公开(公告)号：US20060166241A1

公开(公告)日：2006-07-27

申请号：US11325834

申请日：2006-01-05

申请人： Jeo-young Shim ,  Kyu-youn Hwang ,  Joon-ho Kim ,  Sung-ouk Jung ,  Kyu-tae Yoo ,  Joon-shik Park ,  Ji-na Namgoong

发明人： Jeo-young Shim ,  Kyu-youn Hwang ,  Joon-ho Kim ,  Sung-ouk Jung ,  Kyu-tae Yoo ,  Joon-shik Park ,  Ji-na Namgoong

IPC分类号： C12Q1/68 ,  C12M1/34

CPC分类号： C12N15/1006 ,  C12Q1/6806 ,  C12Q2563/173 ,  C12Q2523/308

摘要： Provided are nucleic acid isolation unit and method. The method includes immobilizing an aromatic compound-containing nucleic acid intercalator on a solid support; contacting a first buffer solution containing a nucleic acid sample to be purified to the intercalator immobilized on the solid support to bind the intercalator with nucleic acids contained in the nucleic acid sample; cleaning the resultant structure where the nucleic acids are bound to the intercalator immobilized on the solid support; and eluting the nucleic acids with a second buffer solution.

摘要翻译： 提供了核酸分离单元和方法。 该方法包括将含芳族化合物的核酸嵌入剂固定在固体支持物上; 将含有要纯化的核酸样品的第一缓冲溶液与固定在固体支持物上的嵌入剂接触，以使嵌入剂与核酸样品中所含的核酸结合; 清洗所得结构，其中核酸与固定在固相载体上的嵌入剂结合; 并用第二缓冲溶液洗脱核酸。

公开(公告)号：US07384872B2

公开(公告)日：2008-06-10

申请号：US11130756

申请日：2005-05-17

申请人： Kyu-youn Hwang ,  Ji-na Namgoong ,  Jeo-young Shim

发明人： Kyu-youn Hwang ,  Ji-na Namgoong ,  Jeo-young Shim

IPC分类号： H01L21/311

CPC分类号： G01N33/54353 ,  B01J19/0046 ,  B01J2219/00387 ,  B01J2219/00432 ,  B01J2219/00527 ,  B01J2219/00608 ,  B01J2219/00612 ,  B01J2219/00621 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00722

摘要： Provided are a method of producing a substrate having a patterned organosilane layer and a method of using the substrate having the patterned organosilane layer. The method of producing the substrate having the patterned organosilane layer, includes: coating organosilane on a substrate to obtain an organosilane layer; coating a photoresist material on the organosilane layer; exposing the photoresist material to light through a mask to obtain a patterned surface on the photoresist material; developing an exposed or unexposed region of the photoresist material using a developer; and wet etching a portion of the organosilane layer in the region from which the photoresist material has been removed, using a HF-containing solution as an etchant.

摘要翻译： 提供了具有图案化有机硅烷层的基板的制造方法以及使用具有图案化有机硅烷层的基板的方法。 具有图案化有机硅烷层的基板的制造方法包括：在基板上涂布有机硅烷，得到有机硅烷层; 在有机硅烷层上涂覆光致抗蚀剂材料; 通过掩模将光致抗蚀剂材料曝光以在光致抗蚀剂材料上获得图案化表面; 使用显影剂显影光致抗蚀剂材料的曝光或未曝光区域; 并且使用含HF溶液作为蚀刻剂，湿法蚀刻除去了光致抗蚀剂材料的区域中的部分有机硅烷层。

公开(公告)号：US20050272268A1

公开(公告)日：2005-12-08

申请号：US11130756

申请日：2005-05-17

申请人： Kyu-youn Hwang ,  Ji-na Namgoong ,  Jeo-young Shim

发明人： Kyu-youn Hwang ,  Ji-na Namgoong ,  Jeo-young Shim

IPC分类号： H01L27/12 ,  B01J19/00 ,  G01N33/543 ,  H01L21/31 ,  H01L21/469

CPC分类号： G01N33/54353 ,  B01J19/0046 ,  B01J2219/00387 ,  B01J2219/00432 ,  B01J2219/00527 ,  B01J2219/00608 ,  B01J2219/00612 ,  B01J2219/00621 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00722

摘要： Provided are a method of producing a substrate having a patterned organosilane layer and a method of using the substrate having the patterned organosilane layer. The method of producing the substrate having the patterned organosilane layer, includes: coating organosilane on a substrate to obtain an organosilane layer; coating a photoresist material on the organosilane layer; exposing the photoresist material to light through a mask to obtain a patterned surface on the photoresist material; developing an exposed or unexposed region of the photoresist material using a developer; and wet etching a portion of the organosilane layer in the region from which the photoresist material has been removed, using a HF-containing solution as an etchant.

摘要翻译： 提供了具有图案化有机硅烷层的基板的制造方法以及使用具有图案化有机硅烷层的基板的方法。 具有图案化有机硅烷层的基板的制造方法包括：在基板上涂布有机硅烷，得到有机硅烷层; 在有机硅烷层上涂覆光致抗蚀剂材料; 通过掩模将光致抗蚀剂材料曝光以在光致抗蚀剂材料上获得图案化表面; 使用显影剂显影光致抗蚀剂材料的曝光或未曝光区域; 并且使用含HF溶液作为蚀刻剂，湿法蚀刻除去了光致抗蚀剂材料的区域中的部分有机硅烷层。

公开(公告)号：US07524662B2

公开(公告)日：2009-04-28

申请号：US11207343

申请日：2005-08-19

申请人： Ji-na Namgoong ,  Kyu-youn Hwang ,  Jeo-young Shim

发明人： Ji-na Namgoong ,  Kyu-youn Hwang ,  Jeo-young Shim

IPC分类号： C12N11/16 ,  C12Q1/68

CPC分类号： B82Y30/00 ,  B01J19/0046 ,  B01J2219/00576 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00662 ,  B01J2219/00693 ,  B01J2219/00711 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01J2219/00731

摘要： Provided is a method of storing a substrate having an active group or a probe molecule immobilized thereon. The method includes attaching a UV film to a surface of the substrate having the active group or probe immobilized thereon; and exposing the UV film to UV light, wherein the UV film comprises a UV-permeable base film and a pressure sensitive adhesive layer formed on a surface of the UV-permeable base film to immobilize the substrate, and when the pressure sensitive adhesive layer is exposed to the UV light, its adhesive force decreases.

摘要翻译： 提供一种存储其上固定有活性基团或探针分子的底物的方法。 该方法包括将UV膜附着到其上固定有活性基团或探针的基底表面上; 并将所述UV膜暴露于紫外光，其中，所述UV膜包含紫外线透过性基膜和形成在所述紫外线透过性基膜的表面上的压敏粘合剂层，以固定所述基板，并且当所述压敏粘合剂层为 暴露在紫外光下，其粘附力降低。

公开(公告)号：US20060040369A1

公开(公告)日：2006-02-23

申请号：US11207343

申请日：2005-08-19

申请人： Ji-na Namgoong ,  Kyu-youn Hwang ,  Jeo-young Shim

发明人： Ji-na Namgoong ,  Kyu-youn Hwang ,  Jeo-young Shim

IPC分类号： C12N11/16

CPC分类号： B82Y30/00 ,  B01J19/0046 ,  B01J2219/00576 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00626 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00662 ,  B01J2219/00693 ,  B01J2219/00711 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01J2219/00731

摘要： Provided is a method of storing a substrate having an active group or a probe molecule immobilized thereon. The method includes attaching a UV film to a surface of the substrate having the active group or probe immobilized thereon; and exposing the UV film to UV light, wherein the UV film comprises a UV-permeable base film and a pressure sensitive adhesive layer formed on a surface of the UV-permeable base film to immobilize the substrate, and when the pressure sensitive adhesive layer is exposed to the UV light, its adhesive force decreases.

公开(公告)号：US20050282204A1

公开(公告)日：2005-12-22

申请号：US11141437

申请日：2005-05-31

申请人： Jeo-young Shim ,  Ji-na Namgoong ,  Kyu-youn Hwang

发明人： Jeo-young Shim ,  Ji-na Namgoong ,  Kyu-youn Hwang

IPC分类号： C12Q1/68 ,  B01J19/00 ,  C12M1/00 ,  C12M1/34 ,  C12N15/09 ,  G01N21/45 ,  G01N21/64 ,  G01N33/53 ,  G01N33/68 ,  G01N35/02 ,  G01N37/00

CPC分类号： G01N21/6428 ,  B01J19/0046 ,  B01J2219/00317 ,  B01J2219/00385 ,  B01J2219/00432 ,  B01J2219/00527 ,  B01J2219/00576 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00621 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00675 ,  B01J2219/00677 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01J2219/00731 ,  B01L2300/0636 ,  B01L2300/0819 ,  B82Y30/00 ,  G01N21/45 ,  G01N21/6452

摘要： A microarray substrate having a patterned thin layer on a substrate is provided. In the microarray substrate, the substrate has a reflectance different from that of a material of the thin layer, and the patterned thin layer includes a spot region having a thickness at which constructive interference occurs between a first reflected light of irradiated excitation light reflected from the substrate and a second reflected light of irradiated excitation light reflected from the thin layer and a background region having a thickness at which destructive interference occurs between the first reflected light of irradiated excitation light reflected from the substrate and the second reflected light of irradiated excitation light reflected from the thin layer.

摘要翻译： 提供了在基板上具有图案化薄层的微阵列基板。 在微阵列基板中，基板具有与薄层的材料的反射率不同的反射率，图案化薄层包括具有厚度的点区域，该区域具有在从所述薄层反射的照射的激发光的第一反射光之间发生相长的干涉 基板和从薄层反射的照射的激发光的第二反射光和具有厚度的背景区域的背景区域，所述厚度在从基板反射的照射的激发光的第一反射光和被照射的激发光的第二反射光反射之间产生相消干涉 从薄层。

公开(公告)号：US07727622B2

公开(公告)日：2010-06-01

申请号：US11338994

申请日：2006-01-25

申请人： Jeo-young Shim ,  Sung-ouk Jung ,  Ji-na Namgoong ,  Kyu-tae Yoo ,  Jang-seok Ma

发明人： Jeo-young Shim ,  Sung-ouk Jung ,  Ji-na Namgoong ,  Kyu-tae Yoo ,  Jang-seok Ma

IPC分类号： G01N21/47

CPC分类号： C03C17/28 ,  C03C2218/111 ,  C03C2218/365 ,  G01N21/278 ,  G01N21/6452

摘要： Provided is a calibration apparatus for an optical scanner, including a substrate on which a molecule capable of forming an excimer is immobilized. A method of manufacturing the calibration apparatus and a method of calibrating an optical scanner using the calibration apparatus are also provided.

摘要翻译： 提供了一种用于光学扫描仪的校准装置，包括其上固定有能够形成准分子的分子的基底。 还提供了一种制造校准装置的方法和使用校准装置校准光学扫描器的方法。

公开(公告)号：US07510865B2

公开(公告)日：2009-03-31

申请号：US11347185

申请日：2006-02-03

申请人： Kyu-tae Yoo ,  Joon-ho Kim ,  Jun-hong Min ,  Sung-ouk Jung ,  Ji-na Namgoong ,  Kui-hyun Kim ,  Jeo-young Shim ,  Kak Namkoong

发明人： Kyu-tae Yoo ,  Joon-ho Kim ,  Jun-hong Min ,  Sung-ouk Jung ,  Ji-na Namgoong ,  Kui-hyun Kim ,  Jeo-young Shim ,  Kak Namkoong

IPC分类号： C12M1/34

CPC分类号： G01N33/54373

摘要： Provided are a sensing switch and a sensing method using the same. The sensing switch includes: a substrate; a supporter on the substrate; a sensing plate that is connected to a side of the supporter and is in parallel with the substrate by a predetermined distance; a receptor binding region on an upper surface of an end portion of the sensing plate; an electric or magnetic field generation device that induces deflection of the sensing plate when a receptor bound to the receptor binding region is selectively bound to an electrically or magnetically active ligand; and a pair of switching electrodes that are separated by a predetermined distance and is connected when the sensing plate contacts the substrate due to the deflection of the sensing plate. A target material need not be labelled, a signal processing of a fluorescent or electrical detection signal using an analysis apparatus is not required, and a signal can be directly decoded by confirming whether a current flows through the switch.

摘要翻译： 提供了一种感测开关和使用该感测开关的感测方法。 感测开关包括：基板; 底物上的支撑物; 感测板，其与所述支撑体的一侧连接并且与所述基板平行预定距离; 在感测板的端部的上表面上的受体结合区域; 当与受体结合区结合的受体选择性地结合到电或磁性活性配体时，引起感测板偏转的电场或磁场产生装置; 以及一对分离预定距离的开关电极，并且当感测板由于感测板的偏转而与基板接触时被连接。 目标材料不需要标注，不需要使用分析装置的荧光或电检测信号的信号处理，并且可以通过确认电流是否流过开关直接解码信号。

公开(公告)号：US07659149B2

公开(公告)日：2010-02-09

申请号：US11345790

申请日：2006-02-02

申请人： Kyu-tae Yoo ,  Sung-ouk Jung ,  Jun-hong Min ,  Ji-na Namgoong ,  Soo-hyung Choi ,  Jeo-young Shim

发明人： Kyu-tae Yoo ,  Sung-ouk Jung ,  Jun-hong Min ,  Ji-na Namgoong ,  Soo-hyung Choi ,  Jeo-young Shim

IPC分类号： C12Q1/68 ,  H01L21/66 ,  H01L21/00 ,  H01L21/336 ,  H01L29/80

CPC分类号： G01N33/54306

摘要： Provided is a method of sensing biomolecules using a bioFET, the method including: forming a layer including Au on a gate of the bioFET; forming a probe immobilized on a substrate separated from the gate by a predetermined distance, and a biomolecule having a thiol group (—SH) which is incompletely bonded to the probe; reacting the probe with a sample including a target molecule; and measuring a current flowing in a channel region between a source and a drain of the bioFET.

摘要翻译： 提供了一种使用bioFET感测生物分子的方法，该方法包括：在bioFET的栅极上形成包含Au的层; 形成固定在与栅极分离预定距离的基板上的探针，以及具有与探针不完全结合的硫醇基（-SH）的生物分子; 使探针与包含靶分子的样品反应; 以及测量在bioFET的源极和漏极之间的沟道区域中流动的电流。

公开(公告)号：US20060257627A1

公开(公告)日：2006-11-16

申请号：US11414711

申请日：2006-04-28

申请人： Jeo-young Shim ,  Soo-suk Lee ,  Sung-ouk Jung ,  Ji-na Namgoong ,  Kyu-tae Yoo

发明人： Jeo-young Shim ,  Soo-suk Lee ,  Sung-ouk Jung ,  Ji-na Namgoong ,  Kyu-tae Yoo

IPC分类号： B05D3/00 ,  B29C71/04 ,  B32B3/00

CPC分类号： B81C1/00119 ,  B01L3/5027 ,  Y10T428/24479

摘要： Provided is a method of manufacturing a microfludic device in which coating film patterns made of a coupling agent are formed in microchannels. The method includes: forming the coating film patterns made of the coupling agent on a Si substrate; selectively oxidizing coupling agent-free regions of the Si substrate having thereon the coating film patterns made of the coupling agent using an oxidizing agent with an oxidation potential from 1 to 2 V; and adhering a PDMS (polydimethylsiloxane) microchannel structure to the selectively oxidized Si substrate to form the microchannels.

摘要翻译： 本发明提供一种微流控装置的制造方法，其中，在微通道中形成由偶联剂形成的涂膜图案。 该方法包括：在Si衬底上形成由偶联剂制成的涂膜图案; 使用氧化电位为1〜2V的氧化剂选择性地氧化其上具有由偶联剂形成的涂膜图案的Si基板的无偶联剂区域; 并将PDMS（聚二甲基硅氧烷）微通道结构粘附到选择性氧化的Si衬底上以形成微通道。