公开(公告)号：US06538256B1

公开(公告)日：2003-03-25

申请号：US09641099

申请日：2000-08-17

申请人： Marian Mankos ,  Vidhya Krishnamurthi ,  Kim Y. Lee

发明人： Marian Mankos ,  Vidhya Krishnamurthi ,  Kim Y. Lee

IPC分类号： H01J3708

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J1/34 ,  H01J37/073 ,  H01J37/3175 ,  H01J2237/31779

摘要： A method and system for electron beam lithography at high throughput with shorter electron beam column length, reduced electron-electron interactions, and higher beam current. The system includes a photocathode having a pattern composed of a periodic array of apertures with a specific geometry. The spacing of the apertures is chosen so as to maximize the transmission of the laser beam through apertures significantly smaller than the photon wavelength. The patterned photocathode is illuminated by an array of laser beams to allow blanking and gray-beam modulation of the individual beams at the source level by the switching of the individual laser beams in the array. Potential applications for this invention include electron beam direct write on wafers and mask patterning.

摘要翻译： 用于电子束光刻的方法和系统，其具有较短的电子束柱长度，减少的电子 - 电子相互作用和更高的束电流。 该系统包括具有由具有特定几何形状的周期性孔径阵列组成的图案的光电阴极。 选择孔的间距以便通过明显小于光子波长的孔的最大化激光束的透射。 图案化的光电阴极被激光束阵列照射，以通过阵列中的各个激光束的切换来允许源极处的各个光束的消隐和灰光束调制。 本发明的潜在应用包括晶片上的电子束直接写入和掩模图案化。

公开(公告)号：US06288401B1

公开(公告)日：2001-09-11

申请号：US09364777

申请日：1999-07-30

申请人： Tai-Hon P Chang ,  Marian Mankos ,  Lawrence P Muray ,  Ho-Seob Kim ,  Kim Y Lee

发明人： Tai-Hon P Chang ,  Marian Mankos ,  Lawrence P Muray ,  Ho-Seob Kim ,  Kim Y Lee

IPC分类号： G21K108

CPC分类号： H01J29/54 ,  H01J37/073 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/1501

摘要： A field emission source produces a charged particle beam that can be electrostatically aligned with the optical axis. Quadrupole (or higher multipole) centering electrodes approximately centered on the optical axis are placed between the emitter and the extraction electrode. By applying centering potentials of equal amplitude and opposite polarity on opposing elements of the centering electrodes, an electrostatic deflection field is created near the optical axis. The electrostatic deflection field aligns the charged particle beam with the optical axis thereby obviating the need to mechanically align the emitter with the optical axis. A second set of centering electrodes may be used to deflect the charged particle beam back and to ensure that the charged particle beam is parallel with the optical axis. Further, the extraction electrode may be split into a quadrupole arrangement with the extraction and centering potentials superimposed.

摘要翻译： 场发射源产生可以与光轴静电对准的带电粒子束。 大约以光轴为中心的四极（或更高的多极）定心电极放置在发射极和引出电极之间。 通过在定心电极的相对元件上施加相等振幅和相反极性的定心电位，在光轴附近产生静电偏转场。 静电偏转磁场将带电粒子束与光轴对准，从而避免了将发射器与光轴机械对准的需要。 可以使用第二组定心电极将带电粒子束偏转回来并确保带电粒子束与光轴平行。 此外，提取电极可以被分成四极排列，其中提取和对中电位叠加。

公开(公告)号：US06220914B1

公开(公告)日：2001-04-24

申请号：US09449201

申请日：1999-11-24

申请人： Kim Y. Lee ,  Tai-Hon Philip Chang ,  Marian Mankos ,  C. Neil Berglund

发明人： Kim Y. Lee ,  Tai-Hon Philip Chang ,  Marian Mankos ,  C. Neil Berglund

IPC分类号： H01J902

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J1/34 ,  H01J37/073 ,  H01J2237/31779

摘要： A photocathode having a gate electrode so that modulation of the resulting electron beam is accomplished independently of the laser beam. The photocathode includes a transparent substrate, a photoemitter, and an electrically separate gate electrode surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

摘要翻译： 具有栅极的光电阴极，使得所得电子束的调制独立于激光束而实现。 光电阴极包括透明基板，光电发射器和围绕发光体的发射区域的电分离的栅电极。 来自发射区域的电子束发射由供给栅电极的电压调制。 此外，栅电极可以具有多个段，其能够响应于单独提供给多个段中的每一个的电压而使电子束成形。

公开(公告)号：US06555830B1

公开(公告)日：2003-04-29

申请号：US09638376

申请日：2000-08-15

申请人： Marian Mankos ,  Tai-Hon Philip Chang ,  Kim Y. Lee ,  Ming Yu

发明人： Marian Mankos ,  Tai-Hon Philip Chang ,  Kim Y. Lee ,  Ming Yu

IPC分类号： G21G500

CPC分类号： H01J37/073 ,  G01N23/225 ,  H01J2237/06316 ,  H01J2237/0653 ,  H01J2237/24514 ,  H01J2237/30472

摘要： The microcolumn configuration of the present invention provides for emission noise reduction through the use of a screened beam-limiting aperture for monitoring the electron beam current. This novel approach utilizes a screening aperture located between the emitter and the beam-limiting aperture, which screening aperture collects most of the current transmitted by the first lens of the electron beam column. In order to achieve good noise suppression, the screening aperture should let through only the portion of the beam where the electrons are correlated. The current collected by the beam-limiting aperture is then used as a reference signal in the image processing. The elimination of this noise increases the detection sensitivity of an inspection tool. This reduces the total number of required pixels and therefore increases the throughput of the tool.

摘要翻译： 本发明的微柱结构通过使用用于监测电子束电流的屏蔽光束限制孔来提供发射噪声降低。 这种新颖的方法利用位于发射极和光束限制孔之间的屏蔽孔，该屏蔽孔收集由电子束柱的第一透镜传输的大部分电流。 为了实现良好的噪声抑制，屏蔽孔径应仅通过电子相关的光束部分。 然后由光束限制孔收集的电流用作图像处理中的参考信号。 消除这种噪声会增加检测工具的检测灵敏度。 这减少了所需像素的总数，因此增加了工具的吞吐量。

公开(公告)号：US06376985B2

公开(公告)日：2002-04-23

申请号：US09052903

申请日：1998-03-31

申请人： Kim Y. Lee ,  Tai-Hon Philip Chang ,  Marian Mankos ,  C. Neil Berglund

发明人： Kim Y. Lee ,  Tai-Hon Philip Chang ,  Marian Mankos ,  C. Neil Berglund

IPC分类号： H01J4006

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J1/34 ,  H01J37/073 ,  H01J2237/31779

摘要： A photocathode having a gate electrode so that modulation of the resulting electron beam is accomplished independently of the laser beam. The photocathode includes a transparent substrate, a photoemitter, and an electrically separate gate electrode surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

摘要翻译： 具有栅极的光电阴极，使得所得电子束的调制独立于激光束而实现。 光电阴极包括透明基板，光电发射器和围绕发光体的发射区域的电分离的栅电极。 来自发射区域的电子束发射由供给栅电极的电压调制。 此外，栅电极可以具有多个段，其能够响应于单独提供给多个段中的每一个的电压而使电子束成形。

公开(公告)号：US08258474B1

公开(公告)日：2012-09-04

申请号：US13071412

申请日：2011-03-24

申请人： Marian Mankos

发明人： Marian Mankos

IPC分类号： H01J37/26

CPC分类号： H01J37/261 ,  H01J37/04 ,  H01J37/252 ,  H01J2237/04926 ,  H01J2237/2538

摘要： One embodiment relates to an apparatus for generating two spatially overlapping electron beams on a specimen. A first electron beam source is configured to generate a low-energy electron beam, and an energy-dispersive device bends the low-energy electron beam towards an semitransparent electron mirror. The semitransparent electron mirror is biased to reflect the low-energy electron beam. A second electron beam source is configured to generate a high-energy electron beam that passes through an opening in the semitransparent electron mirror. Both the low- and high-energy electron beams enter the same energy-dispersive device that bends both beams towards the specimen. A deflection system positioned between the high-energy electron source and semitransparent electron mirror is configured to deflect the high-energy electron beam by an angle that compensates for the difference in bending angles between the low- and high-energy electron beams introduced by the energy-dispersive device. Other embodiments are also disclosed.

摘要翻译： 一个实施例涉及用于在样本上产生两个空间上重叠的电子束的装置。 第一电子束源被配置为产生低能电子束，并且能量分散器件将低能电子束弯曲成半透明电子镜。 半透明电子镜被偏置以反射低能电子束。 第二电子束源被配置为产生穿过半透明电子反射镜中的开口的高能电子束。 低能量和高能量电子束都进入同样的能量分散装置，使两个光束朝向样品弯曲。 位于高能电子源和半透明电子反射镜之间的偏转系统被配置为使高能电子束偏转角度，该角度补偿由能量引入的低能量和高能量电子束之间的弯曲角度的差异 - 分散设备 还公开了其他实施例。

公开(公告)号：US07692167B1

公开(公告)日：2010-04-06

申请号：US11588492

申请日：2006-10-26

申请人： Marian Mankos

发明人： Marian Mankos

IPC分类号： H01J37/302

CPC分类号： H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30483 ,  H01J2237/31789

摘要： One embodiment pertains to an apparatus for reflection electron beam lithography, including at least illumination electron-optics, an electron-reflective pattern generator, projection electron-optics, a moving stage holding a target substrate, control circuitry, and a deflection system. The illumination electron-optics is configured to form an illumination electron beam. The electron-reflective pattern generator configured to generate an electron-reflective pattern of pixels and to reflect the illumination electron beam using the pattern to form a patterned electron beam. The projection electron-optics is configured to project the patterned electron beam onto the moving target substrate. The control circuitry is configured to shift the generated pattern in discrete steps in synchronization with the stage motion. The deflection system is configured to deflect said projected patterned electron beam so as to compensate for said stage motion in between discrete shifts of said generated pattern. Other features and embodiments are also disclosed.

摘要翻译： 一个实施例涉及用于反射电子束光刻的装置，至少包括照明电子光学，电子反射图案发生器，投射电子光学，保持目标衬底的移动台，控制电路和偏转系统。 照明电子光学被配置为形成照明电子束。 电子反射型图形发生器被配置为产生像素的电子反射图案并且使用该图案反射照射电子束以形成图案化的电子束。 投影电子学被配置为将图案化电子束投影到移动目标衬底上。 控制电路被配置为与台阶运动同步地以离散步进移位生成的图案。 偏转系统被配置为偏转所述投影的图案化电子束，以补偿所述生成图案的离散位移之间的所述阶段运动。 还公开了其它特征和实施例。

公开(公告)号：US07217924B1

公开(公告)日：2007-05-15

申请号：US11205367

申请日：2005-08-16

申请人： Marian Mankos ,  Eric Munro

发明人： Marian Mankos ,  Eric Munro

IPC分类号： H01J37/26 ,  G01N23/225

CPC分类号： H01J37/05 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26 ,  H01J37/29 ,  H01J2237/0044 ,  H01J2237/063 ,  H01J2237/151 ,  H01J2237/2446 ,  H01J2237/262

摘要： One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam source is configured to generate a higher-energy electron beam. A holey mirror is biased to reflect the lower-energy electron beam. The holey mirror also includes an opening therein through which passes the higher-energy electron beam, thereby forming the dual-energy electron beam. A prism array combiner introduces a first dispersion between the lower-energy electron beam and the higher-energy electron beam within the dual-energy electron beam. A prism array separator is configured to separate the dual-energy electron beam traveling to a substrate from a scattered electron beam traveling away from the substrate. The prism array separator introduces a second dispersion which compensates for the dispersion of the prism array combiner. Other embodiments are also disclosed.

摘要翻译： 一个实施例涉及一种用于产生双能量电子束的装置。 第一电子束源被配置为产生较低能量的电子束，并且第二电子束源被配置为产生较高能量的电子束。 有孔镜被偏置以反射较低能量的电子束。 多孔镜还包括其中通过高能电子束的开口，从而形成双能电子束。 棱镜阵列组合器在双能电子束内引入低能电子束与高能电子束之间的第一色散。 棱镜阵列分离器被配置为将从衬底传播的散射电子束分离到衬底行进的双能电子束。 棱镜阵列分离器引入补偿棱镜阵列组合器的色散的第二色散。 还公开了其他实施例。

公开(公告)号：US06399934B1

公开(公告)日：2002-06-04

申请号：US09642525

申请日：2000-08-18

申请人： Jeffrey S. Sullivan ,  Steven Coyle ,  Andres Fernandez ,  Marian Mankos

发明人： Jeffrey S. Sullivan ,  Steven Coyle ,  Andres Fernandez ,  Marian Mankos

IPC分类号： H01J4014

CPC分类号： H01J3/024 ,  H01J37/073

摘要： An electron source is disclosed in which control signals having transition times less than about 10 nanoseconds and electrically isolated from a gated photocathode control an electron beam supplied by the gated photocathode. In one embodiment, the electron source includes a transmissive substrate, a photoemitter on the substrate, a gate insulator on the photoemitter, a gate electrode on the gate insulator, a housing enclosing the photoemitter and the gate electrode, a light source located outside the housing, and a detector located in the housing to receive light from the light source. The detector is electrically coupled to control a voltage applied to one of the gate electrode or the photoemitter.

摘要翻译： 公开了一种电子源，其中具有小于约10纳秒的转换时间和与门控光电阴极电隔离的控制信号控制由门控光电阴极提供的电子束。 在一个实施例中，电子源包括透射衬底，衬底上的光发射器，光发射器上的栅极绝缘体，栅极绝缘体上的栅极电极，封装光电发生器和栅电极的壳体，位于壳体外部的光源 以及位于壳体中的用于接收来自光源的光的检测器。 检测器电耦合以控制施加到栅极电极或光电发射器之一的电压。

公开(公告)号：US08092927B2

公开(公告)日：2012-01-10

申请号：US13034770

申请日：2011-02-25

申请人： Mohammed Tahmassebpur ,  Salam Harb ,  Liqun Han ,  Marian Mankos

发明人： Mohammed Tahmassebpur ,  Salam Harb ,  Liqun Han ,  Marian Mankos

IPC分类号： B32B15/04 ,  B32B15/18 ,  F16C29/00 ,  F16C29/02

CPC分类号： C22C19/051 ,  B32B15/01 ,  C22C19/00 ,  Y10T428/12625 ,  Y10T428/12931 ,  Y10T428/12937 ,  Y10T428/12944 ,  Y10T428/12951 ,  Y10T428/24025 ,  Y10T428/30

摘要： A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.

摘要翻译： 一种形成用于电子枪的高真空环境中的闸阀的方法，该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯，并且具有拉伸强度 强度为约750兆帕，加工镍铁包层，将芯焊接到包层以形成闸阀，并加工闸阀，以消除芯和包层之间的界面处的任何尺寸差异。 以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。 最后一部分提供了由镍合金壳提供的场屏蔽，由非磁性合金提供的低杂散场，良好的真空性能和严格的机械公差控制。 此外，由于与不锈钢和钛相比，该合金具有低氧化速度的优点，所以由于诸如电子束轰击的条件，存在较少的污染物积聚。