摘要:
A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
摘要翻译:提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者,清洁片包括维氏硬度不低于10MPa的清洁层。
摘要:
A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
摘要翻译:提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者,清洁片包括维氏硬度不低于10MPa的清洁层。
摘要:
A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
摘要翻译:提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者,清洁片包括维氏硬度不低于10MPa的清洁层。
摘要:
A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
摘要翻译:提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者,清洁片包括维氏硬度不低于10MPa的清洁层。
摘要:
A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10.
摘要翻译:提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者,清洁片包括维氏硬度不低于10的清洁层。
摘要:
A cleaning sheet which comprises a cleaning layer having a tensile stress at 10% strain of from 0.3 to 3,000 N/mm2 or a carrying member with a cleaning function wherein at least one side of the carrying member has a cleaning layer having a tensile stress at 10% strain of from 0.3 to 3,000 N/mm2, particularly, a cleaning sheet or a carrying member with a cleaning function of the aforementioned constructions, wherein the aforementioned cleaning layer comprises a resin layer having been hardened by an active energy source or a polymer resin having heat resistance.
摘要翻译:一种清洁片,其包括具有0.3至3,000N / mm 2的10%应变下的拉伸应力的清洁层或具有清洁功能的承载构件,其中所述承载构件的至少一侧具有拉伸应力在 特别是具有上述结构的清洁功能的清洁片或承载构件,其中上述清洁层包括已被活性能源或聚合物硬化的树脂层, 具有耐热性的树脂。
摘要:
An aim of the invention is to provide a cleaning member which causes no contamination of a substrate processing equipment by ionic impurities in the removal of foreign matters attached to the interior of the equipment through cleaning by the conveyance thereof into the equipment, a cleaning member which causes little contamination of a substrate processing equipment by metal impurities attributed to a protective film in the removal of foreign matters attached to the interior of the equipment through cleaning by the conveyance thereof into the equipment and a cleaning member which causes no contamination of a substrate processing equipment by metal impurities in the removal of foreign matters attached to the interior of the equipment through cleaning by the conveyance thereof into the equipment. The means for solving the aims of the invention concerns a cleaning sheet comprising a cleaning layer provided on one side of a base material, from which cleaning layer F−, Cl−, Br−, NO2−, NO3−, PO43−, SO42−, Na+, NH4+ and K+ are extractable with pure water each in an amount of not greater than 20 ppm (as extracted under boiling at 120° C. for 1 hour), and a pressure-sensitive adhesive layer provided on the other, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer and a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment; a cleaning sheet comprising a releasable protective film laminated on a cleaning layer, wherein the protective film is formed by a material from which metal elements such as Na, K, Ca, Mg, Al, Ti, Cr, Mn, Fe, Co, Ni, Cu and Zn or compounds thereof are transferred to a silicon wafer each in an amount of not greater than 1×1012 atoms/cm2 as calculated in terms of metal element when the protective film is brought into contact with (the mirror surface of) the silicon wafer at 23° C. for 1 minute, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer and a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment with the releasable protective film peeled off the cleaning layer; and a cleaning sheet comprising a cleaning layer provided on one side of a base material, which cleaning layer containing metal elements such as Na, K, Mg, Al, Ca, Ti, Cr, Mn, Fe, Co, Ni, Cu and Zn or compounds thereof each in an amount of not greater than 5 ppm (μg/g) as calculated in terms of metal element, and a pressure-sensitive adhesive layer provided on the other, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer and a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment.
摘要:
A cleaning sheet has a cleaning layer having a surface resistivity not less than 1×1013 &OHgr;/□. In a method of manufacturing a conveying member with a cleaning function, for sticking the cleaning sheet, in which the cleaning layer formed of an adhesive that is polymerized/cured by an active energy is provided onto one surface of a base material and an ordinary adhesive layer is provided onto the other surface thereof, onto the conveying member via an ordinary adhesive layer to have a shape larger than the shape of the conveying member and then cutting the cleaning sheet along a shape of the conveying member, wherein a polymerizing/curing reaction of the cleaning layer is carried out after the cleaning sheet is cut out into the shape of the conveying member.
摘要:
A low-staining adhesive sheet provided with an adhesive layer containing as the main component a pressure-sensitive adhesive polymer on a base film, wherein the pressure-sensitive adhesive polymer is substantially free from oligomeric low-molecular weight matters; and a method for removing a resist material by using this low-staining adhesive sheet. This low-staining adhesive sheet gives no organic staining matters remaining on the surface of article (for example, substrate) to be used as an adherend and is useful in removing a resist material and foreign matters, and re-peeling surface-protectors, masking materials, and other materials.
摘要:
A cleaning sheet comprises a cleaning layer provided on one side of a base material, from which cleaning layer F−, Cl−, Br−, NO2−, NO3−, PO43−, SO42−, Na+, NH4+ and K+ are extractable with pure water each in an amount of not greater than 20 ppm, when extracted under boiling at 120° C. for 1 hour, and a pressure-sensitive adhesive layer provided on the other side of the base material, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer. The present disclosure also relates to a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment.