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    DRYING DEVICE AND SANITARY WASHING APPARATUS EQUIPPED WITH THE SAME
    3.
    发明申请
    DRYING DEVICE AND SANITARY WASHING APPARATUS EQUIPPED WITH THE SAME 审中-公开
    干燥设备和具有相同设备的卫生洗涤设备

    公开(公告)号：US20090313752A1

    公开(公告)日：2009-12-24

    申请号：US12302828

    申请日：2007-05-30

    申请人： Keijirou Kunimoto ,  Hideki Ohno ,  Shigeru Shirai ,  Yoshiharu Shimada

    发明人： Keijirou Kunimoto ,  Hideki Ohno ,  Shigeru Shirai ,  Yoshiharu Shimada

    IPC分类号： A47K17/00

    CPC分类号： E03D9/08 ,  A47K10/48

    摘要： A drying device in accordance with the invention is characterized by including: an air blowing portion for blowing pressurized air so as to dry a surface to be dried by a jet of pressurized air whose abutment area to the surface to be dried is narrower than the surface to be dried; and a moving unit for moving the air blowing portion while the jet is being blown such that the jet blown from the air blowing portion sequentially sweeps a substantially entire surface of the surface to be dried, wherein the moving unit includes a first moving device for moving the air blowing portion in a state in which a blowing direction of the jet is being maintained so as to form a predetermined angle with respect to a moving direction of the air blowing portion and a second moving device for moving the air blowing portion in a direction different from that of the moving direction.For example, this first moving device moves in an advancing/retracting direction of the air blowing portion, and the second moving device deflects the blowing direction of the jet.

    摘要翻译： 根据本发明的干燥装置的特征在于包括：吹风部分，用于吹送加压空气，以便通过加压空气的喷射干燥待干燥的表面，其与待干燥表面的邻接面积比表面窄 待干燥 以及移动单元，用于在喷射流动的同时使吹风部移动，使得从吹风部吹出的喷流顺序地扫掠要干燥的表面的大致整个表面，其中，移动单元包括用于移动的第一移动装置 在保持喷射吹出方向以相对于吹风部的移动方向形成预定角度的状态下的吹风部分和用于沿空气吹送部分的方向移动的第二移动装置 不同于移动方向。 例如，该第一移动装置沿着送风部的前进/后退方向移动，第二移动装置偏转射流的吹出方向。

    Hygiene washing apparatus
    4.
    发明申请
    Hygiene washing apparatus 审中-公开
    卫生洗涤设备

    公开(公告)号：US20050246828A1

    公开(公告)日：2005-11-10

    申请号：US10525770

    申请日：2003-08-22

    申请人： Shigeru Shirai ,  Tomohide Matsumoto ,  Hideki Ohno ,  Kazushige Nakamura ,  Toshinari Matsumoto ,  Mitsuyuki Furubayashi ,  Takemi Oketa

    发明人： Shigeru Shirai ,  Tomohide Matsumoto ,  Hideki Ohno ,  Kazushige Nakamura ,  Toshinari Matsumoto ,  Mitsuyuki Furubayashi ,  Takemi Oketa

    IPC分类号： E03D9/08

    CPC分类号： E03D9/08

    摘要： When the human body is washed, washing water is sprayed on a surface to be washed of the human body from a posterior nozzle and a bidet nozzle. On the other hand, when the human body is not washed, the posterior nozzle and the bidet nozzle are subjected to high-temperature cleaning by a nozzle cleaning nozzle. When it is detected that a sanitary washing apparatus has not been employed yet, the posterior nozzle and the bidet nozzle are allowed to be cleaned by the nozzle cleaning nozzle by a controller. After a cleaning operation is terminated, a user is notified that the cleaning operation is terminated by a notification lamp and a speaker. A scale inhibiting material supply device is interposed in a pipe on the upstream side of an instantaneous heating device by the nozzle cleaning nozzle.

    摘要翻译： 当人体被洗涤时，将洗涤水从后喷嘴和坐浴盆喷嘴喷射到要洗涤的人体表面上。 另一方面，当人体未被洗涤时，后喷嘴和坐浴喷嘴通过喷嘴清洗喷嘴进行高温清洗。 当检测到尚未使用卫生洗涤装置时，通过控制器允许后喷嘴和坐浴盆喷嘴被喷嘴清洁喷嘴清洁。 在清洁操作终止之后，通知使用者通知灯和扬声器终止清洁操作。 防垢材料供给装置通过喷嘴清洁喷嘴插入到瞬时加热装置的上游侧的管中。

    Sanitary washing apparatus
    5.
    发明授权
    Sanitary washing apparatus 有权
    卫生洗衣机

    公开(公告)号：US07191473B2

    公开(公告)日：2007-03-20

    申请号：US10341445

    申请日：2003-01-14

    申请人： Tomohide Matsumoto ,  Hideki Ohno ,  Kazushige Nakamura ,  Shigeru Shirai ,  Hiroaki Fujii ,  Shinichi Maruyama ,  Muneo Tao

    发明人： Tomohide Matsumoto ,  Hideki Ohno ,  Kazushige Nakamura ,  Shigeru Shirai ,  Hiroaki Fujii ,  Shinichi Maruyama ,  Muneo Tao

    IPC分类号： A47K3/022

    CPC分类号： E03D9/08 ,  B05B1/1636 ,  B05B1/169

    摘要： When a user sets water power using a water power adjustment switch in a remote control device, a controller controls the period of pressure fluctuations, the width of pressure fluctuations, and the central pressure of the discharge pressure of a pump on the basis of a signal transmitted by radio from the remote control device. When the user sets the divergent angle of washing water using a washing area adjustment switch in the remote control device, the controller controls the divergent angle of the washing water sprayed from a posterior nozzle on the basis of the signal transmitted by radio from the remote control device. Consequently, the washing water supplied to a side surface of a cylindrical swirl chamber from a first flow path in the posterior nozzle is sprayed from a spray hole as dispersed spiral flow, and the washing water supplied to a lower part of the cylindrical swirl chamber from a second flow path in the posterior nozzle is sprayed from the spray hole as linear flow.

    摘要翻译： 当用户使用遥控装置中的水力调节开关来设置水力时，控制器基于信号控制压力波动的周期，压力波动的宽度和泵的排出压力的中心压力 通过无线电从遥控装置发射。 当用户使用遥控装置中的洗涤区域调节开关设定洗涤水的发散角时，控制器基于通过无线电从遥控器发送的信号控制从后喷嘴喷射的洗涤水的发散角度 设备。 因此，从喷嘴的第一流路向圆筒形涡流室的侧面供给的洗涤水以分散的螺旋流从喷雾孔喷出，从圆筒形涡流室的下部供给的洗涤水从 后喷嘴中的第二流路作为线性流从喷雾孔喷射。

    Plant monitoring apparatus and storage medium
    7.
    发明授权
    Plant monitoring apparatus and storage medium 有权
    工厂监控设备和存储介质

    公开(公告)号：US06950766B2

    公开(公告)日：2005-09-27

    申请号：US10297805

    申请日：2001-06-13

    申请人： Masami Okamoto ,  Shigeru Shirai

    发明人： Masami Okamoto ,  Shigeru Shirai

    IPC分类号： G08B25/00 ,  G05B9/02 ,  G05B15/02 ,  G05B23/02 ,  G08B29/06 ,  G06F19/00 ,  G06F11/30

    CPC分类号： G05B23/0264

    摘要： A plant monitoring apparatus and a storage medium which allow engineering efficiency and data reliability to be improved are provided. There are disposed TAG databases 11a and 11b which store, according to an identifier, fixed parameters which are shared by a monitoring device 2 and a controlling device 3 composing the plant monitoring apparatus 1 and which are correlated with each input point. A distributing means 8 distributes fixed parameters edited by a database editing means 7 to both the monitoring device 2 and the controlling device 3 at a time.

    摘要翻译： 提供了能够提高工程效率和数据可靠性的设备监视装置和存储介质。 存在根据标识符存储由监视装置2共享的固定参数和组成工厂监控装置1并与每个输入点相关的控制装置3的TAG数据库11a和11b。 分配装置8一次将由数据库编辑装置7编辑的固定参数分发给监视装置2和控制装置3。

    Warm-water washing device
    8.
    发明授权
    Warm-water washing device 失效
    温水洗涤装置

    公开(公告)号：US5970528A

    公开(公告)日：1999-10-26

    申请号：US793904

    申请日：1997-05-23

    申请人： Shigeru Shirai ,  Hiroaki Yoshida

    发明人： Shigeru Shirai ,  Hiroaki Yoshida

    IPC分类号： E03D9/08 ,  F24D17/00

    CPC分类号： F24D17/0073 ,  E03D9/08

    摘要： The present invention relates to a warm water washing device for washing a human body and aims to pasteurize an inside of a water flowing route which is difficult to clean and keep the device hygienic without an outbreak of pollution due to fungi and molds. A warm water washing device according to the present invention provides with a discharge nozzle 22 for discharging warm water for washing a human body and pasteurization control means 34 for controlling the function to pasteurize the discharge nozzle 22 and a hot water course 23 to discharge nozzle 22.

    摘要翻译： PCT No.PCT / JP96 / 01892 Sec。 371日期1997年5月23日 102（e）日期1997年5月23日PCT提交1996年7月8日PCT公布。 出版物WO97 / 03255 日本1997年1月30日本发明涉及一种用于洗涤人体的温水洗涤装置，其目的是将难以清洁并保持装置卫生的水流路线的内部巴氏消毒而不会由于真菌而引起污染， 模具 根据本发明的温水洗涤装置具有用于排出用于洗涤人体的温水的排出喷嘴22和用于控制排出喷嘴22和热水流路23的功能的巴氏消毒控制装置34，以排出喷嘴22 。

    Electrophotographic layered light receiving member containing A-Si and Ge
    9.
    发明授权
    Electrophotographic layered light receiving member containing A-Si and Ge 失效
    含有A-Si和Ge的电子照相层状光接收元件

    公开(公告)号：US5545500A

    公开(公告)日：1996-08-13

    申请号：US246556

    申请日：1994-05-19

    申请人： Shigeru Shirai ,  Shigeru Ohno

    发明人： Shigeru Shirai ,  Shigeru Ohno

    IPC分类号： G03G5/082 ,  G03G5/147 ,  G03G5/82

    CPC分类号： G03G5/08242 ,  G03G5/08228

    摘要： There is provided an improved light receiving member comrpsing a substrate and a light receiving layer formed by laminating a first layer having photoconductivity which is constituted with an amorphous material containing silicon atoms as the main constituent atoms and germanium atoms, and a second layer constituted with an amorphous material containing silicon atoms, carbon atoms and an element for controlling the conductivity. The germanium atoms contained in the first layer are in the state of being unevenly distributed in the entire layer region or in the partial layer region adjacent to the substrate. The first layer may contain one or more kinds selected from an element for controlling the conductivity, oxygen atoms and nitrogen atoms in the entire layer region on in the partial layer region.

    摘要翻译： 提供了一种改进的光接收元件，其包括基底和通过层叠具有光导电性的第一层而形成的光接收层，该第一层由含有硅原子的非晶态材料作为主要成分原子和锗原子构成，第二层由 含有硅原子的无定形材料，碳原子和用于控制导电性的元素。 包含在第一层中的锗原子处于不均匀分布在整个层区域或与衬底相邻的部分层区域中的状态。 第一层可以包含选自用于控制部分层区域中的整个层区域中的导电性，氧原子和氮原子的元素中的一种或多种。

    Process for photo-assisted epitaxial growth using remote plasma with in-situ etching
    10.
    发明授权
    Process for photo-assisted epitaxial growth using remote plasma with in-situ etching 失效
    使用远程等离子体进行原位蚀刻的光辅助外延生长工艺

    公开(公告)号：US4918028A

    公开(公告)日：1990-04-17

    申请号：US262233

    申请日：1988-10-21

    申请人： Shigeru Shirai

    发明人： Shigeru Shirai

    IPC分类号： C23C16/24 ,  C23C16/452 ,  G02F1/15 ,  H01L21/205

    CPC分类号： G02F1/1527 ,  C23C16/24 ,  C23C16/452 ,  H01L21/02381 ,  H01L21/02422 ,  H01L21/02433 ,  H01L21/0245 ,  H01L21/02532 ,  H01L21/0262 ,  Y10S148/029 ,  Y10S148/048

    摘要： A process for forming deposited film, which comprises:(a) the step of preparing a substrate having crystal nuclei or regions where crystal nuclei are selectively formed scatteringly on the surface for forming deposited film in a film forming space for formation of deposited film;(b) the step of forming deposited film on the above substrate by introducing an activated species (A) formed by decomposition of a compound (SX) containing silicon and a halogen and an activated species (B) formed from a chemical substance for film formation (B) which is chemically mutually reactive on said activated species (A) separately from each other into said film-forming space to effect chemical reaction therebetween;(c) the step of introducing a gaseous substance (E) having etching action on the deposited film to be formed or a gaseous substance (E.sub.2) forming said gaseous substance (E) into said film-forming space during said film-forming step (b) and exposing the deposited film growth surface to said gaseous substance (E) to apply etching action thereon, thereby effecting preferentially crystal growth in a specific face direction;(d) irradiating said gaseous substance (E) with light energy during said step (c), and(e) the step of increasing etching activity of said gaseous substance (E) by irradiation of light energy.

    摘要翻译： 一种用于形成沉积膜的方法，包括：（a）制备具有晶核的基板或者在沉积膜形成空间中形成沉积膜的表面上分散选择性地形成晶核的区域的步骤; （b）通过引入由含有硅和卤素的化合物（SX）分解形成的活性物质（A）和由用于成膜的化学物质形成的活化物质（B））在上述基板上形成沉积膜的步骤 （B），其在所述活化物质（A）上彼此分开地化学相互反应成所述成膜空间，以在其间进行化学反应; （c）在所述成膜步骤中将形成有所形成的沉积膜的具有蚀刻作用的气态物质（E）或形成所述气态物质（E）的气态物质（E2）引入所述成膜空间的步骤 b）并将沉积的膜生长表面暴露于所述气态物质（E）以在其上施加蚀刻作用，从而优先在特定的面方向上实现晶体生长; （d）在所述步骤（c）期间用光能照射所述气态物质（E），和（e）通过照射光能增加所述气态物质（E）的蚀刻活性的步骤。