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1.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07528935B2
公开(公告)日：2009-05-05
申请号：US11312654
申请日：2005-12-21
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.
摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突出部，其布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品。 这些突起通常在第一距离处等距离间隔开。 物品保持器还包括用于将物品夹持到保持器的一对电极。 电极设置在突起上方或下方的基本上相同的平面中，并且通过间隙彼此间隔开。 位于间隙的相对侧上的多个突起内的相邻突起被间隔开大于第一距离的第二距离。
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2.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07110091B2
公开(公告)日：2006-09-19
申请号：US10896367
申请日：2004-07-22
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Joost Jeroen Ottens , Jan Hopman
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Joost Jeroen Ottens , Jan Hopman
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.
摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突起，其被布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品;以及至少一个夹紧电极，用于产生用于夹紧物品的静电夹紧力 反对文章持有人。 夹持电极包括用于局部地改变静电夹持力的电场改变器，用于调平衬底的局部高度变化。
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3.发明授权Using unflatness information of the substrate table or mask table for decreasing overlay 有权使用衬底表或掩模台的不平坦信息减少重叠公开(公告)号：US07239368B2
公开(公告)日：2007-07-03
申请号：US10998179
申请日：2004-11-29
申请人： Rene Oesterholt , Ralph Brinkhof , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Koenraad Stephan Silvester Salden
发明人： Rene Oesterholt , Ralph Brinkhof , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Koenraad Stephan Silvester Salden
CPC分类号： G03F7/70783 , G03F7/707
摘要： A lithographic system includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. Feed forward correction of non-flatness induced wafer grid distortion is allowed during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.
摘要翻译： 光刻系统包括用于提供投射辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上赋予图案的掩模，用于保持基板的基板台，以及 投影系统，用于将图案化的光束投影到基板的目标部分上。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 在对准和曝光期间允许非平坦度引起的晶片网格变形的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。
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公开(公告)号：US07119885B2
公开(公告)日：2006-10-10
申请号：US10926402
申请日：2004-08-26
申请人： Joost Jeroen Ottens , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Koen Jacobus Johannes Maria Zaal
CPC分类号： G03F7/707 , G03F7/70825
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.
摘要翻译： 公开了一种光刻设备。 该装置包括用于调节辐射束的照明系统和用于支撑待放置在辐射束中的基本平坦的制品的物品支撑件。 物品支撑件包括用于支撑物品的多个支撑突起和位于支撑突起的边界附近的至少一个保护构件，用于在物品释放期间至少保护支撑突起的边界部分。 该装置还包括用于从所述物品支撑件释放所述物品的释放装置。
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公开(公告)号：US07327438B2
公开(公告)日：2008-02-05
申请号：US10840797
申请日：2004-05-07
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Joost Jeroen Ottens
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Joost Jeroen Ottens
CPC分类号： G03F7/707 , G03F7/70783
摘要： A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.
摘要翻译： 一种光刻投影装置，具有用于提供投影射线束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望图案对投影光束进行图案化; 用于保持基板的基板保持器，所述基板保持器设置有提供用于将基板压靠在基板保持器上的保持力; 释放结构，其被构造和布置成抵抗所述保持力从所述保持器中弹出所述基板; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻投影装置可以包括控制器，用于控制释放结构，以便以最终释放之前减小的释放力将基板从保持器释放。
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6.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07161662B2
公开(公告)日：2007-01-09
申请号：US10890379
申请日：2004-07-14
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783 , Y10T279/23
摘要： A lithographic projection apparatus includes a radiation system for providing a beam of radiation, and a substrate holder. The substrate holder includes a plurality of protrusions for providing a substantially flat plane of support for supporting a substrate in a beam path of the beam of radiation, at least one clamping electrode for generating an electric field for clamping the substrate against the substrate holder, and a peripheral supporting edge arranged to contact the substrate. The electrode extends beyond the peripheral supporting edge for providing a torsion load to level the substrate near the edges of the substrate.
摘要翻译： 光刻投影装置包括用于提供辐射束的辐射系统和衬底保持器。 衬底保持器包括多个突起，用于提供基本上平坦的支撑平面，用于在辐射束的光束路径中支撑衬底;至少一个夹持电极，用于产生用于将衬底夹持在衬底保持器上的电场;以及 布置成接触所述基板的外围支撑边缘。 电极延伸超过外围支撑边缘，以提供扭转负载以使基板在基板的边缘附近平坦化。
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公开(公告)号：US07110085B2
公开(公告)日：2006-09-19
申请号：US10839720
申请日：2004-05-06
CPC分类号： G03F7/707 , G03F7/70783
摘要： A lithographic projection apparatus including a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder having a plurality of protrusions, the extremities thereof defining a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder provided with the ability to provide a pressing force for pressing the substrate against the extremities of the protrusions, the protrusions in an edge zone of the substrate holder arranged to provide a substantially flat overhanging of the substrate in relation to the pressing force of the pressing means; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus is characterized in that the protrusions in an off-edge zone of the substrate holder are distributed so as to provide a substantial equal supporting area for each protrusion of the plurality of protrusions, the supporting areas being defined by a Voronoi diagram distribution associated to the protrusions. The lithographic apparatus offers a substrate holder with a reduced overlay and focus error.
摘要翻译： 一种光刻投影装置，包括用于提供投影辐射束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望图案对投影光束进行图案化; 具有多个突起的衬底保持器，其末端限定用于支撑基本上平坦的衬底的基本平坦的支撑平面，衬底保持器具有提供用于将衬底压靠突起的末端的按压力的能力， 衬底保持器的边缘区域中的突起被布置成相对于按压装置的按压力提供基板的基本平坦的伸出; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻投影装置的特征在于，衬底保持器的偏离边缘区域中的突起被分布成为多个突起中的每个突起提供基本相等的支撑区域，支撑区域由Voronoi图分布 与突起相关联。 光刻设备提供具有减小的覆盖和聚焦误差的衬底保持器。
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公开(公告)号：US07327439B2
公开(公告)日：2008-02-05
申请号：US10988832
申请日：2004-11-16
IPC分类号： G03B27/62
CPC分类号： G03F7/70716 , B32B38/0012 , B32B38/06 , B32B2315/02 , G03F7/70708 , Y10T428/24479
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to condition a radiation beam, and an article support configured to support an article to be placed in a beam path of the radiation beam. The article support includes a plurality of bonded layers. At least one of the bonded layers includes a plurality of recesses facing another of the bonded layers, so as to reduce a bonding surface between the bonded layers.
摘要翻译： 公开了一种光刻设备。 该装置包括布置成调节辐射束的照明系统和被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件。 物品支撑件包括多个粘合层。 至少一个接合层包括面对另一个接合层的多个凹槽，以便减少接合层之间的接合表面。
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9.发明授权公开(公告)号：US07804582B2
公开(公告)日：2010-09-28
申请号：US11494794
申请日：2006-07-28
申请人： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens , Judocus Marie Dominicus Stoeldraijer , Antonius Johannes De Kort , Franciscus Van De Mast , Marteijn De Jong
发明人： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens , Judocus Marie Dominicus Stoeldraijer , Antonius Johannes De Kort , Franciscus Van De Mast , Marteijn De Jong
IPC分类号： G03B27/58
CPC分类号： G03F7/70858 , G03F7/70516 , G03F7/70775
摘要： A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.
摘要翻译： 光刻设备包括一个系统，用于补偿衬底台的热变形对衬底台的位置测量的影响，使用衬底台中的侧视镜。 提出了使用各种衬底台扫描轨迹校准光刻设备的方法以及衬底台中横向镜的局部位置和旋转的测量。 具有对准标记的双级光刻设备，其限定仅在曝光站处使用的侧视镜的几何形状，以便当衬底台位于测量站时测量侧视镜的几何形状。
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公开(公告)号：US20080297744A1
公开(公告)日：2008-12-04
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或在排水管内使气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
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