Suppression of emission noise for microcolumn applications in electron beam inspection
    1.
    发明授权
    Suppression of emission noise for microcolumn applications in electron beam inspection 失效
    抑制电子束检测中微柱应用的发射噪声

    公开(公告)号:US06555830B1

    公开(公告)日:2003-04-29

    申请号:US09638376

    申请日:2000-08-15

    IPC分类号: G21G500

    摘要: The microcolumn configuration of the present invention provides for emission noise reduction through the use of a screened beam-limiting aperture for monitoring the electron beam current. This novel approach utilizes a screening aperture located between the emitter and the beam-limiting aperture, which screening aperture collects most of the current transmitted by the first lens of the electron beam column. In order to achieve good noise suppression, the screening aperture should let through only the portion of the beam where the electrons are correlated. The current collected by the beam-limiting aperture is then used as a reference signal in the image processing. The elimination of this noise increases the detection sensitivity of an inspection tool. This reduces the total number of required pixels and therefore increases the throughput of the tool.

    摘要翻译: 本发明的微柱结构通过使用用于监测电子束电流的屏蔽光束限制孔来提供发射噪声降低。 这种新颖的方法利用位于发射极和光束限制孔之间的屏蔽孔,该屏蔽孔收集由电子束柱的第一透镜传输的大部分电流。 为了实现良好的噪声抑制,屏蔽孔径应仅通过电子相关的光束部分。 然后由光束限制孔收集的电流用作图像处理中的参考信号。 消除这种噪声会增加检测工具的检测灵敏度。 这减少了所需像素的总数,因此增加了工具的吞吐量。

    Method of forming gated photocathode for controlled single and multiple electron beam emission
    2.
    发明授权
    Method of forming gated photocathode for controlled single and multiple electron beam emission 失效
    形成用于受控单电子束和多电子束发射的门控光电阴极的方法

    公开(公告)号:US06220914B1

    公开(公告)日:2001-04-24

    申请号:US09449201

    申请日:1999-11-24

    IPC分类号: H01J902

    摘要: A photocathode having a gate electrode so that modulation of the resulting electron beam is accomplished independently of the laser beam. The photocathode includes a transparent substrate, a photoemitter, and an electrically separate gate electrode surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

    摘要翻译: 具有栅极的光电阴极,使得所得电子束的调制独立于激光束而实现。 光电阴极包括透明基板,光电发射器和围绕发光体的发射区域的电分离的栅电极。 来自发射区域的电子束发射由供给栅电极的电压调制。 此外,栅电极可以具有多个段,其能够响应于单独提供给多个段中的每一个的电压而使电子束成形。

    Gated photocathode for controlled single and multiple electron beam emission
    3.
    发明授权
    Gated photocathode for controlled single and multiple electron beam emission 失效
    用于受控单电子束和多电子束发射的门控光电阴极

    公开(公告)号:US06376985B2

    公开(公告)日:2002-04-23

    申请号:US09052903

    申请日:1998-03-31

    IPC分类号: H01J4006

    摘要: A photocathode having a gate electrode so that modulation of the resulting electron beam is accomplished independently of the laser beam. The photocathode includes a transparent substrate, a photoemitter, and an electrically separate gate electrode surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

    摘要翻译: 具有栅极的光电阴极,使得所得电子束的调制独立于激光束而实现。 光电阴极包括透明基板,光电发射器和围绕发光体的发射区域的电分离的栅电极。 来自发射区域的电子束发射由供给栅电极的电压调制。 此外,栅电极可以具有多个段,其能够响应于单独提供给多个段中的每一个的电压而使电子束成形。

    Precision alignment and assembly of microlenses and microcolumns
    4.
    发明授权
    Precision alignment and assembly of microlenses and microcolumns 失效
    精密对准和组装微透镜和微柱

    公开(公告)号:US06281508B1

    公开(公告)日:2001-08-28

    申请号:US09246573

    申请日:1999-02-08

    IPC分类号: G21K108

    摘要: A method and the associated apparatus for alignment and assembly of microlenses and microcolumns in which aligning structures such as rigid fibers are used to precisely align multiple microlens components. Alignment openings are formed in the microlens components and standard optical fibers are threaded through the openings in each microlens component as they are stacked. The fibers provide sufficient stiffness and stability to the structure to precisely align the apertures of the microlens components and thereby allow for increased assembly efficiency over traditional microlens and microcolumn bonding techniques.

    摘要翻译: 用于对准和组装微透镜和微柱的方法和相关联的装置,其中使用诸如刚性纤维的对准结构来精确对准多个微透镜组件。 在微透镜部件中形成对准开口,并且当它们堆叠时,标准光纤穿过每个微透镜部件中的开口。 纤维为结构提供足够的刚度和稳定性,以精确地对准微透镜部件的孔,从而相对于传统的微透镜和微柱接合技术允许提高组装效率。

    Microcolumn assembly using laser spot welding
    5.
    发明授权
    Microcolumn assembly using laser spot welding 失效
    使用激光点焊的微柱组件

    公开(公告)号:US06195214B1

    公开(公告)日:2001-02-27

    申请号:US09364822

    申请日:1999-07-30

    IPC分类号: G02B702

    摘要: A method for forming microcolumns in which laser spot welding bonds the multiple layers of an electron beam microcolumn. A silicon microlens is laser spot welded to a glass insulation layer by focusing a laser through the insulation layer onto the silicon microlens. The glass layer is transparent to the laser, allowing all of the energy to be absorbed by the silicon. This causes the silicon to heat, which, in turn, heats the adjacent surface of the glass insulation layer creating a micro-weld between the silicon and glass. The insulation layer includes a portion which protrudes beyond the edge of the first microlens so that when a second microlens is attached to the opposite side of the insulation layer, the second microlens can be laser spot welded to the protruding portion of the insulation layer by focusing a laser through the protruding portion of the insulation layer to heat the second microlens.

    摘要翻译: 一种形成微柱的方法,其中激光点焊结合电子束微柱的多层。 将硅微透镜通过将激光通过绝缘层聚焦到硅微透镜上而被激光点焊到玻璃绝缘层。 玻璃层对于激光是透明的,允许所有的能量被硅吸收。 这导致硅加热,这进而加热玻璃绝缘层的相邻表面,从而在硅和玻璃之间形成微焊缝。 绝缘层包括突出超过第一微透镜的边缘的部分,使得当第二微透镜附着到绝缘层的相对侧时,第二微透镜可以通过聚焦被激光点焊到绝缘层的突出部分 激光穿过绝缘层的突出部分以加热第二微透镜。

    Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance
    6.
    发明授权
    Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance 失效
    使用具有用于产生透射共振的孔径图案的光电阴极的电子束光刻系统

    公开(公告)号:US06538256B1

    公开(公告)日:2003-03-25

    申请号:US09641099

    申请日:2000-08-17

    IPC分类号: H01J3708

    摘要: A method and system for electron beam lithography at high throughput with shorter electron beam column length, reduced electron-electron interactions, and higher beam current. The system includes a photocathode having a pattern composed of a periodic array of apertures with a specific geometry. The spacing of the apertures is chosen so as to maximize the transmission of the laser beam through apertures significantly smaller than the photon wavelength. The patterned photocathode is illuminated by an array of laser beams to allow blanking and gray-beam modulation of the individual beams at the source level by the switching of the individual laser beams in the array. Potential applications for this invention include electron beam direct write on wafers and mask patterning.

    摘要翻译: 用于电子束光刻的方法和系统,其具有较短的电子束柱长度,减少的电子 - 电子相互作用和更高的束电流。 该系统包括具有由具有特定几何形状的周期性孔径阵列组成的图案的光电阴极。 选择孔的间距以便通过明显小于光子波长的孔的最大化激光束的透射。 图案化的光电阴极被激光束阵列照射,以通过阵列中的各个激光束的切换来允许源极处的各个光束的消隐和灰光束调制。 本发明的潜在应用包括晶片上的电子束直接写入和掩模图案化。

    Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask
    7.
    发明授权
    Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask 有权
    使用电子束抗蚀剂掩模制造用于磁头的磁写磁极的方法

    公开(公告)号:US07716813B2

    公开(公告)日:2010-05-18

    申请号:US11634667

    申请日:2006-12-05

    IPC分类号: G11B5/187 B44C1/22

    摘要: A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.

    摘要翻译: 公开了一种用于独立地控制磁记录头的写极尖的轨道宽度和斜角的方法。 该方法包括利用电子束平版印刷法在极尖层材料中建立轨道宽度。 通过提供临时掩蔽材料来制造具有已建立的轨道宽度的该极尖材料的一部分,以形成受保护的部分。 至少一个未保护的部分被暴露以成形。 然后将该未保护部分倾斜以产生至少一个倾斜部分。 受保护部分产生上极尖部分,其与斜面部分一起产生改进的极尖。 还公开了具有改进的极尖的磁头和具有具有改进的极尖的磁头的磁盘驱动器。

    Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask
    9.
    发明申请
    Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask 有权
    使用电子束抗蚀剂掩模制造用于磁头的磁写磁极的方法

    公开(公告)号:US20080127481A1

    公开(公告)日:2008-06-05

    申请号:US11634667

    申请日:2006-12-05

    IPC分类号: G11B5/127

    摘要: A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.

    摘要翻译: 公开了一种用于独立地控制磁记录头的写极尖的轨道宽度和斜角的方法。 该方法包括利用电子束平版印刷法在极尖层材料中建立轨道宽度。 通过提供临时掩蔽材料来制造具有已建立的轨道宽度的该极尖材料的一部分,以形成受保护的部分。 至少一个未保护的部分被暴露以成形。 然后将该未保护部分倾斜以产生至少一个倾斜部分。 受保护部分产生上极尖部分,其与斜面部分一起产生改进的极尖。 还公开了具有改进的极尖的磁头和具有具有改进的极尖的磁头的磁盘驱动器。

    Process for fabricating patterned magnetic recording media
    10.
    发明申请
    Process for fabricating patterned magnetic recording media 有权
    制造图案化磁记录介质的方法

    公开(公告)号:US20080093336A1

    公开(公告)日:2008-04-24

    申请号:US11583845

    申请日:2006-10-20

    IPC分类号: B44C1/22 C03C25/68

    CPC分类号: G11B5/855 G11B5/667 G11B5/732

    摘要: A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.

    摘要翻译: 一种制造图案化磁记录介质的方法,包括以下步骤:(a)提供包括最上面的非磁性中间层的层堆叠; (b)在所述中间层上形成抗蚀剂层; (c)形成第一图案,其包括延伸穿过抗蚀剂层的第一组凹槽,并暴露出中间层的第一组间隔开的表面部分; (d)用一层硬掩模材料填充第一组凹槽; (e)选择性地去除所述抗蚀剂层以形成第二图案,所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和(f)用形成磁记录层的磁性硬质材料层填充第二组凹部。