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公开(公告)号:US20170199402A1
公开(公告)日:2017-07-13
申请号:US14946261
申请日:2015-11-19
CPC分类号: G02F1/0955 , G02B6/122 , G02B6/132 , G02B2006/12061 , G02B2006/1208 , G02B2006/12109 , G02B2006/12121 , G02B2006/12123
摘要: Methods for forming magneto-optical films for integrated photonic devices and integrated photonic devices incorporating same are described. An optical isolator or any nonreciprocal photonic component for an integrated photonic device can be fabricated by depositing a functional garnet layer directly onto a non-garnet substrate; depositing a seed garnet layer on the functional garnet layer; and after depositing both the functional garnet layer and the seed layer performing an annealing process. Since the seed garnet layer crystalizes faster than the functional garnet layer, crystallization of the functional garnet layer can be accomplished directly on the non-garnet substrate during a single annealing step for the seed layer and the functional garnet layer.