Group III-nitride based resonant cavity light emitting devices fabricated on single crystal gallium nitride substrates
    1.
    发明申请
    Group III-nitride based resonant cavity light emitting devices fabricated on single crystal gallium nitride substrates 有权
    在单晶氮化镓衬底上制造的III族氮化物基谐振腔发光器件

    公开(公告)号:US20050087753A1

    公开(公告)日:2005-04-28

    申请号:US10693803

    申请日:2003-10-24

    摘要: In a method for producing a resonant cavity light emitting device, a seed gallium nitride crystal (14) and a source material (30) are arranged in a nitrogen-containing superheated fluid (44) disposed in a sealed container (10) disposed in a multiple-zone furnace (50). Gallium nitride material is grown on the seed gallium nitride crystal (14) to produce a single-crystal gallium nitride substrate (106, 106′). Said growing includes applying a temporally varying thermal gradient (100, 100′, 102, 102′) between the seed gallium nitride crystal (14) and the source material (30) to produce an increasing growth rate during at least a portion of the growing. A stack of group III-nitride layers (112) is deposited on the single-crystal gallium nitride substrate (106, 106′), including a first mirror sub-stack (116) and an active region (120) adapted for fabrication into one or more resonant cavity light emitting devices (108, 150, 160, 170, 180).

    摘要翻译: 在制造谐振腔发光器件的方法中,将氮化镓晶体(14)和源极材料(30)布置在设置在密封容器(10)中的含氮过热流体(44)中, 多区炉(50)。 在氮化镓晶体(14)上生长氮化镓材料以制造单晶氮化镓衬底(106,106')。 所述生长包括在种子氮化镓晶体(14)和源材料(30)之间施加时间上不同的热梯度(100,100',102,102'),以在至少一部分生长期间产生增加的生长速率 。 一组III族氮化物层(112)沉积在单晶氮化镓衬底(106,106')上,其包括第一反射镜子层(116)和适于制造成一体的有源区(120) 或更多的谐振腔发光器件(108,150,160,170,180)。

    Resonant cavity light emitting devices and associated method
    9.
    发明授权
    Resonant cavity light emitting devices and associated method 失效
    谐振腔发光器件及相关方法

    公开(公告)号:US07582498B2

    公开(公告)日:2009-09-01

    申请号:US11295627

    申请日:2005-12-06

    IPC分类号: H01L21/00 C30B15/00

    摘要: A method may produce a resonant cavity light emitting device. A seed gallium nitride crystal and a source material in a nitrogen-containing superheated fluid may provide a medium for mass transport of gallium nitride precursors therebetween. A seed crystal surface may be prepared by applying a first thermal profile between the seed gallium nitride crystal and the source material. Gallium nitride material may be grown on the prepared surface of the seed gallium nitride crystal by applying a second thermal profile between the seed gallium nitride crystal and the source material while the seed gallium nitride crystal and the source material are in the nitrogen-containing superheated fluid. A stack of group III-nitride layers may be deposited on the single-crystal gallium nitride substrate. The stack may include a first mirror sub-stack and an active region adaptable for fabrication into one or more resonant cavity light emitting devices.

    摘要翻译: 一种方法可以产生谐振腔发光器件。 种子氮化镓晶体和含氮过热流体中的源材料可以提供用于其间的氮化镓前体的质量传输的介质。 可以通过在种子氮化镓晶体和源材料之间施加第一热分布来制备晶种表面。 可以通过在种子氮化镓晶体和源材料之间施加第二热分布而在种子氮化镓晶体的制备表面上生长氮化镓材料,而种子氮化镓晶体和源材料在含氮过热流体 。 可以在单晶氮化镓衬底上沉积III族氮化物层的堆叠。 堆叠可以包括第一镜子子堆叠和适于制造成一个或多个谐振腔发光器件的有源区域。

    Group III-nitride based resonant cavity light emitting devices fabricated on single crystal gallium nitride substrates
    10.
    发明授权
    Group III-nitride based resonant cavity light emitting devices fabricated on single crystal gallium nitride substrates 有权
    在单晶氮化镓衬底上制造的III族氮化物基谐振腔发光器件

    公开(公告)号:US07009215B2

    公开(公告)日:2006-03-07

    申请号:US10693803

    申请日:2003-10-24

    IPC分类号: H01L33/00

    摘要: In a method for producing a resonant cavity light emitting device, a seed gallium nitride crystal (14) and a source material (30) are arranged in a nitrogen-containing superheated fluid (44) disposed in a sealed container (10) disposed in a multiple-zone furnace (50). Gallium nitride material is grown on the seed gallium nitride crystal (14) to produce a single-crystal gallium nitride substrate (106, 106′). Said growing includes applying a temporally varying thermal gradient (100, 100′, 102, 102′) between the seed gallium nitride crystal (14) and the source material (30) to produce an increasing growth rate during at least a portion of the growing. A stack of group III-nitride layers (112) is deposited on the single-crystal gallium nitride substrate (106, 106′), including a first mirror sub-stack (116) and an active region (120) adapted for fabrication into one or more resonant cavity light emitting devices (108, 150, 160, 170, 180).

    摘要翻译: 在制造谐振腔发光器件的方法中,将氮化镓晶体(14)和源极材料(30)布置在设置在密封容器(10)中的含氮过热流体(44)中, 多区炉(50)。 在氮化镓晶体(14)上生长氮化镓材料以制造单晶氮化镓衬底(106,106')。 所述生长包括在种子氮化镓晶体(14)和源材料(30)之间施加时间上不同的热梯度(100,100',102,102'),以在至少一部分生长期间产生增加的生长速率 。 一组III族氮化物层(112)沉积在单晶氮化镓衬底(106,106')上,其包括第一反射镜子层(116)和适于制造成一体的有源区(120) 或更多的谐振腔发光器件(108,150,160,170,180)。