)的多层。 (1)基板侧的第一层包含选自元素周期表的第4A,5A和6A族元素的一种或多种金属; (2)含有B和C的表面层; 和(3)在第一层和表面层之间夹层形成的等级组成层,其中B和C的含量从第一层侧向表面层侧连续或逐步变化。 本发明的另一种硬涂层具有立方氮化硼膜作为其最外表面层; 立方氮化硼膜以从B和N含有层成核的状态堆叠; 并且所述B和N含量层在至少所述成核部分中以摩尔计的N与B的比率为0.8至1,并且含有选自由4A,5A, 和6A,Si以摩尔计0.02至0.1的比例。 这种构造提供了能够在硬质合金,高速钢等的基板表面上形成具有良好粘附性的硬涂层膜。

    Hard film, method of forming the same and target for hard film formation
    2.
    发明授权
    Hard film, method of forming the same and target for hard film formation 有权
    硬膜,形成方法和硬膜形成的目标

    公开(公告)号:US07211138B2

    公开(公告)日:2007-05-01

    申请号:US10769913

    申请日:2004-02-03

    IPC分类号: C23C14/06

    摘要: A hard film is formed of a material having composition indicated by a chemical formula: (TiaAlbVcSidBf) (C1−eNe), in which subscripts a, b, c, d, f and e indicate atomic ratios of Ti, Al, V, Si, B and N, respectively, and meet relational expressions: 0.02≦a≦0.5, 0.4

    摘要翻译: 硬质膜由具有以下化学式表示的组成的材料形成:(Ti a a a B b) 其中下标a,b,c,d,f和e(C 1-e N e) 分别表示Ti,Al,V,Si,B和N的原子比,满足关系式:0.02 <= a <= 0.5,0.4

    Hard wear resistant film, process for forming hard film, and target used to form hard film
    4.
    发明授权
    Hard wear resistant film, process for forming hard film, and target used to form hard film 有权
    硬质耐磨膜,硬质成膜工艺和用于形成硬膜的靶材

    公开(公告)号:US06767658B2

    公开(公告)日:2004-07-27

    申请号:US10200535

    申请日:2002-07-23

    IPC分类号: C23C1406

    摘要: Disclosed is a hard film exhibiting high wear resistance, with composition of (Alb,[Cr1−&agr;V&agr;]c(C1−dNd), satisfying the condition of 0.5≦b≦0.8, 0.2≦c≦0.5, b+c=1, 0.05≦&agr;≦0.95, 0.5≦d≦1 (where b and c each represents atomic ratio of Al and Cr+V, and d denotes atomic ratio of N, &agr; denotes atomic ratio of V.), or with composition of (M&agr;,Alb,[Cr−&agr;V&agr;]c)(C1−dNd), wherein M is at least one element selected from Ti, Nb, W, Ta and Mo and satisfying the condition of 0.02≦a≦0.3, 0.5≦b≦0.8, 0.05≦c, a+b+c=1, 0.5≦d≦1, 0≦&agr;≦1 (where a represents atomic ratio of M). However, the case is exempted where M is Ti and the value of &agr; is 0.

    摘要翻译: 公开了具有高耐磨性的硬膜,其组成为(Alb,[Cr1-αValpha] c(C1-dNd)),满足条件为0.5≤b≤0.8,0.2≤c≤0.5,b + c = 1,0.05 <=α<= 0.95,0.5 <= d <= 1(其中b和c各自表示Al和Cr + V的原子比,d表示N的原子比,α表示V的原子比。 )或具有(Malpha,Alb,[Cr-αValpha] c)(C1-dNd)的组成的组合物,其中M是选自Ti,Nb,W,Ta和Mo中的至少一种元素,并且满足条件0.02 < a <= 0.3,0.5 <= b <= 0.8,0.05 <= c,a + b + c = 1,0.5 <= d <= 1,0 <=α<= 1(其中a表示M的原子比) 但是,如果M是Ti,并且α的值为0,则该情况是豁免的。

    Gear spindle and oil seal used therein

    公开(公告)号:US10016798B2

    公开(公告)日:2018-07-10

    申请号:US14424582

    申请日:2012-08-31

    申请人: Kenji Yamamoto

    发明人: Kenji Yamamoto

    摘要: In a gear spindle, outer cylinder gear sections (11) are each integrally formed on an inner peripheral surface of a spindle outer cylinder and inner cylinder gear sections (14) are each integrally formed on an outer peripheral surface of a spindle inner cylinder (13). An oil seal (27) that seals in the lubricating oil (20) for each of the aforementioned gear sections includes, a seal body (29) having a channel-shaped cross section and interposed in the peripheral gap between the inner peripheral surface of the spindle outer cylinder and the outer peripheral surface of the spindle inner cylinder (13), and a seal mounting member (30) that includes a band, a spring, or the like that tightens and fixes the seal body to the outer peripheral surface of the spindle inner cylinder (13) to allow expansion of the seal body in the axial direction in the aforementioned peripheral gap.

    Press-forming mold and method for manufacturing protective film for press-forming mold

    公开(公告)号:US09902093B2

    公开(公告)日:2018-02-27

    申请号:US14009522

    申请日:2012-04-03

    摘要: A press-forming mold has a protective film for preventing seizing during press-forming formed on at least a forming surface that comes into contact with a formed body. The protective film is formed by PVD. An arbitrary selection section extracted from the surface of the protective film is divided into a plurality of individual sections; and, when the gradient of the surface at the nth division point is represented by (dZn/dXn), taking N to represent the number of divisions, the root-mean-square RΔq calculated by the following numerical expression is no greater than 0.032. R ⁢ ⁢ Δ ⁢ ⁢ q = 1 N ⁢ ∑ n = 1 N ⁢ ⁢ ( d ⁢ ⁢ Z n d ⁢ ⁢ X n ) 2 It is thereby possible to improve the seizing resistance of a press-forming mold having a protective film formed by PVD.

    Transparent electroconductive film and process for producing the same
    10.
    发明授权
    Transparent electroconductive film and process for producing the same 有权
    透明导电膜及其制造方法

    公开(公告)号:US09297061B2

    公开(公告)日:2016-03-29

    申请号:US12449303

    申请日:2008-02-15

    IPC分类号: B32B9/00 C23C14/08 C03C17/34

    摘要: In a transparent electroconductive film including a transparent substrate and a transparent electroconductive oxide layer disposed on the transparent substrate, when the transparent electroconductive oxide layer is composed of zinc oxide, the surface resistivity of the transparent electroconductive oxide layer increases with time and thus it has been difficult to obtain a transparent electroconductive film stable against an environmental variation. Consequently, hard carbon films are provided on the surfaces of a transparent electroconductive oxide layer including at least one layer and containing zinc oxide as a main component in “the order of transparent substrate-hard carbon film-transparent electroconductive oxide layer-hard carbon film” or “the order of hard carbon film-transparent substrate-transparent electroconductive oxide layer-hard carbon film”. Alternatively, an organosilicon compound covering layer is provided on a surface of the transparent electroconductive oxide layer. Thereby, the water contact angle can be 75 degrees or more, and an increase in the resistivity of the transparent electroconductive oxide layer can be suppressed.

    摘要翻译: 在透明导电膜包括透明基板和透明导电氧化物层的透明导电膜上,当透明导电氧化物层由氧化锌组成时,透明导电氧化物层的表面电阻率随着时间的推移而增加, 难以获得对环境变化稳定的透明导电膜。 因此,在“透明基板 - 硬质碳膜透明导电氧化物层 - 硬质碳膜”的顺序,在包含至少一层并含有氧化锌作为主要成分的透明导电氧化物层的表面上设置硬质碳膜, 或“硬碳膜透明基板透明导电氧化物层 - 硬质碳膜的顺序”。 或者,在透明导电氧化物层的表面上设置有机硅化合物覆盖层。 因此,水接触角可以为75度以上,并且可以抑制透明导电氧化物层的电阻率的增加。