公开(公告)号：US08985880B2

公开(公告)日：2015-03-24

申请号：US13177997

申请日：2011-07-07

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

IPC分类号： G03D5/00 ,  G03B27/32 ,  H01L21/67

CPC分类号： G03F7/16 ,  H01L21/6715

摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

摘要翻译： 在一个实施例中，涂层和显影装置包括具有两个早期涂覆单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。 该装置具有至少两个适于异常的操作模式M1和M2。 在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。 在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。

公开(公告)号：US20120116567A1

公开(公告)日：2012-05-10

申请号：US13281535

申请日：2011-10-26

申请人： Makoto HAYAKAWA ,  Hiroshi Tomita ,  Tatsuhei Yoshida

发明人： Makoto HAYAKAWA ,  Hiroshi Tomita ,  Tatsuhei Yoshida

IPC分类号： G06F19/00

CPC分类号： H01L21/67288 ,  H01L21/67178 ,  H01L21/67276 ,  H01L21/67745

摘要： A coating and developing treatment apparatus includes a substrate transfer mechanism; a defect inspection section; means for controlling transfer of a substrate; means for classifying a defect based on the state of the defect; means for storing a transfer route of the substrate by the substrate transfer mechanism when the substrate has been treated by treatment sections; and means for specifying, based on a kind of the defect classified by the defect classification means and the transfer route of the substrate stored in the storage means, a treatment section which is a cause of occurrence of the classified defect, and judging presence or absence of an abnormality of the specified treatment section, wherein the transfer control means controls the substrate transfer mechanism to transfer a substrate bypassing the treatment section which has been judged to be abnormal by the defective treatment specification means.

摘要翻译： 涂布显影处理装置包括基板转印机构; 缺陷检查部; 用于控制基板转印的装置; 基于缺陷状态对缺陷进行分类的手段; 用于在基板被处理部处理时通过基板转印机构存储基板的转印路径的装置; 以及用于基于由缺陷分类装置分类的缺陷的种类和存储在存储装置中的基板的传送路线来指定作为分类缺陷的发生原因的处理部分，并且判断是否存在 指定处理部的异常，其中转移控制装置控制基板转移机构，以传递旁路通过缺陷处理指定装置判断为异常的处理部的基板。

公开(公告)号：US20120013859A1

公开(公告)日：2012-01-19

申请号：US13177997

申请日：2011-07-07

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

IPC分类号： G03B27/52

CPC分类号： G03F7/16 ,  H01L21/6715

摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

摘要翻译： 在一个实施例中，涂层和显影装置包括具有两个早期涂覆单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。 该装置具有至少两个适于异常的操作模式M1和M2。 在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。 在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。

公开(公告)号：US09026240B2

公开(公告)日：2015-05-05

申请号：US13281535

申请日：2011-10-26

申请人： Makoto Hayakawa ,  Hiroshi Tomita ,  Tatsuhei Yoshida

发明人： Makoto Hayakawa ,  Hiroshi Tomita ,  Tatsuhei Yoshida

IPC分类号： G06F19/00 ,  G06F17/50 ,  G06F11/00 ,  G06F7/02 ,  H01L21/67 ,  H01L21/677

CPC分类号： H01L21/67288 ,  H01L21/67178 ,  H01L21/67276 ,  H01L21/67745

摘要： A coating and developing treatment apparatus includes a substrate transfer mechanism; and a defect inspection section. A transfer control part controls transfer of a substrate. A defect classification part classifies a defect based on the state of the defect. A storage part stores a transfer route of the substrate by the substrate transfer mechanism when the substrate has been treated by treatment sections. A defective treatment specification part specifies, based on a kind of the defect classified by the defect classification part and the transfer route of the substrate stored in the storage part, a treatment section which is a cause of occurrence of the classified defect, and judges presence or absence of an abnormality of the specified treatment section. The transfer control part controls the substrate transfer mechanism to transfer a substrate bypassing the treatment section which has been judged to be abnormal by the defective treatment specification part.

摘要翻译： 涂布显影处理装置包括基板转印机构; 和缺陷检查部。 转印控制部件控制基板的转印。 缺陷分类部根据缺陷的状态对缺陷进行分类。 当基板已经被处理部处理时，存储部件通过基板传送机构来存储基板的传送路径。 有缺陷的处理规范部分基于由缺陷分类部分分类的缺陷的种类和存储在存储部分中的基板的传送路径，指定作为分类缺陷的发生的原因的处理部，并且判断存在 或没有指定治疗部位的异常。 转印控制部分控制基板转印机构，以传递由缺陷处理指定部分判断为异常的处理部旁路的基板。