Method for constructing an encapsulated MEMS band-pass filter for integrated circuits
    3.
    发明授权
    Method for constructing an encapsulated MEMS band-pass filter for integrated circuits 失效
    用于构建用于集成电路的封装的MEMS带通滤波器的方法

    公开(公告)号:US06429755B2

    公开(公告)日:2002-08-06

    申请号:US09772459

    申请日:2001-01-30

    IPC分类号: H03H924

    摘要: Integrated circuit fabrication technique for constructing novel MEMS devices, specifically band-pass filter resonators, in a manner compatible with current integrated circuit processing, and completely encapsulated to optimize performance and eliminate environmental corrosion. The final devices may be constructed of single-crystal silicon, eliminating the mechanical problems associated with using polycrystalline or amorphous materials. However, other materials may be used for the resonator. The final MEMS device lies below the substrate surface, enabling further processing of the integrated circuit, without protruding structures. The MEMS device is about the size of a SRAM cell, and may be easily incorporated into existing integrated circuit chips. The natural frequency of the device may be altered with post-processing or electronically controlled using voltages and currents compatible with integrated circuits.

    摘要翻译: 用于以与当前集成电路处理兼容的方式构造新型MEMS器件,特别是带通滤波器谐振器的集成电路制造技术,并且被完全封装以优化性能并消除环境腐蚀。 最终的器件可以由单晶硅构成,消除了与使用多晶或非晶材料相关的机械问题。 然而,其他材料可以用于谐振器。 最终的MEMS器件位于衬底表面之下,能够进一步处理集成电路,而不会有突出的结构。 MEMS器件大约是SRAM单元的尺寸,并且可以容易地并入到现有的集成电路芯片中。 可以使用与集成电路兼容的电压和电流进行后处理或电子控制来改变器件的固有频率。

    Encapsulated MEMS band-pass filter for integrated circuits
    4.
    发明授权
    Encapsulated MEMS band-pass filter for integrated circuits 有权
    用于集成电路的封装的MEMS带通滤波器

    公开(公告)号:US06275122B1

    公开(公告)日:2001-08-14

    申请号:US09375942

    申请日:1999-08-17

    IPC分类号: H03H946

    摘要: Integrated circuit fabrication technique for constructing novel MEMS devices, specifically band-pass filter resonators, in a manner compatible with current integrated circuit processing, and completely encapsulated to optimize performance and eliminate environmental corrosion. The final devices may be constructed of single-crystal silicon, eliminating the mechanical problems associated with using polycrystalline or amorphous materials. However, other materials may be used for the resonator. The final MEMS device lies below the substrate surface, enabling further processing of the integrated circuit, without protruding structures. The MEMS device is about the size of a SRAM cell, and may be easily incorporated into existing integrated circuit chips. The natural frequency of the device may be altered with post-processing or electronically controlled using voltages and currents compatible with integrated circuits.

    摘要翻译: 用于以与当前集成电路处理兼容的方式构造新型MEMS器件,特别是带通滤波器谐振器的集成电路制造技术,并且被完全封装以优化性能并消除环境腐蚀。 最终的器件可以由单晶硅构成,消除了与使用多晶或非晶材料相关的机械问题。 然而,其他材料可以用于谐振器。 最终的MEMS器件位于衬底表面之下,能够进一步处理集成电路,而不会有突出的结构。 MEMS器件大约是SRAM单元的尺寸,并且可以容易地并入到现有的集成电路芯片中。 可以使用与集成电路兼容的电压和电流进行后处理或电子控制来改变器件的固有频率。

    Rotational fill techniques for injection molding of solder
    5.
    发明授权
    Rotational fill techniques for injection molding of solder 失效
    用于注射成型焊料的旋转填充技术

    公开(公告)号:US07784673B2

    公开(公告)日:2010-08-31

    申请号:US12189388

    申请日:2008-08-11

    IPC分类号: B23K31/02 B23K37/00

    摘要: A system and method for injection molding conductive bonding material into a plurality of cavities in a non-rectangular mold is disclosed. The method comprises aligning a fill head with a non-rectangular mold. The non-rectangular mold includes a plurality of cavities. The fill head is placed in substantial contact with the non-rectangular mold. Rotational motion is provided to at least one of the non-rectangular mold and the fill head while the fill head is in substantial contact with the non-rectangular mold. Conductive bonding material is forced out of the fill head toward the non-rectangular mold. The conductive bonding material is provided into at least one cavity of the plurality of cavities contemporaneous with the at least one cavity being in proximity to the fill head.

    摘要翻译: 公开了一种用于将导电接合材料注射成非矩形模具中的多个空腔的系统和方法。 该方法包括将填充头与非矩形模具对准。 非矩形模具包括多个空腔。 填充头被放置成与非矩形模具基本接触。 旋转运动提供给非矩形模具和填充头中的至少一个,同时填充头基本上与非矩形模具接触。 将导电接合材料从填充头推向非矩形模具。 导电接合材料被提供到与填充头附近的至少一个空腔同时的多个空腔的至少一个空腔中。

    Fabrication of high resolution aluminum ablation masks
    10.
    发明授权
    Fabrication of high resolution aluminum ablation masks 失效
    高分辨率铝烧蚀掩模的制造

    公开(公告)号:US5756236A

    公开(公告)日:1998-05-26

    申请号:US789905

    申请日:1997-01-29

    CPC分类号: B23K26/06

    摘要: A method of fabricating a high resolution ablation mask for use at laser fluences of greater than 200 mJ/cm.sup.2 is disclosed. The method comprises combining dry etching and chemical etching of an unetched ablation mask which comprises a transparent substrate, a layer of high UV light refractivity material, e.g. aluminum, deposited on said substrate, and a photoresist layer positioned on a predetermined area of said high UV light refractivity material layer leaving other areas of said high UV light refractivity material layer exposed.

    摘要翻译: 公开了一种在大于200mJ / cm 2的激光能量密度下制造高分辨率消融掩模的方法。 该方法包括组合干蚀刻和未蚀刻消融掩模的化学蚀刻,其包括透明衬底,高UV光折射材料层, 铝,沉积在所述衬底上,以及光致抗蚀剂层,其定位在所述高UV光折射率材料层的预定区域上,留下所述高UV光折射率材料层的其它区域暴露。