公开(公告)号：US08045138B2

公开(公告)日：2011-10-25

申请号：US12198719

申请日：2008-08-26

Applicant: Makoto Ogusu

Inventor： Makoto Ogusu

IPC: G03B27/42 ,  G03B27/52

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. The support plate includes a liquid-repellent structure portion on the surface of which is formed a texture repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.

Abstract translation: 曝光装置通过液体使基板曝光。 该装置包括保持基板并移动的台，以及设置在台上并围绕基板的周边并支撑液体与支撑基板的支撑板。 支撑板包括在其表面上形成斥液剂的防液结构部分，并且其表面上的平坦部分形成为对液体的拒胶性。

公开(公告)号：US20100239963A1

公开(公告)日：2010-09-23

申请号：US12729398

申请日：2010-03-23

Applicant: Makoto Ogusu

Inventor： Makoto Ogusu

IPC: G03F1/00 ,  G03F7/20

CPC classification number: B82Y40/00 ,  B82Y10/00 ,  G03F1/24 ,  G03F1/50

Abstract: An exposure mask of the present invention is an exposure mask for patterning a three-dimensional shape on a resist. The exposure mask comprises a first region where a plurality of openings having a first size smaller than a resolution limit of an exposure apparatus are arranged, a second region where a plurality of openings having a second size smaller than the first size are arranged, and a third region where the plurality of openings having the first size and the plurality of openings having the second size are mixed and arranged between the first region and the second region.

Abstract translation: 本发明的曝光掩模是用于在抗蚀剂上图形化三维形状的曝光掩模。 曝光掩模包括其中布置有具有小于曝光设备的分辨率极限的第一尺寸的多个开口的第一区域，布置具有小于第一尺寸的第二尺寸的多个开口的第二区域，以及 第三区域，其中具有第一尺寸的多个开口和具有第二尺寸的多个开口被混合并布置在第一区域和第二区域之间。

公开(公告)号：US6043104A

公开(公告)日：2000-03-28

申请号：US339539

申请日：1999-06-24

Applicant: Mamoru Uchida ,  Makoto Ogusu

Inventor： Mamoru Uchida ,  Makoto Ogusu

IPC: H01S5/062 ,  H01S5/0625 ,  H01S5/10 ,  H01S5/125 ,  H01S5/34 ,  H01S5/40 ,  H01S5/50 ,  H01L21/00

CPC classification number: B82Y20/00 ,  H01S5/06258 ,  H01S5/1021 ,  H01S5/06236 ,  H01S5/1017 ,  H01S5/125 ,  H01S5/3404 ,  H01S5/4031 ,  H01S5/4087 ,  H01S5/5036

Abstract: A fabrication method of a semiconductor laser capable of controlling a polarization mode of output light is disclosed. In the fabrication method, after two laser portions are independently formed, the laser portions are positioned to be optically coupled to each other. In another fabrication method of the laser, after at least portions of two laser portions are separately formed, an irregularly-formed portion at a boundary portion therebetween is removed. The fabrication method can be facilitated and a degree of freedom in the polarization control can be increased, since the two laser portions are separately formed.

Abstract translation: 公开了一种能够控制输出光的偏振模式的半导体激光器的制造方法。 在制造方法中，在独立地形成两个激光部分之后，激光部分被定位成彼此光学耦合。 在激光的另一制造方法中，在两个激光部分的至少部分分开形成之后，在其间的边界部分处不规则地形成部分被去除。 由于两个激光部分分别形成，所以可以促进制造方法并且可以提高偏振控制的自由度。

公开(公告)号：US20100118289A1

公开(公告)日：2010-05-13

申请号：US12605951

申请日：2009-10-26

Applicant: Makoto Ogusu

Inventor： Makoto Ogusu

IPC: G03B27/58 ,  G03B27/32

CPC classification number: G03B27/32 ,  G03F7/70341 ,  G03F7/7095

Abstract: A member of an immersion exposure apparatus for exposing an image of a pattern of an original on a substrate via a liquid, and configured to be in contact with the liquid, includes a base portion, and a plurality of protruded portions provided on the base portion, wherein a contact angle θ of a material of a surface of the protruded portions before the protruded portions are exposed with light from a light source is larger than 90 degrees with respect to the liquid, and wherein, a value obtained by dividing a sum of a surface area of a face of the base portion on which the plurality of protruded portions are provided and the surface area of the plurality of protruded portions, by an area of the face of the base portion on which the plurality of protruded portions are provided, is r, r>1/|cos θ| is satisfied.

Abstract translation: 浸渍曝光装置的构件，其用于经由液体经由液体将原稿的图案的图像曝光并且被配置为与液体接触的部件包括基部和设置在基部上的多个突出部 ，其中接触角＆ 在来自光源的光暴露突出部分之前的突出部分的表面的材料相对于液体大于90度，并且其中，通过将表面的表面积之和除以 通过设置有多个突出部的基部的面的面积和多个突出部的表面积，设有多个突出部的基部的面积为r，r> 1 / | cos＆thetas; | 满意

公开(公告)号：US20060274297A1

公开(公告)日：2006-12-07

申请号：US11438348

申请日：2006-05-23

Applicant: Makoto Ogusu

Inventor： Makoto Ogusu

IPC: G03B27/72

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F9/7011 ,  G03F9/7015 ,  G03F9/7019

Abstract: An exposure apparatus includes a projection optical system configured to project a reticle pattern onto a plate by using a light from a light source, a liquid being filled in a space between the projection optical system and the plate so that the plate is exposed through the projection optical system and the liquid, and a photo detector unit configured to detect the light via the projection optical system and the liquid, wherein the photo detector unit includes a diffuser configured to diffuse the light, a detector configured to detect the light that has been diffused by the diffuser, and a substrate configured to prevent the liquid from contacting the detector, and to introduce the light to the diffuser.

Abstract translation: 曝光装置包括投影光学系统，其被配置为通过使用来自光源的光将光罩图案投影到板上，液体被填充在投影光学系统和板之间的空间中，使得板通过突起 光学系统和液体;以及光检测器单元，被配置为经由投影光学系统和液体检测光，其中光电检测器单元包括扩散器，其配置成扩散光;检测器，被配置为检测被扩散的光 以及被配置为防止液体与检测器接触并将光引入扩散器的基板。

公开(公告)号：US06652781B2

公开(公告)日：2003-11-25

申请号：US09754311

申请日：2001-01-05

Applicant: Hideo Kato ,  Hiroshi Maehara ,  Makoto Ogusu

Inventor： Hideo Kato ,  Hiroshi Maehara ,  Makoto Ogusu

IPC: B29D1100

CPC classification number: B29D11/00769 ,  B29D11/00009 ,  G02B3/00 ,  G02B5/1852 ,  G03F7/70058 ,  G03F7/70241

Abstract: In a method for manufacture of an optical element, a thin film is formed on a surface, such as a grating surface, an aspherical surface or a spherical surface, formed on a mold. Then, a substrate is bonded to the thin film. Subsequently, the thin film and the substrate are separated from the mold.

Abstract translation: 在制造光学元件的方法中，在形成在模具上的表面，例如光栅表面，非球面或球面上形成薄膜。 然后，将基板粘合到薄膜上。 随后，将薄膜和基底与模具分离。

公开(公告)号：US6083650A

公开(公告)日：2000-07-04

申请号：US105047

申请日：1998-06-26

Applicant: Makoto Ogusu ,  Kenji Saitoh

Inventor： Makoto Ogusu ,  Kenji Saitoh

IPC: G02B5/18 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70425 ,  G03F7/70433 ,  G03F9/70

Abstract: A method of manufacturing an element with a concentric pattern by use of a photolithographic process is disclosed, wherein the method includes preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly, and-exposing regions of a substrate corresponding to the plural zones, respectively, by using the masks corresponding to the zones, respectively, while rotating the substrate by regular angles.

Abstract translation: 公开了一种通过使用光刻工艺制造具有同心图案的元件的方法，其中该方法包括分别制备具有对应于图案的扇形区域的扇形图案的掩模，该扇形图案可以通过划分扇形区域来限定扇形区域 所述图案与所述图案同心的至少一个圆圈以提供多个区域，然后通过分别使用对应于所述区域的掩模分别对每个区域进行等角度划分和曝光与多个区域对应的基板的区域，同时 以规则的角度旋转基板。

公开(公告)号：US09328380B2

公开(公告)日：2016-05-03

申请号：US14116088

申请日：2012-04-23

Applicant: Makoto Ogusu

Inventor： Makoto Ogusu

IPC: C12Q1/68 ,  B01L7/00 ,  G01N21/64 ,  B01L3/00 ,  G01N35/00

CPC classification number: C12Q1/686 ,  B01L3/5027 ,  B01L7/52 ,  B01L2300/0877 ,  B01L2300/168 ,  B01L2300/1827 ,  B01L2300/1883 ,  G01N21/6428 ,  G01N2035/00158

Abstract: A real time analysis in accordance with temperature change and highly sensitive detection are permitted. A flow passage device has a flow passage (1) and is able to heat a fluid in the flow passage. A state of the fluid in the flow passage is observable using light. The flow passage device includes a first member (2) including an observation surface (3) and an upper inner wall surface (4), and a second member (5) including a lower inner wall surface that opposes the upper inner wall surface (4) and that is part of inner walls of the flow passage. A heating resistor (6) having a reflective surface that reflects light is provided on the lower inner wall surface. The light reflected by the reflective surface passes through the upper inner wall surface (4) and the observation surface (3).

Abstract translation: 允许根据温度变化和高灵敏度检测进行实时分析。 流路装置具有流路（1），能够对流路内的流体进行加热。 可以使用光来观察流道中的流体的状态。 流路装置包括包括观察面（3）和上内壁面（4）的第一构件（2）和包括与上内壁面（4）相对的下内壁面的第二构件 ），并且是流动通道的内壁的一部分。 具有反射光的反射表面的加热电阻器（6）设置在下内壁表面上。 由反射面反射的光穿过上部内壁面（4）和观察面（3）。

公开(公告)号：US07768625B2

公开(公告)日：2010-08-03

申请号：US11438348

申请日：2006-05-23

Applicant: Makoto Ogusu

Inventor： Makoto Ogusu

IPC: G03B27/42

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F9/7011 ,  G03F9/7015 ,  G03F9/7019

Abstract: An exposure apparatus includes (a) a projection optical system to project a reticle pattern onto a plate by using a light from a light source, and (b) a photo detector unit to detect the light via the projection optical system. The photo detector unit includes (i) a substrate, which is patterned with a wiring pattern and transmits the light, (ii) a detector to detect the light, and (iii) a bump to space the substrate from the detector, and to electrically connect the detector and the wiring pattern of the substrate.

Abstract translation: 曝光装置包括：（a）通过使用来自光源的光将掩模版图案投影到板上的投影光学系统，以及（b）经由投影光学系统检测光的光检测器单元。 光检测器单元包括：（i）衬底，其被布线图案图案化并透射光，（ii）检测器以检测光，以及（iii）凸起以使衬底与检测器间隔开，并且电 连接检测器和基板的布线图案。

公开(公告)号：US20090059191A1

公开(公告)日：2009-03-05

申请号：US12198719

申请日：2008-08-26

Applicant: Makoto Ogusu

Inventor： Makoto Ogusu

IPC: G03B27/52

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. The support plate includes a liquid-repellent structure portion on the surface of which is formed a texture repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.

Abstract translation: 曝光装置通过液体使基板曝光。 该装置包括保持基板并移动的台，以及设置在台上并围绕基板的周边并支撑液体与支撑基板的支撑板。 支撑板包括在其表面上形成斥液剂的防液结构部分，并且其表面上的平坦部分形成为对液体的拒胶性。