Pattern inspection device of substrate surface and pattern inspection method of the same
    1.
    发明授权
    Pattern inspection device of substrate surface and pattern inspection method of the same 有权
    基板表面图案检查装置及图案检验方法相同

    公开(公告)号:US08736830B2

    公开(公告)日:2014-05-27

    申请号:US13145968

    申请日:2009-12-10

    IPC分类号: G01N21/00

    摘要: There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

    摘要翻译: 提供了一种用于基板表面的图案检查装置,其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括:具有精细重复图案的近场光学头101; a&thetas; 驱动单元311,其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201,用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

    PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME
    2.
    发明申请
    PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME 有权
    基板表面图案检测装置及其图案检测方法

    公开(公告)号:US20120013890A1

    公开(公告)日:2012-01-19

    申请号:US13145968

    申请日:2009-12-10

    IPC分类号: G01N21/956 G01N21/47

    摘要: There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

    摘要翻译: 提供了一种用于基板表面的图案检查装置,其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括:具有精细重复图案的近场光学头101; a&thetas; 驱动单元311,其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201,用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

    SPECTRAL DETECTION METHOD AND DEVICE, AND DEFECT INSPECTION METHOD AND APPARATUS USING THE SAME
    3.
    发明申请
    SPECTRAL DETECTION METHOD AND DEVICE, AND DEFECT INSPECTION METHOD AND APPARATUS USING THE SAME 有权
    光谱检测方法和装置,以及缺陷检查方法和使用其的装置

    公开(公告)号:US20100182589A1

    公开(公告)日:2010-07-22

    申请号:US12626963

    申请日:2009-11-30

    IPC分类号: G01J3/08 G01J3/00

    摘要: In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.

    摘要翻译: 在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中,有利的是在短波长范围内使用宽波长范围的光。 然而,实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。 本发明提供一种用于检测图案缺陷的检查装置。 检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。 光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜,该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。

    Spectral detection method and device, and defect inspection method and apparatus using the same
    4.
    发明授权
    Spectral detection method and device, and defect inspection method and apparatus using the same 有权
    光谱检测方法和装置,以及使用其的缺陷检查方法和装置

    公开(公告)号:US08279431B2

    公开(公告)日:2012-10-02

    申请号:US12626963

    申请日:2009-11-30

    IPC分类号: G01N21/00

    摘要: In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.

    摘要翻译: 在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中,有利的是在短波长范围内使用宽波长范围的光。 然而,实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。 本发明提供一种用于检测图案缺陷的检查装置。 检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。 光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜,该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。