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    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
    2.
    发明申请
    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME 有权
    光泽化合物和包含它们的光敏树脂组合物

    公开(公告)号：US20100261815A1

    公开(公告)日：2010-10-14

    申请号：US12743373

    申请日：2009-04-01

    申请人： Chang Ho Cho ,  Sung-Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

    发明人： Chang Ho Cho ,  Sung-Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

    IPC分类号： C08K5/3417 ,  C07D405/12

    CPC分类号： C07D405/12 ,  G03F7/031

    摘要： A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.

    摘要翻译： 提供了一种新的光敏化合物。 光活性化合物具有由式1表示的结构：其中R1，R2，R3，A，X，Y，n和m如说明书中所定义。 光敏化合物有效吸收紫外光。 因此，光活性化合物具有改善的产生自由基的能力，并且有效地用不饱和键光聚合。 还提供了包含光敏化合物的感光性树脂组合物。 感光性树脂组合物具有良好的灵敏度，因为它有效地吸收紫外光。 此外，感光性树脂组合物在残留膜比，机械强度和耐热性，化学品和显影方面具有优异的特性。 因此，感光性树脂组合物有利地用于液晶显示装置的柱间隔物，外涂层和钝化膜的固化材料中。 此外，感光性树脂组合物具有优异的热加工特性。

    Photoactive compound and photosensitive resin composition comprising the same
    3.
    发明授权
    Photoactive compound and photosensitive resin composition comprising the same 有权
    光敏化合物和包含其的感光性树脂组合物

    公开(公告)号：US08252507B2

    公开(公告)日：2012-08-28

    申请号：US12743373

    申请日：2009-04-01

    申请人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

    发明人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

    IPC分类号： C07D209/82 ,  C08F2/48 ,  G03F7/028 ,  G03F7/033

    CPC分类号： C07D405/12 ,  G03F7/031

    摘要： A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.

    摘要翻译： 提供了一种新的光敏化合物。 光活性化合物具有由式1表示的结构：其中R1，R2，R3，A，X，Y，n和m如说明书中所定义。 光敏化合物有效吸收紫外光。 因此，光活性化合物具有改善的产生自由基的能力，并且有效地用不饱和键光聚合。 还提供了包含光敏化合物的感光性树脂组合物。 感光性树脂组合物具有良好的灵敏度，因为它有效地吸收紫外光。 此外，感光性树脂组合物在残留膜比，机械强度和耐热性，化学品和显影方面具有优异的特性。 因此，感光性树脂组合物有利地用于液晶显示装置的柱间隔物，外涂层和钝化膜的固化材料中。 此外，感光性树脂组合物具有优异的热加工特性。

    Photoactive compound and photosensitive resin composition containing the same
    5.
    发明授权
    Photoactive compound and photosensitive resin composition containing the same 有权
    光敏化合物和含有它的感光性树脂组合物

    公开(公告)号：US08168369B2

    公开(公告)日：2012-05-01

    申请号：US13147342

    申请日：2010-02-12

    申请人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Chung ,  Sang Kyu Kwak ,  Chang Soon Lee

    发明人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Chung ,  Sang Kyu Kwak ,  Chang Soon Lee

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  C07D209/82

    CPC分类号： C07F9/5728 ,  C07D209/88 ,  C08F2/50 ,  G03F7/031 ,  Y10S430/106 ,  Y10S430/127

    摘要： The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.

    摘要翻译： 本发明涉及由化学式1化学式1表示的新结构的光敏化合物，其中R1，R2，R3，A如说明书中所定义，和含有该化合物的感光性树脂组合物。 本发明的光活性化合物包括硝基和膦酸酯结构，因此通过有效吸收UV光，光活性化合物和碱溶性粘合剂树脂之间的相容性优异，并且改善了感光性树脂组合物的溶解性而显示出极好的灵敏度 。 此外，本发明的感光性树脂组合物具有优异的残留膜厚度和机械强度特性以及耐热，耐化学腐蚀和耐开发性能。 因此，本发明的感光性树脂组合物有利于硬化液晶显示器的列间隔物，外涂层和钝化材料，并且在高温工艺特性中也是有利的。

    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME
    8.
    发明申请
    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME 有权
    光敏化合物和含有它们的光敏树脂组合物

    公开(公告)号：US20110318692A1

    公开(公告)日：2011-12-29

    申请号：US13147342

    申请日：2010-02-12

    申请人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Cung ,  Sang Kyu Kwak ,  Chang Soon Lee

    发明人： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Cung ,  Sang Kyu Kwak ,  Chang Soon Lee

    IPC分类号： G03F7/031 ,  C07F9/40 ,  C07D209/86 ,  G03F7/032

    CPC分类号： C07F9/5728 ,  C07D209/88 ,  C08F2/50 ,  G03F7/031 ,  Y10S430/106 ,  Y10S430/127

    摘要： The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.

    摘要翻译： 本发明涉及由化学式1化学式1表示的新结构的光敏化合物，其中R1，R2，R3，A如说明书中所定义，和含有该化合物的感光性树脂组合物。 本发明的光活性化合物包括硝基和膦酸酯结构，因此通过有效吸收UV光，光活性化合物和碱溶性粘合剂树脂之间的相容性优异，并且改善了感光性树脂组合物的溶解性而显示出极好的灵敏度 。 此外，本发明的感光性树脂组合物具有优异的残留膜厚度和机械强度特性以及耐热，耐化学腐蚀和耐开发性能。 因此，本发明的感光性树脂组合物有利于硬化液晶显示器的列间隔物，外涂层和钝化材料，并且在高温工艺特性中也是有利的。

    Photoactive compound and photosensitive resin composition comprising the same
    10.
    发明授权
    Photoactive compound and photosensitive resin composition comprising the same 有权
    光敏化合物和包含其的感光性树脂组合物

    公开(公告)号：US08871430B2

    公开(公告)日：2014-10-28

    申请号：US14111166

    申请日：2012-05-14

    申请人： Changho Cho ,  Won Jin Chung ,  Raisa Kharbash ,  Sunghyun Kim ,  Dongchang Choi ,  Sang Chul Lee ,  Han Soo Kim ,  Yoon Hee Heo ,  Sunhwa Kim

    发明人： Changho Cho ,  Won Jin Chung ,  Raisa Kharbash ,  Sunghyun Kim ,  Dongchang Choi ,  Sang Chul Lee ,  Han Soo Kim ,  Yoon Hee Heo ,  Sunhwa Kim

    IPC分类号： G03F7/004 ,  G03F7/028 ,  C07D209/82

    CPC分类号： G03F7/0045 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/032 ,  G03F7/033 ,  G03F7/0388

    摘要： The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.

    摘要翻译： 本发明涉及一种具有新颖结构的光敏化合物和含有它的光敏树脂组合物，本发明的光敏化合物由于通过包括硝基和膦酸盐对UV光源的有效吸收而具有优异的灵敏度 结构，并且通过优异的膦酸酯结构和粘合剂树脂的相容性改善感光性树脂组合物的溶解性，具有优异的保留率，机械强度，耐热性，耐化学性和耐显影性。 因此，根据本发明的感光性树脂组合物可用于固化液晶显示装置的柱间隔物，外涂层，钝化材料等，并且考虑到高温加工性能是有用的。