公开(公告)号：US5707687A

公开(公告)日：1998-01-13

申请号：US637357

申请日：1996-04-24

申请人： Koji Ueda ,  Hiroki Endo ,  Hidenori Miyamoto

发明人： Koji Ueda ,  Hiroki Endo ,  Hidenori Miyamoto

IPC分类号： B05D1/40 ,  B05C11/08 ,  G03F7/16 ,  H01L21/00 ,  H01L21/027 ,  B05D3/12 ,  B05C11/02 ,  B05D1/18

CPC分类号： H01L21/6715 ,  B05C11/08 ,  G03F7/162

摘要： A suction chuck and an inner cup are rotated in unison with each other to spread a coating solution uniformly over a planar object in the inner cup under centrifugal forces. Vent holes defined in an outer cup lid which closes an outer cup are held out of communication with vent holes defined in a ring-shaped closure member, so that the interior space in the outer cup is kept out of communication with the exterior space around the outer cup. The concentration of a solvent in the outer cup remains so high that no mist is produced in the outer cup. After the planar object has been coated and before the outer cup lid is opened, the ring-shaped closure member is turned to align the vent holes in the outer cup lid with the vent holes in the ring-shaped closure member, breaking any vacuum in the outer cup with ambient air introduced through the vent holes into the outer cup. Thereafter, the outer and inner cup lids are opened, and the coated planar object is taken out.

摘要翻译： 吸盘和内杯彼此一致地旋转，以在离心力下在内杯中的平面物体上均匀地涂覆涂布溶液。 限定在封闭外杯的外杯盖中的排气孔与环形封闭构件中限定的通气孔保持不连通，使得外杯中的内部空间与外围空间相连接 外杯。 外杯中的溶剂的浓度保持如此高，使得外杯中不产生雾。 在平面物体被涂覆之后并且在外杯盖打开之前，环形封闭构件被转动以使外杯盖中的通气孔与环形封闭构件中的通气孔对齐，从而破坏 具有环境空气的外杯通过通气孔引入外杯中。 此后，打开外杯盖和内杯盖，并取出涂覆的平面物体。

公开(公告)号：US5879457A

公开(公告)日：1999-03-09

申请号：US783988

申请日：1997-01-14

申请人： Tsutomu Sahoda ,  Koji Ueda ,  Hiroki Endo ,  Hidenori Miyamoto

发明人： Tsutomu Sahoda ,  Koji Ueda ,  Hiroki Endo ,  Hidenori Miyamoto

IPC分类号： B05C11/08 ,  G03F7/16 ,  H01L21/00 ,  H01L21/027 ,  B05C5/00 ,  B05C13/00

CPC分类号： H01L21/6715 ,  B05C11/08

摘要： A rotating cup type liquid coating device with structure for suppressing pulsatory movement of the coated liquid when stopping rotation of the inner cup 3, includes a buffer space S formed for connecting an inner space of the inner cup 3 and an inner space of an outer cup 2 surrounding the inner cup, on an outer periphery of the inner cup 3 , through respective throttle portions 16, 17.

摘要翻译： 具有用于在停止内杯3的旋转时抑制被涂液体的脉动运动的结构的旋转杯式液体涂布装置包括形成为用于连接内杯3的内部空间和外杯的内部空间的缓冲空间S 2通过相应的节流部分16,17围绕内杯3在内杯3的外周上。

公开(公告)号：US06287067B1

公开(公告)日：2001-09-11

申请号：US08947543

申请日：1997-10-11

申请人： Hidenori Miyamoto ,  Susumu Okano ,  Koji Ueda ,  Taiichiro Aoki

发明人： Hidenori Miyamoto ,  Susumu Okano ,  Koji Ueda ,  Taiichiro Aoki

IPC分类号： B65H100

CPC分类号： H01L21/67161 ,  B23P21/004 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  Y10S414/135 ,  Y10S414/136

摘要： A processing unit structure 1 a plurality of processing units 2, . . . , assembled together continuously in a horizontal direction, wherein a transfer portion 3 is provided on the top of each processing unit 2, . . . , for transferring the plate-like material to be processed between adjacent one of the processing units. A transfer device, such as a shuttle (SH) is provided in each of the transfer portions 3. Each processing unit 2 performs a series of processes on the plate-like material and is constructed with processing blocks 4 and 4 and a transfer portion 3 in the form of a transfer robot (R) positioned between the processing blocks 4 and 4. Further, each processing unit 2. . . is independent from one another so that it is possible to selectively add and remove different ones of the processing units with respect to the processing unit structure 1.

摘要翻译： 处理单元结构1是多个处理单元2，...。 。 。 在水平方向上连续地组装在一起，其中传送部分3设置在每个处理单元2的顶部。 。 。 用于在相邻的一个处理单元之间传送待处理的板状材料。 在每个转印部分3中设置有诸如梭（SH）的转印装置。每个处理单元2对板状材料执行一系列处理，并且由处理块4和4以及转印部3 以位于处理块4和4之间的传送机器人（R）的形式。此外，每个处理单元2。 。 彼此独立，使得可以相对于处理单元结构1选择性地添加和去除处理单元中的不同处理单元。

公开(公告)号：US5706930A

公开(公告)日：1998-01-13

申请号：US637356

申请日：1996-04-24

申请人： Tsutomu Sahoda ,  Koji Ueda ,  Hidenori Miyamoto ,  Toru Arikawa

发明人： Tsutomu Sahoda ,  Koji Ueda ,  Hidenori Miyamoto ,  Toru Arikawa

IPC分类号： B65G49/07 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68 ,  B65G29/00

CPC分类号： H01L21/681 ,  H01L21/67796 ,  Y10S414/135

摘要： When a carrier arm is retracted, a semiconductor wafer carried thereon passes between three light-emitting elements and three light-detecting elements associated therewith. At this time, a controller determines six points on the outer circumferential edge of the semiconductor wafer based on signals from sensors made up of the light-emitting elements and the light-detecting elements. The controller selects three of the determined points, determines the center of a circumscribed circle passing through the selected three points, and regards the determined center as the center of the semiconductor wafer. Then, the controller controls movement of the semiconductor wafer toward a rotary-cup coating device, an evacuating drying device, or an edge cleaning device based on the center of the semiconductor wafer.

摘要翻译： 当承载臂缩回时，其上承载的半导体晶片通过三个发光元件和与其相关联的三个光检测元件。 此时，控制器基于由发光元件和光检测元件构成的传感器的信号来确定半导体晶片的外周边缘上的六个点。 控制器选择三个确定的点，确定通过所选三个点的外接圆的中心，并将确定的中心视为半导体晶片的中心。 然后，控制器基于半导体晶片的中心来控制半导体晶片朝向旋转杯式涂布装置，抽真空干燥装置或边缘清洁装置的移动。

公开(公告)号：US5591262A

公开(公告)日：1997-01-07

申请号：US410315

申请日：1995-03-24

申请人： Hiroyoshi Sago ,  Hideya Kobari ,  Koji Ueda ,  Hidenori Miyamoto ,  Ryuzo Takatsuki

发明人： Hiroyoshi Sago ,  Hideya Kobari ,  Koji Ueda ,  Hidenori Miyamoto ,  Ryuzo Takatsuki

IPC分类号： G03F7/16 ,  B05C11/08 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  H01L21/683 ,  B05C7/00

CPC分类号： H01L21/67051 ,  Y10S134/902

摘要： The invention disclosed defined a vertically extending passage through the rotary center of an inner cup or the rotary center of a spinner in a notary chemical treater, disposes a stationary cleaning fluid nozzle in the passage, and injects the cleaning fluid from the nozzle to clean a lid of the rotary chemical treater and the underside of an object treatment within the treater. The underside of the lid and the underside of the objective part are efficiently cleaned, and the need for sealing the movable parts against the cleaning fluid is eliminated because the nozzle is stationary, ensuring the prevention of the cleaning fluid from leaking.

摘要翻译： 本发明公开了一种通过内杯的旋转中心或旋转器在公证化学处理器中的旋转中心的垂直延伸的通道，将固定的清洁流体喷嘴置于通道中，并将喷嘴从喷嘴喷射到清洁 旋转化学处理器的盖子和处理器内的物体处理的下侧。 盖子的下侧和目标部分的下侧被有效地清洁，并且由于喷嘴是静止的，消除了将可动部件密封在清洁流体上的需要，从而确保防止清洗液体泄漏。

公开(公告)号：US09299874B2

公开(公告)日：2016-03-29

申请号：US13878964

申请日：2011-10-12

申请人： Hidenori Miyamoto ,  Tadahiko Hirakawa ,  Koichi Misumi

发明人： Hidenori Miyamoto ,  Tadahiko Hirakawa ,  Koichi Misumi

IPC分类号： H01L31/18 ,  H01L21/67 ,  H01L21/677 ,  H01L31/032 ,  B05D1/26

CPC分类号： H01L31/18 ,  B05D1/26 ,  B05D2252/02 ,  B05D2252/04 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/6776 ,  H01L31/0322 ,  Y02E10/541 ,  Y02E10/543 ,  Y02P70/521

摘要： A coating apparatus including a coating part which has a nozzle which ejects a liquid material including an oxidizable metal from a tip portion, and a relative driving unit which moves a substrate and the nozzle in relation to each other so that the tip portion passes through the substrate, such that at least the tip portion of the nozzle provides an affinity control part which is formed so that affinity between the affinity control part and the liquid material is less than that between the liquid materials.

摘要翻译： 一种涂布装置，其具有涂布部，该涂布部具有从顶端部喷射包含可氧化金属的液体材料的喷嘴，以及相对驱动部，其相对于彼此移动基板和喷嘴，使得前端部穿过 使得喷嘴的至少尖端部分提供亲和力控制部分，该亲和控制部分形成为使亲和控制部分和液体材料之间的亲和力小于液体材料之间的亲和力。

公开(公告)号：US09186696B2

公开(公告)日：2015-11-17

申请号：US12874984

申请日：2010-09-02

申请人： Hidenori Miyamoto ,  Kenji Maruyama ,  Tadahiko Hirakawa ,  Koichi Misumi

发明人： Hidenori Miyamoto ,  Kenji Maruyama ,  Tadahiko Hirakawa ,  Koichi Misumi

IPC分类号： B05C11/00 ,  B05C11/10 ,  B05C5/00 ,  C23C16/52 ,  H01L21/67 ,  H01L21/677 ,  H01L31/0216 ,  H01L31/032 ,  H01L31/18 ,  B41J2/045

CPC分类号： B05C11/1015 ,  B05C5/005 ,  B41J2/04566 ,  C23C16/52 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/6776 ,  H01L31/02167 ,  H01L31/0322 ,  H01L31/18 ,  Y02E10/541 ,  Y02P70/521

摘要： A coating apparatus including a coating part which applies a liquid material including an oxidizable metal on a substrate, a chamber having a coating space in which the coating part applies the liquid material on the substrate and a transport space into which the substrate is transported, and a removal unit which removes the liquid material from the inside of the chamber when at least one of oxygen concentration and humidity inside the chamber exceeds a threshold value.

摘要翻译： 一种涂布装置，包括：涂布部，其将包含可氧化金属的液体材料涂布在基板上;具有涂布空间的室，其中所述涂布部将所述液体材料施加到所述基板上;以及输送空间，所述基板被输送到所述输送空间中;以及 当所述室内的氧浓度和湿度中的至少一个超过阈值时，所述去除单元从所述室的内部除去所述液体材料。

公开(公告)号：US09027504B2

公开(公告)日：2015-05-12

申请号：US13484625

申请日：2012-05-31

申请人： Hidenori Miyamoto ,  Tsutomu Sahoda

发明人： Hidenori Miyamoto ,  Tsutomu Sahoda

IPC分类号： B05C13/02 ,  F24J3/00 ,  F27B5/16 ,  H01L21/67 ,  H01L21/677 ,  H01L31/032

CPC分类号： H01L21/67173 ,  H01L21/67109 ,  H01L21/67253 ,  H01L21/6776 ,  H01L31/0322 ,  H01L31/0326 ,  Y02E10/541

摘要： A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part.

摘要翻译： 一种加热装置，包括：第一加热部和第二加热部，在所述第一加热部和第二加热部之间，在所述膜厚度方向的基板位置配置有具有涂膜的基板; 以及距离控制部，其控制所述基板位置与所述第一加热部之间的第一距离和所述基板位置与所述第二加热部之间的第二距离中的至少一个。

公开(公告)号：US20140072500A1

公开(公告)日：2014-03-13

申请号：US13611499

申请日：2012-09-12

申请人： Masaru Kuwahara ,  Koichi Misumi ,  Hidenori Miyamoto

发明人： Masaru Kuwahara ,  Koichi Misumi ,  Hidenori Miyamoto

IPC分类号： C01B21/092

CPC分类号： C01B21/092 ,  C01B19/002 ,  C01B19/007 ,  C01G3/12 ,  C01G9/08 ,  C01G15/00 ,  C01G15/006 ,  C01G19/00 ,  C01G30/008 ,  H01L31/02168 ,  H01L31/0322 ,  H01L31/0326 ,  H01L31/18 ,  Y02E10/541

摘要： A method of producing a hydrazine-coordinated Cu chalcogenide complex, including: a step (I) in which Cu or Cu2Se and a chalcogen are reacted in dimethylsulfoxide in the presence of hydrazine, a step (II) in which a solution obtained in the step (I) is subjected to concentration and filtration, and a step (III) in which a purifying solvent is added to a solution obtained in the step (II).

摘要翻译： 一种制备肼配位的Cu硫属元素化合物的方法，包括：在肼的存在下，在二甲亚砜中使Cu或Cu 2 Se和硫族元素反应的步骤（I），其中在步骤（II）中获得的溶液 （I）进行浓缩和过滤，以及步骤（III），其中将纯化溶剂加入到步骤（II）中获得的溶液中。

公开(公告)号：US20140008420A1

公开(公告)日：2014-01-09

申请号：US13544254

申请日：2012-07-09

申请人： Hidenori Miyamoto

发明人： Hidenori Miyamoto

IPC分类号： C23C26/00 ,  B05C9/14 ,  B23K3/00 ,  B05D3/02 ,  B23K1/00

CPC分类号： H01L31/0322 ,  B05B15/52 ,  B05C5/0254 ,  H01L31/0326 ,  H01L2924/0002 ,  Y02E10/541 ,  H01L2924/00

摘要： A substrate treating method including: a coating step in which a coating film of a liquid material comprising a metal and a solvent is formed on a first substrate and a second substrate; and a heating step in which the coating film is heated in a state where the first substrate and the second substrate are held in a manner such that the coating film formed on the first substrate faces the coating film formed on the second substrate.

摘要翻译： 一种基板处理方法，包括：涂覆步骤，其中在第一基板和第二基板上形成包括金属和溶剂的液体材料的涂膜; 以及加热步骤，其中在第一基板和第二基板被保持的状态下加热涂膜，使得形成在第一基板上的涂膜面对形成在第二基板上的涂膜。