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    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    3.
    发明授权
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US07110091B2

    公开(公告)日：2006-09-19

    申请号：US10896367

    申请日：2004-07-22

    申请人： Koen Jacobus Johannes Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Joost Jeroen Ottens ,  Jan Hopman

    发明人： Koen Jacobus Johannes Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Joost Jeroen Ottens ,  Jan Hopman

    IPC分类号： G03B27/62 ,  G03B27/58 ,  H02N13/00

    CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

    摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.

    摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突起，其被布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品;以及至少一个夹紧电极，用于产生用于夹紧物品的静电夹紧力 反对文章持有人。 夹持电极包括用于局部地改变静电夹持力的电场改变器，用于调平衬底的局部高度变化。

    Lithographic apparatus with rotation filter device
    5.
    发明申请
    Lithographic apparatus with rotation filter device 失效
    带旋转滤光片的平版印刷设备

    公开(公告)号：US20090073401A1

    公开(公告)日：2009-03-19

    申请号：US11898800

    申请日：2007-09-14

    申请人： Edwin Johan Buis ,  Tjarko Adriaan Rudolf Van Empel

    发明人： Edwin Johan Buis ,  Tjarko Adriaan Rudolf Van Empel

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70916 ,  B01D45/14 ,  C04B35/522 ,  C04B35/573 ,  C04B35/83 ,  C04B2235/5248 ,  C04B2235/5268 ,  G03F7/70166 ,  G03F7/7095

    摘要： A lithographic apparatus including a filter device is disclosed. The filter device has a plurality of foils attached to a holder which is able to rotate around a rotation axis. The foils are arranged substantially parallel to the rotation axis. The foils comprise a uni-directional carbon-fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C—SiC composite). During operation, the filter device rotates and filters out debris from a radiation source, such as a Sn plasma source. Such a filter device per se may be provided.

    摘要翻译： 公开了一种包括过滤装置的光刻设备。 过滤装置具有多个箔片，其附接到能够围绕旋转轴线旋转的保持器。 箔片基本上平行于旋转轴线布置。 箔包含选自由碳 - 碳复合材料（C-C复合材料）和碳 - 碳化硅复合材料（C-SiC复合材料）组成的组的单向碳纤维复合材料。 在操作期间，过滤装置旋转并过滤来自诸如Sn等离子体源的辐射源的碎屑。 可以提供这样的过滤装置本身。

    Lithographic apparatus and device manufacturing method
    6.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07227612B2

    公开(公告)日：2007-06-05

    申请号：US10937871

    申请日：2004-09-10

    申请人： Antonius Johannes Van Der Net ,  Tjarko Adriaan Rudolf Van Empel ,  Ronald Van Der Ham

    发明人： Antonius Johannes Van Der Net ,  Tjarko Adriaan Rudolf Van Empel ,  Ronald Van Der Ham

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70933 ,  G03F7/70775 ,  G03F7/70883

    摘要： A lithographic apparatus includes a support constructed to support a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an interior space through which an interferometer beam propagates, and a first gas supply for supplying a purge gas to inhibit contamination of the projection system. The purge gas has a predetermined refractive index. The apparatus also includes a second gas supply for supplying a conditioning gas to the interior space for conditioning the interior space, and a refractive index matching system arranged to match the refractive index of the conditioning gas to the predetermined refractive index of the purge gas.

    摘要翻译： 光刻设备包括：支撑构件，用于支撑图案形成装置，该构图装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束;构造成保持衬底的衬底台;被配置为投影 图案化的辐射束到基板的目标部分，干涉仪光束传播的内部空间以及用于供应吹扫气体以抑制投影系统的污染的第一气体供应。 净化气体具有预定的折射率。 该设备还包括用于将调节气体供应到内部空间用于调节内部空间的第二气体供应源，以及折射率匹配系统，其布置成使调节气体的折射率与净化气体的预定折射率相匹配。

    Lithographic apparatus and device manufacturing method
    8.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US08228487B2

    公开(公告)日：2012-07-24

    申请号：US12389077

    申请日：2009-02-19

    申请人： Albert Pieter Rijpma ,  Tjarko Adriaan Rudolf Van Empel

    发明人： Albert Pieter Rijpma ,  Tjarko Adriaan Rudolf Van Empel

    IPC分类号： G03B27/58 ,  G03B27/62

    CPC分类号： G03B27/52 ,  G03F7/70875

    摘要： A lithographic apparatus is configured to transfer a pattern from a patterning structure, held by a patterning structure holder, onto a substrate that is held by a substrate holder. The apparatus includes a first object holder configured to hold an object, and an object temperature conditioner configured to condition a temperature of the object prior to and/or during transfer of the object to the first object holder. The object temperature conditioner includes a second object holder having a fluid duct system and an electrical temperature conditioner.

    摘要翻译： 光刻设备被配置为将图案化结构保持在图案形成结构保持器上的图案转移到由基板保持器保持的基板上。 该装置包括构造成保持物体的第一物体保持器和被配置为在物体转移到第一物体保持器之前和/或期间将物体的温度调节的对象温度调节器。 物体温度调节器包括具有流体管道系统和电温度调节器的第二物体保持器。

    Lithographic apparatus and device manufacturing method incorporating a pressure shield
    9.
    发明授权
    Lithographic apparatus and device manufacturing method incorporating a pressure shield 有权
    平版印刷设备和装置制造方法，包括压力屏蔽

    公开(公告)号：US08218128B2

    公开(公告)日：2012-07-10

    申请号：US12355262

    申请日：2009-01-16

    申请人： Tjarko Adriaan Rudolf Van Empel

    发明人： Tjarko Adriaan Rudolf Van Empel

    IPC分类号： G03B27/54

    CPC分类号： G03F7/709 ,  G03F7/70058 ,  G03F7/70858

    摘要： A lithographic apparatus is disclosed that has a movable article support configured to hold and move an article, a radiation control system configured to control a beam of radiation to be targeted onto the article, the article support, or both, the article to be moved relatively to the radiation control system by the movable article support for measurement, exposure, or both purposes, and a pressure shield that is mechanically uncoupled from the radiation control system to shield against pressure waves induced by the article support so as to help prevent displacement of the radiation control system caused by the pressure waves.

    摘要翻译： 公开了一种光刻设备，其具有被配置为保持和移动物品的可移动物品支撑件，辐射控制系统，被配置成将待辐射束控制在物品上，物品支撑件或两者上，以相对移动的物品 通过用于测量，曝光或两者目的的可移动物品支撑件到辐射控制系统，以及与辐射控制系统机械地分离以防止由物品支撑件引起的压力波的压力屏蔽，以帮助防止 辐射控制系统由压力波引起。