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公开(公告)号：US20090280727A1
公开(公告)日：2009-11-12
申请号：US12118438
申请日：2008-05-09
申请人： LAKSHMANAN KARUPPIAH , Tetsuya Ishikawa , Donald J.K. Olgado , Allen L. D'Ambra , Hung Chih Chen
发明人： LAKSHMANAN KARUPPIAH , Tetsuya Ishikawa , Donald J.K. Olgado , Allen L. D'Ambra , Hung Chih Chen
CPC分类号： B24B41/005 , B24B27/0076 , B24B37/345
摘要： Embodiments of the present invention provide a polishing module configured to use in a polishing system. The polishing module comprises a base member, two polishing stations disposed on the base member, one load cup, and a carousel having three polishing heads.
摘要翻译： 本发明的实施例提供了一种配置成在抛光系统中使用的抛光模块。 抛光模块包括基座构件，设置在基座构件上的两个抛光台，一个负载杯和具有三个抛光头的圆盘传送带。
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公开(公告)号：US20090264049A1
公开(公告)日：2009-10-22
申请号：US12105924
申请日：2008-04-18
摘要： The present invention generally relates to a substrate transferring system. Particularly, the present invention relates to apparatus and method to effectively remove the chemical fume, vapor and other byproducts generated during a polishing process. One embodiment of the present invention provides an apparatus for polishing a substrate comprising a platen having a polishing surface configured to polish the substrate by contacting the substrate while moving relatively to the substrate, a polishing head configured to support the substrate and position the substrate to be in contact with the polishing surface during polishing, a solution nozzle configured to dispense a polishing solution on the polishing surface, and an exhaust assembly configured to remove fume, vapor and other byproducts generated during polishing.
摘要翻译： 本发明一般涉及基片转印系统。 特别地，本发明涉及有效地除去在抛光过程中产生的化学烟雾，蒸气和其它副产物的装置和方法。 本发明的一个实施例提供了一种用于抛光衬底的装置，包括具有抛光表面的压板，所述抛光表面被配置为通过在相对于衬底移动的同时使衬底接触而抛光衬底;抛光头，其被配置为支撑衬底并将衬底定位为 在抛光期间与抛光表面接触，配置成在研磨表面上分配抛光溶液的溶液喷嘴以及被配置为去除在抛光期间产生的烟雾，蒸气和其它副产物的排气组件。
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公开(公告)号：US20080268753A1
公开(公告)日：2008-10-30
申请号：US11739450
申请日：2007-04-24
IPC分类号： B24B1/00
CPC分类号： B24B37/30 , H01L21/6838
摘要： The present invention relates to a load cup configured to speed up substrate transferring to and from a carrier head and to reduce corrosion during the transferring. One embodiment of the present invention provides a non-contact substrate holder comprising a pedestal having a top surface configured to support a substrate, and at least one injection port configured to eject a high velocity liquid stream on the top surface of the pedestal, wherein the liquid stream in configured to secure the substrate on the pedestal without the substrate contacting the top surface of the pedestal.
摘要翻译： 本发明涉及一种负载杯，其被配置为加速基板向载体头转移和从载体头转移并减少转印期间的腐蚀。 本发明的一个实施例提供了一种非接触衬底保持器，其包括具有构造成支撑衬底的顶表面的基座和被配置为在基座的顶表面上喷射高速液体流的至少一个注入端口，其中， 液体流被配置成将基板固定在基座上，而基板不接触基座的顶面。
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公开(公告)号：US20100099342A1
公开(公告)日：2010-04-22
申请号：US12255442
申请日：2008-10-21
IPC分类号： B24D9/08
CPC分类号： B24B53/017
摘要： A method and apparatus for replacing a polishing pad conditioning disk is a chemical mechanical polishing system is provided. The apparatus comprises a disk load/unload station for unloading used conditioning disks from a pad conditioning assembly and loading unused conditioning disks onto the pad conditioning assembly, on or more disk storage stations for storing both used and unused conditioning disks, and a central robot having a range of motion sufficient for transferring both used an unused conditioning disks between the disk load/unload station and the one or more disk storage stations. Embodiments described herein reduce the length of system interruption by eliminating the need to safety lock out the system for the replacement of polishing pad conditioning disks.
摘要翻译： 一种用于更换抛光垫调节盘的方法和装置是提供化学机械抛光系统。 该装置包括用于从衬垫调节组件卸载使用的调节盘并将未使用的调节盘装载到衬垫调节组件上的多个盘装载/卸载站，用于存储使用和未使用的调节盘的两个或多个盘存储站，以及一个中央机器人， 足够的运动范围，用于在盘装载/卸载站和一个或多个盘存储站之间使用未使用的调节盘。 本文所描述的实施例通过消除安全锁定系统来更换抛光垫调节盘来减少系统中断的长度。
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公开(公告)号：US20090036036A1
公开(公告)日：2009-02-05
申请号：US12245759
申请日：2008-10-05
IPC分类号： B24B53/02
CPC分类号： B24B53/017 , B24B53/005 , B24B53/12
摘要： Apparatus and methods for conditioning a polishing pad are provided. An apparatus includes a base, an arm adapted to support a conditioning disk; and a drive mechanism coupled between the arm and the conditioning disk, wherein the drive mechanism is adapted to directly rotate the conditioning disk relative to the arm. Numerous other aspects are disclosed.
摘要翻译： 提供了用于调节抛光垫的装置和方法。 一种装置包括底座，适于支撑调节盘的臂; 以及联接在所述臂和所述调节盘之间的驱动机构，其中所述驱动机构适于相对于所述臂直接旋转所述调节盘。 公开了许多其他方面。
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公开(公告)号：US20090036035A1
公开(公告)日：2009-02-05
申请号：US12245758
申请日：2008-10-05
CPC分类号： B24B53/017 , B24B53/005 , B24B53/12
摘要： Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.
摘要翻译： 用于调理抛光垫的装置和方法包括基座，枢转地联接到基座并适于支撑调节盘的臂以及联接到基座和臂的致动器。 致动器适于使臂以线性可变量的力将调节盘压靠抛光垫。 用致动器产生第一力。 第一力通过线性可变量被缩放到通过调节盘施加到抛光垫的第二力。 公开了许多其他方面。
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公开(公告)号：US20070212983A1
公开(公告)日：2007-09-13
申请号：US11684969
申请日：2007-03-12
CPC分类号： B24B53/017 , B24B53/005 , B24B53/12
摘要： Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.
摘要翻译： 用于调理抛光垫的装置和方法包括基座，枢转地联接到基座并适于支撑调节盘的臂以及联接到基座和臂的致动器。 致动器适于使臂以线性可变量的力将调节盘压靠抛光垫。 用致动器产生第一力。 第一力通过线性可变量被缩放到通过调节盘施加到抛光垫的第二力。 公开了许多其他方面。
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公开(公告)号：US20090278081A1
公开(公告)日：2009-11-12
申请号：US12411261
申请日：2009-03-25
申请人： Hichem M'Saad , Lakshmanan Karuppiah , Hung Chih Chen , Jeonghoon Oh , Robert Lum , Stan D. Tsai , Cassio Conceicao , Ashish Bhatnagar , Michael Perry , Kadthala Narendrnath , Yosi Shacham-Diamand
发明人： Hichem M'Saad , Lakshmanan Karuppiah , Hung Chih Chen , Jeonghoon Oh , Robert Lum , Stan D. Tsai , Cassio Conceicao , Ashish Bhatnagar , Michael Perry , Kadthala Narendrnath , Yosi Shacham-Diamand
IPC分类号： C09K13/00
CPC分类号： B24B37/24
摘要： A method for forming a polishing media and an article of manufacture is described. The article of manufacture may be formed into a polishing article. The polishing article includes a polymer base material and a plurality of nano-scale structures disposed in or on the polymer base material.
摘要翻译： 描述了用于形成抛光介质和制造物品的方法。 制品可以形成为抛光制品。 抛光制品包括聚合物基材和设置在聚合物基材中或其上的多个纳米级结构。
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9.发明授权Systems and methods for substrate polishing end point detection using improved friction measurement 有权使用改进摩擦测量的基板抛光终点检测的系统和方法公开(公告)号：US09061394B2
公开(公告)日：2015-06-23
申请号：US13459079
申请日：2012-04-28
IPC分类号： B24B1/00 , B24B37/013 , B24B49/16
CPC分类号： B24B37/013 , B24B49/16
摘要： Methods, apparatus, and systems for polishing a substrate are provided. The invention includes an upper platen; a torque/strain measurement instrument coupled to the upper platen; and a lower platen coupled to the torque/strain measurement instrument and adapted to drive the upper platen to rotate through the torque/strain measurement instrument. In other embodiments, the invention includes an upper carriage; a side force measurement instrument coupled to the upper carriage; and a lower carriage coupled to the side force measurement instrument and adapted to support a polishing head. Numerous additional aspects are disclosed.
摘要翻译： 提供了用于抛光衬底的方法，装置和系统。 本发明包括上压板; 耦合到上压板的扭矩/应变测量仪器; 以及耦合到扭矩/应变测量仪器并适于驱动上压板旋转通过扭矩/应变测量仪器的下压板。 在其他实施例中，本发明包括一个上部托架; 耦合到上部托架的侧向力测量仪器; 以及耦合到所述侧向力测量仪器并适于支撑抛光头的下托架。 公开了许多附加方面。
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公开(公告)号：US08250695B2
公开(公告)日：2012-08-28
申请号：US12573500
申请日：2009-10-05
申请人： Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
发明人： Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
IPC分类号： A47L25/00
CPC分类号： B08B1/04
摘要： Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate.
摘要翻译： 本文所述的实施例涉及可用于刷清洁模块中的用于辊组件的装置和方法。 在一个实施例中，描述了辊组件。 辊组件包括具有至少两个基本上平行的相对侧壁的环形凹槽，所述至少两个基本上平行的相对侧壁适于沿着衬底的周边接触衬底的主表面，每个相对的侧壁包括具有预压缩尺寸小于 衬底的周边的厚度。
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