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47 条记录 (耗时 0.032 秒)

    Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
    1.
    发明授权
    Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof 有权
    使用调谐聚合物膜作为底层的多层抗蚀剂系统及其制造方法

    公开(公告)号：US07361444B1

    公开(公告)日：2008-04-22

    申请号：US09256034

    申请日：1999-02-23

    申请人： Marie Angelopoulos ,  Katherina E. Babich ,  Douglas Charles LaTulipe ,  Qinghuang Lin ,  David R. Medeiros ,  Wayne Martin Moreau ,  Karen E. Petrillo ,  John P. Simons

    发明人： Marie Angelopoulos ,  Katherina E. Babich ,  Douglas Charles LaTulipe ,  Qinghuang Lin ,  David R. Medeiros ,  Wayne Martin Moreau ,  Karen E. Petrillo ,  John P. Simons

    IPC分类号： G03F7/023

    CPC分类号： G03F7/091 ,  Y10S430/145

    摘要： Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials. These underlayer films include the group consisting of novolac based resists whose processing conditions are controlled, polyarylsulfones such as the BARL material, polyhydroxystyrene based derivatives, an example being a copolymer of polyhydroxystyrene and polyhydroxystyrene reacted with anthracenemethanol that contains a cross-linker, and acid catalyst (thermal acid generator), polyimides, polyethers in particular polyarylene ethers, polyarylenesulfides, polycarbonates such as polyarylenecarbonates, epoxies, epoxyacrylates, polyarylenes such as polyphenylenes, polyarylenevinylenes such as polyphenylenevinylenes, polyvinylcarbazole, cyclicolefins, and polyesters. Such films have index of refraction and extinction coefficient tunable from about 1.4 to about 2.1 and from about 0.1 to about 0.6 at UV and DUV wavelengths, in particular 365, 248, 193 and 157 nm and EUV. Moreover, underlayer films produced in the present invention do not interact with the resist limiting interfacial mixing and contamination of resist by an outgassing product. The bilayer and TSI resist structures can be used for 248, 193, 157, EUV, x-ray, e-beam, and ion beam technology.

    摘要翻译： 公开了包括双层和顶面成像的多层抗蚀剂结构，其利用用作ARC的调谐底层，平坦化层和耐蚀刻硬掩模，其特性如光学，化学和物理性质被定制以产生呈现高分辨率的多层抗蚀剂结构 自由光刻及其制备方法。 这些下层膜包括其加工条件被控制的基于酚醛清漆的抗蚀剂的组，诸如BARL材料的聚芳基砜，聚羟基苯乙烯基衍生物，作为与含有交联剂的蒽甲醇反应的聚羟基苯乙烯和聚羟基苯乙烯的共聚物的实例，以及酸催化剂 （热酸生成剂），聚酰亚胺，聚醚，特别是聚亚芳基醚，聚芳基硫醚，聚碳酸酯如聚芳基碳酸酯，环氧化物，环氧丙烯酸酯，聚亚芳基如聚苯撑，聚亚芳基亚乙烯基如聚亚苯基亚乙烯基，聚乙烯基咔唑，环烯烃和聚酯。 这种膜的折射率和消光系数在UV和DUV波长，特别是365,248,293和157nm以及EUV下可调节为约1.4至约2.1和约0.1至约0.6。 此外，在本发明中制备的底层膜不与抗蚀剂界面混合和除气产物对抗蚀剂的污染相互作用。 双层和TSI抗蚀剂结构可用于248,193,157，EUV，X射线，电子束和离子束技术。

    Packaged radiation sensitive coated workpiece process for making and method of storing same
    8.
    发明授权
    Packaged radiation sensitive coated workpiece process for making and method of storing same 失效
    包装辐射敏感涂层工艺制造及其存储方法

    公开(公告)号：US06543617B2

    公开(公告)日：2003-04-08

    申请号：US09802471

    申请日：2001-03-09

    申请人： Marie Angelopoulos ,  Wu-Song Huang ,  Ranee Wai-Ling Kwong ,  David Robert Medeiros ,  Wayne Martin Moreau ,  Karen Elizabeth Petrillo ,  Herman Russell Wendt ,  Christopher Karl Magg

    发明人： Marie Angelopoulos ,  Wu-Song Huang ,  Ranee Wai-Ling Kwong ,  David Robert Medeiros ,  Wayne Martin Moreau ,  Karen Elizabeth Petrillo ,  Herman Russell Wendt ,  Christopher Karl Magg

    IPC分类号： B65D8500

    CPC分类号： G03F7/0012

    摘要： The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitvity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.

    摘要翻译： 本发明包括一个包装的涂层工件。 包装的涂层工件具有：（1）涂覆有对光辐射，微粒或化学污染物敏感的抗蚀剂膜的工件; （2）密封以封闭涂覆的工件和任选地第一吸气剂的内部阻隔件，以产生密封的第一外壳; 和（3）密封以封闭密封的第一外壳和任选的第二吸气剂的外屏障，只要所包封的涂覆的工件具有至少一个吸气剂，以产生适合于存储至少一个时间段的包装的涂覆的工件 周没有显着损失敏感性，分辨率或性能。 本发明还包括用于制备包装的涂层工件的方法以及将涂覆的工件的存储时间增加至少一周而不会显着降低灵敏度，分辨率或性能的方法。

    Developers for polychloroacrylate and polychloromethacrylate based resists
    9.
    发明授权
    Developers for polychloroacrylate and polychloromethacrylate based resists 失效
    聚氯丙烯酸酯和聚氯甲基丙烯酸酯基抗蚀剂的开发商

    公开(公告)号：US06221568B1

    公开(公告)日：2001-04-24

    申请号：US09421591

    申请日：1999-10-20

    申请人： Marie Angelopoulos ,  Wayne Martin Moreau ,  Karen Elizabeth Petrillo

    发明人： Marie Angelopoulos ,  Wayne Martin Moreau ,  Karen Elizabeth Petrillo

    IPC分类号： G03F732

    CPC分类号： G03F7/325

    摘要： The present invention is directed to developer compositions for poly-alpha-acrylate or methacrylate based resists giving high contrast and whose components are closely matched in boiling points. The use of the present developer improved the critical dimensional uniformity of images developed in a positive electron beam resist. More particularly, the present invention is directed to developer formulations whose compositions are directed to enhanced printed linearity, better across the plate uniformity, and improved contrast of the imaged positive resists. Such a improved developer can be used for the positive resist exposed by photons, electrons, ions, or X-rays.

    摘要翻译： 本发明涉及具有高对比度且其组分在沸点上紧密匹配的聚α-丙烯酸酯或甲基丙烯酸酯基抗蚀剂的显影剂组合物。 使用本发明人改善了在正电子束抗蚀剂中显影的图像的临界尺寸均匀性。 更具体地说，本发明涉及其组合物指向增强的印刷线性，更好地跨平板均匀性以及改进的成像正性抗蚀剂的对比度的显影剂制剂。 这种改进的显影剂可用于由光子，电子，离子或X射线暴露的正性抗蚀剂。

    Method of making a packaged radiation sensitive resist film-coated workpiece
    10.
    发明授权
    Method of making a packaged radiation sensitive resist film-coated workpiece 有权
    制造辐射敏感抗蚀剂膜涂层工件的方法

    公开(公告)号：US07168224B2

    公开(公告)日：2007-01-30

    申请号：US10295595

    申请日：2002-11-15

    申请人： Marie Angelopoulos ,  Wu-Song Huang ,  Ranee Wai-Ling Kwong ,  David Robert Medeiros ,  Wayne Martin Moreau ,  Karen Elizabeth Petrillo ,  Herman Russell Wendt ,  Christopher Karl Magg

    发明人： Marie Angelopoulos ,  Wu-Song Huang ,  Ranee Wai-Ling Kwong ,  David Robert Medeiros ,  Wayne Martin Moreau ,  Karen Elizabeth Petrillo ,  Herman Russell Wendt ,  Christopher Karl Magg

    IPC分类号： B65B29/00

    CPC分类号： G03F7/0012

    摘要： The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitivity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.

    摘要翻译： 本发明包括一个包装的涂层工件。 包装的涂层工件具有：（1）涂覆有对光辐射，微粒或化学污染物敏感的抗蚀剂膜的工件; （2）密封以封闭涂覆的工件和任选地第一吸气剂的内部阻隔件，以产生密封的第一外壳; 和（3）密封以封闭密封的第一外壳和任选的第二吸气剂的外屏障，只要所包封的涂覆的工件具有至少一个吸气剂，以产生适合于存储至少一个时间段的包装的涂覆的工件 周没有明显的灵敏度，分辨率或性能的损失。 本发明还包括用于制备包装的涂层工件的方法以及将涂覆的工件的存储时间增加至少一周而不会显着降低灵敏度，分辨率或性能的方法。