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公开(公告)号：US09044707B2
公开(公告)日：2015-06-02
申请号：US12085205
申请日：2006-09-25
CPC分类号： B01D53/32 , B01D53/007 , B01D2259/806 , B01D2259/818 , B01J19/126
摘要： In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
摘要翻译： 在包括微波发生器的微波等离子体消除装置的操作方法和用于从微波发生器接收微波能量的气室中，使用微波能量产生等离子体的微波能量的量， 对气室进行监控，微波发生器产生的微波能量的功率根据被监测的微波能量进行调整。
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公开(公告)号：US20100038230A1
公开(公告)日：2010-02-18
申请号：US12085205
申请日：2006-09-25
CPC分类号： B01D53/32 , B01D53/007 , B01D2259/806 , B01D2259/818 , B01J19/126
摘要： In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
摘要翻译： 在包括微波发生器的微波等离子体消除装置的操作方法和用于从微波发生器接收微波能量的气室中，使用微波能量产生等离子体的微波能量的量， 对气室进行监控，微波发生器产生的微波能量的功率根据被监测的微波能量进行调整。
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公开(公告)号：US20110197759A1
公开(公告)日：2011-08-18
申请号：US11990255
申请日：2006-07-27
IPC分类号： B03C3/34
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
摘要： A method is described for treating gas exhaust from a polysilicon etch process, which uses a plasma abatement device to treat the gas. The device comprises a stainless steel gas chamber having a gas inlet for receiving the gas and a gas outlet. As the gas may contain a halocompound and water vapour, the chamber is heated to a temperature that inhibits adsorption of water on the surface within the chamber, thereby inhibiting corrosion of the gas chamber. The gas is then conveyed to the gas chamber for treatment, and the temperature of the chamber is maintained above said temperature during treatment of the gas.
摘要翻译： 描述了一种用于处理来自多晶硅蚀刻工艺的排气的方法，其使用等离子体消除装置来处理气体。 该装置包括具有用于接收气体的气体入口和气体出口的不锈钢气室。 由于气体可能含有卤化合物和水蒸气，所以将该室加热到抑制室内表面上的水吸附的温度，从而抑制气室的腐蚀。 然后将气体输送到气室进行处理，并且在处理气体期间将室的温度保持在所述温度以上。
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公开(公告)号：US08776719B2
公开(公告)日：2014-07-15
申请号：US11990257
申请日：2006-07-27
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
摘要： A microwave plasma reactor (10) comprises a reactor chamber, a microwave resonant cavity (14) located within the reactor chamber, a waveguide (16) for conveying microwave radiation to the resonant cavity, the waveguide having a convergent tapered portion, means for forming an electromagnetic standing wave within the resonant cavity from the microwave radiation for initiating and sustaining a plasma within the resonant cavity, the resonant cavity having a gas inlet and a gas outlet, and conduit means extending from the gas outlet for containing a plasma conveyed from the resonant cavity with a gas flowing from the gas inlet to the gas outlet.
摘要翻译： 微波等离子体反应器（10）包括反应室，位于反应器室内的微波谐振腔（14），用于将微波辐射传送到谐振腔的波导（16），波导具有会聚锥形部分，用于形成 来自微波辐射的谐振腔内的电磁驻波，用于在谐振腔内引发和维持等离子体，谐振腔具有气体入口和气体出口，以及从气体出口延伸的管道装置，用于容纳从 谐振腔，其具有从气体入口到气体出口流动的气体。
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公开(公告)号：US08518162B2
公开(公告)日：2013-08-27
申请号：US11990255
申请日：2006-07-27
IPC分类号： B01D53/00
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
摘要： A method is described for treating gas exhaust from a polysilicon etch process, which uses a plasma abatement device to treat the gas. The device comprises a stainless steel gas chamber having a gas inlet for receiving the gas and a gas outlet. As the gas may contain a halocompound and water vapor, the chamber is heated to a temperature that inhibits adsorption of water on the surface within the chamber, thereby inhibiting corrosion of the gas chamber. The gas is then conveyed to the gas chamber for treatment, and the temperature of the chamber is maintained above said temperature during treatment of the gas.
摘要翻译： 描述了一种用于处理来自多晶硅蚀刻工艺的排气的方法，其使用等离子体消除装置来处理气体。 该装置包括具有用于接收气体的气体入口和气体出口的不锈钢气室。 由于气体可能含有卤化合物和水蒸气，所以将该室加热到抑制室内表面上的水吸附的温度，从而抑制气室的腐蚀。 然后将气体输送到气室用于处理，并且在处理气体期间将室的温度保持在所述温度以上。
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公开(公告)号：US20090165953A1
公开(公告)日：2009-07-02
申请号：US12084189
申请日：2006-09-26
IPC分类号： H01L21/3065 , C23C16/511 , B01J19/08
CPC分类号： B01D53/007 , B01D2259/806 , B01J19/088 , B01J19/126 , B01J2219/0809 , B01J2219/0869 , B01J2219/0871 , B01J2219/0875 , B01J2219/0883 , B01J2219/1227 , B01J2219/1239 , B01J2219/1245 , B01J2219/1266 , B01J2219/1269 , B01J2219/1272 , C23C16/4412
摘要： A plasma reactor (10) comprises a microwave resonant cavity (12) having a gas inlet (18) and a gas outlet (20), a waveguide (14) for conveying microwave radiation to the resonant cavity, and a plasma torch (40) for injecting into the resonant cavity a plasma stream containing ions for reacting with a gas flowing from the gas inlet (18) to the gas outlet (20).
摘要翻译： 等离子体反应器（10）包括具有气体入口（18）和气体出口（20）的微波谐振腔（12），用于将微波辐射传送到谐振腔的波导（14）和等离子体焰炬（40） 用于将包含离子的等离子体流注入到谐振腔中，所述离子流与从气体入口（18）流到气体出口（20）的气体反应。
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公开(公告)号：US08168128B2
公开(公告)日：2012-05-01
申请号：US12084189
申请日：2006-09-26
IPC分类号： B01J19/08
CPC分类号： B01D53/007 , B01D2259/806 , B01J19/088 , B01J19/126 , B01J2219/0809 , B01J2219/0869 , B01J2219/0871 , B01J2219/0875 , B01J2219/0883 , B01J2219/1227 , B01J2219/1239 , B01J2219/1245 , B01J2219/1266 , B01J2219/1269 , B01J2219/1272 , C23C16/4412
摘要： A plasma reactor (10) comprises a microwave resonant cavity (12) having a gas inlet (18) and a gas outlet (20), a waveguide (14) for conveying microwave radiation to the resonant cavity, and a plasma torch (40) for injecting into the resonant cavity a plasma stream containing ions for reacting with a gas flowing from the gas inlet (18) to the gas outlet (20).
摘要翻译： 等离子体反应器（10）包括具有气体入口（18）和气体出口（20）的微波谐振腔（12），用于将微波辐射传送到谐振腔的波导（14）和等离子体焰炬（40） 用于将包含离子的等离子体流注入到谐振腔中，所述离子流与从气体入口（18）流到气体出口（20）的气体反应。
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公开(公告)号：US07494633B2
公开(公告)日：2009-02-24
申请号：US11659641
申请日：2005-08-02
CPC分类号： B01D53/68 , B01D53/30 , B01D2257/2047 , Y02C20/30
摘要： Apparatus is described for treating an effluent fluid stream from a semiconductor manufacturing process tool. The apparatus comprises a combustion chamber, means for heating the combustion chamber, and a nozzle for injecting the effluent stream into the combustion chamber. The apparatus is configured to enable a fuel and an oxidant to be selectively injected into the effluent stream as required to optimise the combustion conditions for a particular effluent stream. In one to embodiment, a lance projecting into the nozzle selectively injects an oxidant into the effluent stream, and a sleeve surrounding the nozzle selectively injects a fuel into the effluent stream.
摘要翻译： 描述了用于处理来自半导体制造工艺工具的流出物流的装置。 该装置包括燃烧室，用于加热燃烧室的装置和用于将流出物流注入燃烧室的喷嘴。 该装置被配置为使燃料和氧化剂能够根据需要选择性地注入流出物流中，以优化特定流出物流的燃烧条件。 在一个实施例中，突出到喷嘴中的喷枪选择性地将氧化剂注入流出物流中，并且围绕喷嘴的套筒选择性地将燃料喷射到流出物流中。
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公开(公告)号：US08647580B2
公开(公告)日：2014-02-11
申请号：US11658240
申请日：2005-07-19
IPC分类号： B01D53/70
CPC分类号： F04C19/00 , C23C16/4412 , F04F5/54 , Y02C20/30
摘要： System for treating an effluent fluid stream from a process tool including a vacuum pump (16) for drawing an effluent stream from the process tool chamber, an abatement device (12) for treating the effluent stream and a liquid ring pump (14) for at least partially evacuating the abatement device (12). During use, the abatement device (12) converts one or more components of the effluent stream, for example F2 or a PFC, into one or more liquid-soluble a compounds, for example HF, that are less harmful to the environment. The liquid ring pump (14) receives the effluent stream and a liquid, and exhausts a solution of the liquid and the liquid-soluble component of the effluent stream. The liquid ring pump (14) thus operates as both a wet scrubber and an atmospheric vacuum pumping stage.
摘要翻译： 用于处理来自处理工具的流出物流的系统，包括用于从处理工具室抽出流出物流的真空泵（16），用于处理流出物流的减排装置（12）和用于处理流出物流的液环泵 至少部分地排除减排装置（12）。 在使用期间，减排装置（12）将流出物流（例如F2或PFC）的一种或多种组分转化成对环境有害的较少的一种或多种液体可溶的化合物，例如HF。 液体环泵（14）接收流出物流和液体，排出液体和流出物流的液体可溶性成分的溶液。 液环泵（14）因此作为湿式洗涤器和大气真空泵送阶段工作。
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公开(公告)号：US06530977B2
公开(公告)日：2003-03-11
申请号：US09796846
申请日：2001-03-01
IPC分类号： B01D4700
CPC分类号： B01D53/68 , B01D53/70 , B01D2258/0216
摘要： A method for the abatement of one or more pyrophoric gases in a gas stream, which includes introducing water in to the gas stream and/or mixing the gas stream with preheated air and introducing the gas stream in to a container in which the pyrophoric gases are abated.
摘要翻译： 一种用于减轻气流中的一种或多种自燃气体的方法，其包括将水引入气流中和/或将气流与预热的空气混合并将气流引入到其中自燃气体的容器中 减轻
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