Long-laser-pulse method of producing thin films
    1.
    发明授权
    Long-laser-pulse method of producing thin films 失效
    长激光脉冲生产薄膜的方法

    公开(公告)号:US5019552A

    公开(公告)日:1991-05-28

    申请号:US482131

    申请日:1990-02-20

    摘要: A method of depositing thin films by means of laser vaporization employs a long-pulse laser (Nd-glass of about one millisecond duration) with a peak power density typically in the range 10.sup.5 -10.sup.6 W/cm.sup.2. The method may be used to produce high T.sub.c superconducting films of perovskite material. In one embodiment, a few hundred nanometers thick film of YBa.sub.2 Cu.sub.3 O.sub.7-x is produced on a SrTiO.sub.3 crystal substrate in one or two pulses. In situ-recrystallization and post-annealing, both at elevated temperature and in the presence of an oxidizing agenThe invention described herein arose in the course of, or under, Contract No. DE-C03-76SF0098 between the United States Department of Energy and the University of California.

    摘要翻译: 通过激光蒸发沉积薄膜的方法采用通常在105-106W / cm 2范围内的峰值功率密度的长脉冲激光(大约1毫秒持续时间的Nd玻璃)。 该方法可用于生产钙钛矿材料的高Tc超导膜。 在一个实施例中,在一个或两个脉冲中,在SrTiO3晶体衬底上产生几百纳米厚的YBa2Cu3O7-x膜。 在高温和氧化剂存在下,原位重结晶和后退火有助于提高膜质量。 薄膜厚度表现出具有蒸汽发射角的cosθ依赖性,并且薄膜组成与该角度无关。