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    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    2.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置

    公开(公告)号：US20120002185A1

    公开(公告)日：2012-01-05

    申请号：US13215616

    申请日：2011-08-23

    申请人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

    发明人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

    IPC分类号： G03B27/54

    CPC分类号： G03F7/7085 ,  G02B26/0833 ,  G03F7/70116 ,  G03F7/70266 ,  G03F7/70591 ,  G03F7/706

    摘要： A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.

    摘要翻译： 微光刻投影曝光装置包括可以由多个微镜形成的光学表面，以及被配置为测量与多个位置处的光学表面相关的参数的测量装置。 测量装置包括具有多个照明构件的照明单元，每个具有光出射面。 光学成像系统在其中布置至少两个光出射面的物平面与至少基本上与光学表面重合的像平面之间建立成像关系。 检测器单元在与光学表面相互作用后测量光的性质，并且评估单元基于由检测器单元确定的特性来确定每个位置的表面相关参数。

    Microlithographic projection exposure apparatus
    7.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US08854604B2

    公开(公告)日：2014-10-07

    申请号：US13215616

    申请日：2011-08-23

    申请人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

    发明人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20 ,  G02B26/08

    CPC分类号： G03F7/7085 ,  G02B26/0833 ,  G03F7/70116 ,  G03F7/70266 ,  G03F7/70591 ,  G03F7/706

    摘要： A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.

    摘要翻译： 微光刻投影曝光装置包括可以由多个微镜形成的光学表面，以及被配置为测量与多个位置处的光学表面相关的参数的测量装置。 测量装置包括具有多个照明构件的照明单元，每个具有光出射面。 光学成像系统在其中布置至少两个光出射面的物平面与至少基本上与光学表面重合的像平面之间建立成像关系。 检测器单元在与光学表面相互作用后测量光的性质，并且评估单元基于由检测器单元确定的特性来确定每个位置的表面相关参数。

    Illumination system of a microlithographic projection exposure apparatus
    8.
    发明授权
    Illumination system of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的照明系统

    公开(公告)号：US09046786B2

    公开(公告)日：2015-06-02

    申请号：US13604296

    申请日：2012-09-05

    申请人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

    发明人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

    IPC分类号： G03B27/72 ,  G03B27/54 ,  G03F7/20

    CPC分类号： G03F7/70158 ,  G03F7/70058

    摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

    摘要翻译： 微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。 由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。 位移机构改变衍射光学元件的相互空间排列。 在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。 这使得可以以简单的方式生产连续可变的照明设置。

    ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS
    9.
    发明申请
    ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS 审中-公开
    用于投影微结构的照明光学及相关方法

    公开(公告)号：US20090262324A1

    公开(公告)日：2009-10-22

    申请号：US12464730

    申请日：2009-05-12

    申请人： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

    发明人： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

    IPC分类号： G03B27/80

    CPC分类号： G03F7/7085 ,  G03F7/70116

    摘要： A microlithographic projection exposure apparatus (1) comprises an illumination system (4) with an illumination optics (5) for illuminating an illumination field in a reticle plane (6). The illumination optics (5) further includes a light distribution device (12a) which comprises a light deflection array (12) of separate elements and an optical assembly (21, 23 to 26) which converts the light intensity distribution defined by the light distribution device (12a) in a first plane (19) of the illumination optics (5) into an illumination angle distribution in the reticle plane (6). Downstream of an output coupling device (17), which is arranged in the light path between the light deflection array (12) and the reticle plane (6), a space and time resolving detection device (30) is exposed to outcoupled illumination light (31) in such a way that the detection device (30) detects a light intensity distribution corresponding to the light intensity distribution in the first plane (19). The detection device (30) allows the influence of separate elements or groups of separate elements on the light intensity distribution in the first plane (19) to be determined, particularly by varying said separate elements or groups of separate elements over time. The result is an illumination optics in which the function of the light deflection array is performed during normal operation.

    摘要翻译： 微光刻投影曝光装置（1）包括具有用于照亮标线板平面（6）中的照明场的照明光学器件（5）的照明系统（4）。 照明光学器件（5）还包括配光装置（12a），其包括分离元件的光偏转阵列（12）和光学组件（21,23至26），该光学组件（21,23至26）将由光分配装置 （5）的第一平面（19）中的光线（12a）成为所述掩模版平面（6）中的照明角度分布。 布置在光偏转阵列（12）和光罩平面（6）之间的光路中的输出耦合装置（17）的下游，空间和时间分辨检测装置（30）暴露于外耦合照明光 31），使得检测装置（30）检测对应于第一平面（19）中的光强度分布的光强度分布。 检测装置（30）允许确定分离的元件或单独元件组对第一平面（19）中的光强度分布的影响，特别是通过随时间改变所述单独元件或单独元件组。 结果是在正常操作期间执行光偏转阵列的功能的照明光学器件。

    Microlithographic projection exposure apparatus
    10.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US08891057B2

    公开(公告)日：2014-11-18

    申请号：US12818501

    申请日：2010-06-18

    申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

    摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

    摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。