公开(公告)号：US06870310B2

公开(公告)日：2005-03-22

申请号：US10618008

申请日：2003-07-14

申请人： Masahiko Okunuki ,  Hiroya Ohta ,  Norio Saito ,  Masaki Takakuwa ,  Sayaka Tanimoto ,  Takeshi Haraguchi

发明人： Masahiko Okunuki ,  Hiroya Ohta ,  Norio Saito ,  Masaki Takakuwa ,  Sayaka Tanimoto ,  Takeshi Haraguchi

IPC分类号： G03F7/20 ,  H01J1/46 ,  H01J3/02 ,  H01J29/46 ,  H01J37/06 ,  H01J37/07 ,  H01J37/09 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J3/029 ,  H01J37/07 ,  H01J37/09

摘要： This invention provides a multielectron gun which generates a plurality of electron beams having uniform characteristics. A multielectron gun (2) is formed of a plurality of electron guns (2a-2c). The electron gun (2a) has, in addition to an electron source (21a), Wehnelt electrode (22a), and anode electrode (23), a shield electrode (24) between the Wehnelt electrode (22a) and anode electrode (23). The shield electrode reduces field interference among the electron guns.

摘要翻译： 本发明提供一种多电子枪，其产生具有均匀特性的多个电子束。 多电子枪（2）由多个电子枪（2a-2c）形成。 电子枪（2a）除了电子源（21a），Wehnelt电极（22a）和阳极电极（23）之外还具有在Wehnelt电极（22a）和阳极电极（23）之间的屏蔽电极（24） 。 屏蔽电极减少电子枪之间的场干扰。

公开(公告)号：US20080067376A1

公开(公告)日：2008-03-20

申请号：US11751094

申请日：2007-05-21

申请人： Sayaka Tanimoto ,  Osamu Kamimura ,  Yasunari Sohda ,  Hiroya Ohta

发明人： Sayaka Tanimoto ,  Osamu Kamimura ,  Yasunari Sohda ,  Hiroya Ohta

IPC分类号： G21K7/00

CPC分类号： H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/24592 ,  H02N13/00

摘要： This invention provides a charged particle beam apparatus that can makes reduction in off axis aberration and separate detection of secondary beams to be compatible. The charged particle beam apparatus has: an electron optics that forms a plurality of primary charged particle beams, projects them on a specimen, and makes them scan the specimen with a first deflector; a plurality of detectors that individually detect a plurality of secondary charged particle beams produced from the plurality of locations of the specimen by irradiation of the plurality of primary charged particle beams; and a voltage source for applying a voltage to the specimen. The charged particle beam apparatus further has: a Wien filter for separating paths of the primary charged particle beams and paths of the secondary charged particle beams; a second deflector for deflecting the secondary charged particle beams separated by the Wien filter; and control means for controlling the first deflector and the second deflector in synchronization, wherein the plurality of detectors detect the plurality of secondary charged particle beams separated by the Wien filter individually.

摘要翻译： 本发明提供了一种带电粒子束装置，其可以减少离轴像差和将次级束的分离检测兼容。 带电粒子束装置具有：形成多个初级带电粒子束的电子光学器件，将它们投射在样本上，并使它们用第一偏转器扫描样本; 多个检测器，通过多个初级带电粒子束的照射，分别检测从样本的多个位置产生的多个次级带电粒子束; 以及用于向样本施加电压的电压源。 带电粒子束装置还具有：维纳滤波器，用于分离初级带电粒子束的路径和二次带电粒子束的路径; 用于偏转由维恩滤波器分离的二次带电粒子束的第二偏转器; 以及用于同步地控制第一偏转器和第二偏转器的控制装置，其中多个检测器分别检测由维恩过滤器分离的多个次级带电粒子束。

公开(公告)号：US07906761B2

公开(公告)日：2011-03-15

申请号：US12037623

申请日：2008-02-26

申请人： Sayaka Tanimoto ,  Hiroya Ohta ,  Hiroshi Makino ,  Ryuichi Funatsu

发明人： Sayaka Tanimoto ,  Hiroya Ohta ,  Hiroshi Makino ,  Ryuichi Funatsu

IPC分类号： G01N23/225 ,  H01J49/00

CPC分类号： G01N23/225 ,  H01J37/265 ,  H01J37/28

摘要： A charged particle beam apparatus that can achieve both high defect-detection sensitivity and high inspection speed for a sample with various properties in a multi-beam type semiconductor inspection apparatus. The allocation of the primary beam on the sample is made changeable, and furthermore, the beam allocation for performing the inspection at the optimum inspection specifications and at high speed is selected based on the property of the sample. In addition, many optical parameters and apparatus parameters are optimized. Furthermore, the properties of the selected primary beam are measured and adjusted.

摘要翻译： 一种能够实现多光束型半导体检查装置中具有各种性质的样品的高缺陷检测灵敏度和高检测速度的带电粒子束装置。 使样品上的一次光束的分配是可变的，此外，基于样品的性质选择用于以最佳检查规格和高速进行检查的光束分配。 此外，优化了许多光学参数和设备参数。 此外，测量和调整所选择的一次光束的性质。

公开(公告)号：US07880143B2

公开(公告)日：2011-02-01

申请号：US11958717

申请日：2007-12-18

申请人： Sayaka Tanimoto ,  Hiroya Ohta ,  Hiroshi Makino ,  Ryuichi Funatsu

发明人： Sayaka Tanimoto ,  Hiroya Ohta ,  Hiroshi Makino ,  Ryuichi Funatsu

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/0435 ,  H01J2237/2448 ,  H01J2237/24564 ,  H01J2237/24592

摘要： A plurality of primary beams are formed from a single electron source, the surface charge of a sample is controlled by at least one primary beam, and at the same time, the inspection of the sample is conducted using a primary beam other than this. Also, for an exposure area of the primary beam for surface charge control and an exposure area of the primary beam for the inspection, the surface electric field strength is set individually. Also, the current of the primary beam for surface charge control and the interval between the primary beam for surface charge control and the primary beam for inspection are controlled.

摘要翻译： 由单个电子源形成多个主光束，通过至少一个主光束来控制样品的表面电荷，同时使用除此之外的一次光束进行样品的检查。 此外，对于用于表面电荷控制的一次光束的曝光区域和用于检查的主光束的曝光区域，单独设置表面电场强度。 此外，控制用于表面电荷控制的主光束的电流以及用于表面电荷控制的主光束和用于检查的主光束之间的间隔。

公开(公告)号：US08193493B2

公开(公告)日：2012-06-05

申请号：US13032050

申请日：2011-02-22

申请人： Sayaka Tanimoto ,  Hiroya Ohta ,  Hiroshi Makino ,  Ryuichi Funatsu

发明人： Sayaka Tanimoto ,  Hiroya Ohta ,  Hiroshi Makino ,  Ryuichi Funatsu

IPC分类号： G01N23/00 ,  G01N23/225

CPC分类号： G01N23/225 ,  H01J37/265 ,  H01J37/28

摘要： A charged particle beam apparatus that can achieve both high defect-detection sensitivity and high inspection speed for a sample with various properties in a multi-beam type semiconductor inspection apparatus. The allocation of the primary beam on the sample is made changeable, and furthermore, the beam allocation for performing the inspection at the optimum inspection specifications and at high speed is selected based on the property of the sample. In addition, many optical parameters and apparatus parameters are optimized. Furthermore, the properties of the selected primary beam are measured and adjusted.

摘要翻译： 一种能够实现多光束型半导体检查装置中具有各种性质的样品的高缺陷检测灵敏度和高检测速度的带电粒子束装置。 使样品上的一次光束的分配是可变的，此外，基于样品的性质选择用于以最佳检查规格和高速进行检查的光束分配。 此外，优化了许多光学参数和设备参数。 此外，测量和调整所选择的一次光束的性质。

公开(公告)号：US20100133433A1

公开(公告)日：2010-06-03

申请号：US11958717

申请日：2007-12-18

申请人： Sayaka TANIMOTO ,  Hiroya Ohta ,  Hiroshi Makino ,  Ryuichi Funatsu

发明人： Sayaka TANIMOTO ,  Hiroya Ohta ,  Hiroshi Makino ,  Ryuichi Funatsu

IPC分类号： G01N23/225

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/0435 ,  H01J2237/2448 ,  H01J2237/24564 ,  H01J2237/24592

摘要： A plurality of primary beams are formed from a single electron source, the surface charge of a sample is controlled by at least one primary beam, and at the same time, the inspection of the sample is conducted using a primary beam other than this. Also, for an exposure area of the primary beam for surface charge control and an exposure area of the primary beam for the inspection, the surface electric field strength is set individually. Also, the current of the primary beam for surface charge control and the interval between the primary beam for surface charge control and the primary beam for inspection are controlled.

摘要翻译： 由单个电子源形成多个主光束，通过至少一个主光束来控制样品的表面电荷，同时使用除此之外的一次光束进行样品的检查。 此外，对于用于表面电荷控制的一次光束的曝光区域和用于检查的主光束的曝光区域，单独设置表面电场强度。 此外，控制用于表面电荷控制的主光束的电流以及用于表面电荷控制的主光束和用于检查的主光束之间的间隔。

公开(公告)号：US07189979B2

公开(公告)日：2007-03-13

申请号：US10822720

申请日：2004-04-13

申请人： Masahiko Okunuki ,  Hiroya Ohta

发明人： Masahiko Okunuki ,  Hiroya Ohta

IPC分类号： H01J37/07

CPC分类号： H01J37/065

摘要： An electron gun includes a cathode portion which emits electrons, an anode portion which accelerates the emission electrons, a bias portion which is arranged between the cathode portion and the anode portion and controls trajectories of the emission electrons, a shielding portion which is arranged below the anode portion and shields some of the emission electrons, and a cooling portion which cools the shielding portion. The bias portion controls the trajectories of the electrons so as to form a crossover between the bias portion and the anode portion, and prevents the electrons from emitting on the anode portion.

摘要翻译： 电子枪包括发射电子的阴极部分，加速发射电子的阳极部分，设置在阴极部分和阳极部分之间的偏置部分，并控制发射电子的轨迹;屏蔽部分布置在 阳极部分并屏蔽一些发射电子;以及冷却部分，其冷却屏蔽部分。 偏置部分控制电子的轨迹，以在偏压部分和阳极部分之间形成交叉，并防止电子在阳极部分上发射。

公开(公告)号：US06768118B2

公开(公告)日：2004-07-27

申请号：US10350188

申请日：2003-01-24

申请人： Yoshinori Nakayama ,  Yasunari Sohda ,  Hiroya Ohta ,  Norio Saitou ,  Masato Muraki ,  Masaki Takakuwa

发明人： Yoshinori Nakayama ,  Yasunari Sohda ,  Hiroya Ohta ,  Norio Saitou ,  Masato Muraki ,  Masaki Takakuwa

IPC分类号： H01J326

CPC分类号： H01J37/244 ,  H01J2237/24405 ,  H01J2237/31774

摘要： The present invention provides a beam monitoring sensor which can offer both high beam monitoring precision and high speed monitoring in a multi-electron beam writing system and a monitoring method using the same. In a Faraday cup for electron beam monitoring, tantalum or a heavy metal material having an atomic number larger than that of tantalum is used to provide a Faraday cup construction having a high aspect ratio. The micro Faraday cup permits electron beam monitoring having less beam leak to a high acceleration electron beam.

摘要翻译： 本发明提供了一种能够在多电子束书写系统中提供远光监测精度和高速监测的光束监测传感器以及使用其的监测方法。在用于电子束监测的法拉第杯中，钽或重金属 使用原子序数大于钽的材料来提供具有高纵横比的法拉第杯结构。 微法拉第杯允许电子束监测具有较少的光束泄漏到高加速度电子束。

公开(公告)号：US08592776B2

公开(公告)日：2013-11-26

申请号：US12554577

申请日：2009-09-04

申请人： Momoyo Enyama ,  Hiroya Ohta ,  Osamu Kamimura

发明人： Momoyo Enyama ,  Hiroya Ohta ,  Osamu Kamimura

IPC分类号： H01J3/16

CPC分类号： H01J37/153 ,  H01J37/1472 ,  H01J2237/151 ,  H01J2237/1534

摘要： With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the number of the multipoles need be prepared. In order to solve this problem as described, a charged particle beam apparatus is provided with at least one aberration corrector wherein the number of the multipoles required in the past is decreased by about a half by disposing an electrostatic mirror in an electron optical system.

摘要翻译： 使用多光束型带电粒子束装置和投影带电粒子束装置，在离轴像差校正器的情况下，需要准备多个多极，并且与数字对应的数量的电源 的多极需要准备。 为了解决上述问题，带电粒子束装置设置有至少一个像差校正器，其中通过在电子光学系统中设置静电镜，过去所需的多极数减少约一半。

公开(公告)号：US20120061565A1

公开(公告)日：2012-03-15

申请号：US13321583

申请日：2010-05-18

申请人： Momoyo Enyama ,  Hiroya Ohta ,  Taku Ninomiya ,  Mari Nozoe

发明人： Momoyo Enyama ,  Hiroya Ohta ,  Taku Ninomiya ,  Mari Nozoe

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/265 ,  H01J2237/2446 ,  H01J2237/2817

摘要： Disclosed is a charged particle beam device, wherein multibeam secondary electron detectors (121a, 121b, 121c) and a single beam detector (140; 640) are provided, and under the control of a system control unit (135), an optical system control circuit (139) controls a lens and a beam selecting diaphragm (141) and switches the electrooptical conditions between those for multibeam mode and those for single beam mode, thereby one charged particle beam device can be operated as a multibeam charged particle device and a single beam charged particle device by switching. Thus, observation conditions are flexibly changed in accordance with an object to be observed, and a sample can be observed with a high accuracy and high efficiency.

摘要翻译： 公开了一种带电粒子束装置，其中提供多波束二次电子检测器（121a，121b，121c）和单光束检测器（140; 640），并且在系统控制单元（135）的控制下，光学系统控制 电路（139）控制透镜和选择光阑（141），并将电光条件切换到用于多光束模式的光学条件和单光束模式之间，从而一个带电粒子束装置可以作为多光束带电粒子装置和单个 光束带电粒子装置通过切换。 因此，观察条件根据待观察的目标灵活地变化，并且可以高精度和高效率地观察样品。