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    Preparations for use in solid phase immunoassays comprising monoclonal antibodies covalently embedded in their immobilized hybridoma cells
    2.
    发明授权
    Preparations for use in solid phase immunoassays comprising monoclonal antibodies covalently embedded in their immobilized hybridoma cells 失效
    用于固相免疫测定的制剂，其包含共价嵌入其固定的杂交瘤细胞中的单克隆抗体

    公开(公告)号：US4727023A

    公开(公告)日：1988-02-23

    申请号：US773931

    申请日：1985-09-09

    Applicant: Lynn Wang ,  Michael Inbar

    Inventor： Lynn Wang ,  Michael Inbar

    IPC: G01N33/531 ,  G01N33/532 ,  G01N33/577 ,  G01N33/53 ,  C12N15/00 ,  G01N33/558

    CPC classification number: G01N33/532 ,  G01N33/531 ,  G01N33/577 ,  Y10S435/968 ,  Y10S436/804

    Abstract: A reagent for use in solid phase immunoassay diagnostics comprises a matrix of non-active hybridoma cells embedded with its self-produced, covalently bound, actively presented monoclonal antibodies.The solid phase reagent according to the invention is prepared by incubating in vitro a culture medium containing active hybridoma cells capable of producing monoclonal antibodies, allowing the formation of antibodies to proceed, separating and washing said cells, resuspending the cells in a buffer solution, adding to the resulting suspension an inactivator substance capable of converting active hybridoma cells into the non-active state.

    Abstract translation: 用于固相免疫测定诊断的试剂包括嵌入其自产的共价结合的积极呈递的单克隆抗体的非活性杂交瘤细胞的基质。 根据本发明的固相试剂通过体外培养含有能够产生单克隆抗体的活性杂交瘤细胞的培养基，允许形成抗体进行，分离和洗涤所述细胞，将细胞重新悬浮在缓冲溶液中，加入 向所得悬浮液提供能够将活性杂交瘤细胞转化为非活性状态的灭活剂物质。

    Method of treating androgen-dependent disorders
    3.
    发明授权
    Method of treating androgen-dependent disorders 失效
    治疗雄激素依赖性疾病的方法

    公开(公告)号：US06710037B2

    公开(公告)日：2004-03-23

    申请号：US10137057

    申请日：2002-05-01

    Applicant: Lynn Wang ,  Richard W. Bond ,  Jonathan A. Pachter

    Inventor： Lynn Wang ,  Richard W. Bond ,  Jonathan A. Pachter

    IPC: A61K4800

    CPC classification number: C12N15/86 ,  A61K38/443 ,  A61K48/00 ,  C12N2710/10343 ,  A61K2300/00

    Abstract: Novel methods of treating subjects afflicted with an androgen-dependent disorder, such as prostate cancer and benign prostatic hyperplasia are disclosed. Specifically, methods of treating androgen-dependent disorders by introducing a polypeptide or a polynucleotide encoding the polypeptide, which enhances inactivation of active androgens, are described.

    Abstract translation: 公开了治疗患有雄激素依赖性疾病如前列腺癌和良性前列腺增生的受试者的新方法。 具体地，描述了通过引入增强活化雄激素失活的多肽或编码多肽的多核苷酸来治疗雄激素依赖性病症的方法。

    Automated design layout pattern correction based on context-aware patterns
    4.
    发明授权
    Automated design layout pattern correction based on context-aware patterns 有权
    基于上下文感知模式的自动设计布局模式校正

    公开(公告)号：US08924896B2

    公开(公告)日：2014-12-30

    申请号：US13755374

    申请日：2013-01-31

    Applicant: Lynn Wang ,  Vito Dai ,  Luigi Capodieci

    Inventor： Lynn Wang ,  Vito Dai ,  Luigi Capodieci

    IPC: G06F17/50

    CPC classification number: G06F17/50 ,  G06F17/5081 ,  Y02T10/82

    Abstract: A process and apparatus are provided for automated pattern-based semiconductor design layout correction. Embodiments include scanning a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout based on a match with a pre-characterized difficult-to-manufacture pattern, determining a corrected pattern based on a pre-determined correlation between the corrected pattern and the pre-characterized difficult-to-manufacture pattern, and replacing the difficult-to-manufacture pattern with the corrected pattern within the drawn semiconductor design layout.

    Abstract translation: 提供了一种用于基于自动图案的半导体设计布局校正的工艺和装置。 实施例包括扫描绘制的半导体设计布局以基于与预先表征的难以制造的图案的匹配来确定所绘制的半导体设计布局内的难以制造的图案，基于预定的相关性来确定校正的图案 在校正图案和预先表征的难以制造图案之间，并且在所绘制的半导体设计布局内用修正图案代替难以制造的图案。

    Stitch insertion for reducing color density differences in double patterning technology (DPT)
    6.
    发明授权
    Stitch insertion for reducing color density differences in double patterning technology (DPT) 有权
    缝合插入以减少双重图案化技术（DPT）中的色彩密度差异

    公开(公告)号：US08918745B2

    公开(公告)日：2014-12-23

    申请号：US13803048

    申请日：2013-03-14

    Applicant: Lynn Wang ,  Sriram Madhavan ,  Luigi Capodieci

    Inventor： Lynn Wang ,  Sriram Madhavan ,  Luigi Capodieci

    IPC: G06F17/50

    CPC classification number: G06F17/5068 ,  G03F1/70 ,  G03F7/70466 ,  G03F7/70475

    Abstract: Methodology enabling a reduction in a density difference between two complementary exposure masks and/or windows of a layout and an apparatus for performing the method are disclosed. Embodiments include: determining a layer of an IC design having features to be resolved by first and second masks; determining a difference of density by comparing a first density of a first set of the features with a second density of a second set of the features; determining a region on the layer of a first feature to be resolved by the first mask; and inserting, within the region, a polygon to be resolved by the second mask based on the difference of density.

    Abstract translation: 公开了能够降低布局的两个互补曝光掩模和/或窗口之间的密度差的方法，以及用于执行该方法的装置。 实施例包括：确定具有要由第一和第二掩模解决的特征的IC设计的层; 通过将第一组特征的第一密度与第二组特征的第二密度进行比较来确定密度差; 确定要由第一掩模解析的第一特征的层上的区域; 以及基于所述密度差在所述区域内插入由所述第二掩模求解的多边形。

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