公开(公告)号：US08736830B2

公开(公告)日：2014-05-27

申请号：US13145968

申请日：2009-12-10

申请人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

发明人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

IPC分类号： G01N21/00

CPC分类号： G01Q60/22 ,  G01N21/95607 ,  G11B5/84

摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

摘要翻译： 提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

公开(公告)号：US20120013890A1

公开(公告)日：2012-01-19

申请号：US13145968

申请日：2009-12-10

申请人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

发明人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

IPC分类号： G01N21/956 ,  G01N21/47

CPC分类号： G01Q60/22 ,  G01N21/95607 ,  G11B5/84

摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

摘要翻译： 提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

公开(公告)号：US08359661B2

公开(公告)日：2013-01-22

申请号：US12649468

申请日：2009-12-30

申请人： Takehiro Tachizaki ,  Masahiro Watanabe ,  Hideaki Sasazawa ,  Minoru Yoshida ,  Tsuneo Nakagomi ,  Teruaki Tokutomi

发明人： Takehiro Tachizaki ,  Masahiro Watanabe ,  Hideaki Sasazawa ,  Minoru Yoshida ,  Tsuneo Nakagomi ,  Teruaki Tokutomi

IPC分类号： G01Q60/52

CPC分类号： G01Q60/54 ,  G01Q60/56 ,  G01Q70/12

摘要： Applying an alternating current to a magnetic head as a sample generates an alternate-current magnetic field from the sample. A cantilever includes a probe that is made of a magnetic material or is coated with a magnetic material. The cantilever is displaced when it approaches the sample. Detecting the displacement of the cantilever detects distribution of the magnetic field from the sample. It is possible to fast measure distribution of the magnetic field generated from the sample when a frequency of the alternating current applied to the sample differs from a resonance frequency of the cantilever.

摘要翻译： 以交替电流作为样品施加磁头会产生来自样品的交流磁场。 悬臂包括由磁性材料制成或涂覆有磁性材料的探针。 悬臂在接近样品时被移位。 检测悬臂的位移检测样品的磁场分布。 当施加到样品的交流电流的频率与悬臂的共振频率不同时，可以快速测量从样品产生的磁场的分布。

公开(公告)号：US20100205699A1

公开(公告)日：2010-08-12

申请号：US12649468

申请日：2009-12-30

申请人： Takehiro TACHIZAKI ,  Masahiro Watanabe ,  Hideaki Sasazawa ,  Minoru Yoshida ,  Tsuneo Nakagomi ,  Teruaki Tokutomi

发明人： Takehiro TACHIZAKI ,  Masahiro Watanabe ,  Hideaki Sasazawa ,  Minoru Yoshida ,  Tsuneo Nakagomi ,  Teruaki Tokutomi

IPC分类号： G01Q60/52 ,  G01Q60/50

CPC分类号： G01Q60/54 ,  G01Q60/56 ,  G01Q70/12

摘要： Applying an alternating current to a magnetic head as a sample generates an alternate-current magnetic field from the sample. A cantilever includes a probe that is made of a magnetic material or is coated with a magnetic material. The cantilever is displaced when it approaches the sample. Detecting the displacement of the cantilever detects distribution of the magnetic field from the sample. It is possible to fast measure distribution of the magnetic field generated from the sample when a frequency of the alternating current applied to the sample differs from a resonance frequency of the cantilever.

摘要翻译： 以交替电流作为样品施加磁头会产生来自样品的交流磁场。 悬臂包括由磁性材料制成或涂覆有磁性材料的探针。 悬臂在接近样品时被移位。 检测悬臂的位移检测样品的磁场分布。 当施加到样品的交流电流的频率与悬臂的共振频率不同时，可以快速测量从样品产生的磁场的分布。

公开(公告)号：US08659761B2

公开(公告)日：2014-02-25

申请号：US13302948

申请日：2011-11-22

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02057 ,  G01B9/02003 ,  G01B9/02081 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70775

摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

摘要翻译： 在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。 因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。 在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光 允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

公开(公告)号：US08064066B2

公开(公告)日：2011-11-22

申请号：US12605089

申请日：2009-10-23

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02057 ,  G01B9/02003 ,  G01B9/02081 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70775

摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

摘要翻译： 在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。 因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。 在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光 允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

公开(公告)号：US20060215171A1

公开(公告)日：2006-09-28

申请号：US11188732

申请日：2005-07-26

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02057 ,  G01B9/02003 ,  G01B9/02081 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70775

摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

公开(公告)号：US20120062903A1

公开(公告)日：2012-03-15

申请号：US13302948

申请日：2011-11-22

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02057 ,  G01B9/02003 ,  G01B9/02081 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70775

摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

摘要翻译： 在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。 因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。 在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光 允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

公开(公告)号：US20100039652A1

公开(公告)日：2010-02-18

申请号：US12605089

申请日：2009-10-23

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02057 ,  G01B9/02003 ,  G01B9/02081 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70775

摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

摘要翻译： 在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。 因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。 在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光 允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

公开(公告)号：US07612889B2

公开(公告)日：2009-11-03

申请号：US11188732

申请日：2005-07-26

申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Shuichi Baba ,  Yasuhiro Yoshitake ,  Mineo Nomoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02057 ,  G01B9/02003 ,  G01B9/02081 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70775

摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

摘要翻译： 在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。 因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。 在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光 允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。