公开(公告)号：US08830610B2

公开(公告)日：2014-09-09

申请号：US13522626

申请日：2011-01-11

申请人： Kohei Matsui ,  Ryosuke Yasui ,  Keiichi Tanaka ,  Takenori Yoshizawa

发明人： Kohei Matsui ,  Ryosuke Yasui ,  Keiichi Tanaka ,  Takenori Yoshizawa

IPC分类号： G02B5/22 ,  G02B5/20 ,  G02F1/1339 ,  G02F1/1335

CPC分类号： G02B5/201 ,  G02F1/133516 ,  G02F1/13394

摘要： An exposure method is provided. In (a) of FIG. 8, exposure is performed while a substrate 20 is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 and the display region, respectively, on the substrate 20. Next, in (b) of FIG. 8, the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52. Subsequently, in (c) of FIG. 8, proximity exposure is performed once on the substrate 20 to simultaneously form third layers 83 on the first layers 81 in the first non-display regions 51, fourth layers 84 on the second layers 82 in the second non-display regions 52, and layers 92 in the display region 40.

摘要翻译： 提供曝光方法。 在图1（a）中， 如图8所示，在基板20沿Y方向传送的同时进行曝光，同时在基板20上分别在第一非显示区域51和显示区域形成第一层81和第91层。接着，在（b ）。 如图8所示，基板20旋转90度，并且在基板20沿X方向传送的同时进行曝光，以在第二非显示区域52中形成第二层82。 如图8所示，在基板20上进行一次接近曝光，同时在第一非显示区域51中的第一层81上形成第三层83，在第二非显示区域52中形成第二层82上的第四层84， 92。

公开(公告)号：US20120300323A1

公开(公告)日：2012-11-29

申请号：US13522626

申请日：2011-01-11

申请人： Kohei Matsui ,  Ryosuke Yasui ,  Keiichi Tanaka ,  Takenori Yoshizawa

发明人： Kohei Matsui ,  Ryosuke Yasui ,  Keiichi Tanaka ,  Takenori Yoshizawa

IPC分类号： G02B5/22 ,  G03B27/60

CPC分类号： G02B5/201 ,  G02F1/133516 ,  G02F1/13394

摘要： An exposure method is provided. In (a) of FIG. 8, exposure is performed while a substrate 20 is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 and the display region, respectively, on the substrate 20. Next, in (b) of FIG. 8, the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52. Subsequently, in (c) of FIG. 8, proximity exposure is performed once on the substrate 20 to simultaneously form third layers 83 on the first layers 81 in the first non-display regions 51, fourth layers 84 on the second layers 82 in the second non-display regions 52, and layers 92 in the display region 40.

摘要翻译： 提供曝光方法。 在图1（a）中， 如图8所示，在基板20沿Y方向传送的同时进行曝光，同时在基板20上分别在第一非显示区域51和显示区域形成第一层81和第91层。接着，在（b ）。 如图8所示，基板20旋转90度，并且在基板20沿X方向传送的同时进行曝光，以在第二非显示区域52中形成第二层82。 如图8所示，在基板20上进行一次接近曝光，同时在第一非显示区域51中的第一层81上形成第三层83，在第二非显示区域52中形成第二层82上的第四层84， 92。

公开(公告)号：US08908302B2

公开(公告)日：2014-12-09

申请号：US13521963

申请日：2011-01-07

申请人： Kohei Matsui ,  Ryosuke Yasui

发明人： Kohei Matsui ,  Ryosuke Yasui

IPC分类号： G02B5/22 ,  G02B7/00 ,  G02F1/1339 ,  G02F1/1335 ,  G03F7/00 ,  G03F7/20 ,  G02B5/20 ,  G02F1/1333

CPC分类号： G02F1/13394 ,  G02B5/201 ,  G02F1/133516 ,  G02F2001/133388 ,  G03F7/0007 ,  G03F7/203 ,  G03F7/70466 ,  G03F7/70791

摘要： An exposure method for color filter substrate is provided. As shown in FIG. 7(a), exposure is performed while a substrate 20 to which a photoresist has been applied is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 (regions indicated by hatching sloping upward to the right) and the display region, respectively, on the substrate 20. Next, as shown in (b), the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52 (regions indicated by hatching sloping upward to the right). Thus, dummy PSs 71 and dummy PSs 72 arranged with desired pitches and having desired shapes can be formed in the first non-display regions 51 and the second non-display regions 52, respectively.

摘要翻译： 提供了一种滤色器基板的曝光方法。 如图所示。 如图7（a）所示，在施加了光致抗蚀剂的基板20在Y方向上传送的同时进行曝光，同时在第一非显示区域51（由阴影向上倾斜所示的区域）同时形成第一层81和层91 向右）和显示区域。接下来，如（b）所示，将基板20旋转90度，并且在沿X方向输送基板20的同时进行曝光， 以在第二非显示区域52（由向右倾斜的阴影指示的区域）上形成第二层82。 因此，可以分别在第一非显示区域51和第二非显示区域52中形成设置有期望的间距并具有期望形状的虚拟PS 71和虚拟PS 72。

公开(公告)号：US08804075B2

公开(公告)日：2014-08-12

申请号：US13138479

申请日：2010-02-24

申请人： Kohei Matsui ,  Kaoru Hatta ,  Ryosuke Yasui

发明人： Kohei Matsui ,  Kaoru Hatta ,  Ryosuke Yasui

IPC分类号： G02F1/1335 ,  G02B5/20 ,  G02F1/1339

CPC分类号： G02B5/201 ,  G02F1/133516 ,  G02F1/13394

摘要： A color filter having excellent display quality is provided by a continuous exposure method using a compact photomask. The color filter includes: a substrate; a black matrix formed on the substrate, for dividing the substrate into rectangular display regions in which the plurality of pixels are arrayed, and non-display regions surrounding the display regions; a stripe pattern; a plurality of columnar spacers disposed in the display regions; and a plurality of dummy columnar spacers. The stripe pattern includes a plurality of colored layers extending in one direction. Each colored layer intersects with a pair of sides of the display region in a direction perpendicular to the direction in which the colored layers extend. The thickness of both end portions of each colored layer disposed on the non-display region is not uniform. The dummy columnar spacers are disposed in portions of the non-display regions, where the colored layers are absent.

摘要翻译： 通过使用紧凑型光掩模的连续曝光方法提供具有优异显示质量的滤色器。 滤色器包括：基板; 形成在所述基板上的黑色矩阵，用于将所述基板分割成排列有所述多个像素的矩形显示区域和围绕所述显示区域的非显示区域; 条纹图案 设置在显示区域中的多个柱状间隔物; 以及多个虚拟柱状间隔物。 条纹图案包括在一个方向上延伸的多个着色层。 每个着色层在与着色层延伸的方向垂直的方向上与显示区域的一对相交。 设置在非显示区域上的各着色层的两端部的厚度不均匀。 虚拟柱状间隔物设置在不显示着色层的非显示区域的部分中。

公开(公告)号：US08698984B2

公开(公告)日：2014-04-15

申请号：US13138929

申请日：2010-04-28

申请人： Kohei Matsui ,  Ryosuke Yasui

发明人： Kohei Matsui ,  Ryosuke Yasui

IPC分类号： G02F1/1335

CPC分类号： G02B5/201 ,  G02F1/133514 ,  G02F1/133516 ,  G03F7/0007

摘要： A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the blind shutter which are parallel to the Y axis are each positioned so as to be distant by 500 μm to 1000 μm from a side which forms the outer circumference of the outermost opening and which is closest to the frame area extending in the Y-axis direction. Next, photo spacers are formed on the colored layer such that the central axis of each photo spacer is positioned in a range of positions that are distant by 300 μm or less from a side which is closest to the frame area extending in the Y-axis direction.

摘要翻译： 提供一种滤色器，其通过使用小掩模连续曝光方法形成，其中相邻的曝光区域之间的部分被遮光板遮挡光，并且在显示像素区域外的着色层上形成有虚拟的光隔离物 均匀的高度。 首先，通过使用小掩模连续曝光法，形成了沿X轴方向跨越显示像素区域和框架区域延伸的着色层。 此时，与Y轴平行的遮光板的边缘分别定位成从形成最外侧开口的外周的一侧离开框架500μm至1000μm 区域沿Y轴方向延伸。 接下来，在着色层上形成光隔离物，使得每个光电间隔物的中心轴线位于从最靠近Y轴延伸的框架区域的一侧距离300μm以下的位置的范围内 方向。

公开(公告)号：US08697319B2

公开(公告)日：2014-04-15

申请号：US13138340

申请日：2010-02-04

申请人： Kohei Matsui ,  Yasuhiro Shibata ,  Ryosuke Yasui

发明人： Kohei Matsui ,  Yasuhiro Shibata ,  Ryosuke Yasui

IPC分类号： G02B5/20 ,  G03F7/20

CPC分类号： G03F7/0007 ,  G02B5/201 ,  G03F1/50 ,  G03F7/2022

摘要： An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.

摘要翻译： 提供一种曝光方法，其中当使用具有多个掩模图案的光掩模进行曝光时，对应于各种不同滤色器的各种掩模图案在基板上的不同区域中曝光，而不将光掩模移动到 曝光装置 相对于光源固定具有用于曝光构成第一滤色器的彩色像素的一部分的第一掩模图案和用于曝光构成第二滤色器的彩色像素的一部分的第二掩模图案的光掩模。 来自光源的光束在转印衬底的同时选择性地导向第一掩模图案，以连续地暴露第一区域中的抗蚀剂，并且来自光源的光束被选择性地导向第二掩模图案同时传送衬底 以在第二区域中连续地曝光抗蚀剂。

公开(公告)号：US20120038863A1

公开(公告)日：2012-02-16

申请号：US13138929

申请日：2010-04-28

申请人： Kohei Matsui ,  Ryosuke Yasui

发明人： Kohei Matsui ,  Ryosuke Yasui

IPC分类号： G02F1/1335 ,  G03F1/00 ,  G02B5/22

CPC分类号： G02B5/201 ,  G02F1/133514 ,  G02F1/133516 ,  G03F7/0007

摘要： A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the blind shutter which are parallel to the Y axis are each positioned so as to be distant by 500 μm to 1000 μm from a side which forms the outer circumference of the outermost opening and which is closest to the frame area extending in the Y-axis direction. Next, photo spacers are formed on the colored layer such that the central axis of each photo spacer is positioned in a range of positions that are distant by 300 μm or less from a side which is closest to the frame area extending in the Y-axis direction.

摘要翻译： 提供一种滤色器，其通过使用小掩模连续曝光方法形成，其中相邻的曝光区域之间的部分被遮光板遮挡光，并且在显示像素区域外的着色层上形成有虚拟的光隔离物 均匀的高度。 首先，通过使用小掩模连续曝光法，形成了沿X轴方向跨越显示像素区域和框架区域延伸的着色层。 此时，与Y轴平行的遮光板的边缘分别定位成从形成最外侧开口的外周的一侧离开框架500μm至1000μm 区域沿Y轴方向延伸。 接下来，在着色层上形成光隔离物，使得每个光电间隔物的中心轴线位于从最靠近Y轴延伸的框架区域的一侧距离300μm以下的位置的范围内 方向。

公开(公告)号：US08767324B2

公开(公告)日：2014-07-01

申请号：US13516078

申请日：2010-12-10

申请人： Kohei Matsui ,  Ryosuke Yasui

发明人： Kohei Matsui ,  Ryosuke Yasui

IPC分类号： G02B5/22 ,  G02F1/1335

CPC分类号： G02F1/133516 ,  G02B5/201 ,  Y10S359/90

摘要： A color filter substrate is provided that allows the realization of a liquid crystal display device having excellent display quality and generating no noticeable display unevenness. On a color filter substrate, a lattice-shaped black matrix is formed, and a plurality of colored pixels are formed in matrix. The maximum value of the differences between the overlap widths Wa (or Wb) in the row direction between first colored layers and the black matrix in an area exposed through a photomask, and the overlap widths Wg (or Wh) in the row direction between second colored layers and the black matrix in an area exposed through another photomask, is 4 μm or less. Further, the maximum value of overlap widths Wa to Wl in the row direction between all of the colored pixels and the black matrix is 8 μm or less.

摘要翻译： 提供一种滤色器基板，其允许实现具有优异的显示质量并且不产生显着的显示不均匀性的液晶显示装置。 在滤色器基板上，形成格子状的黑矩阵，并且以矩阵形成多个彩色像素。 通过光掩模曝光的区域中的第一着色层和黑矩阵之间的行方向上的重叠宽度Wa（或Wb）之间的差异的最大值以及第二行中的行方向上的重叠宽度Wg（或Wh） 彩色层和通过另一光掩模曝光的区域中的黑色矩阵为4μm以下。 此外，所有着色像素和黑矩阵之间的行方向上的重叠宽度Wa至W1的最大值为8μm以下。

公开(公告)号：US08605237B2

公开(公告)日：2013-12-10

申请号：US13138928

申请日：2010-04-28

申请人： Kohei Matsui ,  Ryosuke Yasui

发明人： Kohei Matsui ,  Ryosuke Yasui

IPC分类号： G02F1/1335

CPC分类号： G02B5/003 ,  G02B5/201 ,  G02F1/133512 ,  G02F1/133514 ,  G03F7/0007

摘要： A color filter which is able to form a liquid crystal display device that has few variation in display caused due to difference in exposure illuminance among exposure heads and/or misalignment in pattern position, and that is excellent in display quality, and an exposure mask used for producing the color filter are provided. A color filter 1 includes: a substrate 2; black matrixes 3 provided on the substrate 2; and a plurality of colored layers 4 which partially overlap the black matrixes 3 in at least a first direction. The widths of overlap portions 5 in which the black matrixes 3 and the colored layers 4 overlap each other in the first direction are varied over the entirety of a display area, and the degree of the variation is uniformly distributed over the entirety of the display area. As a result, even if the sizes of the overlap portions 5 are partially varied due to misalignment in position of the exposure heads and/or change of exposure condition, the partial variation is blended into the variation of the widths distributed over the entirety of the display area, so that a varied state can be prevented from becoming conspicuous as a whole.

摘要翻译： 一种能够形成由于曝光头之间的曝光照度的差异和/或图案位置的不对准而导致的显示变化很小并且显示质量优异的显示品质的显示装置，以及使用的曝光掩模的滤色器 用于制造滤色片。 滤色器1包括：基板2; 设置在基板2上的黑色矩阵3; 以及在至少第一方向上与黑矩阵3部分地重叠的多个着色层4。 黑矩阵3和着色层4在第一方向上彼此重叠的重叠部分5的宽度在整个显示区域上变化，并且变化程度均匀地分布在整个显示区域上 。 结果，即使重叠部分5的尺寸由于曝光头的位置不对准和/或曝光条件的改变而部分变化，部分变化也被混合到整个宽度分布的宽度变化中 显示区域，从而可以防止变化状态整体变得显眼。

公开(公告)号：US20120293884A1

公开(公告)日：2012-11-22

申请号：US13516078

申请日：2010-12-10

申请人： Kohei Matsui ,  Ryosuke Yasui

发明人： Kohei Matsui ,  Ryosuke Yasui

IPC分类号： G02B5/20 ,  G03F7/20 ,  G03F1/00

CPC分类号： G02F1/133516 ,  G02B5/201 ,  Y10S359/90

摘要： A color filter substrate is provided that allows the realization of a liquid crystal display device having excellent display quality and generating no noticeable display unevenness. On a color filter substrate, a lattice-shaped black matrix is formed, and a plurality of colored pixels are formed in matrix. The maximum value of the differences between the overlap widths Wa (or Wb) in the row direction between first colored layers and the black matrix in an area exposed through a photomask, and the overlap widths Wg (or Wh) in the row direction between second colored layers and the black matrix in an area exposed through another photomask, is 4 μm or less. Further, the maximum value of overlap widths Wa to Wl in the row direction between all of the colored pixels and the black matrix is 8 μm or less.

摘要翻译： 提供一种滤色器基板，其允许实现具有优异的显示质量并且不产生显着的显示不均匀性的液晶显示装置。 在滤色器基板上，形成格子状的黑矩阵，并且以矩阵形成多个彩色像素。 通过光掩模曝光的区域中的第一着色层和黑矩阵之间的行方向上的重叠宽度Wa（或Wb）之间的差异的最大值以及第二行中的行方向上的重叠宽度Wg（或Wh） 彩色层和通过另一光掩模曝光的区域中的黑色矩阵为4μm以下。 此外，所有着色像素和黑矩阵之间的行方向上的重叠宽度Wa至W1的最大值为8μm以下。