公开(公告)号：US20070196748A1

公开(公告)日：2007-08-23

申请号：US11356027

申请日：2006-02-17

申请人： Marie Angelopoulos ,  Katherina Babich ,  Sean Burns ,  Richard Conti ,  Allen Gabor ,  Scott Halle ,  Arpan Mahorowala ,  Dirk Pfeiffer

发明人： Marie Angelopoulos ,  Katherina Babich ,  Sean Burns ,  Richard Conti ,  Allen Gabor ,  Scott Halle ,  Arpan Mahorowala ,  Dirk Pfeiffer

IPC分类号： G03G13/00

CPC分类号： G03F7/091 ,  Y10S438/952

摘要： A lithographic structure consisting essentially of: an organic antireflective material disposed on a substrate; a vapor-deposited RCHX material, wherein R is one or more elements selected from the group consisting of Si, Ge, B, Sn, Fe and Ti, and wherein X is not present or is one or more elements selected from the group consisting of O, N, S and F; and a photoresist material disposed on the RCHX material. The invention is also directed to methods of making the lithographic structure, and using the structure to pattern a substrate.

摘要翻译： 一种光刻结构，主要由以下部分组成：设置在基板上的有机抗反射材料; 气相沉积的RCHX材料，其中R是选自Si，Ge，B，Sn，Fe和Ti中的一种或多种元素，并且其中X不存在或者是选自以下的一种或多种元素： O，N，S和F; 以及设置在RCHX材料上的光致抗蚀剂材料。 本发明还涉及制造光刻结构的方法，并且使用该结构来图案化衬底。

公开(公告)号：US20070015082A1

公开(公告)日：2007-01-18

申请号：US11180787

申请日：2005-07-14

申请人： Marie Angelopoulos ,  Katherina Babich ,  Sean Burns ,  Allen Gabor ,  Scott Halle ,  Arpan Mahorowala ,  Dirk Pfeiffer

发明人： Marie Angelopoulos ,  Katherina Babich ,  Sean Burns ,  Allen Gabor ,  Scott Halle ,  Arpan Mahorowala ,  Dirk Pfeiffer

IPC分类号： G03F7/26 ,  G03C5/00

CPC分类号： G03F7/091 ,  G03F7/0757 ,  Y10T428/24942 ,  Y10T428/31663

摘要： A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or 157 nm radiation. In combination, the organic antireflective material and the silicon antireflective material provide an antireflective material suitable for deep ultraviolet lithography. The invention is also directed to a process of making the lithographic structure.

摘要翻译： 一种光刻结构，包括：设置在基板上的有机抗反射材料; 以及设置在有机抗反射材料上的硅抗反射材料。 硅抗反射材料包括具有SiO 2主链的交联聚合物，发色团和对193nm或157nm辐射基本透明的透明有机基团。 组合地，有机抗反射材料和硅抗反射材料提供适用于深紫外光刻的抗反射材料。 本发明还涉及制备光刻结构的方法。

公开(公告)号：US20070015083A1

公开(公告)日：2007-01-18

申请号：US11180788

申请日：2005-07-14

申请人： Katherina Babich ,  Sean Burns ,  Elbert Huang ,  Arpan Mahorowala ,  Dirk Pfeiffer ,  Karen Temple

发明人： Katherina Babich ,  Sean Burns ,  Elbert Huang ,  Arpan Mahorowala ,  Dirk Pfeiffer ,  Karen Temple

IPC分类号： G03C1/00

CPC分类号： G03F7/091 ,  Y10T428/31663

摘要： An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer of formula I, wherein 1≦x≦2; 1≦y≦5; 1≧0; m>0; n>0; R is a chromophore, M is a metal selected from Group IIIB to Group VIB, lanthanides, Group IIIA, Group IVA except silicon; and L is an optional ligand. The invention is also directed to a process of making a lithographic structure including a silicon-metal oxide, antireflective material.

摘要翻译： 一种抗反射组合物和包含硅 - 金属氧化物，衍生自该组合物的抗反射材料的光刻结构。 抗反射组合物包含式I的聚合物，其中1≤x≤2; 1 <= y <= 5; 1> = 0; m> 0; n> 0; R是发色团，M是选自IIIB族至VIB族的镧系元素，镧系元素，IIIA族，IVA族除外; L是任选的配体。 本发明还涉及制备包括硅 - 金属氧化物，抗反射材料的光刻结构的方法。

公开(公告)号：US07446532B1

公开(公告)日：2008-11-04

申请号：US11879531

申请日：2007-07-18

申请人： Sean Burns

发明人： Sean Burns

IPC分类号： G01V3/00

CPC分类号： G01R33/34069 ,  G01R33/34007 ,  G01R33/34092 ,  G01R33/422

摘要： According to one aspect, a nuclear magnetic resonance (NMR) radio-frequency (RF) coil of an NMR spectrometer includes oppositely-facing arches at opposite longitudinal ends of the coil window, along shielded regions of the coil. The arched coil shapes allow situating the transverse parts of the coil away from the interfaces between the sample measurement volume and coil shields while minimizing the additional coil length and thus coil inductance and capacitance needed to move the transverse conductors away from interfaces. Moving the transverse parts of the coil away from the measurement volume facilitates shimming. The coil may be lifted on a plurality of longitudinal support rods spaced around a circumference of the coil, in order to reduce the capacitance between the coil and associated shields.

摘要翻译： 根据一个方面，NMR光谱仪的核磁共振（NMR）射频（RF）线圈沿线圈的屏蔽区域包括在线圈窗口的相对纵向端部处的相对的拱形。 拱形线圈形状允许将线圈的横向部分远离样品测量体积和线圈屏蔽之间的界面，同时最小化额外的线圈长度，从而使横向导体远离界面所需的线圈电感和电容最小化。 使线圈的横向部分远离测量体积有助于匀场。 线圈可以在围绕线圈的圆周间隔开的多个纵向支撑杆上提升，以便减小线圈和相关联的屏蔽之间的电容。

公开(公告)号：US07436182B1

公开(公告)日：2008-10-14

申请号：US11903350

申请日：2007-09-21

申请人： Alexander M. J. Hudson ,  Sean Burns ,  Knut Mehr

发明人： Alexander M. J. Hudson ,  Sean Burns ,  Knut Mehr

IPC分类号： G01V3/00

CPC分类号： G01R33/3628 ,  G01R33/34015 ,  G01R33/3403 ,  G01R33/34092

摘要： According to some embodiments, low-temperature (cryogenic) nuclear magnetic resonance (NMR) probe fixed capacitors include thermally-conductive dielectric layers serving to thermally connect the capacitors to a cryogenic heat sink. For example, a sapphire layer may be metalized on opposite sides to form copper capacitor plates, and along an edge to form a copper heat sink contact. Heat generated by RF currents during an operation of an NMR circuit including such a capacitor is discharged through the thermally-conductive dielectric to the heat sink. Cooling cold-probe circuit components such as capacitors through thermally-conductive capacitor dielectrics allows reducing perturbations introduced into the circuit by components such as heat sinks.

摘要翻译： 根据一些实施例，低温（低温）核磁共振（NMR）探针固定电容器包括用于将电容器热连接到低温散热器的导热电介质层。 例如，蓝宝石层可以在相对侧进行金属化以形成铜电容器板，并沿着边缘形成铜散热器接触。 在包括这种电容器的NMR电路的操作期间由RF电流产生的热量通过导热电介质被排放到散热器。 通过导热电容电介质冷却冷探头电路元件，如电容器，可以减少散热片等部件引入电路的干扰。

公开(公告)号：US20050218637A1

公开(公告)日：2005-10-06

申请号：US11096887

申请日：2005-04-01

申请人： Sean Burns

发明人： Sean Burns

IPC分类号： B60R21/26 ,  B60R21/264 ,  F02K9/20 ,  F42B5/16 ,  B60R21/28

CPC分类号： B60R21/2644 ,  F02K9/20 ,  F42B5/16

摘要： A gas generant tablet (24) for use in a linear inflator (10). The tablet (24) includes a body portion (102) having a first end (104), a second end (106), and a longitudinal axis (T). A first projection (108) extends from the tablet first end (104) in a first direction, with at least a portion of the first projection (108) extending non-orthogonally with respect to the tablet longitudinal axis (T). A second projection (112) extends from the tablet second end (106) in a second direction generally opposite the first direction. At least a portion of the second projection (112) extends non-orthogonally with respect to the tablet longitudinal axis (T). The tablet (24) is shaped such that a cavity (25) is formed between adjacent tablets (24) when the tablets are stacked within a combustion chamber of the inflator (10). Also disclosed is an inflator (10) for use in an inflatable vehicle occupant protection system (200). The inflator (10) includes a longitudinal enclosure (22) having a substantially uniform cross-sectional area along at least a portion of the enclosure. The enclosure (22) defines an interior cavity (22c) for containing a quantity of a gas generant composition therein, and includes a plurality of apertures (40) formed therealong to enable fluid communication between the enclosure interior cavity (22c) and an exterior of the enclosure. A plurality of gas generant tablets (24) is stacked along the enclosure (22), the tablets being shaped such that a cavity (25) is provided between adjacent tablets (24) when the tablets are stacked within the enclosure (22).

摘要翻译： 一种用于线性充气机（10）的气体发生剂片剂（24）。 片剂（24）包括具有第一端（104），第二端（106）和纵向轴线（T）的主体部分（102）。 第一突起（108）在第一方向上从片剂第一端（104）延伸，第一突起（108）的至少一部分相对于片剂纵向轴线（T）非正交地延伸。 第二突起（112）在大致与第一方向相反的第二方向上从片剂第二端（106）延伸。 第二突起（112）的至少一部分相对于片剂纵向轴线（T）非正交地延伸。 片剂（24）的形状使得当片剂堆叠在充气机（10）的燃烧室内时，相邻片剂（24）之间形成空腔（25）。 还公开了一种用于可充气车辆乘员保护系统（200）中的充气机（10）。 充气机（10）包括沿着外壳的至少一部分具有基本上均匀的横截面面积的纵向外壳（22）。 外壳（22）限定用于在其中容纳一定数量的气体发生剂组合物的内部空腔（22c），并且包括多个孔（40），所述多个孔（40）沿其形成，以使得外壳内腔（22c）和 外壳外观。 多个气体发生剂片（24）沿着封套（22）堆叠，片剂被成形为使得当片剂堆叠在封闭物（22）内时，相邻片剂（24）之间设置空腔（25）。

公开(公告)号：US07645621B2

公开(公告)日：2010-01-12

申请号：US11872900

申请日：2007-10-16

申请人： Colin Brodsky ,  Mary Jane Brodsky ,  Sean Burns ,  Habib Hichri

发明人： Colin Brodsky ,  Mary Jane Brodsky ,  Sean Burns ,  Habib Hichri

IPC分类号： H01L21/66 ,  G01R31/26 ,  G01N21/00 ,  G01C5/00

CPC分类号： G01N21/956 ,  H01L22/20

摘要： Inspection methods. A method includes adhering an optical blocking layer directly onto and in direct mechanical contact with a semiconductor process wafer, the blocking layer being substantially opaque to a range of wavelengths of light; applying at least one layer over the blocking layer; and inspecting optically at least one wavelength at least one inspection area, the blocking layer extending substantially throughout the inspection area. An inspection method including adhering an optical absorbing layer to a semiconductor process wafer, where the absorbing layer is configured to substantially absorb a range of wavelengths of light; applying at least one layer over the absorbing layer; and inspecting optically at least one wavelength at least one inspection area of the process wafer. A manufacturing method including ascertaining if a defect is present within a photoresist layer, and changing a semiconductor manufacturing process to prevent the defect, if the defect is present.

摘要翻译： 检验方法 一种方法包括将光学阻挡层直接粘附到半导体工艺晶片上并与半导体工艺晶片直接机械接触，所述阻挡层对于一定波长的光的范围基本上是不透明的; 在阻挡层上施加至少一层; 并且在光学上至少检测至少一个波长的至少一个检查区域，所述阻挡层基本上延伸遍及所述检查区域。 一种检查方法，包括将光吸收层粘附到半导体处理晶片，其中吸收层被配置为基本上吸收一定范围的光的波长; 在吸收层上施加至少一层; 并且在光学上检查至少一个波长的处理晶片的至少一个检查区域。 如果存在缺陷，则包括确定光致抗蚀剂层内是否存在缺陷以及改变半导体制造工艺以防止缺陷的制造方法。

公开(公告)号：US20090097017A1

公开(公告)日：2009-04-16

申请号：US11872900

申请日：2007-10-16

申请人： Colin Brodsky ,  Mary Jane Brodsky ,  Sean Burns ,  Habib Hichri

发明人： Colin Brodsky ,  Mary Jane Brodsky ,  Sean Burns ,  Habib Hichri

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  H01L22/20

摘要： Inspection methods. A method includes adhering an optical blocking layer directly onto and in direct mechanical contact with a semiconductor process wafer, the blocking layer being substantially opaque to a range of wavelengths of light; applying at least one layer over the blocking layer; and inspecting optically at least one wavelength at least one inspection area, the blocking layer extending substantially throughout the inspection area. An inspection method including adhering an optical absorbing layer to a semiconductor process wafer, where the absorbing layer is configured to substantially absorb a range of wavelengths of light; applying at least one layer over the absorbing layer; and inspecting optically at least one wavelength at least one inspection area of the process wafer. A manufacturing method including ascertaining if a defect is present within a photoresist layer, and changing a semiconductor manufacturing process to prevent the defect, if the defect is present.

摘要翻译： 检验方法 一种方法包括将光学阻挡层直接粘附到半导体工艺晶片上并与半导体工艺晶片直接机械接触，所述阻挡层对于一定波长的光的范围基本上是不透明的; 在阻挡层上施加至少一层; 并且在光学上至少检测至少一个波长的至少一个检查区域，所述阻挡层基本上延伸遍及所述检查区域。 一种检查方法，包括将光吸收层粘附到半导体处理晶片，其中吸收层被配置为基本上吸收一定范围的光的波长; 在吸收层上施加至少一层; 并且在光学上检查至少一个波长的处理晶片的至少一个检查区域。 如果存在缺陷，则包括确定光致抗蚀剂层内是否存在缺陷以及改变半导体制造工艺以防止缺陷的制造方法。

公开(公告)号：US20070113940A1

公开(公告)日：2007-05-24

申请号：US11479493

申请日：2006-06-30

申请人： Sean Burns ,  Deborah Hordos ,  Jason Newell

发明人： Sean Burns ,  Deborah Hordos ,  Jason Newell

IPC分类号： C06B29/00

CPC分类号： C06B29/02 ,  B60R2021/2648 ,  C06B23/009 ,  C06B29/08 ,  C06C9/00 ,  C06D5/06

摘要： A gas generator 10 includes an autoignition composition that contains an alkali metal chlorate such as potassium chlorate as an oxidizer, a carboxylic acid such as DL-tartaric acid as a fuel, and a desiccant in operable communication therewith. Gas generating systems 180 such as vehicle occupant protection systems 180, containing the gas generator 10, are also provided.

摘要翻译： 气体发生器10包括含有碱金属氯酸盐如氯酸钾作为氧化剂的自燃组合物，诸如DL-酒石酸的羧酸作为燃料，以及与其可操作地连通的干燥剂。 还提供了包含气体发生器10的诸如车辆乘员保护系统180的气体发生系统180。

公开(公告)号：US20070202790A1

公开(公告)日：2007-08-30

申请号：US11364277

申请日：2006-02-27

申请人： Sean Burns ,  William Dalsin

发明人： Sean Burns ,  William Dalsin

IPC分类号： F23J13/08

CPC分类号： F23L17/04

摘要： A chimney cap includes an intake pipe extension and an exhaust pipe extension; each extension includes an opening, the exhaust opening being disposed above the intake opening. The cap further includes solid sidewalls surrounding the intake opening and a diffusion plate disposed over the intake opening and below the exhaust opening.

摘要翻译： 烟囱盖包括进气管延伸部和排气管延伸部; 每个延伸部包括开口，排气口设置在进气口的上方。 所述盖还包括围绕所述进气开口的实心侧壁和设置在所述进气开口上方和所述排气口下方的扩散板。