摘要:
Nanoporous polymeric materials are fabricated in which polymeric strands are crosslinked via ring structures. Preferred ring structures are formed de novo during crosslinking, and at least some of the ring structures are preferably included in the backbones of the strands. At least one of the ring structures may advantageously comprise an aromatic structure, and may more advantageously comprise a benzyl moiety. Especially preferred polymers comprise a poly(arylene ether) synthesized from a difluoroaromatic portion and an aromatic bisphenolic portion. In another preferred aspect, the difluoroaromatic portions of the poly(arylene ether) carry at least two different crosslinking functionalities. In an even more preferred aspect, the crosslinking functionalities comprise an ethynyl and a tetracyclone. Nanoporosity is preferably introduced by thermolyzing one or more thermolabile portions in the crosslinked polymer. An especially preferred thermolabile portion comprises ethylene glycol-poly(caprolactone).
摘要:
Nanoporous materials are fabricated from polymers having backbones with reactive groups used in crosslinking. In one aspect of preferred methods and compositions, the reactive groups in the backbone comprise a diene and a dienophile. The diene may advantageously comprise a tetracyclone, and the dienophile may advantageously comprise an ethynyl. In another aspect of preferred methods and compositions, the reactive groups in the backbone are included in a conjugated system. Especially preferred polymeric strands comprise a poly(arylene ether) synthesized from a difluoroaromatic portion and an aromatic bisphenolic portion. It is still more preferred that the difluoroaromatic portions of the poly(arylene ether) are modified in such a way that some difluoroaromatic portions carry a thermolabile portion. In still other aspects crosslinking may advantageously occur without reliance on an exogenous crosslinker.
摘要:
Compositions and methods are provided in which an electrical device is fabricated by incorporating macrocycles in a polymer on a substrate portion of the device, and crosslinking the polymer to form a crosslinked polymer. It is preferred that at least some of the macrocycles are relatively large, including at least six rings in the backbone of a macrocycle. It is also preferred that rings used in forming the macrocycles may be relatively large, preferably having at least six members as in phenyl rings. The intermacrocyclic links can be relatively complex, such as where four macrocycles may be coupled to a single atom or a single phenyl group. In yet other aspects, macrocycles can be heavily conjugated, with more preferred macrocycles having a completely conjugated backbone. In yet other aspects the macrocycles can have backbones with ether, carboxyl, and ethynyl groups, some of which can be used in crosslinking without reliance on an extrinsic crosslinker. In still another aspect, the macrocycles can be fabricated from a bisphenol and a difluoroaromatic compound.
摘要:
Compositions and methods are provided in which nanoporous polymeric materials are produced via stable, polymeric template strands having reactive groups that can be used for forming crosslinking functionalities and/or adding thermolabile groups, wherein at least some of the thermolabile groups are thermolyzed to produce voids. The template strands preferably comprise aromatic systems and vicinal keto groups, such as a polybenzil formed from fluorene bisphenol or 3,3'-dihydroxytolane with 4,4'-difluorobenzil. At least some of the reactive groups preferably react using an addition-elimination reaction. Especially preferred thermolabile groups comprise poly(propylene oxide), and especially preferred crosslinkers comprise ethynyl-moiety and tetracyclone moieties.
摘要:
An embodiment of the present invention is a technique to form a resin. A mixture is formed by a curing agent dissolved in the epoxy resin. The epoxy resin contains a first rigid rod mesogen. The curing agent contains a second rigid rod mesogen and one of a hydroxyl, amine, and anhydride.
摘要:
Methods of forming a microelectronic structure are described. Embodiments of those methods include forming a conformal layer of a water soluble nanopowder on a wafer, and then scribing the wafer.
摘要:
The embodiments of the present invention include coating a semiconductor wafer with a polymer layer and attaching the polymer layer to a support substrate with a tape. The tape has at least two adhesive sides, and at least one radiation sensitive side. The radiation sensitive side facilitates release of the tape.
摘要:
In some embodiments, a method includes providing a composition which includes a base at least partially filled with filler particles and applying the composition as an underfill composition. At least some of the filler particles are electrically conductive.
摘要:
A method for implementing a bismaleimide (BMI) polymer as a sacrificial material for an integrated circuit air gap dielectric. The method of one embodiment comprises forming a first and second metal interconnect lines on a substrate, wherein at least a portion of the first and second metal interconnect lines extend parallel to one another and wherein a trough is located between the parallel portion of said first and second metal interconnect lines. A layer of bismaleimide is spin coated over the substrate. The layer of bismaleimide is polished with a chemical mechanical polish, wherein the trough remains filled with the bismaleimide. A diffusion layer is formed over the substrate. The substrate is heated to activate a pyrolysis of the bismaleimide. An air gap is formed in the trough in the space vacated by the bismaleimide.
摘要:
An oxidizing slurry for removal of low dielectric constant materials. The slurry is formed utilizing non-oxidizing particles with a separate oxidizing agent, oxidizing particles alone or reducible abrasive particles with a compatible oxidizing agent. The particles can be formed of a metal oxide, nitride, or carbide material, by itself or mixtures thereof, or can be coated on a core material such as silicon dioxide or can be coformed therewith. A preferred oxidizing slurry is multi-modal in particle size distribution. Although developed for utilization in CMP semiconductor processing the oxidizing slurry of the present invention also can be utilized for other high precision polishing processes.