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公开(公告)号：US4798962A
公开(公告)日：1989-01-17
申请号：US16120
申请日：1987-02-18
CPC分类号： G03F9/70
摘要： A projection exposure apparatus has a pattern lighting optical system including an exposure light source for lighting a pattern on a photomask, a projection optical system for forming an image of the pattern lighted by the exposure light source on the surface of a wafer, an alignment lighting optical system including an alignment light source for lighting alignment marks on the photomask and the wafer, and an alignment optical system for detecting relative positional relationship between the mask pattern and the wafer through the projection optical system, and further the projection optical system includes an image-forming system which exhibits two extremums of axial aberration as a function of wavelength.
摘要翻译： 投影曝光装置具有图案照明光学系统，其包括用于点亮光掩模上的图案的曝光光源，用于在晶片表面上形成由曝光光源照射的图案的图像的投影光学系统，对准照明 光学系统，包括用于照明光掩模和晶片上的对准标记的对准光源，以及用于通过投影光学系统检测掩模图案和晶片之间的相对位置关系的对准光学系统，此外，投影光学系统包括图像 表现出作为波长的函数的两个轴向像差极值的系统。
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公开(公告)号：US4795244A
公开(公告)日：1989-01-03
申请号：US906986
申请日：1986-09-15
CPC分类号： G03F7/70058 , G03F9/70
摘要： A projection type exposure apparatus for projecting an image of a pattern formed on a reticle onto a wafer in which the exposure is carried out with first light and the alignment between reticle and wafer is carried out with a second light having a wavelength different from that of the first light. The apparatus includes an optical member disposed between alignment optical system and projection optical system for reflecting the first light and transmitting the second light.
摘要翻译： 一种投影型曝光装置，用于将在掩模版上形成的图案的图像投影到用第一光进行曝光的晶片上，并且用掩模版和晶片之间的对准将第二光与 第一盏灯。 该装置包括设置在对准光学系统和投影光学系统之间的光学构件，用于反射第一光并透射第二光。
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公开(公告)号：US4730900A
公开(公告)日：1988-03-15
申请号：US696085
申请日：1985-01-29
IPC分类号： G03B27/34 , G02B7/02 , G02B7/09 , G02B7/28 , G02B21/24 , G03F7/20 , G03F7/207 , H01L21/027 , H01L21/30 , G01J5/00 , G02B27/52
CPC分类号： G03F7/70241 , G02B21/241 , G02B7/028 , G03F7/70825 , G03F7/70883 , G03F7/70891
摘要： A projection optical apparatus comprises illuminating means providing for an illuminating light beam, a projection optical system including optical elements disposed across the illuminating light beam and having an imaging plane, and detecting mean including temperature sensor means provided on at least one of the optical elements and producing an output corresponding to the temperature of the one optical element.
摘要翻译： 投影光学装置包括提供照明光束的照明装置，包括设置在照明光束两侧并具有成像平面的光学元件的投影光学系统，以及包括设置在至少一个光学元件上的温度传感器装置的检测装置， 产生对应于一个光学元件的温度的输出。
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公开(公告)号：US4789242A
公开(公告)日：1988-12-06
申请号：US894840
申请日：1986-08-08
申请人： Shuhei Takagi , Makoto Uehara , Koichi Matsumoto
发明人： Shuhei Takagi , Makoto Uehara , Koichi Matsumoto
IPC分类号： G02B27/46 , G01B11/00 , G01S17/02 , G03F9/00 , H01L21/027
摘要： An optical apparatus comprising a laser light source, an optical system for focusing a beam of light from the laser light source onto an object surface through an objective lens and a spatial filter disposed at the entrance pupil of the objective lens or at a position conjugated with the entrance pupil, wherein the origin of the divergence of the laser beam having an angle of divergence emitted from the laser light source is projected on the entrance pupil of the objective lens by the optical system.
摘要翻译： 一种光学装置，包括激光光源，用于通过物镜将来自激光光源的光束聚焦到物体表面上的光学系统，以及设置在物镜的入射光瞳上的空间滤光器或与物镜共轭的位置 入射光瞳，其中具有从激光源发射的发散角的激光束的发散的原点通过光学系统投影在物镜的入射光瞳上。
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公开(公告)号：US4769750A
公开(公告)日：1988-09-06
申请号：US918131
申请日：1986-10-14
申请人： Koichi Matsumoto , Makoto Uehara , Tetsuo Kikuchi
发明人： Koichi Matsumoto , Makoto Uehara , Tetsuo Kikuchi
CPC分类号： G02B27/0961 , G02B19/0014 , G02B19/0047 , G02B27/09 , G02B3/0043 , G02B3/0056 , G02B3/0062 , G03F7/70058
摘要： An illumination optical system comprises a multi-beam generator which includes a plurality of each of two kinds of lens elements different in optical characteristics and which is interposed between a source for generating a collimated light beam and a light condenser. The multi-beam generator generates a large number of secondary light sources from the collimated light beam. The illumination optical system is capable of supplying illuminating light rays having an extremely uniform illumination distribution.
摘要翻译： 照明光学系统包括多光束发生器，其包括光学特性不同的两种透镜元件中的每一种，并且被插入在用于产生准直光束的光源和光聚光器之间。 多光束发生器从准直光束产生大量次级光源。 照明光学系统能够提供具有非常均匀的照明分布的照明光线。
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公开(公告)号：US4637691A
公开(公告)日：1987-01-20
申请号：US576477
申请日：1984-02-02
申请人： Makoto Uehara , Sumio Hashimoto
发明人： Makoto Uehara , Sumio Hashimoto
CPC分类号： G03F7/70058 , G02B19/0028 , G02B19/0047 , G02B21/06 , G02B5/001
摘要： A mirror converging-type illumination optical system for converging light rays from a light source into substantially parallel light rays using a concave reflecting mirror having a secondary curved surface comprises a conical refraction member having a convex conical refraction surface at an input or incident side thereof and another convex conical refraction surface at an output side thereof. The refraction member is arranged in a path of the parallel light rays with a vertex of the conical refraction member being substantially aligned with the optical axis of the illumination optical system. The refraction member inverts the inner and outer portions of the incident parallel light rays. The absence of incident parallel light around the optical axis thereof is corrected to achieve a uniform intensity of light rays.
摘要翻译： 使用具有次级曲面的凹面反射镜将来自光源的光线会聚到基本上平行的光线的镜面会聚式照明光学系统包括在输入或入射侧具有凸锥形折射面的锥形折射构件， 在其输出侧的另一个凸锥形折射表面。 折射构件布置在平行光线的路径中，其中锥形折射构件的顶点基本上与照明光学系统的光轴对准。 折射构件使入射的平行光线的内部和外部反转。 校正光轴周围没有入射平行光，以实现均匀的光线强度。
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公开(公告)号：US4592625A
公开(公告)日：1986-06-03
申请号：US469015
申请日：1983-02-23
申请人： Makoto Uehara , Satoru Anzai , Kyoichi Suwa
发明人： Makoto Uehara , Satoru Anzai , Kyoichi Suwa
CPC分类号： G03F7/70241 , G02B13/22
摘要： A double-conjugate maintaining optical system for maintaining the conjugate relation between an object and its image even if the distance between the object and the image varies and also maintaining another set of conjugate relation in a predetermined condition includes an afocal system comprising a plurality of lens units, a first positive lens unit disposed on the object side of the afocal system, and a second positive lens unit disposed on the image side of the afocal system. The first positive lens unit is movable relative to the second positive lens unit so that the object is positioned on the focal plane of the first positive lens unit opposite to the afocal system. The afocal system is movable along the optical axis thereof in a predetermined relation with the first positive lens unit.
摘要翻译： 即使物体与图像之间的距离发生变化并且在预定条件下也保持另一组共轭关系的双重共轭维持光学系统，用于保持物体与其图像之间的共轭关系，包括包括多个透镜的无焦点系统 设置在无焦点系统的物体侧的第一正透镜单元和设置在无焦系统的像侧上的第二正透镜单元。 第一正透镜单元可相对于第二正透镜单元移动，使得物体位于与无焦系统相对的第一正透镜单元的焦平面上。 无焦点系统可以沿其光轴以与第一正透镜单元预定的关系移动。
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公开(公告)号：US4498762A
公开(公告)日：1985-02-12
申请号：US451394
申请日：1982-12-20
申请人： Makoto Uehara , Satoru Anzai
发明人： Makoto Uehara , Satoru Anzai
CPC分类号： G03F9/7049
摘要： A projection type exposure apparatus has a projection objective lens, a projection negative having a predetermined shape pattern and an alignment mark, and a photosensitive plate having an alignment mark. The shape pattern of the projection negative is projected upon the photosensitive plate by the projection objective lens. Main illuminating optical means illuminates the projection negative with a first wavelength light to which the photosensitive plate is sensitive, and alignment optical means illuminates the projection negative with a second wavelength light to which the photosensitive plate is insensitive. The positional relation between the projection negative and the photosensitive plate is detected using the second wavelength light through the projection objective lens. One of the alignment mark on the projection negative and the alignment mark on the photosensitive plate has a zone pattern which forms a light-condensing point at a position spaced apart by a predetermined amount from the surface on which said one mark is formed, and said predetermined amount corresponds to the amount of chromatic aberration of the projection objective lens, at the side thereof adjacent to said zone pattern, for the second wavelength light relative to the first wavelength light.
摘要翻译： 投影型曝光装置具有投影物镜，具有预定形状图案的投影阴极和对准标记，以及具有对准标记的感光板。 投影阴影的形状图案通过投影物镜投影在感光板上。 主照明光学装置用感光板敏感的第一波长光照亮投影阴极，并且对准光学装置用感光板不敏感的第二波长光照射投影负片。 使用通过投影物镜的第二波长光来检测投影负片和感光片之间的位置关系。 投影负极上的对准标记和感光板上的对准标记之一具有区域图案，该区域图案在与形成有所述一个标记的表面间隔开预定量的位置处形成聚光点，并且所述区域图案 预定量对应于相对于第一波长光的第二波长光的投影物镜的与所述区域图案相邻的一侧的色差量。
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9.发明授权Ink composition, recording method and recorded image utilizing the same, ink set and ink head 有权墨水组成，记录方法和使用其的记录图像，墨水组和墨水头公开(公告)号：US07699919B2
公开(公告)日：2010-04-20
申请号：US10665088
申请日：2003-09-22
IPC分类号： C09D11/02
CPC分类号： C09D11/40
摘要： An ink composition is prepared in such a manner that a difference between a dynamic surface tension (mN/m) measured by a maximum bubble pressure method at a temperature of 24 to 26° C. and a static surface tension (mN/m) is within a range from 0 to 7 (mN/m). The ink composition is stored in an ink tank of an ink head, and is supplied from the ink tank to an ink chamber having a discharge port, and a voltage is applied to partitions formed by a piezoelectric material to apply a pressure by the partitions to the ink composition stored in the ink chamber, whereby a liquid droplet of the ink composition is discharged from the discharge port and the liquid droplet is deposited on a recording material to record an image.
摘要翻译： 制备油墨组合物，使得在24至26℃的温度下通过最大气泡压力法测量的动态表面张力（mN / m）和静态表面张力（mN / m）之间的差为 在0至7（mN / m）的范围内。 油墨组合物储存在墨头的墨盒中，并从墨盒供给到具有排出口的墨室，并且将电压施加到由压电材料形成的隔板上以通过隔板施加压力 存储在墨水室中的墨水组合物，由此墨水组合物的液滴从排出口排出，液滴沉积在记录材料上以记录图像。
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10.发明授权Image forming apparatus having humidity detection and toner concentration adjusting according to detected humidity 有权具有根据检测到的湿度的湿度检测和调色剂浓度调节的图像形成装置公开(公告)号：US06353716B1
公开(公告)日：2002-03-05
申请号：US09667591
申请日：2000-09-22
申请人： Makoto Uehara , Yasutaka Maeda , Ken Yamagishi , Masayasu Narimatsu , Hiroji Kawamoto , Yuka Sakagami , Tomoe Matsuoka
发明人： Makoto Uehara , Yasutaka Maeda , Ken Yamagishi , Masayasu Narimatsu , Hiroji Kawamoto , Yuka Sakagami , Tomoe Matsuoka
IPC分类号： G03G1500
CPC分类号： G03G15/0849 , G03G15/0853 , G03G15/0887 , G03G15/5058
摘要： An image forming apparatus including a developing unit for stocking a developing agent containing toner and forming a toner image on a photosensitive medium with the developing agent, a toner supply unit for supplying the toner to the developing unit, a toner specific concentration detecting unit for detecting the toner specific concentration of the developing agent stocked in the developing unit, a humidity detecting unit for detecting humidity in the neighborhood of the developing unit, a storage unit for storing the humidity information detected by the humidity detecting unit, and a toner specific concentration correcting unit for controlling the toner supply amount of the toner supply unit on the basis of the humidity information stored to correct the toner specific concentration, wherein the toner specific concentration correcting unit compares newly-detected humidity with reference humidity corresponding to the humidity which is detected at the time when the developing agent is stocked into the developing unit or exchanged by new developing agent and which is stored in the storage unit, and corrects the toner specific concentration in accordance with the comparison result.
摘要翻译： 一种图像形成装置，包括用于将含有调色剂的显影剂放置在显影剂上并在感光介质上形成调色剂图像的显影单元，用于向显影单元供应调色剂的调色剂供应单元，用于检测调色剂的浓度检测单元 存储在显影单元中的显影剂的调色剂比浓度，用于检测显影单元附近的湿度的湿度检测单元，用于存储由湿度检测单元检测的湿度信息的存储单元和调色剂特定浓度校正 单元，用于基于存储的用于校正调色剂特定浓度的湿度信息来控制调色剂供给单元的调色剂供应量，其中调色剂特异性浓度校正单元将新检测到的湿度与对应于湿度的参考湿度进行比较， 显影剂的时间 插入显影单元或由新显影剂交换并存储在存储单元中，并根据比较结果校正调色剂特定浓度。
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