公开(公告)号：US5679204A

公开(公告)日：1997-10-21

申请号：US621527

申请日：1996-03-25

申请人： Masayuki Kobayashi ,  Kiyoshi Maeda ,  Masato Toyota ,  Hiroshi Ohnishi ,  Hiroshi Tanaka ,  Toshio Komemura ,  Tamio Matsumura

发明人： Masayuki Kobayashi ,  Kiyoshi Maeda ,  Masato Toyota ,  Hiroshi Ohnishi ,  Hiroshi Tanaka ,  Toshio Komemura ,  Tamio Matsumura

IPC分类号： C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/00

CPC分类号： H01J37/32477 ,  H01J37/32559

摘要： Components such as an earth plate, a gas introduction ring, and the like placed in a reaction chamber in a plasma apparatus are made of aluminum containing magnesium in a concentration of 2.2 to 2.8% by weight and are not coated with alumite. In addition, a heater incorporated in a section of the reaction chamber heats the section during a plasma cleaning process. Further, an electrical discharge chamber is also incorporated in the plasma apparatus for providing a plasma to the reaction chamber for efficient plasma cleaning of the apparatus.

摘要翻译： 在等离子体装置中放置在反应室中的诸如接地板，气体引入环等的部件由含有2.2至2.8重量％的镁的铝制成，并且未涂覆有耐氧化铝。 此外，加入到反应室的一部分中的加热器在等离子体清洗过程中加热该部分。 此外，在等离子体装置中还并入放电室，用于向反应室提供等离子体，用于对装置进行有效的等离子体清洗。

公开(公告)号：US4691241A

公开(公告)日：1987-09-01

申请号：US671984

申请日：1984-11-15

申请人： Kunio Tomohisa ,  Kiyoshi Maeda ,  Masamichi Cho

发明人： Kunio Tomohisa ,  Kiyoshi Maeda ,  Masamichi Cho

IPC分类号： H04N1/053 ,  H04N1/113 ,  H04N1/12 ,  H04N1/193 ,  H04N1/401 ,  H04N5/217 ,  H04N1/10

CPC分类号： H04N1/193 ,  H04N1/053 ,  H04N1/401 ,  H04N5/2176 ,  H04N1/1135 ,  H04N1/12 ,  H04N2201/04712 ,  Y10S331/02

摘要： An image signal of the input and/or the output side is (are) multiplied by a shading compensation signal obtained from the output signal of a low-pass filter employed in a PLL circuit or a greating signal multiplying means.

摘要翻译： 将输入和/或输出侧的图像信号乘以由PLL电路中采用的低通滤波器的输出信号或加灰信号乘法装置获得的阴影补偿信号。

公开(公告)号：US4647145A

公开(公告)日：1987-03-03

申请号：US548307

申请日：1983-11-03

申请人： Kiyoshi Maeda ,  Kunio Tomohisa

发明人： Kiyoshi Maeda ,  Kunio Tomohisa

IPC分类号： H04N1/113 ,  G02B26/10 ,  G06T1/00 ,  H04N1/053 ,  H04N1/12 ,  H04N1/409

CPC分类号： H04N1/053 ,  G02B26/10 ,  H04N1/4092 ,  H04N1/1135 ,  H04N1/12 ,  H04N2201/0471 ,  H04N2201/04772

摘要： An image signal is obtained by scanning an original picture using a sharp beam and an unsharp beam which are different in phase in an image reproducing system.

摘要翻译： 通过使用在图像再现系统中相位不同的尖锐光束和不清晰光束扫描原始图像来获得图像信号。

公开(公告)号：US06461977B1

公开(公告)日：2002-10-08

申请号：US09417086

申请日：1999-10-13

申请人： Hiroshi Matsuo ,  Takuji Oda ,  Yuichi Yokoyama ,  Kiyoshi Maeda ,  Shinya Inoue ,  Yuji Yamamoto

发明人： Hiroshi Matsuo ,  Takuji Oda ,  Yuichi Yokoyama ,  Kiyoshi Maeda ,  Shinya Inoue ,  Yuji Yamamoto

IPC分类号： H01L21302

CPC分类号： H01L21/67069 ,  H01L21/31116 ,  H01L21/76897

摘要： An improved etching method allowing the formation of a silicon nitride film with an adequate film thickness at the sidewall portion of a pattern is disclosed. A silicon nitride film formed to cover a stepped pattern is dry-etched, employing plasma of mixed gases containing CH2F2 and O2. As a result, a sidewall spacer of the silicon nitride film is formed at the sidewall of the pattern in a self-aligned manner.

摘要翻译： 公开了一种改进的蚀刻方法，其允许在图案的侧壁部分处形成具有适当膜厚度的氮化硅膜。 用包含CH 2 F 2和O 2的混合气体的等离子体干蚀刻形成为覆盖阶梯图案的氮化硅膜。 结果，氮化硅膜的侧壁间隔物以自对准的方式形成在图案的侧壁处。

公开(公告)号：US06444515B2

公开(公告)日：2002-09-03

申请号：US09761176

申请日：2001-01-18

申请人： Hiroshi Matsuo ,  Yuichi Yokoyama ,  Takuji Oda ,  Kiyoshi Maeda ,  Shinya Inoue ,  Yuji Yamamoto

发明人： Hiroshi Matsuo ,  Yuichi Yokoyama ,  Takuji Oda ,  Kiyoshi Maeda ,  Shinya Inoue ,  Yuji Yamamoto

IPC分类号： H01L218238

CPC分类号： H01L27/10873 ,  H01L21/76805 ,  H01L21/76897 ,  H01L23/485 ,  H01L27/10888 ,  H01L27/10894 ,  H01L2924/0002 ,  H01L2924/00

摘要： A hard mask insulating layer is formed on a gate electrode which is formed on a main surface of a silicon substrate with a gate insulating layer interposed. An SiN sidewall spacer is directly formed on a thin SiO2 layer which is formed to cover a side surface of the gate electrode. A contact hole is formed to penetrate an interlayer insulating layer formed on an SiN stopper layer and reach the main surface of the silicon substrate.

摘要翻译： 在栅极电极上形成硬掩模绝缘层，栅电极形成在硅衬底的主表面上，栅极绝缘层被插入。 SiN侧壁间隔物直接形成在形成为覆盖栅电极的侧表面的薄SiO 2层上。 形成接触孔以穿透形成在SiN阻挡层上的层间绝缘层并到达硅衬底的主表面。

公开(公告)号：US5994227A

公开(公告)日：1999-11-30

申请号：US119045

申请日：1998-07-20

申请人： Hiroshi Matsuo ,  Takuji Oda ,  Yuichi Yokoyama ,  Kiyoshi Maeda ,  Shinya Inoue ,  Yuji Yamamoto

发明人： Hiroshi Matsuo ,  Takuji Oda ,  Yuichi Yokoyama ,  Kiyoshi Maeda ,  Shinya Inoue ,  Yuji Yamamoto

IPC分类号： H01L21/28 ,  H01L21/00 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/60 ,  H01L21/8242 ,  H01L21/8244 ,  H01L27/108 ,  H01L27/11

CPC分类号： H01L21/67069 ,  H01L21/31116 ,  H01L21/76897

摘要： An improved etching method allowing the formation of a silicon nitride film with an adequate film thickness at the sidewall portion of a pattern is disclosed. A silicon nitride film formed to cover a stepped pattern is dry-etched, employing plasma of mixed gases containing CH.sub.2 F.sub.2 and O.sub.2. As a result, a sidewall spacer of the silicon nitride film is formed at the sidewall of the pattern in a self-aligned manner.

公开(公告)号：US4517608A

公开(公告)日：1985-05-14

申请号：US398027

申请日：1982-07-14

申请人： Kiyoshi Maeda ,  Masashi Okamoto

发明人： Kiyoshi Maeda ,  Masashi Okamoto

IPC分类号： G03B27/50 ,  G03F5/00 ,  H04N1/036 ,  H04N1/06 ,  H04N1/191 ,  H04N1/23 ,  H04N1/405 ,  H04N1/22

CPC分类号： H04N1/0678 ,  H04N1/036 ,  H04N1/0657 ,  H04N1/1911 ,  H04N1/1916 ,  H04N1/1917 ,  H04N1/06

摘要： An image scanning and recording system includes a recording unit for duplicating and recording halftone images on a photosensitive material. The recording unit comprises an acousto-optic light modulating element including a plurality of ultrasonic wave exciting portions disposed side by side on a single acousto-optic medium. The ultrasonic wave exciting portions independently, modulate incident light into a plurality of modulated light beams in response to image signals from photoelectrical scanning means. A scale-down optical system then reduces the diameter of the plurality of modulated light beams, and a plurality of light transfer elements transfer the light beams from the scale-down optical system to a focussing lens system to be projected therefrom onto a film mounted on a recording cylinder.

摘要翻译： 图像扫描和记录系统包括用于在感光材料上复制和记录半色调图像的记录单元。 记录单元包括声光调制元件，声光调制元件包括在单个声光介质上并排设置的多个超声波激励部分。 超声波激励部分独立地响应于来自光电扫描装置的图像信号将入射光调制成多个调制光束。 缩小光学系统然后减小多个调制光束的直径，并且多个光传输元件将来自缩小光学系统的光束传送到聚焦透镜系统以从其投射到安装在其上的胶片上 记录圆筒。

公开(公告)号：US5039714A

公开(公告)日：1991-08-13

申请号：US335373

申请日：1989-04-10

申请人： Hideo Kasahara ,  Masashi Sakamoto ,  Hiroaki Ishikawa ,  Kiyoshi Maeda

发明人： Hideo Kasahara ,  Masashi Sakamoto ,  Hiroaki Ishikawa ,  Kiyoshi Maeda

IPC分类号： C08L51/04

CPC分类号： C08L51/04

摘要： A high-gloss, impact-resistant rubber-modified polystyrene composition, characterized in that said rubber-modified polystyrene consists essentially of(i) a polystyrene,(ii) dispersed particles of elastomeric polymers, and optionally polydimethylsiloxane and at least one member selected from the group consisting of mineral oil, and metallic salts or amides of higher fatty acids based on the total weight of the composition.

公开(公告)号：US4636869A

公开(公告)日：1987-01-13

申请号：US546046

申请日：1983-10-27

申请人： Kunio Tomohisa ,  Kiyoshi Maeda ,  Koji Yao

发明人： Kunio Tomohisa ,  Kiyoshi Maeda ,  Koji Yao

IPC分类号： G06T3/40 ,  H04N1/191 ,  H04N1/207 ,  H04N1/393 ,  H04N1/40 ,  H04N1/04 ,  H04N1/46

CPC分类号： G06T3/40 ,  H04N1/1911 ,  H04N1/207 ,  H04N1/3935 ,  H04N1/40068

摘要： In reproducing images, magnification conversion is performed either by reading image data from a memory in a skipped or overlapped fashion of their addresses of sub-scanning direction factor or by scanning certain scanning lines of an original picture (recording film) in a skipped or overlapped fashion in the sub-scanning direction according to a specified magnification ratio.

摘要翻译： 在再现图像中，通过以副扫描方向因子的地址的跳过或重叠方式从存储器读取图像数据或通过扫描跳过或重叠的原始图像（记录膜）的某些扫描线来执行放大转换 按照指定的放大率在副扫描方向上进行时尚。

公开(公告)号：US4221960A

公开(公告)日：1980-09-09

申请号：US960058

申请日：1978-11-13

申请人： Kiyoshi Maeda ,  Kyohei Fujisawa

发明人： Kiyoshi Maeda ,  Kyohei Fujisawa

IPC分类号： H04N1/23 ,  G02F1/01 ,  G02F1/11 ,  G05D25/02 ,  H01S3/10 ,  G11B7/00

CPC分类号： G05D25/02 ,  G02F1/0121 ,  G02F1/113

摘要： A light ray emitted by a light source and which is to be modulated by an acoustic-optical modulator element is stabilized by its intensity being detected before it enters the acoustic-optical modulator element and being used to produce correction signals. The correction signals are used to amplitude-modulate a high-frequency carrier in reverse phase to the change of intensity of the light ray, to produce corrected carrier signals. Then the corrected carrier signals are further amplitude-modulated by control signals to produce modulator signals which are used to modulate the light ray in the acoustic-optical modulator element.

摘要翻译： 由光源发射并由声光调制器元件调制的光线在其进入声光调制器元件之前被检测到的强度被稳定，并用于产生校正信号。 校正信号用于对与光线的强度的变化相反的高频载波进行幅度调制，以产生校正的载波信号。 然后校正的载波信号被控制信号进一步幅度调制，以产生用于调制声光调制器元件中的光线的调制器信号。