公开(公告)号：US11254576B2

公开(公告)日：2022-02-22

申请号：US16606962

申请日：2018-04-10

申请人： LG Chem, Ltd.

发明人： Jin Young Son ,  Cheol Woo Kim ,  Byoung Hoon Ahn ,  Hyun Sik Chae ,  Sang Hoon Choy

IPC分类号： C01B32/19

摘要： A method of preparing graphene, including preparing graphite; and putting the graphite in the inside of a vessel and applying vibration at a frequency of 55 Hz to 65 Hz to the vessel.

公开(公告)号：US11050046B2

公开(公告)日：2021-06-29

申请号：US16615021

申请日：2018-12-14

申请人： LG Chem, Ltd.

发明人： Taek Soo Lee ,  Cheol Woo Kim ,  Sang Hoon Choy

IPC分类号： H01M4/04

摘要： The present invention relates to an electrode slurry coating apparatus comprising a lower die applying electrode slurry on a collector, an intermediate die, an upper die, a first discharge part primarily applying the electrode slurry on the collector to form a first coating layer; an intermediate pressing part pressing the first coating layer to adjust a thickness of the first coating layer; a second discharge part secondarily applying the electrode slurry on a surface of the first coating layer to form a second coating layer; and an upper pressing part pressing the first coating layer and the second coating layer, which are stacked, at the same time to adjust a thickness of each of the first coating layer and the second coating layer, wherein the first discharge part has a width less than that of the second discharge part.

公开(公告)号：US11448597B2

公开(公告)日：2022-09-20

申请号：US16652290

申请日：2018-12-17

申请人： LG Chem, Ltd.

发明人： Jin Young Son ,  Moo Yong Shin ,  Taek Soo Lee ,  Cheol Woo Kim ,  Sang Hoon Choy

IPC分类号： G01N21/57 ,  H01M4/04 ,  G01N21/35 ,  G01N21/47 ,  G01N21/65 ,  G01N21/3554 ,  G01N21/25 ,  H01M4/88 ,  G01N15/14

摘要： The present invention relates to an apparatus and method for monitoring a dry state of an electrode substrate in which electrode slurry is applied to a collector. The monitoring method comprises emitting light onto a surface of the electrode substrate; receiving the light reflected by the surface of the electrode substrate; and analyzing a luminous intensity or spectrum of the received light to estimate a drying rate of the electrode substrate.
The apparatus includes a light emitting part emitting light from a light source onto a surface of the electrode substrate; a light receiving part receiving the light reflected by the surface of the electrode substrate; and a computing device analyzing a luminous intensity or spectrum of the received light and comparing analyzed characteristics of the light with the reference data of the reflected light to the drying rate of the electrode substrate.

公开(公告)号：US20200185696A1

公开(公告)日：2020-06-11

申请号：US16615021

申请日：2018-12-14

申请人： LG Chem, Ltd.

发明人： Taek Soo Lee ,  Cheol Woo Kim ,  Sang Hoon Choy

IPC分类号： H01M4/04

摘要： The present invention relates to an electrode slurry coating apparatus comprising a lower die applying electrode slurry on a collector, an intermediate die, and an upper die, a first discharge part primarily applying the electrode slurry on the collector to form a first coating layer; an intermediate pressing part pressing the first coating layer to adjust a thickness of the first coating layer; a second discharge part secondarily applying the electrode slurry on a surface of the first coating layer to form a second coating layer; and an upper pressing part pressing the first coating layer and the second coating layer, which are stacked, at the same time to to adjust a thickness of each of the first coating layer and the second coating layer, wherein the first discharge part has a width less than that of the second discharge part.

公开(公告)号：US11511309B2

公开(公告)日：2022-11-29

申请号：US17278963

申请日：2020-08-31

申请人： LG Chem, Ltd.

发明人： Ki Tae Kim ,  Do Hyun Lee ,  Taek Soo Lee ,  Cheol Woo Kim ,  Young Joon Jo ,  Sang Hoon Choy

IPC分类号： B05C5/02 ,  B05C9/06 ,  B05C11/10 ,  H01M4/04

摘要： The present invention relates to a double slit coating die, and an electrode active material coating apparatus comprising same, the double slit coating die comprising first to fourth blocks which are positioned sequentially adjacent to each other, and having a structure in which the positions of the first and second blocks can move in a direction tilted at an angle θ with respect to the interface between the second and third blocks. The present invention has the effects of preventing slip surfaces between blocks constituting the die from spreading apart, and reducing offset in a coating process.

公开(公告)号：US20200331759A1

公开(公告)日：2020-10-22

申请号：US16606962

申请日：2018-04-10

申请人： LG Chem, Ltd.

发明人： Jin Young Son ,  Cheol Woo Kim ,  Byoung Hoon Ahn ,  Hyun Sik Chae ,  Sang Hoon Choy

IPC分类号： C01B32/19

摘要： A method of preparing graphene, including preparing graphite; and putting the graphite in the inside of a vessel and applying vibration at a frequency of 55 Hz to 65 Hz to the vessel.

公开(公告)号：US11424433B2

公开(公告)日：2022-08-23

申请号：US16615373

申请日：2018-11-20

申请人： LG CHEM, LTD.

发明人： Taek Soo Lee ,  Jung Min Yang ,  Sang Hoon Choy ,  Cheol Woo Kim

IPC分类号： H01M4/04 ,  H01M4/70 ,  H01M50/531

摘要： A method for manufacturing an electrode having an irregular shape through a simple process while minimizing the amount of wasted electrode active material is provided. The method results in first to third coating areas formed to be spaced apart from each other on a collector, a plurality of fourth coating areas formed between the first coating area and the second coating area, and a plurality of fifth coating areas formed between the second coating area and the third coating area. The plurality of fourth coating areas and the plurality of fifth coating areas are dislocated from each other when viewed from one side in a width direction of the collector.

公开(公告)号：US20220006064A1

公开(公告)日：2022-01-06

申请号：US17278919

申请日：2020-09-16

申请人： LG Chem, Ltd.

发明人： Taek Soo Lee ,  Young Joon Jo ,  Sang Hoon Choy ,  Ki Tae Kim ,  Ji Hee Yoon ,  Cheol Woo Kim

IPC分类号： H01M4/04 ,  B05C5/02 ,  B05C11/10 ,  H01M10/0525

摘要： The present invention relates to electrode slurry coating apparatus and method, the present invention ultimately allowing the process efficiency to be increased and rate of errors to be reduced when double-layer structured active material layers are formed by temporally adjusting the height of first and second discharge outlets through which active material is discharged.

公开(公告)号：US20210354166A1

公开(公告)日：2021-11-18

申请号：US17278963

申请日：2020-08-31

申请人： LG Chem, Ltd.

发明人： Ki Tae Kim ,  Do Hyun Lee ,  Taek Soo Lee ,  Cheol Woo Kim ,  Young Joon Jo ,  Sang Hoon Choy

IPC分类号： B05C5/02

摘要： The present invention relates to a double slit coating die, and an electrode active material coating apparatus comprising same, the double slit coating die comprising first to fourth blocks which are positioned sequentially adjacent to each other, and having a structure in which the positions of the first and second blocks can move in a direction tilted at an angle θ with respect to the interface between the second and third blocks. The present invention has the effects of preventing slip surfaces between blocks constituting the die from spreading apart, and reducing offset in a coating process.

公开(公告)号：US20200240915A1

公开(公告)日：2020-07-30

申请号：US16652290

申请日：2018-12-17

申请人： LG Chem, Ltd.

发明人： Jin Young Son ,  Moo Yong Shin ,  Taek Soo Lee ,  Cheol Woo Kim ,  Sang Hoon Choy

IPC分类号： G01N21/57 ,  H01M4/04

摘要： The present invention relates to an apparatus and method for monitoring a dry state of an electrode substrate in which electrode slurry is applied to a collector. The monitoring method comprises emitting light onto a surface of the electrode substrate; receiving the light reflected by the surface of the electrode substrate; and analyzing a luminous intensity or spectrum of the received light to estimate a drying rate of the electrode substrate.The apparatus includes a light emitting part emitting light from a light source onto a surface of the electrode substrate; a light receiving part receiving the light reflected by the surface of the electrode substrate; and a computing device analyzing a luminous intensity or spectrum of the received light and comparing analyzed characteristics of the light with the reference data of the reflected light to the drying rate of the electrode substrate.