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    Alignment apparatus and exposure apparatus equipped therewith
    1.
    发明授权
    Alignment apparatus and exposure apparatus equipped therewith 失效
    对准装置和配备的曝光装置

    公开(公告)号：US5684595A

    公开(公告)日：1997-11-04

    申请号：US720212

    申请日：1996-09-26

    申请人： Masaki Kato ,  Hideo Mizutani ,  Masashi Tanaka

    发明人： Masaki Kato ,  Hideo Mizutani ,  Masashi Tanaka

    IPC分类号： G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

    CPC分类号： G03F9/70 ,  G03F9/7065 ,  G03F9/7088

    摘要： An alignment apparatus for aligning a first object (reticle) with a second object (wafer) when irradiating a projection light on the first object to project a pattern of the first object onto the second object through a projection optical system. The apparatus includes an illumination optical system for illuminating a plurality marks on the second object with an alignment light having a wavelength band different from the projection light, a detection optical system for receiving the alignment light from the illuminated mark through the projection optical system to detect an image of the mark formed by the alignment light, and a compensating optical system arranged within the detection optical system for compensating a chromatic aberration of magnification caused by the projection optical system due to the differences among the wavelengths within the wavelength band of the alignment light.

    摘要翻译： 一种对准装置，用于当通过投影光学系统照射第一物体上的投影光以将第一物体的图案投影到第二物体上时，使第一物体（光罩）与第二物体（晶片）对准。 该装置包括：照射光学系统，用于利用具有与投射光不同的波长带的对准光来照射第二物体上的多个标记;检测光学系统，用于通过投影光学系统接收来自照明标记的对准光，以检测 由对准光形成的标记的图像和布置在检测光学系统内的补偿光学系统，用于补偿由于对准光的波长带内的波长之间的差异而由投影光学系统引起的倍率色像差 。