公开(公告)号：US08642796B2

公开(公告)日：2014-02-04

申请号：US13161012

申请日：2011-06-15

申请人： Masayuki Saito ,  Kazuharu Suzuki ,  Shunichi Nabeya

发明人： Masayuki Saito ,  Kazuharu Suzuki ,  Shunichi Nabeya

IPC分类号： C07F15/00 ,  C23C16/00

CPC分类号： C07F15/0053 ,  C23C16/18 ,  C23C16/45553

摘要： An object of the present invention is to provide an organoruthenium compound which has good film formation characteristics as an organoruthenium compound for chemical deposition, has a high vapor pressure, and can easily form a film even when hydrogen is used as a reactant gas. The present invention relates to an organoruthenium compound, dicarbonyl-bis(5-methyl-2,4-hexanediketonato)ruthenium (II) which can have isomers 1 to 3, wherein the content of the isomer 2 is 30% by mass or more, the content of the isomer 3 is 30% by mass or less, and the balance is the isomer 1.

摘要翻译： 本发明的目的是提供一种作为化学沉积的有机钌化合物具有良好的成膜特性的有机钌化合物，具有高的蒸气压，并且即使在使用氢作为反应气体时也能容易地形成膜。 本发明涉及可以具有异构体1〜3的有机钌化合物二羰基 - 双（5-甲基-2,4-己二酮）钌（II），其中异构体2的含量为30质量％以上， 异构体3的含量为30质量％以下，余量为异构体1。

公开(公告)号：US08911827B2

公开(公告)日：2014-12-16

申请号：US14003297

申请日：2012-04-16

申请人： Kazuharu Suzuki ,  Shunichi Nabeya ,  Masayuki Saito

发明人： Kazuharu Suzuki ,  Shunichi Nabeya ,  Masayuki Saito

IPC分类号： C23C16/18 ,  C07F15/00

CPC分类号： C23C16/18 ,  C07F15/0086

摘要： A chemical deposition method for producing a platinum thin film or a platinum compound thin film by chemical vapor deposition of an organoplatinum compound is represented by the following formula, which includes a divalent platinum atom, and hexadiene or a hexadiene derivative and alkyl anions coordinated to the divalent platinum atom. In the following formula, R1 and R2 are each an alkyl group, and may be different from each other. R3 and R4 are each a hydrogen atom or an alkyl group, and may be different from each other. The organoplatinum compound is satisfactory in stability and generates no toxic substance in film formation, and hence is satisfactory in handleability and excellent in practicability. The organoplatinum compound has a high vapor pressure, enables the film formation at a low temperature, and is useful as a CVD raw material easily forming a film on a spatial structure.

摘要翻译： 通过化学气相沉积有机铂化合物制备铂薄膜或铂化合物薄膜的化学沉积方法由下式表示，其包括二价铂原子，己二烯或己二烯衍生物和与 二价铂原子。 在下式中，R 1和R 2各自为烷基，并且可以彼此不同。 R 3和R 4各自为氢原子或烷基，并且可以彼此不同。 有机铂化合物的稳定性令人满意，成膜时不产生有毒物质，因此操作性好，实用性优异。 有机铂化合物具有高蒸气压，能够在低温下形成膜，并且可用作在空间结构上容易形成膜的CVD原料。

公开(公告)号：US20130344243A1

公开(公告)日：2013-12-26

申请号：US14003297

申请日：2012-04-16

申请人： Kazuharu Suzuki ,  Shunichi Nabeya ,  Masayuki Saito

发明人： Kazuharu Suzuki ,  Shunichi Nabeya ,  Masayuki Saito

IPC分类号： C23C16/18

CPC分类号： C23C16/18 ,  C07F15/0086

摘要： The present invention is an organoplatinum compound for producing a platinum thin film or a platinum compound thin film by chemical vapor deposition, wherein the organoplatinum compound is represented by the following formula, and includes a divalent platinum atom, and hexadiene or a hexadiene derivative and alkyl anions coordinated to the divalent platinum atom. In the following formula, R1 and R2 are each an alkyl group, and may be different from each other. R3 and R4 are each a hydrogen atom or an alkyl group, and may be different from each other. The organoplatinum compound is satisfactory in stability and generates no toxic substance in film formation, and hence is satisfactory in handleability and excellent in practicability. The organoplatinum compound has a high vapor pressure, enables the film formation at a low temperature, and is useful as a CVD raw material easily forming a film on a spatial structure.

摘要翻译： 本发明是通过化学气相沉积制造铂薄膜或铂化合物薄膜的有机铂化合物，其中有机铂化合物由下式表示，并且包括二价铂原子，己二烯或己二烯衍生物和烷基 阴离子与二价铂原子配位。 在下式中，R 1和R 2各自为烷基，并且可以彼此不同。 R 3和R 4各自为氢原子或烷基，并且可以彼此不同。 有机铂化合物的稳定性令人满意，成膜时不产生有毒物质，因此操作性好，实用性优异。 有机铂化合物具有高蒸气压，能够在低温下形成膜，并且可用作在空间结构上容易形成膜的CVD原料。

公开(公告)号：US08920875B2

公开(公告)日：2014-12-30

申请号：US13146420

申请日：2010-01-08

申请人： Kazuharu Suzuki ,  Masayuki Saito

发明人： Kazuharu Suzuki ,  Masayuki Saito

IPC分类号： C23C16/00 ,  C23C16/18 ,  H01L21/28 ,  H01L21/285 ,  H01L49/02 ,  C07F15/00

CPC分类号： C07F15/0046 ,  C23C16/18 ,  H01L21/28194 ,  H01L21/28556 ,  H01L28/65

摘要： To provide a ruthenium compound suitable for a chemical vapor deposition method (CVD method). A liquid cyclooctatetraenetricarbonyl ruthenium complex represented by the following Formula (1) is obtained by irradiating a solution mixture of dodecacarbonyl triruthenium and a cyclooctatetraene with light. A satisfactory ruthenium film or ruthenium oxide film can be easily obtained by a chemical vapor deposition method using the complex as a raw material.

摘要翻译： 提供适用于化学气相沉积法（CVD法）的钌化合物。 通过用光照射十二羰基三钌和环辛四烯的溶液混合物，得到由下式（1）表示的液体四环四羰基钌络合物。 通过使用该复合物作为原料的化学气相沉积法可以容易地获得令人满意的钌膜或氧化钌膜。

公开(公告)号：US20110287175A1

公开(公告)日：2011-11-24

申请号：US13146420

申请日：2010-01-08

申请人： Kazuharu Suzuki ,  Masayuki Saito

发明人： Kazuharu Suzuki ,  Masayuki Saito

IPC分类号： C07F15/00 ,  B05D5/12 ,  B01J19/08

CPC分类号： C07F15/0046 ,  C23C16/18 ,  H01L21/28194 ,  H01L21/28556 ,  H01L28/65

摘要： To provide a ruthenium compound suitable for a chemical vapor deposition method (CVD method). A liquid cyclooctatetraenetricarbonyl ruthenium complex represented by the following Formula (1) is obtained by irradiating a solution mixture of dodecacarbonyl triruthenium and a cyclooctatetraene with light. A satisfactory ruthenium film or ruthenium oxide film can be easily obtained by a chemical vapor deposition method using the complex as a raw material.

摘要翻译： 提供适用于化学气相沉积法（CVD法）的钌化合物。 通过用光照射十二羰基三钌和环辛四烯的溶液混合物，得到由下式（1）表示的液体四环四羰基钌络合物。 通过使用该复合物作为原料的化学气相沉积法可以容易地获得令人满意的钌膜或氧化钌膜。

公开(公告)号：US5266004A

公开(公告)日：1993-11-30

申请号：US670930

申请日：1991-03-18

申请人： Yasuo Tsumurai ,  Seiichi Kawauchi ,  Masato Saitoh ,  Shiyuji Abiko ,  Kazuharu Suzuki

发明人： Yasuo Tsumurai ,  Seiichi Kawauchi ,  Masato Saitoh ,  Shiyuji Abiko ,  Kazuharu Suzuki

IPC分类号： F04D25/10 ,  F04D29/70

CPC分类号： F04D25/10 ,  F04D29/703

摘要： A blower having a base, a main body which has an air inlet opening and an air blowing opening and which is rotatably mounted on a base, a fan disposed in the main body to make air entering the main body through the air inlet opening flow out of the main body through the air blowing opening, a motor for rotating the fan, an automatic rotation mechanism for rotating the main body through 360.degree. or more relative to the base, and an automatic oscillation mechanism for changing over the normal-direction and reverse-direction rotations of the main body on the base in a predetermined angular range.

摘要翻译： 一种鼓风机，具有基座，主体具有进气口和空气吹入口，并且可旋转地安装在基座上，风扇设置在主体中，以使空气通过进气口开口流入主体 通过吹风口主体，用于使风扇旋转的电动机，用于使主体相对于基座旋转360度或更大的自动旋转机构，以及用于在正向和反向转换的自动振荡机构 主体在基座上的预定角度范围内的方向旋转。