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    Photoactive compound and photosensitive resin composition comprising the same
    3.
    发明授权
    Photoactive compound and photosensitive resin composition comprising the same 有权
    光敏化合物和包含其的感光性树脂组合物

    公开(公告)号：US08252507B2

    公开(公告)日：2012-08-28

    申请号：US12743373

    申请日：2009-04-01

    申请人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

    发明人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

    IPC分类号： C07D209/82 ,  C08F2/48 ,  G03F7/028 ,  G03F7/033

    CPC分类号： C07D405/12 ,  G03F7/031

    摘要： A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.

    摘要翻译： 提供了一种新的光敏化合物。 光活性化合物具有由式1表示的结构：其中R1，R2，R3，A，X，Y，n和m如说明书中所定义。 光敏化合物有效吸收紫外光。 因此，光活性化合物具有改善的产生自由基的能力，并且有效地用不饱和键光聚合。 还提供了包含光敏化合物的感光性树脂组合物。 感光性树脂组合物具有良好的灵敏度，因为它有效地吸收紫外光。 此外，感光性树脂组合物在残留膜比，机械强度和耐热性，化学品和显影方面具有优异的特性。 因此，感光性树脂组合物有利地用于液晶显示装置的柱间隔物，外涂层和钝化膜的固化材料中。 此外，感光性树脂组合物具有优异的热加工特性。

    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
    6.
    发明申请
    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME 有权
    光泽化合物和包含它们的光敏树脂组合物

    公开(公告)号：US20100261815A1

    公开(公告)日：2010-10-14

    申请号：US12743373

    申请日：2009-04-01

    申请人： Chang Ho Cho ,  Sung-Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

    发明人： Chang Ho Cho ,  Sung-Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

    IPC分类号： C08K5/3417 ,  C07D405/12

    CPC分类号： C07D405/12 ,  G03F7/031

    摘要： A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.

    摘要翻译： 提供了一种新的光敏化合物。 光活性化合物具有由式1表示的结构：其中R1，R2，R3，A，X，Y，n和m如说明书中所定义。 光敏化合物有效吸收紫外光。 因此，光活性化合物具有改善的产生自由基的能力，并且有效地用不饱和键光聚合。 还提供了包含光敏化合物的感光性树脂组合物。 感光性树脂组合物具有良好的灵敏度，因为它有效地吸收紫外光。 此外，感光性树脂组合物在残留膜比，机械强度和耐热性，化学品和显影方面具有优异的特性。 因此，感光性树脂组合物有利地用于液晶显示装置的柱间隔物，外涂层和钝化膜的固化材料中。 此外，感光性树脂组合物具有优异的热加工特性。

    Composition for simultaneously forming two isolated column spacer patterns
    7.
    发明授权
    Composition for simultaneously forming two isolated column spacer patterns 有权
    用于同时形成两个隔离柱间隔图案的组合物

    公开(公告)号：US08389593B2

    公开(公告)日：2013-03-05

    申请号：US12654583

    申请日：2009-12-23

    申请人： Chang Ho Cho ,  Keon Woo Lee ,  Sung Hyun Kim ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee

    发明人： Chang Ho Cho ,  Keon Woo Lee ,  Sung Hyun Kim ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee

    IPC分类号： B29C71/04 ,  A61L2/08 ,  G03F7/00

    CPC分类号： C08J3/28 ,  C08K5/005 ,  G03F7/0007 ,  G03F7/027

    摘要： A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.

    摘要翻译： 提供了用于形成柱间隔物的组合物。 组合物包含自由基聚合抑制剂。 使用该组合物可以同时形成饱和图案和半透明图案，作为具有不同形状的柱状间隔物图案，其厚度差可以通过狭缝或半透明掩模通过狭缝或半透明掩模通过稍微降低灵敏度来控制，尽管灵敏度略微降低 改变自由基聚合抑制剂的种类和量。 还提供了使用组合物形成的柱间隔物和使用柱间隔物的液晶显示器。

    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME
    9.
    发明申请
    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME 有权
    光敏化合物和含有它们的光敏树脂组合物

    公开(公告)号：US20110318692A1

    公开(公告)日：2011-12-29

    申请号：US13147342

    申请日：2010-02-12

    申请人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Cung ,  Sang Kyu Kwak ,  Chang Soon Lee

    发明人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Cung ,  Sang Kyu Kwak ,  Chang Soon Lee

    IPC分类号： G03F7/031 ,  C07F9/40 ,  C07D209/86 ,  G03F7/032

    CPC分类号： C07F9/5728 ,  C07D209/88 ,  C08F2/50 ,  G03F7/031 ,  Y10S430/106 ,  Y10S430/127

    摘要： The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.

    摘要翻译： 本发明涉及由化学式1化学式1表示的新结构的光敏化合物，其中R1，R2，R3，A如说明书中所定义，和含有该化合物的感光性树脂组合物。 本发明的光活性化合物包括硝基和膦酸酯结构，因此通过有效吸收UV光，光活性化合物和碱溶性粘合剂树脂之间的相容性优异，并且改善了感光性树脂组合物的溶解性而显示出极好的灵敏度 。 此外，本发明的感光性树脂组合物具有优异的残留膜厚度和机械强度特性以及耐热，耐化学腐蚀和耐开发性能。 因此，本发明的感光性树脂组合物有利于硬化液晶显示器的列间隔物，外涂层和钝化材料，并且在高温工艺特性中也是有利的。

    Photoactive compound and photosensitive resin composition containing the same
    10.
    发明授权
    Photoactive compound and photosensitive resin composition containing the same 有权
    光敏化合物和含有它的感光性树脂组合物

    公开(公告)号：US08168369B2

    公开(公告)日：2012-05-01

    申请号：US13147342

    申请日：2010-02-12

    申请人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Chung ,  Sang Kyu Kwak ,  Chang Soon Lee

    发明人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Chung ,  Sang Kyu Kwak ,  Chang Soon Lee

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  C07D209/82

    CPC分类号： C07F9/5728 ,  C07D209/88 ,  C08F2/50 ,  G03F7/031 ,  Y10S430/106 ,  Y10S430/127

    摘要： The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.

    摘要翻译： 本发明涉及由化学式1化学式1表示的新结构的光敏化合物，其中R1，R2，R3，A如说明书中所定义，和含有该化合物的感光性树脂组合物。 本发明的光活性化合物包括硝基和膦酸酯结构，因此通过有效吸收UV光，光活性化合物和碱溶性粘合剂树脂之间的相容性优异，并且改善了感光性树脂组合物的溶解性而显示出极好的灵敏度 。 此外，本发明的感光性树脂组合物具有优异的残留膜厚度和机械强度特性以及耐热，耐化学腐蚀和耐开发性能。 因此，本发明的感光性树脂组合物有利于硬化液晶显示器的列间隔物，外涂层和钝化材料，并且在高温工艺特性中也是有利的。