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    Exposure apparatus and exposure method for minimizing defocusing of the transferred pattern
    1.
    发明授权
    Exposure apparatus and exposure method for minimizing defocusing of the transferred pattern 失效
    用于最小化转印图案的散焦的曝光装置和曝光方法

    公开(公告)号：US5640227A

    公开(公告)日：1997-06-17

    申请号：US349869

    申请日：1994-12-06

    申请人： Kinya Kato ,  Kazuaki Saiki ,  Masami Seki ,  Masaki Kato

    发明人： Kinya Kato ,  Kazuaki Saiki ,  Masami Seki ,  Masaki Kato

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC分类号： G03F9/7026 ,  G03F7/70358

    摘要： An exposure apparatus and an exposure method which minimize defocusing of the transferred pattern even with a large-sized mask. When the exposure apparatus is used which transfers the pattern formed on a first substrate through a substantially real-size projection optical system onto a second substrate, the positions of the mask and the substrate are detected, and based on the information on the positions the distance between the mask and the substrate is controlled to be substantially constant. According to the present invention, defocusing of the transferred pattern may be substantially avoided by detecting positions of the mask and the plate by making use of, e.g., an obliquely incident light focus detection optical system, and controlling the distance therebetween to be held constant or at a predetermined distance.

    摘要翻译： 曝光装置和曝光方法，即使用大尺寸的掩模，也能最小化转印图案的散焦。 当使用通过基本上实际尺寸的投影光学系统将形成在第一基板上的图案转印到第二基板上的曝光装置时，检测掩模和基板的位置，并且基于关于位置的信息，距离 掩模和基板之间的距离被控制为基本恒定。 根据本发明，通过利用例如倾斜入射的光聚焦检测光学系统来检测掩模和板的位置，并且控制其之间的距离保持不变，可以基本上避免转印图案的散焦 在预定距离处。

    Alignment method, projection exposure method, and projection exposure apparatus
    4.
    发明授权
    Alignment method, projection exposure method, and projection exposure apparatus 失效
    对准方法，投影曝光方法和投影曝光装置

    公开(公告)号：US5850279A

    公开(公告)日：1998-12-15

    申请号：US619981

    申请日：1996-03-20

    申请人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

    发明人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

    CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

    摘要： Disclosed is a projection exposure method for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system. A light beam having a first wavelength for exposure is radiated through the projection optical system onto a first mark area including a fiducial mark on a fiducial plate installed on a substrate stage, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A light beam having a second wavelength to which the photosensitive substrate is not photosensitive is radiated through the projection optical system onto the first mark area, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A positional discrepancy of the fiducial mark caused by the difference in wavelength between the first and second wavelengths is previously calculated on the basis of results of the detection. The light beam having the second wavelength is radiated through the projection optical system onto an alignment mark on the photosensitive substrate, reflected light therefrom is detected to obtain a position of the photosensitive substrate under the light beam having the second wavelength. A positional discrepancy of the photosensitive substrate is corrected on the basis of a result of the detection and the calculation, and thus positional alignment for the photosensitive substrate is performed, followed by actual exposure.

    摘要翻译： 公开了一种投影曝光方法，用于通过投影光学系统将形成在掩模上的图案转印到感光基板上。 将具有用于曝光的第一波长的光束通过投影光学系统辐射到安装在基板台上的基准板上的包括基准标记的第一标记区域上，检测来自第一标记区域的反射光， 基准标记。 具有感光基片不感光的第二波长的光束通过投影光学系统辐射到第一标记区域上，检测来自第一标记区域的反射光以获得基准标记的位置。 基于检测结果预先计算由第一和第二波长之间的波长差导致的基准标记的位置偏差。 具有第二波长的光束通过投影光学系统辐射到感光基板上的对准标记上，检测其反射光，以获得具有第二波长的光束下的感光基板的位置。 基于检测和计算的结果校正感光性基板的位置偏差，由此进行感光性基板的位置对准，然后实际曝光。