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公开(公告)号：US20080093336A1
公开(公告)日：2008-04-24
申请号：US11583845
申请日：2006-10-20
申请人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译： 一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。
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公开(公告)号：US20100221581A1
公开(公告)日：2010-09-02
申请号：US12768616
申请日：2010-04-27
申请人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译： 一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。
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公开(公告)号：US07704614B2
公开(公告)日：2010-04-27
申请号：US11583845
申请日：2006-10-20
申请人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
IPC分类号： G11B5/66
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译： 一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。
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4.发明申请Method for fabricating master stamper/imprinters for patterned recording media utilizing hybrid resist 审中-公开使用混合抗蚀剂制造图案化记录介质的主压模/打印机的方法公开(公告)号：US20080113157A1
公开(公告)日：2008-05-15
申请号：US11595894
申请日：2006-11-13
申请人： Kim Y. Lee , Hong Ying Wang , Shih-Fu Lee , David S. Kuo , Koichi Wago , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Shih-Fu Lee , David S. Kuo , Koichi Wago , Dieter K. Weller
CPC分类号： G03F7/095 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , Y10T428/24355
摘要： A method of fabricating a master stamper/imprinter for manufacturing a patterned recording medium by nano-imprint lithography comprises steps of: (a) providing a substrate having a surface; (b) forming a layer of a hybrid resist material on the surface, the resist layer having an exposed upper surface; (c) subjecting selected areas of the exposed upper surface of the resist layer to an energy beam to form therein a latent image of a topographical pattern to be formed in the resist layer and having a correspondence to a pattern to be formed in a patterned recording medium; and (d) developing the latent image into the topographical pattern in the resist layer, wherein only those areas of the resist layer which have received an energy beam exposure dose between a positive-tone threshold dose D0p and a negative-tone threshold dose D0n are developed.
摘要翻译： 制造用于通过纳米压印光刻制造图案化记录介质的主压模/印刷机的方法包括以下步骤：（a）提供具有表面的基板; （b）在所述表面上形成混合抗蚀剂材料层，所述抗蚀剂层具有暴露的上表面; （c）使抗蚀剂层的暴露的上表面的选定区域能量束在其中形成要在抗蚀剂层中形成的形貌图案的潜像，并且与图案化记录中形成的图案对应 中; 并且（d）将潜像显影成抗蚀剂层中的形貌图案，其中只有已经接收了能量束曝光的抗蚀剂层的那些区域剂量在正音阈值剂量D 0 P 0和 开发出负色调阈值剂量D 0n 。
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公开(公告)号：US20080085362A1
公开(公告)日：2008-04-10
申请号：US11542129
申请日：2006-10-04
申请人： Bing K. Yen , David S. Kuo , Dieter K. Weller , Kim Y. Lee , Koichi Wago
发明人： Bing K. Yen , David S. Kuo , Dieter K. Weller , Kim Y. Lee , Koichi Wago
CPC分类号： G11B5/732 , G11B5/656 , G11B5/7325 , G11B5/855
摘要： A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer (“SUL”) and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.
摘要翻译： 制造图案化的垂直磁记录介质的方法包括以下步骤：（a）提供包括磁软底层（“SUL”）和上覆非磁性中间层的层堆叠; （b）在非磁性中间层上形成掩模层; （c）在掩模层上形成抗蚀剂层; （d）形成延伸穿过抗蚀剂层并露出掩模层的间隔开的表面部分的凹陷图案; （e）将凹槽的图案延伸穿过掩模层以暴露中间层的间隔开的表面部分; 和（f）至少部分地用磁性硬的材料填充凹槽的图案以形成垂直的磁记录层。
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公开(公告)号：US08900655B2
公开(公告)日：2014-12-02
申请号：US11542129
申请日：2006-10-04
申请人： Bing K. Yen , David S. Kuo , Dieter K. Weller , Kim Y. Lee , Koichi Wago
发明人： Bing K. Yen , David S. Kuo , Dieter K. Weller , Kim Y. Lee , Koichi Wago
CPC分类号： G11B5/732 , G11B5/656 , G11B5/7325 , G11B5/855
摘要： A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer (“SUL”) and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.
摘要翻译： 制造图案化的垂直磁记录介质的方法包括以下步骤：（a）提供包括磁软底层（“SUL”）和上覆非磁性中间层的层堆叠; （b）在非磁性中间层上形成掩模层; （c）在掩模层上形成抗蚀剂层; （d）形成延伸穿过抗蚀剂层并露出掩模层的间隔开的表面部分的凹陷图案; （e）将凹槽的图案延伸穿过掩模层以暴露中间层的间隔开的表面部分; 和（f）至少部分地用磁性硬的材料填充凹槽的图案以形成垂直的磁记录层。
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公开(公告)号：US20100039727A1
公开(公告)日：2010-02-18
申请号：US12192338
申请日：2008-08-15
申请人： David S. Kuo , Kim Y. Lee
发明人： David S. Kuo , Kim Y. Lee
IPC分类号： G11B5/596
CPC分类号： G11B5/02 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B2005/0005
摘要： A recording system for magnetic storage devices, including a beam column for generating a beam, a platform for moving a magnetic storage medium relative to the beam, and a signal generator for sequentially, or in a continuously alternating manner, deflecting the beam. In turn, the beam is directed according to displacement of dots on the extent of the magnetic storage medium such that dots of a plurality of dot groupings can be written to on the extent during a single pass of the beam column above the extent.
摘要翻译： 用于磁存储装置的记录系统，包括用于产生光束的光束柱，用于相对于光束移动磁存储介质的平台以及用于顺序地或以连续交替的方式偏转光束的信号发生器。 反过来，光束根据磁存储介质的范围上的点的位移被引导，使得多个点分组的点可以在光束柱的单次通过高于该范围的程度上被写入。
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公开(公告)号：US08018820B2
公开(公告)日：2011-09-13
申请号：US12192338
申请日：2008-08-15
申请人： David S. Kuo , Kim Y. Lee
发明人： David S. Kuo , Kim Y. Lee
IPC分类号： G11B9/00
CPC分类号： G11B5/02 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B2005/0005
摘要： A recording system for magnetic storage devices, including a beam column for generating a beam, a platform for moving a magnetic storage medium relative to the beam, and a signal generator for sequentially, or in a continuously alternating manner, deflecting the beam. In turn, the beam is directed according to displacement of dots on the extent of the magnetic storage medium such that dots of a plurality of dot groupings can be written to on the extent during a single pass of the beam column above the extent.
摘要翻译： 用于磁存储装置的记录系统，包括用于产生光束的光束柱，用于相对于光束移动磁存储介质的平台以及用于顺序地或以连续交替的方式偏转光束的信号发生器。 反过来，光束根据磁存储介质的范围上的点的位移被引导，使得多个点分组的点可以在光束柱的单次通过高于该范围的程度上被写入。
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9.发明授权Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask 有权使用电子束抗蚀剂掩模制造用于磁头的磁写磁极的方法公开(公告)号：US07716813B2
公开(公告)日：2010-05-18
申请号：US11634667
申请日：2006-12-05
申请人： Kim Y. Lee , Jyh-Shuey Lo
发明人： Kim Y. Lee , Jyh-Shuey Lo
CPC分类号： G11B5/3163 , G11B5/127 , G11B5/3116 , Y10T29/49021 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49052
摘要： A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.
摘要翻译： 公开了一种用于独立地控制磁记录头的写极尖的轨道宽度和斜角的方法。 该方法包括利用电子束平版印刷法在极尖层材料中建立轨道宽度。 通过提供临时掩蔽材料来制造具有已建立的轨道宽度的该极尖材料的一部分，以形成受保护的部分。 至少一个未保护的部分被暴露以成形。 然后将该未保护部分倾斜以产生至少一个倾斜部分。 受保护部分产生上极尖部分，其与斜面部分一起产生改进的极尖。 还公开了具有改进的极尖的磁头和具有具有改进的极尖的磁头的磁盘驱动器。
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10.发明授权Method and apparatus for integrating a stair notch and a gap bump at a pole tip in a write head 失效用于将台阶缺口和间隙凸起集成在写头中的极尖处的方法和装置公开(公告)号：US07536774B2
公开(公告)日：2009-05-26
申请号：US11399821
申请日：2006-04-07
申请人： Daniel Wayne Bedell , Wen-Chien David Hsiao , Ming Jiang , Hieu Lam , Kim Y. Lee , Jyh-Shuey Lo , Aron Pentek
发明人： Daniel Wayne Bedell , Wen-Chien David Hsiao , Ming Jiang , Hieu Lam , Kim Y. Lee , Jyh-Shuey Lo , Aron Pentek
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , Y10T29/49043
摘要： A method and apparatus for integrating a stair notch and a gap bump at a pole tip in a write head is disclosed. A protective plated layer is formed over the bump to prevent the bump form being damaged during formation of the notch at the pole tip. The flux from the second pole outside of the track will be effectively channeled to the first pole piece under the alumina bump.
摘要翻译： 公开了一种用于将写入头中的极尖处的台阶缺口和间隙凸起集成的方法和装置。 在凸起之上形成保护镀层，以防止在极尖处形成凹口期间凸起形状被损坏。 来自轨道外部的第二极的磁通将有效地引导到氧化铝凸块下方的第一极靴。
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