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    Method for fabricating master stamper/imprinters for patterned recording media utilizing hybrid resist
    1.
    发明申请
    Method for fabricating master stamper/imprinters for patterned recording media utilizing hybrid resist 审中-公开
    使用混合抗蚀剂制造图案化记录介质的主压模/打印机的方法

    公开(公告)号：US20080113157A1

    公开(公告)日：2008-05-15

    申请号：US11595894

    申请日：2006-11-13

    申请人： Kim Y. Lee ,  Hong Ying Wang ,  Shih-Fu Lee ,  David S. Kuo ,  Koichi Wago ,  Dieter K. Weller

    发明人： Kim Y. Lee ,  Hong Ying Wang ,  Shih-Fu Lee ,  David S. Kuo ,  Koichi Wago ,  Dieter K. Weller

    IPC分类号： G03F7/00 ,  B32B3/00

    CPC分类号： G03F7/095 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  Y10T428/24355

    摘要： A method of fabricating a master stamper/imprinter for manufacturing a patterned recording medium by nano-imprint lithography comprises steps of: (a) providing a substrate having a surface; (b) forming a layer of a hybrid resist material on the surface, the resist layer having an exposed upper surface; (c) subjecting selected areas of the exposed upper surface of the resist layer to an energy beam to form therein a latent image of a topographical pattern to be formed in the resist layer and having a correspondence to a pattern to be formed in a patterned recording medium; and (d) developing the latent image into the topographical pattern in the resist layer, wherein only those areas of the resist layer which have received an energy beam exposure dose between a positive-tone threshold dose D0p and a negative-tone threshold dose D0n are developed.

    摘要翻译： 制造用于通过纳米压印光刻制造图案化记录介质的主压模/印刷机的方法包括以下步骤：（a）提供具有表面的基板; （b）在所述表面上形成混合抗蚀剂材料层，所述抗蚀剂层具有暴露的上表面; （c）使抗蚀剂层的暴露的上表面的选定区域能量束在其中形成要在抗蚀剂层中形成的形貌图案的潜像，并且与图案化记录中形成的图案对应 中; 并且（d）将潜像显影成抗蚀剂层中的形貌图案，其中只有已经接收了能量束曝光的抗蚀剂层的那些区域剂量在正音阈值剂量D 0 P 0和 开发出负色调阈值剂量D 0n 。

    Process for fabricating patterned magnetic recording media
    4.
    发明申请
    Process for fabricating patterned magnetic recording media 有权
    制造图案化磁记录介质的方法

    公开(公告)号：US20080093336A1

    公开(公告)日：2008-04-24

    申请号：US11583845

    申请日：2006-10-20

    申请人： Kim Y. Lee ,  Hong Ying Wang ,  Nobuo Kurataka ,  Christopher Formato ,  David S. Kuo ,  Dieter K. Weller

    发明人： Kim Y. Lee ,  Hong Ying Wang ,  Nobuo Kurataka ,  Christopher Formato ,  David S. Kuo ,  Dieter K. Weller

    IPC分类号： B44C1/22 ,  C03C25/68

    CPC分类号： G11B5/855 ,  G11B5/667 ,  G11B5/732

    摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.

    摘要翻译： 一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

    PROCESS FOR FABRICATING PATTERNED MAGNETIC RECORDING MEDIA
    5.
    发明申请
    PROCESS FOR FABRICATING PATTERNED MAGNETIC RECORDING MEDIA 有权
    制作图形磁记录介质的方法

    公开(公告)号：US20100221581A1

    公开(公告)日：2010-09-02

    申请号：US12768616

    申请日：2010-04-27

    申请人： Kim Y. Lee ,  Hong Ying Wang ,  Nobuo Kurataka ,  Christopher Formato ,  David S. Kuo ,  Dieter K. Weller

    发明人： Kim Y. Lee ,  Hong Ying Wang ,  Nobuo Kurataka ,  Christopher Formato ,  David S. Kuo ,  Dieter K. Weller

    IPC分类号： G03F7/20 ,  G11B5/667

    CPC分类号： G11B5/855 ,  G11B5/667 ,  G11B5/732

    摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.

    摘要翻译： 一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

    Process for fabricating patterned magnetic recording media
    6.
    发明授权
    Process for fabricating patterned magnetic recording media 有权
    制造图案化磁记录介质的方法

    公开(公告)号：US07704614B2

    公开(公告)日：2010-04-27

    申请号：US11583845

    申请日：2006-10-20

    申请人： Kim Y. Lee ,  Hong Ying Wang ,  Nobuo Kurataka ,  Christopher Formato ,  David S. Kuo ,  Dieter K. Weller

    发明人： Kim Y. Lee ,  Hong Ying Wang ,  Nobuo Kurataka ,  Christopher Formato ,  David S. Kuo ,  Dieter K. Weller

    IPC分类号： G11B5/66

    CPC分类号： G11B5/855 ,  G11B5/667 ,  G11B5/732

    摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.

    摘要翻译： 一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

    Method for fabricating patterned perpendicular magnetic recording media
    7.
    发明申请
    Method for fabricating patterned perpendicular magnetic recording media 有权
    图案化垂直磁记录介质的制造方法

    公开(公告)号：US20080085362A1

    公开(公告)日：2008-04-10

    申请号：US11542129

    申请日：2006-10-04

    申请人： Bing K. Yen ,  David S. Kuo ,  Dieter K. Weller ,  Kim Y. Lee ,  Koichi Wago

    发明人： Bing K. Yen ,  David S. Kuo ,  Dieter K. Weller ,  Kim Y. Lee ,  Koichi Wago

    IPC分类号： B05D5/12 ,  B05D1/32

    CPC分类号： G11B5/732 ,  G11B5/656 ,  G11B5/7325 ,  G11B5/855

    摘要： A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer (“SUL”) and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.

    摘要翻译： 制造图案化的垂直磁记录介质的方法包括以下步骤：（a）提供包括磁软底层（“SUL”）和上覆非磁性中间层的层堆叠; （b）在非磁性中间层上形成掩模层; （c）在掩模层上形成抗蚀剂层; （d）形成延伸穿过抗蚀剂层并露出掩模层的间隔开的表面部分的凹陷图案; （e）将凹槽的图案延伸穿过掩模层以暴露中间层的间隔开的表面部分; 和（f）至少部分地用磁性硬的材料填充凹槽的图案以形成垂直的磁记录层。

    Method for fabricating patterned magnetic recording device
    8.
    发明授权
    Method for fabricating patterned magnetic recording device 有权
    图案化磁记录装置的制造方法

    公开(公告)号：US08900655B2

    公开(公告)日：2014-12-02

    申请号：US11542129

    申请日：2006-10-04

    申请人： Bing K. Yen ,  David S. Kuo ,  Dieter K. Weller ,  Kim Y. Lee ,  Koichi Wago

    发明人： Bing K. Yen ,  David S. Kuo ,  Dieter K. Weller ,  Kim Y. Lee ,  Koichi Wago

    IPC分类号： B05D5/12 ,  G11B5/73 ,  G11B5/65 ,  G11B5/855

    CPC分类号： G11B5/732 ,  G11B5/656 ,  G11B5/7325 ,  G11B5/855

    摘要： A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer (“SUL”) and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.

    摘要翻译： 制造图案化的垂直磁记录介质的方法包括以下步骤：（a）提供包括磁软底层（“SUL”）和上覆非磁性中间层的层堆叠; （b）在非磁性中间层上形成掩模层; （c）在掩模层上形成抗蚀剂层; （d）形成延伸穿过抗蚀剂层并露出掩模层的间隔开的表面部分的凹陷图案; （e）将凹槽的图案延伸穿过掩模层以暴露中间层的间隔开的表面部分; 和（f）至少部分地用磁性硬的材料填充凹槽的图案以形成垂直的磁记录层。

    Perpendicular magnetic recording disk with multiple magnetic layers and intermediate dual nucleation films for control of grain size
    10.
    发明授权
    Perpendicular magnetic recording disk with multiple magnetic layers and intermediate dual nucleation films for control of grain size 有权
    具有多个磁性层的垂直磁记录盘和用于控制晶粒尺寸的中间双核成膜

    公开(公告)号：US09040180B2

    公开(公告)日：2015-05-26

    申请号：US13156272

    申请日：2011-06-08

    申请人： Ernesto E. Marinero ,  Dieter K. Weller ,  Brian R. York

    发明人： Ernesto E. Marinero ,  Dieter K. Weller ,  Brian R. York

    IPC分类号： G11B5/66

    CPC分类号： G11B5/66 ,  G11B5/65 ,  G11B5/7325 ,  G11B5/82

    摘要： A perpendicular magnetic recording disk has a graded-anisotropy recording layer (RL) formed of at least two ferromagnetically exchange coupled CoPtCr-oxide magnetic layers (MAG1 and MAG2) with two nucleation films (NF1 and NF2) between the magnetic layers. NF1 is a metal film, preferably Ru or a Ru-based alloy like RuCr, sputter deposited on MAG1 at low pressure to a thickness between about 0.1-1.5 nm. NF2 is a metal oxide film, preferably an oxide of Ta, sputter deposited on NF1 at high pressure to a thickness between about 0.2-1.0 nm. MAG2 is sputter deposited over NF2. NF1 and NF2 provide a significant reduction in average grain size in the RL from a graded-anisotropy RL without nucleation films between MAG1 and MAG2, while also assuring that MAG1 and MAG2 are strongly exchange coupled.

    摘要翻译： 垂直磁记录盘具有由至少两个铁磁交换的CoPtCr-氧化物磁性层（MAG1和MAG2）与磁性层之间的两个成核膜（NF1和NF2）形成的渐变各向异性记录层（RL）。 NF1是金属膜，优选Ru或Ru基Ru合金，在低压下溅射沉积在MAG1上，厚度在约0.1-1.5nm之间。 NF2是金属氧化物膜，优选Ta的氧化物，在高压下溅射沉积在NF1上，厚度在约0.2-1.0nm之间。 MAG2溅射沉积在NF2上。 NF1和NF2从MAG1和MAG2之间没有成核膜的梯度各向异性RL提供RL中的平均晶粒尺寸的显着降低，同时还确保MAG1和MAG2强烈交换耦合。