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    Liquid ejecting head, liquid ejecting apparatus, and actuator
    2.
    发明授权
    Liquid ejecting head, liquid ejecting apparatus, and actuator 有权
    液体喷头，液体喷射装置和致动器

    公开(公告)号：US08459767B2

    公开(公告)日：2013-06-11

    申请号：US12757519

    申请日：2010-04-09

    申请人： Koji Sumi

    发明人： Koji Sumi

    IPC分类号： B41J29/38

    CPC分类号： B41J2/04581 ,  B41J2/0459 ,  B41J2/14233 ,  H01L41/0973

    摘要： A liquid ejecting head includes a flow path forming substrate in which pressure generation chambers are formed. The pressure generation chambers communicate with nozzles that eject liquid droplets. Piezoelectric elements are positioned on the flow path forming substrate to generate pressure changes in the pressure generation chambers. Each piezoelectric element includes a piezoelectric body layer, a first electrode on one side of the piezoelectric body layer, and a second electrode on the opposite side of the piezoelectric body layer. The piezoelectric element is driven in a condition that the relationship between minimum voltage Vmin, and maximum voltage Vmax, which are applied to the piezoelectric element, and peak voltage Vo satisfies the expression, Vmin

    摘要翻译： 液体喷射头包括形成有压力产生室的流路形成基板。 压力产生室与喷射液滴的喷嘴连通。 压电元件位于流路形成基板上，以产生压力产生室中的压力变化。 每个压电元件包括​​压电体层，压电体层一侧的第一电极和与压电体层相对的第二电极。 压电元件在施加到压电元件的最小电压Vmin和最大电压Vmax之间的关系以及峰值电压Vo满足Vmin

    Method of manufacturing dielectric layer and method of manufacturing liquid jet head
    3.
    发明授权
    Method of manufacturing dielectric layer and method of manufacturing liquid jet head 有权
    制造介质层的方法和制造液体喷头的方法

    公开(公告)号：US08003161B2

    公开(公告)日：2011-08-23

    申请号：US12101057

    申请日：2008-04-10

    申请人： Akira Kuriki ,  Hironobu Kazama ,  Toshinao Shinbo ,  Koji Sumi

    发明人： Akira Kuriki ,  Hironobu Kazama ,  Toshinao Shinbo ,  Koji Sumi

    IPC分类号： B05D5/12

    CPC分类号： B41J2/161 ,  B41J2/1628 ,  B41J2/164 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1245 ,  C23C18/1254 ,  C23C18/1283 ,  H01L41/1876 ,  H01L41/318 ,  Y10T29/42

    摘要： A method of manufacturing a dielectric film includes a coating step of coating sol made of an organic metal compound and forming a dielectric precursor film, a drying step of drying the dielectric precursor film, a degreasing step of degreasing the dielectric precursor film, and a baking step of baking the dielectric precursor film to form a dielectric film. The drying step includes a first drying step of drying the dielectric precursor film by heating the dielectric precursor film to a temperature lower than a boiling point of a solvent which is a main solvent of the sol and then holding the dielectric precursor film at the temperature for a predetermined period of time, and a second drying step of drying the dielectric precursor film further by reheating the dielectric precursor film and then holding the dielectric precursor film at the temperature for a predetermined period of time.

    摘要翻译： 制造电介质膜的方法包括：涂覆由有机金属化合物制成的溶胶并形成电介质前体膜的涂覆步骤，干燥电介质前体膜的干燥步骤，使电介质前体膜脱脂的脱脂步骤和烘烤 烘烤电介质前体膜以形成电介质膜的步骤。 干燥步骤包括：第一干燥步骤，通过将电介质前体膜加热到低于作为溶胶的主要溶剂的溶剂的沸点的温度，然后将电介质前体膜保持在温度为 以及第二干燥步骤，通过再次加热电介质前体膜，然后将电介质前体膜保持在该温度下进一步干燥电介质前体膜一段预定时间。

    Actuator device, liquid-jet head and liquid-jet apparatus
    5.
    发明授权
    Actuator device, liquid-jet head and liquid-jet apparatus 失效
    执行器装置，喷液头和液体喷射装置

    公开(公告)号：US07589450B2

    公开(公告)日：2009-09-15

    申请号：US11482689

    申请日：2006-07-10

    申请人： Motoki Takabe ,  Koji Sumi ,  Naoto Yokoyama

    发明人： Motoki Takabe ,  Koji Sumi ,  Naoto Yokoyama

    IPC分类号： H01L41/00 ,  H02N2/00

    CPC分类号： B41J2/14233 ,  B41J2002/14241 ,  B41J2002/14419 ,  B41J2202/03 ,  B41J2202/20 ,  H01L41/0973 ,  H01L41/1876 ,  H01L41/318 ,  H01L41/319

    摘要： An actuator device includes: a layer provided on a single crystal silicon (Si) substrate, and made of silicon dioxide (SiO2); at least one buffer layer provided on the layer made of silicon dioxide (SiO2); a base layer provided on the buffer layer, and made of lanthanum nickel oxide (LNO) having the (100m) plane orientation; and a piezoelectric element. The piezoelectric element includes: a lower electrode provided on the base layer, and made of platinum (Pt) having the (100) plane orientation; a piezoelectric layer made of a ferroelectric layer whose plane orientation is the (100) orientation, the piezoelectric layer formed on the lower electrode by epitaxial growth where a crystal system of at least one kind selected from a group consisting of a tetragonal system, a monoclinic system and a rhombohedral system dominates the other crystal systems; and an upper electrode provided on the piezoelectric layer.

    摘要翻译： 致动器装置包括：设置在单晶硅（Si）衬底上的由二氧化硅（SiO 2）制成的层; 提供在由二氧化硅（SiO 2）制成的层上的至少一个缓冲层; 设置在缓冲层上的由具有（100μm）面取向的氧化镧（LNO）构成的基层; 和压电元件。 压电元件包括​​：设置在基底层上并由具有（100）面取向的铂（Pt）制成的下电极; 由平面取向为（100）取向的铁电体层构成的压电层，通过外延生长在下部电极上形成的压电体，其中选自四方晶系，单斜晶系 系统和菱方系统主导其他晶体系统; 以及设置在压电层上的上电极。

    Method and device for drying substrate
    7.
    发明授权
    Method and device for drying substrate 失效
    干燥基材的方法和装置

    公开(公告)号：US07377053B1

    公开(公告)日：2008-05-27

    申请号：US09936618

    申请日：2000-01-17

    申请人： Norio Maeda ,  Koji Sumi ,  Hiroshi Aihara ,  Masao Oono ,  Takao Matsumoto ,  Naoaki Izutani

    发明人： Norio Maeda ,  Koji Sumi ,  Hiroshi Aihara ,  Masao Oono ,  Takao Matsumoto ,  Naoaki Izutani

    IPC分类号： F26B21/00 ,  F26B21/06 ,  F26B21/12 ,  B08B3/02 ,  B08B3/04 ,  B08B5/00

    CPC分类号： H01L21/67028 ,  Y10S134/902

    摘要： A device for drying substrate comprising a processing vessel housing a specified number of substrates such as semiconductor wafers installed erectedly in parallel to one another, a first substrate supporting member supporting substrates within the processing vessel, the processing fluid supplying section supplying to the processing vessel, the processing fluid for performing processing such as cleaning processing on the substrates, a processing fluid exhausting section exhausting processing fluid from the processing vessel, and a drying fluid supplying section supplying, to the processing vessel, the liquid drops of drying fluid for performing drying processing on the substrates.

    摘要翻译： 一种用于干燥基板的装置，包括：容纳指定数量的基板的处理容器，所述处理容器彼此平行地安装的半导体晶片，第一基板支撑构件，其支撑处理容器内的基板，供给处理容器的处理流体供应部， 用于对基板进行清洗处理的处理流体，来自处理容器的排出处理流体的处理流体排出部分和向处理容器提供用于进行干燥处理的干燥流体液滴的干燥流体供应部分 在基板上。

    Actuator device, liquid-jet head liquid-jet apparatus
    9.
    发明申请
    Actuator device, liquid-jet head liquid-jet apparatus 有权
    致动器装置，喷液头喷液装置

    公开(公告)号：US20070035590A1

    公开(公告)日：2007-02-15

    申请号：US11501040

    申请日：2006-08-09

    申请人： Koji Sumi

    发明人： Koji Sumi

    IPC分类号： B41J2/045

    CPC分类号： B41J2/14233 ,  B41J2002/14241 ,  B41J2202/11

    摘要： An actuator device including vibration plates formed on one side of a substrate; and piezoelectric elements mounted through the vibration plates and each including a lower electrode, a piezoelectric layer, and an upper electrode, wherein a ratio d31/S11E of a piezoelectric constant d31 of the piezoelectric layer to an elastic compliance S11E of the piezoelectric layer is greater than 5 C/m2, and the elastic compliance S11E of each vibration plate is greater than 2×10−8 m2/N.

    摘要翻译： 一种致动器装置，包括形成在基板的一侧上的振动板; 以及压电元件，其通过振动板安装并且各自包括下电极，压电层和上电极，其中比率d 31 压电层的压电常数d 31> 30 与压电层的弹性柔量相差大于5 C / m 2，并且每个振动板的弹性柔顺度S 11大于2×10 -8。 m 2 / N。

    Method of forming a piezoelectric layer in forming a piezoelectric element including a lower electrode on one surface of a substrate
    10.
    发明授权
    Method of forming a piezoelectric layer in forming a piezoelectric element including a lower electrode on one surface of a substrate 失效
    在基板的一个表面上形成包括下电极的压电元件的形成压电层的方法

    公开(公告)号：US07137179B2

    公开(公告)日：2006-11-21

    申请号：US10883035

    申请日：2004-07-02

    申请人： Toshiaki Yokouchi ,  Koji Sumi

    发明人： Toshiaki Yokouchi ,  Koji Sumi

    IPC分类号： H04R17/00 ,  B05D5/12 ,  H01L41/04

    CPC分类号： B41J2/161 ,  B41J2/14233 ,  B41J2/1623 ,  B41J2/1626 ,  B41J2/1645 ,  B41J2/1646 ,  B41J2002/14241 ,  B41J2002/14419 ,  F27B17/0025 ,  F27D5/0037 ,  H01L41/318 ,  Y10T29/42 ,  Y10T29/49128 ,  Y10T29/4913 ,  Y10T29/49401

    摘要： A method of forming a piezoelectric layer includes: a drying step for forming at least one ferroelectric precursor film on a lower electrode of a substrate and drying the ferroelectric precursor film; a degreasing step for carrying the substrate into a region facing a hot plate heated to a certain temperature and for degreasing the ferroelectric precursor film in a state where the substrate is supported by a proximity pin; and a baking step for further baking the degreased ferroelectric precursor film to form the degreased ferroelectric precursor film into a ferroelectric film. The piezoelectric layer is formed by repeating the drying, degreasing, and baking steps for the ferroelectric precursor film in a predetermined number of cycles. The degreasing step includes a step of adjusting a heating temperature of the ferroelectric precursor film by adjusting a distance between the hot plate and the substrate and by lowering a temperature of space on an opposite side of the substrate from the hot plate.

    摘要翻译： 形成压电层的方法包括：干燥步骤，用于在基板的下电极上形成至少一个铁电前体膜并干燥铁电前体膜; 一种脱脂步骤，用于将衬底运送到面对加热到一定温度的热板的区域中，并且用于在衬底由靠近销支撑的状态下去除铁电前体膜; 以及烘烤步骤，用于进一步烘烤脱脂铁电前体膜，以将脱脂铁电前体膜形成为铁电体膜。 通过以规定次数的周期重复强电介质前体膜的干燥，脱脂和烘烤工序来形成压电体层。 脱脂步骤包括通过调节热板和基板之间的距离并通过降低基板与热板相反的一侧的空间温度来调节铁电前体膜的加热温度的步骤。